基本信息:
- 专利标题： Resist removing apparatus
- 申请号：JP2002211410 申请日：2002-07-19
- 公开(公告)号：JP2004053937A 公开(公告)日：2004-02-19
- 发明人： FUKUDA NAOMICHI , MATSUMOTO HIROSHI
- 申请人： Micro Engineering Inc , ミクロ技研株式会社
- 专利权人： Micro Engineering Inc,ミクロ技研株式会社
- 当前专利权人： Micro Engineering Inc,ミクロ技研株式会社
- 优先权： JP2002211410 2002-07-19
- 主分类号： G03F7/42
- IPC分类号： G03F7/42 ; H01L21/304
摘要：
PROBLEM TO BE SOLVED: To provide a resist removing apparatus which prevents a dry film resist from being entwined with or wound around a roller conveyor.
SOLUTION: The resist removing apparatus is a resist removing apparatus A which removes a resist from a substrate G by scattering chemical liquid by a scattering means over the substrate G supported and conveyed by a conveyor roller 2, which is obliquely arranged, the roller shaft 21 of the conveyor roller 2 being cantilevered at its upper end. Further, the resist removing apparatus is equipped with a plurality of guide rollers 3 which support and carry the lower end of the substrate G.
COPYRIGHT: (C)2004,JPO
SOLUTION: The resist removing apparatus is a resist removing apparatus A which removes a resist from a substrate G by scattering chemical liquid by a scattering means over the substrate G supported and conveyed by a conveyor roller 2, which is obliquely arranged, the roller shaft 21 of the conveyor roller 2 being cantilevered at its upper end. Further, the resist removing apparatus is equipped with a plurality of guide rollers 3 which support and carry the lower end of the substrate G.
COPYRIGHT: (C)2004,JPO
公开/授权文献:
- JP4164548B2 Resist removal device 公开/授权日：2008-10-15