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    • 2. 发明专利
    • Method for treating optical material and method for molding optical element
    • 用于处理光学材料的方法和用于模制光学元件的方法
    • JP2012091951A
    • 2012-05-17
    • JP2010239229
    • 2010-10-26
    • Asahi Glass Co Ltd旭硝子株式会社
    • KIMURA TAKESHISAIJO YOSHITAKAYAMAMOTO YUICHI
    • C03B11/00G02B1/00
    • Y02P40/57
    • PROBLEM TO BE SOLVED: To provide a method for molding an optical element, by which an optical element free from cloudiness can be obtained in press molding and which contributes to improvement of yield and productivity.SOLUTION: The method for molding an optical element includes: a heating step where a molding tool for the optical element is used which comprises a pair of upper die 2 and lower die 3 whose opposite surfaces serve as molding surfaces of the optical element and molds the optical element by pressurizing a heat-softened optical material 50 put on the lower die by bringing the dies close to each other, a bismuth-based optical material subjected to a chelate treatment step in which the material is brought into contact with a chelating agent is housed in the molding tool for the optical element, and the molding tool for the optical element is heated to soften the optical material in the molding tool; a pressing step where an optical element shape is imparted to the softened optical material by pressurizing the optical material by the use of the molding tool for the optical element by a pressing means; and a cooling step where the molding tool for the optical element is cooled after the pressing step to solidify the optical material to which the optical element shape has been imparted.
    • 要解决的问题:提供一种用于模制光学元件的方法,通过该方法可以在压制成型中获得没有混浊的光学元件,并且有助于提高产量和生产率。 解决方案:用于模制光学元件的方法包括:加热步骤,其中使用用于光学元件的模制工具,其包括一对上模2和下模3,其相对表面用作光学元件的模制表面 通过使模具靠近彼此而使放置在下模上的热软化光学材料50加压,对经过螯合处理步骤的铋基光学材料进行模制,其中材料与 螯合剂容纳在用于光学元件的模制工具中,并且用于光学元件的模制工具被加热以软化模制工具中的光学材料; 按压步骤,其中通过使用用于光学元件的模制工具通过加压装置对光学材料加压而将光学元件形状赋予软化的光学材料; 以及冷却步骤,其中用于光学元件的模制工具在压制步骤之后被冷却,以固化已赋予光学元件形状的光学材料。 版权所有(C)2012,JPO&INPIT
    • 3. 发明专利
    • Infrared shielding film-coated glass plate and its production method
    • 红外屏蔽薄膜包覆玻璃板及其生产方法
    • JP2007297264A
    • 2007-11-15
    • JP2007058809
    • 2007-03-08
    • Asahi Glass Co Ltd旭硝子株式会社
    • KODAIRA HIROKAZUTOMONAGA HIROYUKISUNAHARA KAZUOYAMAMOTO YUICHIKOBAYASHI DAISUKE
    • C03C17/25B32B18/00
    • PROBLEM TO BE SOLVED: To provide an infrared shielding film-coated glass plate having a high visible light transmittance, a low infrared transmittance, and a high electromagnetic transmittance and being applicable also to areas, such as automobile window glasses, required to have high mechanical and chemical durability and to provide its production method.
      SOLUTION: Disclosed is an infrared shielding film-coated glass plate comprising a glass substrate and a 200-3,000 nm-thick infrared-shielding film formed thereon and having a structure in which fine ITO particles having an average particle diameter of at most 100 nm are dispersed in a matrix based on silicon oxide and containing at least 2 atom% nitrogen based on the Si atoms.
      COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供具有高可见光透射率,低红外线透射率和高电磁透射率的红外屏蔽薄膜涂覆玻璃板,并且还可应用于汽车窗玻璃等要求的区域 具有较高的机械和化学耐久性,并提供其生产方法。 解决方案:公开了一种红外线屏蔽膜涂覆的玻璃板,其包括玻璃基板和形成在其上的200-3,000nm厚的红外屏蔽膜,并且具有其中平均粒径最多为细的ITO颗粒的结构 基于氧化硅将100nm分散在基质中,并且基于Si原子含有至少2原子%的氮。 版权所有(C)2008,JPO&INPIT
    • 4. 发明专利
    • Transparent electrically conductive substrate for solar cell and its manufacturing method
    • 用于太阳能电池的透明电导电基板及其制造方法
    • JP2007234866A
    • 2007-09-13
    • JP2006054779
    • 2006-03-01
    • Asahi Glass Co Ltd旭硝子株式会社
    • TANEDA NAOKISATO KAZUOYAMAMOTO YUICHIKOBAYASHI DAISUKE
    • H01L31/04
    • Y02E10/548
    • PROBLEM TO BE SOLVED: To include a high refractive index layer and to reduce the amount of alkali metal ion in a tin oxide layer. SOLUTION: A transparent electrically conductive substrate for solar cell includes, on a glass substrate, at least a high refractive index layer composed of a titanium oxide layer, a tin oxide layer, or a zinc oxide layer; a low refractive index layer composed of a silicon oxide layer; and a tin oxide layer arranged in this order from a substrate side. In the transparent electrically conductive transparent substrate for solar cell, the high refractive index layer is one formed by spraying stock gas and alcohol of 1 to 4 number of C atoms onto the glass substrate using ordinary pressure CVD process. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:包括高折射率层并减少氧化锡层中的碱金属离子的量。 解决方案:一种用于太阳能电池的透明导电基板在玻璃基板上至少包括由氧化钛层,氧化锡层或氧化锌层构成的高折射率层; 由氧化硅层构成的低折射率层; 以及从衬底侧依次排列的氧化锡层。 在用于太阳能电池的透明导电透明基板中,高折射率层是通过使用普通CVD法将原料气体和1至4个C原子的醇喷射到玻璃基板上形成的。 版权所有(C)2007,JPO&INPIT
    • 5. 发明专利
    • Substrate with transparent conductive film and its manufacturing method
    • 具有透明导电膜的基板及其制造方法
    • JP2005190700A
    • 2005-07-14
    • JP2003427277
    • 2003-12-24
    • Asahi Glass Co Ltd旭硝子株式会社
    • MATSUI TAKESHIGOTO YOSHIOYAMAMOTO YUICHI
    • B32B7/02B32B9/00C03C17/34H01B5/14H01B13/00
    • PROBLEM TO BE SOLVED: To provide a substrate with a transparent conductive film having high transparency, thin thickness, low resistance, small film surface deviation of a resistance value, and high heat resistance, and to provide the manufacturing method of the substrate with the transparent conductive film.
      SOLUTION: The substrate with transparent conductive film has a tin oxide film having a thickness of 5-20 nm on the substrate and an under layer film on the substrate side of the tin oxide film. In the tin oxide film, the maximum value of chlorine ion concentration in the tin oxide film in the distance from the interface between the under layer film and the tin oxide film to 1 nm is the maximum value or less of the chlorine ion concentration in the whole tin oxide film.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了提供一种具有透明度高,薄度小,电阻低,电阻值小的薄膜表面偏差和高耐热性的透明导电膜的基板,并且提供基板的制造方法 与透明导电膜。 解决方案:具有透明导电膜的基板在基板上具有厚度为5-20nm的氧化锡膜和氧化锡膜的基板侧上的下层膜。 在氧化锡膜中,从底层膜和氧化锡膜之间的界面到氧化锡膜的距离的氧化锡膜中的氯离子浓度的最大值是氯离子浓度的最大值 整个氧化锡膜。 版权所有(C)2005,JPO&NCIPI
    • 6. 发明专利
    • Plate glass for display substrate and its manufacturing method
    • 显示基板用玻璃及其制造方法
    • JP2007204295A
    • 2007-08-16
    • JP2006022586
    • 2006-01-31
    • Asahi Glass Co Ltd旭硝子株式会社
    • YAMAMOTO YUICHIAKIYAMA RYOJIICHIKURA EIJIHIROSE MOTOYUKI
    • C03B18/20C03C3/085C03C3/087C03C17/00G09F9/30H01J17/16
    • C03C3/083C03C3/085C03C3/087
    • PROBLEM TO BE SOLVED: To provide plate glass for a display substrate, which is manufactured so that the yellow color development to be generated on the undersurface of a silver electrode and its periphery is restrained even when the silver electrode is formed on the upper surface of the plate glass and to provide a method for manufacturing the plate glass for the display substrate.
      SOLUTION: The plate glass for the display substrate is manufactured by molding molten glass into original plate glass by a float process while surfacing/conveying the molten glass on molten tin and spraying SO
      2 gas continuously toward the surface of the original plate glass in the vicinity of an inlet of a slow cooling furnace or on the upstream side of the slow cooling furnace to form a protective layer. The average H atom concentration on the non-contact side of the plate glass with the molten tin is ≤2.5 mol% at the depth of the plate glass surface to 0.1 μm.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了提供用于显示基板的平板玻璃,其制造成使得即使当银电极形成在银电极及其周边时,也会抑制在银电极及其周边的下表面上产生的黄色显影 并且提供一种用于制造用于显示基板的平板玻璃的方法。 解决方案:用于显示基板的平板玻璃是通过浮法工艺将熔融玻璃模制成原始平板玻璃,同时在熔融锡上铺展/输送熔融玻璃并连续喷射SO 2 SB 2气体而制成的 原始平板玻璃的表面在缓慢冷却炉的入口附近或缓慢冷却炉的上游侧形成保护层。 平板玻璃与熔融锡的非接触侧的平均H原子浓度在平板玻璃表面的深度为≤2.5μmol至0.1μm。 版权所有(C)2007,JPO&INPIT