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1. 发明专利

JPWO2011039847A1 パターン形成方法有权
公开(公告)号：JPWO2011039847A1
公开(公告)日：2013-02-21
申请号：JP2011533987
申请日：2009-09-29
申请人：株式会社東芝
发明人：鋼児浅川 , 鋼児浅川 , 繁樹服部 , 繁樹服部 , 良太北川 , 良太北川
IPC分类号： H01L21/027
CPC分类号： G03F7/16 , B81C1/00031 , B81C2201/0149 , G03F7/0392
摘要：側鎖に脂環式炭化水素基または第3級炭素を含む炭化水素基が導入されたポリアクリレートまたはポリメタクリレートを含む第1のブロックと、α位が炭化水素またはハロゲンで置換されたポリスチレンを含む第2のブロックとを有するブロックコポリマーを基板上に塗布し、前記ブロックコポリマーを相分離させ、前記ブロックコポリマーにエネルギー線を照射して第2のブロックを分解させ、現像液により第2のブロックを除去して、第1のブロックのパターンを形成することを特徴とするパターン形成方法。

2. 发明专利

JP4828487B2 Method of manufacturing a porous structure 有权
公开(公告)号：JP4828487B2
公开(公告)日：2011-11-30
申请号：JP2007213748
申请日：2007-08-20
申请人：株式会社東芝
发明人：康之堀田 , 俊郎平岡 , 鋼児浅川 , 芳浩赤坂
IPC分类号： C08J9/26 , C08J9/36
CPC分类号： G03F7/0002

3. 发明专利

JP4153947B2 Recording medium and a recording apparatus 有权
公开(公告)号：JP4153947B2
公开(公告)日：2008-09-24
申请号：JP2005351049
申请日：2005-12-05
申请人：株式会社東芝
发明人：勝之内藤 , 俊郎平岡 , 正敏櫻井 , 鋼児浅川 , 泰之稗田
IPC分类号： G11B5/65 , G11B5/012 , G11B5/02

4. 发明专利

JP3980854B2 Method of producing a composite member 有权
公开(公告)号：JP3980854B2
公开(公告)日：2007-09-26
申请号：JP2001295461
申请日：2001-09-27
申请人：株式会社東芝
发明人：康之堀田 , 俊郎平岡 , 鋼児浅川 , 茂真竹
IPC分类号： B29C39/10 , G03F7/20 , C08J9/42 , H01B13/00 , H05K3/10 , H05K3/42 , H05K3/46
摘要： PROBLEM TO BE SOLVED: To provide a method to efficiently impregnate a resin while ensuring an electrical connection or a thermal connection with other electronic device or the like in the manufacturing method of a resin impregnated composite member wherein a conductive section or an anisotropic thermal conductive section such as a wiring pattern is formed on a porous base. SOLUTION: This manufacturing method for the composite member wherein the resin is filled in a sheet-form porous body on which the electric or thermal conductive section is selectively formed is equipped with four processes. In the first process, the conductive section is formed on the sheet-form porous body. In the second process, the sheet-form porous body wherein the conductive section has been formed is impregnated with the photo-curing resin only from either one surface side of the front or the rear of the sheet. In the third process, the photo-curing resin is hardened by casting light from the surface on the opposite side from the surface impregnated with the photo-setting resin. In the fourth process, the photo-curing resin which is unhardened is removed.

5. 发明专利

JP3940546B2 Pattern forming method and pattern forming material 有权
公开(公告)号：JP3940546B2
公开(公告)日：2007-07-04
申请号：JP2000169263
申请日：2000-06-06
申请人：株式会社東芝
发明人：康之堀田 , 俊郎平岡 , 鋼児浅川 , 芳浩赤坂
IPC分类号： C08J9/26 , G03F7/075 , B82B1/00 , B82B3/00 , B82Y10/00 , B82Y30/00 , B82Y40/00 , B82Y99/00 , C01B31/02 , C04B35/52 , C08F297/02 , C08F299/00 , C08G81/02 , C08G83/00 , C23F1/00 , G03F7/033 , G11B5/65 , G11B5/84 , H01J9/02 , H01L21/033 , H01L21/302 , H01L21/3065 , H01M2/16 , H01M4/04 , H01M4/88 , H01M4/96 , H01M10/05
CPC分类号： C08J9/26 , B82Y10/00 , B82Y30/00 , C03C17/007 , C03C2217/425 , C03C2217/479 , C03C2218/33 , C08J2333/12 , C08J2383/16 , C23F1/30 , G03F7/0002 , G11B5/74 , G11B5/743 , G11B5/855 , G11B2005/0029 , H01G11/30 , H01G11/56 , H01J9/02 , H01J9/025 , H01L21/02118 , H01L21/02126 , H01L21/02203 , H01L21/02211 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02348 , H01L21/0337 , H01L21/31695 , H01M2/145 , H01M2/1653 , H01M4/131 , H01M4/133 , H01M4/8605 , H01M4/96 , H01M8/0234 , H01M8/0245 , H01M8/026 , H01M8/1011 , H01M10/0525 , Y02E60/13 , Y02E60/523 , Y02P70/56 , Y10S438/945 , Y10S438/947 , Y10S977/90 , Y10T428/24149
摘要： A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc-No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.

