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1. 发明专利

JPH07300677A FILM FORMATION AND APPARATUS THEREFOR BY PHOTO-CVD 失效
公开(公告)号：JPH07300677A
公开(公告)日：1995-11-14
申请号：JP10053592
申请日：1992-03-26
申请人： AGENCY IND SCIENCE TECHN , ASAHI GLASS CO LTD , ISUZU CERAMICS RES INST , NTN TOYO BEARING CO LTD , NIPPON SEIKO KK
发明人： SHIKADA YORIO , KIKUCHI KAORU , HASHIZUME KENICHI , MITSUI AKIRA , OTSUKA YOSHIRO , TANIGUCHI MASAHIKO , NAKANISHI KIYOSHI , IWASAKI MIKA , ITO HIROYUKI , SAITO TAKESHI , TAKAHASHI KUNIHIKO
IPC分类号： C23C16/48 , H01L21/205
摘要： PURPOSE:To efficiently form thin films by accelerating vapor phase precipitation reaction by a photochemical reaction by light energy and forming the thin films on a substrate at a low temp. CONSTITUTION:This apparatus is provided with a plasma generating chamber 18 for supplying reactive gases formed by plasma excitation onto the substrate 17 of a reaction chamber 15 separately from this reaction chamber 15. Reactive gases are supplied from a reactive gas supplying system 13 onto the substrate 17 and are put into an active state by the reaction with the radicals, etc., activated in the plasma generating chamber 14. The excitation by the photochemical reaction necessary for film formation is then efficiently effected by irradiation with a laser by an excimer laser irradiation system 11, by which the thin films are formed on the substrate 17 at a low temp. As a result, an improvement in the efficient decomposition efficiency of the reactive gases at room temp., high-speed formation of the films, improvement in film quality, control of reaction products, etc., are attained.

2. 发明专利

JPH04370522A MAGNETIC RECORDING MEDIUM 失效
公开(公告)号：JPH04370522A
公开(公告)日：1992-12-22
申请号：JP17453591
申请日：1991-06-19
申请人： ASAHI GLASS CO LTD
发明人： MAKINO ICHIRO , HASHIZUME KENICHI
IPC分类号： G11B5/72
摘要： PURPOSE:To improve durability by having protective films, the outermost layer of which consists of an amorphous oxynitride, above recording film. CONSTITUTION:At least one layer of the protective films (P) are provided above the magnetic recording film and the outermost layer on the air side of the P is formed of the oxynitride and more particularly the amorphous oxynitride. The oxynitride contg. silicon, aluminum, oxygen, and nitrogen, as well as least one kind among group 3A, 4A elements of periodic table is more preferable. The film thickness is preferably 40 to 2000Angstrom and more preferably 100 to 500Angstrom . The film forming method of the P includes sputtering, vapor deposition and CVD methods. The durability is further improved in this way.

3. 发明专利

JPH0388730A PRESS-FORMING DIE FOR GLASS 失效
公开(公告)号：JPH0388730A
公开(公告)日：1991-04-15
申请号：JP22305589
申请日：1989-08-31
申请人： ASAHI GLASS CO LTD
发明人： SEGAWA MASARU , HASHIZUME KENICHI , SUGIO TAKESHI , ABE KEISUKE
IPC分类号： C03B9/48 , C03B11/00 , C03B11/08
摘要： PURPOSE:To improve the durability of the press-forming die for glass by coating the forming surface of the die with the film of beta-SiC or beta-SiC and graphite in uniform thickness and specifying the degree of orientation of the (111) face of the film. CONSTITUTION:A glass forming die made of a ceramic such as sintered SiC or a sintered hard alloy of WC-Co, etc., is set in a CVD device, and an Si compd. such as SiCl4, a C source such as CH4 and H2 are introduced respectively in specified amts. at a specified rate and allowed to react with one another at 1250-1500 deg.C in the gas phase. Consequently, a glass forming die excellent in releasability and durability with a beta-SiC film having 80-100% degree of orientation on the (111) face formed on its glass forming surface made of the ceramic or sintered hard alloy is obtained. When a material contg. 99.5-90wt.% beta-SiC having a (111) face orienting property and 0.5-10wt.% graphite and in which the degree of orientation on the (111) face is controlled to 50-100% is used as the component of the film coating the glass forming surface, the similar glass forming die is obtained.

4. 发明专利

JPH0323267A SILICON CARBIDE SINTERED BODY 失效
公开(公告)号：JPH0323267A
公开(公告)日：1991-01-31
申请号：JP15214189
申请日：1989-06-16
申请人： ASAHI GLASS CO LTD
发明人： SEGAWA MASARU , HASHIZUME KENICHI
IPC分类号： C04B35/565 , C04B35/56 , C04B41/87
摘要： PURPOSE:To enhance the density, strength and thermal shock resistance of a silicon carbide sintered body by specifying the sintered body and coating the pores in the sintered body with a silicon carbide coating film formed by a vapor phase method. CONSTITUTION:This silicon carbide sintered body is produced by coating the pores in a specified sintered body with a silicon carbide coating film formed by a vapor phase method. The coating film contains >=60% beta=SiC. The specified sintered body is obtd. by sintering silicon carbide powder contg. >=70wt.% powder of

5. 发明专利

JPH0465374A FORMATION OF SILICON CARBIDE COATING FILM ON SILICON IMPREGNATED SILICON CARBIDE-BASED CERAMICS 失效
公开(公告)号：JPH0465374A
公开(公告)日：1992-03-02
申请号：JP17628190
申请日：1990-07-05
申请人： ASAHI GLASS CO LTD
发明人： HASHIZUME KENICHI
IPC分类号： C04B35/565 , C04B35/56 , C04B41/87
摘要： PURPOSE:To increase the bonding strength of a coating film, to prevent the diffusion of impurities at the time use as a member of a semiconductor diffusing furnace and to enhance the reliability of a product by starting the formation of the coating film at a prescribed temp. or below forming the film without leaving voids in the film and at the interface. CONSTITUTION:Silicon is impregnated into silicon carbide-based ceramics and this ceramics is heated to 850-1,000 deg.C under reduced pressure, SiH4 as reactive gases or CH3SiCl3 as a reactive gas is then introduced and a coating film of >=10 mum thickness is formed and heated to 1,200-1,400 deg.C without cooling.

