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1. 发明专利

JP2009109553A Exposure apparatus and correcting device for substrate 有权
标题翻译：曝光装置和基板校正装置
公开(公告)号：JP2009109553A
公开(公告)日：2009-05-21
申请号：JP2007278850
申请日：2007-10-26
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： HARA TAKAYUKI
IPC分类号： G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of correcting warpage or distortion of a substrate for print wiring. SOLUTION: A packing 3 is stretched by applying a positive pressure and brought into contact with an exposure table 1 to generate a sealed space 90; the sealed space 90 is vacuumed up by a vacuum suction hole 40 and a vacuum pump 4; and a plate 20 is pressed by the atmospheric pressure to apply load on a substrate 99 by the plate 20 and the exposure table 1 to correct the substrate 99. After the substrate suction pressure by the suction pump 11 reaches a prescribed setting, the vacuum pump 4 is stopped; the packing 3 is shrunk; a conveyance device 2 is retracted onto a carrying in conveyer 53; and exposure is carried out. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够校正用于印刷布线的基板的翘曲或变形的曝光装置。解决方案：通过施加正压拉伸填料3并与曝光台1接触以产生密封空间90; 密封空间90由真空抽吸孔40和真空泵4抽真空; 并且通过大气压力压板20，通过板20和曝光台1对基板99施加负载以校正基板99.在抽吸泵11的基板吸入压力达到规定的设定值之后，真空泵 4停了包装3收缩; 输送装置2缩回到输送机53的输送机构上; 并进行曝光。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2004309670A Exposure apparatus equipped with conveyance system 有权
标题翻译：装有输送系统的接触装置
公开(公告)号：JP2004309670A
公开(公告)日：2004-11-04
申请号：JP2003101067
申请日：2003-04-04
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： KIKUCHI KATSUSHI , HARA TAKAYUKI
IPC分类号： G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide an exposure apparatus in which a substrate can be efficiently conveyed.
SOLUTION: The conveyance equipment 1 is equipped with two forks 10, 10 arranged in parallel so as to hold a substrate 50 on the forks 10, 10. The fork 10 has a sucking mechanism to suck the substrate 50. The fork 10 has the length almost equal to the length of a carrying-in device 2 and a platen 3 or to the length of the platen 3 and the reversing machine 4 (L1+L2) so that one substrate 50 can be moved from the carrying-in device 2 to the platen 3 while another substrate 51 can be moved from the platen 3 to the reversing machine 4. The forks 10, 10 are extended from the transfer base 11, and the transfer base 11 is slidably supported on a pair of rails 12 installed on both sides of the carrying-in device 2 and is moved in the distance corresponding nearly to the distance of L1 or L2 over the rails 12 driven by a driving device 19.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决的问题：提供可以有效地输送基板的曝光装置。
解决方案：输送设备1配备有平行布置的两个叉10,10，以将基板50保持在叉10,10上。叉10具有用于吸附基板50的抽吸机构。叉10 具有几乎等于承载装置2和压板3的长度或压板3和反转机4（L1 + L2）的长度的长度，使得一个基板50能够从进入装置2到压板3，而另一个基板51能够从压板3移动到反转机4。叉10,10从转印基座11延伸，并且转印基座11可滑动地支撑在一对轨道12上安装在导入装置2的两侧，并且在由驱动装置19驱动的轨道12上几乎相当于L1或L2的距离的距离内移动。（C）2005年，JPO和NCIPI

3. 发明专利

JP2003174078A HOLDER 审中-公开
公开(公告)号：JP2003174078A
公开(公告)日：2003-06-20
申请号：JP2001370790
申请日：2001-12-05
申请人： ADTEC ENGINEENG CO LTD
发明人： HARA TAKAYUKI
IPC分类号： H01L21/683 , H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a holder which can suck a work depending on the shape or size thereof. SOLUTION: A suction port 1 and a suction pump 3 are coupled through a suction passage 10 being opened/closed through movement of a cylinder 2 and a negative pressure chamber 50 for moving the cylinder 2 is coupled between a work detection port 4 and a pump 5 for movement. When the work W is placed on the work detection port 4, the negative pressure chamber 50 is evacuated to bring abut a negative pressure. Consequently, only the cylinders 2c and 2d mounting no work W move to close the suction passage 10 thus stopping suction from the suction openings 1c and 1d. COPYRIGHT: (C)2003,JPO

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