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1. 发明专利

JPS63127836A CLAMPING MECHANISM FOR MINUTE ARTICLE 失效
公开(公告)号：JPS63127836A
公开(公告)日：1988-05-31
申请号：JP27278486
申请日：1986-11-18
申请人： ANRITSU CORP , NIPPON TELEGRAPH & TELEPHONE
发明人： CHIBA TSUTOMU , TANAKA MITSUO , NOMURA MINORU , YOSHINO KAORU
IPC分类号： B23P19/00 , B23P19/04 , B25J15/08 , H01L33/62 , H01S5/00 , H05K13/04
摘要： PURPOSE:To clamp all article at a constant position by installing a driving cam for transferring the first and second clamp members in the opposite outward direction from a clamp standard position and a stopper for allowing the first clamp member to stop at a standard position. CONSTITUTION:A minute article 1 set at the clamp standard position between the first and second clamp members 12 and 13 at the opened position by a cam 22, and the cam 22 is turned. Then, the first and second clamp members 12 and 13 shift in the opposite inward direction by the spring action of a pressing spring 16 and the first and second parallel spring members 17 and 18, and the first clamp member 12 abuts a stopper member 27, and stops at the clamp standard position. The second clamp member 13 presses the minute article 1 onto the first clamp member 12 by the spring action, and the minute article is clamped. When the cam 22 is turned from this clamp position, the first and second clamp members 12 shift in succession, and the article 1 is released.

2. 发明专利

JPS63127208A OPTICAL AXIS ALIGNING DEVICE 失效
公开(公告)号：JPS63127208A
公开(公告)日：1988-05-31
申请号：JP27278286
申请日：1986-11-18
申请人： ANRITSU CORP , NIPPON TELEGRAPH & TELEPHONE
发明人： CHIBA TSUTOMU , TANAKA MITSUO , NOMURA MINORU , IKEDA MASAHIRO
IPC分类号： G02B6/38 , G02B6/42
摘要： PURPOSE:To quickly and satisfactorily align optical axes by moving and controlling mobile optical axes so that the multiplication result of optical signal detection values corresponding to degrees of coupling of plural mobile optical axes to fixed optical axes is maximum. CONSTITUTION:Optical signals corresponding to degrees of coupling to fixed optical axes 2a and 2b on an optical fiber end face or the like are detected by optical signal detecting means 3a and 3b. Detection values A and B are processed by a multiplying means 6, and movement of optical axes 1a and 1b is fed back and controlled by a mobile optical axis driving means 6 until the peak value of the multiplication result AB is discriminated by a peak discriminating means 5. Consequently, it is unnecessary to independently obtain maximum degrees of coupling of plural optical axes to calculate an intermediate value of them, and plural optical axes are aligned quickly and satisfactorily, and the position of a PN composite element or the like in the luminous state is properly adjusted in a short time.

3. 发明专利

JPS63127209A OPTICAL AXIS ALIGNING DEVICE 失效
公开(公告)号：JPS63127209A
公开(公告)日：1988-05-31
申请号：JP27278386
申请日：1986-11-18
申请人： ANRITSU CORP , NIPPON TELEGRAPH & TELEPHONE
发明人： CHIBA TSUTOMU , TANAKA MITSUO , YOSHINO KAORU
IPC分类号： G02B6/42
摘要： PURPOSE:To easily and quickly align the optical axis of a semiconductor PN junction element to that of an optical waveguide without damaging by moving the semiconductor PN junction element by probe opening/closing mechanisms to align the optical axis. CONSTITUTION:Movement of a PN junction element 1 is controlled through a heat sink 23 by probe opening/closing mechanisms 42 and 42' consisting of conductive materials and is controlled by a probe opening/closing mechanism 43 which is orthogonal to mechanisms 42 and 42' and consists of a conductive material. Optical axes of the element 1 and optical waveguide 16 and 16' are aligned if laser beam from optical waveguides 16 and 16' of an optical module are made incident and the element 1 is positioned so that the indicated value of a selecting level meter 15 between probes 41 and 40 connected to mechanisms 43 and 42 is maximum, and in this state, the optical module which fixes the heat sink 23 and a waveguide 18 is generated. By this optional axis alignment free from thermal and mechanical stress, the optical axis of the semiconductor PN junction element is easily and quickly aligned to that of the optical waveguide without damage.

4. 发明专利

JPH0234844B2 失效
公开(公告)号：JPH0234844B2
公开(公告)日：1990-08-07
申请号：JP10071582
申请日：1982-06-14
申请人： ANRITSU CORP
发明人： CHIBA TSUTOMU , YAMADA MASAO
IPC分类号： B65G47/46 , B07C3/08 , B65G47/86

5. 发明专利

JPH0234845B2 失效
公开(公告)号：JPH0234845B2
公开(公告)日：1990-08-07
申请号：JP10071682
申请日：1982-06-14
申请人： ANRITSU CORP
发明人： CHIBA TSUTOMU , YAMADA MASAO
IPC分类号： B65G47/46 , B07C3/08 , B65G47/86

6. 发明专利

JPS6153731A Etching method by ultraviolet ray and apparatus for the same 失效
标题翻译：紫外线辐射的蚀刻方法及其设备
公开(公告)号：JPS6153731A
公开(公告)日：1986-03-17
申请号：JP17518984
申请日：1984-08-24
申请人： Anritsu Corp
发明人： KOTADO SETSUO , CHIBA TSUTOMU
IPC分类号： H01L21/302 , C23F4/00
摘要： PURPOSE: To realize dry etching and makes unnecessary use of photoresist by placing a substance which can generate reactive activated group with irradiation of ultraviolet ray in contact with the surface of material to be processed and irradiating the material to be processed with focused ultraviolet layer.
CONSTITUTION: A material to be processed 20 is housed within a vessel 4 of etching apparatus using ultraviolet ray, the ultraviolet ray generated from the ultraviolet ray source 10 is transmitted through a transmitting window 5 of such vessel 4. Cl
2 which generates reactive activated groupwith irradiation of ultraviolet ray to a substance 20 to be processed in supplied to the vessel 4 after adjustment with needle valve from the gas supply port 6 provided to the vessel 4. Moreover, reaction byproducts generated from the surface of substance 20 to be processed are absorbed with a reaction byproduct exhaust port 7 to the outside of vessel. The substance to be processed 20 is irradiated with ultraviolet laser emitted from the light source 10 focused through reflection mirror 12, collimeter lens 13 from the dry-etching and thereby the mask using photoresist is unnecessitated.
COPYRIGHT: (C)1986,JPO&Japio
摘要翻译：目的：为了实现干蚀刻，并且通过将能够产生反应性活性基团的物质与被处理材料表面接触的紫外线照射放置在被照射被处理材料的聚焦紫外线层上来实现光刻胶的不必要的使用。构成：将待处理材料20放置在使用紫外线的蚀刻装置的容器4内，由紫外线源10产生的紫外线透过这种容器4的透光窗5。的紫外线照射到被提供给容器4的物质20上，用针阀从设置在容器4上的气体供给口6调节后进行。另外，由待处理物质20的表面产生的反应副产物被反应副产物排气口7到容器的外部。用干蚀刻从被反射镜12，碰撞透镜13聚焦的光源10发出的紫外线激光照射待处理物体20，从而不需要使用光致抗蚀剂的掩模。

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