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1. 发明专利

JP2012214323A Method for producing sheet glass and cleaning brush body 审中-公开
标题翻译：生产玻璃和清洁刷体的方法
公开(公告)号：JP2012214323A
公开(公告)日：2012-11-08
申请号：JP2011080138
申请日：2011-03-31
申请人： Avanstrate Inc , Micro Engineering Inc , AvanStrate株式会社 , ミクロ技研株式会社
发明人： ISE HIRONORI , IGAI OSAMU , IWASE TOSHIHIRO , KOMURA AKIO
IPC分类号： C03C23/00 , B08B1/04 , B08B11/04 , C03C3/091
摘要： PROBLEM TO BE SOLVED: To provide a cleaning brush body improving cleanliness of the surface of sheet glass, and to provide a method for producing sheet glass.SOLUTION: The sheet glass is cleaned by rotating a plurality of cleaning brushes aligned in one direction during transporting the sheet glass. Each of cleaning brushes is equipped with a plurality of blade brush parts extending radially. The respective blade brush parts of the respective plurality of cleaning brushes rotate in synchronism so as not to be in contact with each other. In at least one edge in front in rotating direction of the blade brush parts, front sliding elements cleaning by sliding with respect to the glass surface are formed so as to continuously extend along the edge. Further the rear sliding elements are formed so as to continuously extend in the direction inclined in inside the radiating direction of the cleaning brush body from at least one rear edge in the rotating direction of the blade brush parts. Thereby a flow of the cleaning solution is formed on the surface of the sheet glass, during the rotation of the cleaning brush body.
摘要翻译：要解决的问题：提供一种提高玻璃板表面清洁度的清洁刷体，并提供一种生产玻璃板的方法。解决方案：在运输平板玻璃期间，通过旋转沿一个方向排列的多个清洁刷来清洁平板玻璃。每个清洁刷具有径向延伸的多个叶片刷部分。相应的多个清洁刷的相应叶片刷部分同步地旋转以不彼此接触。在叶片刷部分的旋转方向前方的至少一个边缘中，通过相对于玻璃表面滑动而清洁的前滑动元件形成为沿着边缘连续延伸。此外，后滑动元件形成为沿着在刷子部分的旋转方向上的至少一个后边缘沿着在清洁刷体的辐射方向内倾斜的方向连续地延伸。因此，在清洁刷体旋转期间，清洁液的流动形成在平板玻璃的表面上。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2012134390A Substrate processing apparatus and substrate processing method 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：JP2012134390A
公开(公告)日：2012-07-12
申请号：JP2010286450
申请日：2010-12-22
申请人： Micro Engineering Inc , ミクロ技研株式会社
发明人： MATSUZAWA MINORU
IPC分类号： H01L21/304
CPC分类号： H01L21/67017 , H01L21/67023 , H01L21/67051 , H01L21/6708
摘要： PROBLEM TO BE SOLVED: To prevent deposition of mist, or the like, that has a risk of contaminating the processed surface of a substrate.SOLUTION: A substrate processing apparatus 1 is configured to include a chamber 10 of bottomed double cylinder, and a table 21 supporting a substrate 20. By exhausting the gas in a second space S2, surrounded by the outer wall of an internal cylinder 12 and the inner wall of an external cylinder 13, to the outside of outer wall of the external cylinder 13, pressure in the second space S2 is lowered below the pressure in a first space S1 in the internal cylinder 12. Consequently, the gas in the first space S1 passes through an interconnection mechanism 30 and flows toward the second space S2. When the gas flow passing through the interconnection mechanism 30 is "squeezed", that flow is energized by Venturi effect and mist, or the like, containing particles generated when the substrate 20 is processed is exhausted efficiently from the first space S1 thus preventing contamination of the processed surface of the substrate.
摘要翻译：要解决的问题：为了防止具有污染基板的被处理表面的风险的雾等的沉积。解决方案：基板处理装置1被构造成包括有底双缸的腔室10和支撑基板20的工作台21.通过在第二空间S2中排出气体，被第二空间S2包围，内圆筒 12和外筒13的内壁到外筒13的外壁的外侧，第二空间S2中的压力降低到内筒12内的第一空间S1内的压力。因此，第一空间S1通过互连机构30并流向第二空间S2。当通过互连机构30的气流被“挤压”时，该流量被文丘里效应激励，并且当处理基板20时产生的含有颗粒的雾等等从第一空间S1有效地排出，从而防止污染处理过的表面。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2012002648A Wafer detect inspection device 有权
标题翻译：检测检测装置
公开(公告)号：JP2012002648A
公开(公告)日：2012-01-05
申请号：JP2010137336
申请日：2010-06-16
申请人： Micro Engineering Inc , Naoetsu Electronics Co Ltd , ミクロ技研株式会社 , 直江津電子工業株式会社
发明人： URAKABE KENGO , SEKIKAWA AKIRA , KASAHARA KENICHI , OMATA YOICHI , OKADA YU
IPC分类号： G01N21/956
摘要： PROBLEM TO BE SOLVED: To securely identify a defect part in a silicon wafer to be inspected even if a surface roughness part is present.SOLUTION: The silicon wafer W is irradiated with a single-wavelength near-infrared scattered light beam R1 from a near-infrared light source 1, a transmitted light beam R2 transmitted through the silicon wafer W is converged by a camera lens 2, and the converged transmitted light beam R2 is received and imaged by an imaging camera 3. An image processing part 4 erases a component as a surface roughness part of the silicon wafer W on a picked-up image of the imaging camera 3 to emphasize an image of the defect part.
摘要翻译：要解决的问题：即使存在表面粗糙部分，也可以安全地识别待检查的硅晶片中的缺陷部分。解决方案：从近红外光源1向单晶波长近红外散射光束R1照射硅晶片W，透过硅晶片W的透射光束R2被照相机镜头2会聚并且会聚的透射光束R2由成像照相机3接收和成像。图像处理部分4在成像照相机3的拾取图像上擦除作为硅晶片W的表面粗糙部分的分量，以强调成像缺陷部分的图像。版权所有（C）2012，JPO＆INPIT