6. 发明专利

JPH03103329A PRESSING MOLD FOR GLASS AND PRODUCTION THEREOF 失效
公开(公告)号：JPH03103329A
公开(公告)日：1991-04-30
申请号：JP24058289
申请日：1989-09-19
申请人： ASAHI GLASS CO LTD
发明人： HASHIZUME KENICHI , SUGIO TAKESHI
IPC分类号： C03B11/00 , C03B11/08
摘要： PURPOSE:To stably mold a glass article having high precision by using a forming mold made of a dense silicon carbide ceramics containing Al2O3 fine particles uniformly dispersed in the bonded part of SiC and containing alpha-crystal as a major part of the SiC crystal. CONSTITUTION:The press-forming mold of glass is made of a dense silicon carbide ceramics containing Al2O3 fine particles uniformly dispersed in the bonded part of SiC and containing alpha-SiC crystal accounting for >=80% of the SiC crystal. The mold can be produced by the following method. Powder of alpha-SiC or beta-SiC is mixed with 0.5-10wt.% of Al2O3 powder and the mixture is crushed to obtain the raw material. The material is sintered to a density of >=94% using a hot-press or without applying a load and then sintered to a density of >=99% with a hot isostatic press(HIP).

7. 发明专利

JPH05242427A 失效
公开(公告)号：JPH05242427A
公开(公告)日：1993-09-21
申请号：JP7534892
申请日：1992-02-26
申请人： ASAHI GLASS CO LTD
发明人： HASHIZUME KENICHI
IPC分类号： G11B5/31
摘要： PURPOSE:To prevent the selective wear-down of a 'Permalloy(R)' film at the time of working a head and to decrease the fluctuations in recording characteristics by dispersing and incorporating oxide particulates into a soft magnetic alloy constituting the thin-film magnetic head core. CONSTITUTION:The thin-film magnetic head core is formed by forming the 'Permalloy(R)' film 3 by an electroplating method on a substrate 1 and forming a ceramic insulating layer 2 thereon. The oxide particulates 4 are dispersed and incorporated into this 'Permalloy(R)' film 3. Oxide particles of alumina, silica and zirconia or mixtures composed of these oxide particles are used as the particulates 4. The grain size of the particulates is specified to a 50 to 500nm range and the volumetric fraction thereof in the core is specified to 5 to 30%. The working characteristics of the 'Permalloy(R)' film 3 are thereby improved and the selective wear-down of the 'Permalloy(R)' film 3 during the working of the head is prevented. The thin-film magnetic head core, therefore, has eventually the stable magnetic characteristics.

8. 发明专利

JPH04318955A GLASS BOARD FOR DUMMY WAFER 失效
公开(公告)号：JPH04318955A
公开(公告)日：1992-11-10
申请号：JP11256391
申请日：1991-04-17
申请人： ASAHI GLASS CO LTD
发明人： ISHIKAWA HIROYUKI , HASHIZUME KENICHI , MAKINO ICHIRO
IPC分类号： G03F1/84 , H01L21/02 , H01L21/027 , H01L21/66
摘要： PURPOSE:To have a light-screening film part excellent in chemical durability and mechanical durability by providing a light-screening film consisting of ceramics on a part of the glass substrate surface. CONSTITUTION:A light-screening film 2 consisting of a metal, a metal oxide or ceramics is provided on a part of the surface of a glass substrate 1, further, a transparent film of a zirconium silicide oxide is provided at least to cover the light-screening film 2. In order to provide the light-screening film 2 on a part of the surface of the glass substrate 1, a film can be made on a desired part by a sputtering method, also a method, where the light-screening film 2 excepting the desired part is removed by etching or the like can be adopted after making the light-screening film 2 on the whole of the surface. Thereby, it can act as the light-screening film 2 sufficiently efficient in an anti-abrasion property and chemical durability.

9. 发明专利

JPH03208859A CERAMIC SECTION FOR MELTING AND MOLDING GLASS 失效
公开(公告)号：JPH03208859A
公开(公告)日：1991-09-12
申请号：JP102590
申请日：1990-01-09
申请人： ASAHI GLASS CO LTD
发明人： HASHIZUME KENICHI , SAKAI TSUNEZO
IPC分类号： C03B40/02 , C03B5/167 , C03B19/09 , C03B40/00 , C04B35/00
摘要： PURPOSE:To nearly prevent the melt sticking of glass to an oxide ceramic section and to improve the durability of the section by incorporating tungsten oxide into the ceramic section for melting and molding glass. CONSTITUTION:Tungsten oxide preferably based on WO3 is incorporated into a section for melting and molding glass stock such as art glass or glass for building materials by 5-70wt.%, preferably 10-50wt.%, alumina, zirconia, chromia, cordierite, silica, mullite, calcia, etc., are used as other constituent oxides and

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