6. 发明专利

JP3910926B2 Manufacturing method for a display device a transparent substrate 有权
公开(公告)号：JP3910926B2
公开(公告)日：2007-04-25
申请号：JP2003049612
申请日：2003-02-26
申请人：株式会社東芝
发明人：鋼児浅川 , 明藤本
IPC分类号： G02F1/1333 , G09F9/30 , G02F1/1335 , G09F9/00 , H01J9/24 , H01J17/16 , H01J61/40 , H01J63/04 , H01L51/50 , H01L51/52 , H01L51/56 , H05B33/02 , H05B33/10 , H05B33/14
CPC分类号： H01J11/10 , G02F1/133502 , G02F1/133512 , G02F2001/133562 , G02F2001/133565 , H01J9/205 , H01L51/52 , H01L51/5262

7. 发明专利

JP3782357B2 A method of manufacturing a semiconductor light-emitting element 有权
公开(公告)号：JP3782357B2
公开(公告)日：2006-06-07
申请号：JP2002010571
申请日：2002-01-18
申请人：株式会社東芝
发明人：春二吉武 , 健一大橋 , 敦子山下 , 仁杉山 , 克江頭 , 鋼児浅川 , 明藤本 , 康彦赤池 , 章一鷲塚
IPC分类号： H01L21/302 , H01L33/06 , H01L33/14 , H01L33/22 , H01L33/32
CPC分类号： H01L33/22

8. 发明专利

JP3776571B2 Function element 失效
公开(公告)号：JP3776571B2
公开(公告)日：2006-05-17
申请号：JP25387097
申请日：1997-09-18
申请人：株式会社東芝
发明人：勝宏前田 , 俊郎平岡 , 修二早瀬 , 鋼児浅川
IPC分类号： F03G7/00 , G02F1/15 , H01M10/05 , H01M10/0565 , H02N11/00
CPC分类号： Y02E60/122
摘要： PROBLEM TO BE SOLVED: To provide a functional element which has the large interface area and has high durability of an interface by forming a three-dimensional co- continuous micro phase separating structure of a semiconductive or conductive organic high polymer chain and an ion conductive organic high polymer chain, and using a high polymer mold chemically bonded on the interface. SOLUTION: A material by bonding a light electric charge generating or carrier transporting molecular structure in a pendant shape in a principal chain or as a side chain of an electrically inactive high polymer chain, can be cited as a semiconductive or conductive organic high polymer. A conjugative high polymer may also be used. A high polymer electrolyte type ion conductor can be cited as an ion conductive high polymer. A phase separating film 103 is formed by applying a dibrock copolymer of polyaniline (basic emeraldin)- polyethylene oxide on a transparent electrode 102 formed on a glass substrate 101. A carbon electrode 105 is arranged on this through an electrolyte phase 104. An electrochromic element manufacture in this way has a high response speed.

9. 发明专利

JP3766293B2 A method of manufacturing a composite member, a composite member for the production of the mask substrate, and the composite member 有权
公开(公告)号：JP3766293B2
公开(公告)日：2006-04-12
申请号：JP2001170018
申请日：2001-06-05
申请人：株式会社東芝
发明人：康之堀田 , 俊郎平岡 , 鋼児浅川 , 茂真竹
IPC分类号： H05K3/18 , G03F1/54 , G03F1/70 , G03F7/20 , G03F9/00 , H05K3/00 , H05K3/10 , H05K3/40 , H05K3/46

10. 发明专利

JP5681607B2 光電変換素子有权
公开(公告)号：JP5681607B2
公开(公告)日：2015-03-11
申请号：JP2011218681
申请日：2011-09-30
申请人：株式会社東芝
发明人：明藤本 , 明藤本 , 務中西 , 務中西 , 中村　健二 , 健二中村 , くみ益永 , くみ益永 , 鋼児浅川 , 鋼児浅川
IPC分类号： H01L31/0352 , H01L31/0224 , H01L31/068 , H01L31/075 , H01L31/18
CPC分类号： H01L31/022425 , H01L31/02168 , H01L31/0288 , Y02E10/50

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