4. 发明专利

JP2008119560A Steam focusing nozzle and cleaning process 审中-公开
标题翻译：蒸汽聚焦喷嘴和清洁过程
公开(公告)号：JP2008119560A
公开(公告)日：2008-05-29
申请号：JP2006302861
申请日：2006-11-08
申请人： Micro Engineering Inc , ミクロ技研株式会社
发明人： MURANAKA KOJI , KOMURA AKIO , KOMATA YOICHI
IPC分类号： B08B3/02 , B08B3/08 , H01L21/027 , H01L21/304 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a steam nozzle removing an object to be washed by centralizing steam on a treatment substrate after a steam eruption and utilizing the centralization of a thermal energy and hitting power.
SOLUTION: The steam is dispersed on a dispersion board inside the nozzle and the dispersed steam is sprayed to a focusing point on the nozzle central axis at a tapered side wall by Coanda effect. The use of the focusing nozzle having this construction prevents a reduction in the temperature of a high-temperature fluid observed in a general circular nozzle to enable a spraying of the steam good in temperature efficiency on the treatment substrate. Further, the effective use of the thermal energy and the hitting power of the steam centralized by the focusing nozzle enables the cleaning of particles which have been difficult to remove, and the removal of a resist film or the like.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种蒸汽喷嘴，其在蒸汽喷出之后通过在处理基板上集中蒸汽来除去待清洗的物体，并利用热能和击打力的集中。
解决方案：蒸汽分散在喷嘴内的分散板上，分散的蒸汽通过柯达效应被喷射到锥形侧壁上的喷嘴中心轴上的聚焦点上。使用具有这种结构的聚焦喷嘴可以防止在一般的圆形喷嘴中观察到的高温流体的温度降低，从而能够在处理基板上喷射良好的蒸汽温度。此外，有效利用热能和由聚焦喷嘴集中的蒸汽的击打力使得能够清洁难以除去的颗粒，以及去除抗蚀剂膜等。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2007333556A Method and device for multiple point measurement of perpendicularity 审中-公开
标题翻译：用于多点测量的方法和设备
公开(公告)号：JP2007333556A
公开(公告)日：2007-12-27
申请号：JP2006165579
申请日：2006-06-15
申请人： Micro Engineering Inc , ミクロ技研株式会社
发明人： KOMURA AKIO , KOMATA YOICHI
IPC分类号： G01B11/30
摘要： PROBLEM TO BE SOLVED: To provide an inexpensive non-contact type highly accurate measuring system by solving the following problems: in perpendicularity measurement for long size such as a mask substrate for a large size liquid crystal, a large size machine processing face, and a large size level block reference face, a laser reflection type collimetor or the like is used, and an ultra-precision drive reference axis is especially expensive in long measurement exceeding 1 m in a large mask substrate, while a problem of contact with an object to be measured by using a level or the collimetor occurs. SOLUTION: Increase of accumulated errors and restriction of measurement pitches are improved in multi-point measurement being defects of the conventional successive three-point measurement method. The accumulated errors of the successive three-point measurement is proportional to a square of the number of measurement points. In the invention, a long entire length is divided into several blocks, parts between the blocks are measured in the conventional three-point method with three sensors 21, 22 and 23. The inside of the block is measured by simultaneous signal processing with a fourth sensor 24, and remarkable reduction of the accumulated errors and option of the measurement pitches are enabled. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：解决以下问题：为了提供廉价的非接触式高精度测量系统，通过解决以下问题：对于长尺寸的垂直度测量，例如用于大尺寸液晶的掩模基板，大型机器加工面，并且使用大尺寸水平块基准面，激光反射型比较器等，并且在大掩模基板中超过1m的超精密驱动基准轴特别昂贵，而与发生通过使用水平或比例计测量的物体。解决方案：传统的连续三点测量方法的缺点是多点测量中累积误差的增加和测量间距的限制得到改善。连续三点测量的累积误差与测量点数的平方成比例。在本发明中，将长整个长度分成几个块，以三个传感器21,22和23的传统三点法测量块之间的部分。块的内部通过同时进行的信号处理与第四个传感器24，并且能够显着减少累积误差和测量间距的选项。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2007216158A Substrate cleaning method and apparatus using superheated steam 审中-公开
标题翻译：基板清洗方法和使用超级蒸汽的装置
公开(公告)号：JP2007216158A
公开(公告)日：2007-08-30
申请号：JP2006040288
申请日：2006-02-17
申请人： Micro Engineering Inc , ミクロ技研株式会社
发明人： KOMURA AKIO , KOMATA YOICHI
IPC分类号： B08B3/02 , B08B3/08 , G02F1/1333 , H01L21/027 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a clean and non-contact substrate cleaning technology with a shortened apparatus line by combining a surfactant with superheated steam, without using a technology or an device such as chemical solution, eximer UV, AP plasma, ultrasonic wave, brushing or high pressure water, in substrate cleaning.
SOLUTION: In this cleaning method, surfactant solution is sprayed over the substrate with a shower nozzle, then superheated steam is jetted from a steam nozzle, to remove organic matter by heated surfactant solution and an implosion phenomenon of steam. Particles are removed by a phreatic explosion phenomenon by spraying fine atomized water over the substrate immediately below the steam, washed matter is discharged and carried out by a washing nozzle, watermark is prevented by covering the substrate front face with the atomized water, and the substrate is dried by an air nozzle.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：通过将表面活性剂与过热蒸汽组合而不使用技术或诸如化学溶液，准分子UV，AP等离子体的装置，通过缩短装置线来提供清洁和非接触的基板清洗技术，超声波，刷牙或高压水，在基材清洗中。解决方案：在这种清洗方法中，表面活性剂溶液用淋浴喷头喷涂在基材上，然后从蒸汽喷嘴喷射过热蒸汽，通过加热的表面活性剂溶液和蒸汽的内爆现象去除有机物。通过在蒸汽的正下方喷涂细小的雾化水，将洗净的物质排出并通过洗涤喷嘴进行，通过用雾化水覆盖基板正面来防止水印，并且基板被空气喷嘴干燥。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2004053937A Resist removing apparatus 有权
公开(公告)号：JP2004053937A
公开(公告)日：2004-02-19
申请号：JP2002211410
申请日：2002-07-19
申请人： Micro Engineering Inc , ミクロ技研株式会社
发明人： FUKUDA NAOMICHI , MATSUMOTO HIROSHI
IPC分类号： G03F7/42 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a resist removing apparatus which prevents a dry film resist from being entwined with or wound around a roller conveyor.
SOLUTION: The resist removing apparatus is a resist removing apparatus A which removes a resist from a substrate G by scattering chemical liquid by a scattering means over the substrate G supported and conveyed by a conveyor roller 2, which is obliquely arranged, the roller shaft 21 of the conveyor roller 2 being cantilevered at its upper end. Further, the resist removing apparatus is equipped with a plurality of guide rollers 3 which support and carry the lower end of the substrate G.
COPYRIGHT: (C)2004,JPO

8. 发明专利

JP2007253091A Cleaning of fine pattern surface 审中-公开
标题翻译：精细图案表面的清洁
公开(公告)号：JP2007253091A
公开(公告)日：2007-10-04
申请号：JP2006082461
申请日：2006-03-24
申请人： Micro Engineering Inc , ミクロ技研株式会社
发明人： KOMURA AKIO , KOMATA YOICHI
IPC分类号： B08B3/02 , G02F1/13 , G02F1/1333
摘要： PROBLEM TO BE SOLVED: To provide a clean and non-contacting cleaning method without using a technique and an apparatus of ultrasonic wave, brushing, high pressure liquid, etc. in the cleaning of a fine pattern surface.
SOLUTION: In the cleaning method, at first, superheated steam is sprayed from a steam nozzle to the fine pattern surface, thereby, steam is caused to penetrate to the inner part of fine grooves and particles are moistened by dew condensation. Nextly, the particles are covered with a thin film by fine spraying from a fine atomized water shower, in such a state, the superheated steam is sprayed again, thereby, dew condensate and fine spray films are instantly subjected to steam explosion, and the particles are discharged from the groove parts, are catched by surrounding water film surfaces and are discharged and conveyed by washing water without allowing the particles to penetrate into the fine grooves again by surface tension of water and the viscosity effect.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供清洁和非接触的清洁方法，而不使用超声波，刷洗，高压液体等的技术和设备来清洁精细图案表面。解决方案：在清洁方法中，首先，将过热蒸汽从蒸汽喷嘴喷射到精细图案表面，从而使蒸汽穿透到细槽的内部，并且通过结露使颗粒被润湿。接下来，通过从细雾化水淋浴器进行细喷雾，用薄膜覆盖颗粒，在这种状态下，再次喷射过热蒸汽，从而使凝露水和细喷雾膜立即进行蒸汽爆炸，从槽部排出，被周围的水膜表面捕捉，并且通过洗涤水排出并输送，而不会使颗粒再次通过水的表面张力和粘度效应渗透到细槽中。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2002127008A DRESSING DEVICE FOR INNER PERIPHERY CUTTER 失效
公开(公告)号：JP2002127008A
公开(公告)日：2002-05-08
申请号：JP2000320903
申请日：2000-10-20
申请人： ASAHI SUNAC CORP , TOSHIBA CERAMICS CO , ASAHI DENSHI KK , MICRO ENGINEERING INC
发明人： AMARI MASAHIKO , SAITO TAKAO , OKUBO MAMORU , SATO NOBUYUKI , KATO YOSHIHIRO , KOMATA KOICHI , SUGANO MASATOMO
IPC分类号： B24B53/00
摘要： PROBLEM TO BE SOLVED: To provide a dressing device for an inner periphery cutter capable of efficiently dressing the cutting edge of the inner periphery cutter to be applied for a slicing machine. SOLUTION: Dressing nozzles 40, 42 are opposed to the cutting edge 14B of the inner periphery cutter 14 and atomized liquid drops are sprayed from the dressing nozzles 40, 42 to the cutting edge 14B for dressing the cutting edge 14B. When a liquid is supplied at a pressure of 3 MPa to 50 MPa to the dressing nozzles 40, 42 the liquid drops 48 suitable for dressing collide with the cutting edge 14B to permit the efficient separation chips 54 deposited on the cutting edge 14B.

10. 发明专利

JP2015058958A 包装装置および包装システム有权
标题翻译：包装装置和包装系统
公开(公告)号：JP2015058958A
公开(公告)日：2015-03-30
申请号：JP2013194026
申请日：2013-09-19
申请人：ミクロ技研株式会社 , Micro Engineering Inc
发明人： KUWANO TAKASHI , IWAUCHI TOSHITAKA
IPC分类号： B65B5/04 , B65B43/30 , B65B43/54
摘要：【課題】包装対象物の投影面積の変化により生じる「袋外れ」などのトラブルの発生を防止することができる包装装置および包装システムを提供する。【解決手段】包装システムは、一端に袋口が形成された横置き状態のガセット袋の袋口を開閉するための複数のクランプ、包装対象物である収容容器Bをガセット袋に挿入するための運搬アームを有する。また、包装システムは、開らかれた袋口の内側からそれぞれ異なる放射方向へ向けて移動する整形部材11a、11b、11c、11dを備え、これらにより袋口の形状を収容容器B毎の挿入時の接触が回避される形状に強制的に整形するとともに、整形された袋口の形状を、ガセット袋への収容容器Bの挿入が終了するまで維持させる。【選択図】図4
摘要翻译：要解决的问题：提供一种包装装置和包装系统，其可以防止由包装物体的投影面积的变化引起的“袋脱落”等问题的发生。解决方案：包装系统具有多个夹具为了在水平状态下打开和关闭角撑板袋的袋口，在一端形成袋口，以及用于将容器B或包装物插入到角撑袋中的托架臂。此外，包装系统包括分别从打开的袋口的内部朝不同的辐射方向移动的成形构件11a，11b，11c和11d，从而在袋口的形状被强制成形时避免在插入每个容器B期间的接触，保持成形袋口的形状，直到容器B插入角撑板袋中。

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