会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明专利
    • Living cationic polymerization initiator system, and production method of polymer using the same
    • 生活阳离子聚合引发剂体系及其使用聚合物的生产方法
    • JP2014047287A
    • 2014-03-17
    • JP2012191625
    • 2012-08-31
    • Univ Of Fukui国立大学法人福井大学Maruzen Petrochem Co Ltd丸善石油化学株式会社
    • SUGIHARA SHINJI
    • C08F4/00C08F293/00
    • PROBLEM TO BE SOLVED: To produce a block copolymer of a cationic polymerizable vinyl monomer and a radical polymerizable vinyl monomer.SOLUTION: Provided is an initiator system that is used for living cationic polymerization of a cationic polymerizable vinyl monomer. A polymer subjected to cationic polymerization is subjected to living radical polymerization of at least one vinyl monomer under a living cationic polymerization initiator that includes: a proton acid (component (A)); and an RAFT cationic agent of the formula (1) (Ris a Calkyl group that may branch; Ris a Calkylene group that may branch; Ris a substitutable alkyl group, aryl group, arylalkyl group, alkylthio group, arylthio group, arylalkylthio group or acylamino group; Q is O or S; and p is 0, 1 or 2), and under the absence of a metal lewis acid.
    • 要解决的问题:制备阳离子可聚合乙烯基单体和可自由基聚合的乙烯基单体的嵌段共聚物。溶液:提供用于阳离子可聚合乙烯基单体的阳离子聚合的引发剂体系。 进行阳离子聚合的聚合物在活性阳离子聚合引发剂下进行至少一种乙烯基单体的活性自由基聚合,所述活性阳离子聚合引发剂包括:质子酸(组分(A)); 和式(1)的RAFT阳离子性试剂(Ris可以分支的C烷基; R是可以分支的C亚烷基; R是可取代的烷基,芳基,芳基烷基,烷硫基,芳硫基,芳基烷硫基或酰基氨基 基团; Q为O或S; p为0,1或2),且不存在金属路易斯酸。
    • 3. 发明专利
    • Adsorbent and gold recovery method using the same
    • 使用它的吸收和金回收方法
    • JP2013136035A
    • 2013-07-11
    • JP2011289038
    • 2011-12-28
    • Maruzen Petrochem Co Ltd丸善石油化学株式会社
    • YOSHIDA NORIHIRO
    • B01J20/26B01J20/34C02F1/28C22B3/24C22B7/00C22B11/00
    • Y02P10/234
    • PROBLEM TO BE SOLVED: To provide an adsorbent which has excellent selective gold adsorption capacity, enables filling in a column and dispersion to a solution and can be easily separated from the solution, and a gold recovery method using the adsorbent.SOLUTION: An ABC type azo group triblock copolymer bonded in a sequence of three types of structural units A-B-C based on a segment A comprising repetition of a structural unit (a) indicated by a general formula (1) and comprising a "methoxyethyl vinyl ether-b-phenyl (4-(2-vinyloxyethoxy) phenyl) diazene-b-paraisopropenyl phenol polymer" and a "methoxyethyl vinyl ether-b-phenyl (4-(2-hydroxyethoxy) phenyl) diazene polymer" is synthesized, and the polymers are impregnated in resin beads. In the formula (1), Rindicates a methyl group etc., and k indicates an integral number of 1-10.
    • 要解决的问题:为了提供具有优异的选择性金吸附能力的吸附剂,可以将柱填充并分散于溶液中,并且可以容易地从溶液中分离出来,以及使用吸附剂的金回收方法。解决方案:ABC型 基于包括重复由通式(1)表示的结构单元(a)并包含“甲氧基乙基乙烯基醚-b-苯基(4)”的链段A的三种类型的结构单元ABC的顺序键合的偶氮基三嵌段共聚物 - (2-乙烯氧基乙氧基)苯基)二氮烯-b-对异丙烯基苯酚聚合物“和”甲氧基乙基乙烯基醚-b-苯基(4-(2-羟基乙氧基)苯基)二氮烯聚合物“,并将聚合物浸渍在树脂珠中 。 在式(1)中,表示甲基等,k表示1-10的整数。
    • 4. 发明专利
    • Method for producing resist copolymer having low molecular weight
    • 生产具有低分子量的树脂共聚物的方法
    • JP2013103997A
    • 2013-05-30
    • JP2011249049
    • 2011-11-14
    • Maruzen Petrochem Co Ltd丸善石油化学株式会社
    • OIKAWA TOMO
    • C08F2/06C08F4/04G03F7/038
    • C08F220/68C08F220/18C08F220/28
    • PROBLEM TO BE SOLVED: To provide a method for producing a resist copolymer having a weight-average molecular weight of not less than 3,000 and not more than 6,000, in which copolymer the contents of an oligomer having a molecular weight of not more than 1,000 and a byproduct derived from a polymerization initiator are small.SOLUTION: The method for producing the resist copolymer includes: a step of continuously supplying a solution containing a monomer and a solution containing the polymerization initiator to a heated solvent to carry out radical polymerization, wherein the variation range of the concentration of the polymerization initiator in a polymerization solution is within ±25% of the median value between the maximum concentration and the minimum concentration during a specific time period from when the supply amount of monomer reaches 10% of the whole supply amount of monomer until the completion of the monomer solution supply; and the variation range of the concentration of unreacted monomer in the polymerization solution is within ±35% of the median value between the maximum concentration and the minimum concentration during the specific time period.
    • 要解决的问题:提供一种重均分子量不小于3,000且不大于6,000的抗蚀剂共聚物的制造方法,其中共聚物中分子量不大的低聚物的含量 来自聚合引发剂的副产物小。 解决方案:制备抗蚀剂共聚物的方法包括:将含有单体和含有聚合引发剂的溶液的溶液连续供给到加热溶剂中以进行自由基聚合的步骤,其中浓度的变化范围 聚合溶液中的聚合引发剂在从单体的供体量达到单体总供应量的10%直到完成的特定时间段内的最大浓度和最小浓度之间的中值的±25%以内 单体溶液供应; 并且聚合溶液中未反应单体的浓度的变化范围在特定时间段内最大浓度和最小浓度之间的中值的±35%以内。 版权所有(C)2013,JPO&INPIT
    • 5. 发明专利
    • Negative resist composition for ion beam drawing and pattern forming method
    • 用于离子束绘图和图案形成方法的负极性组合物
    • JP2013003439A
    • 2013-01-07
    • JP2011136222
    • 2011-06-20
    • Shibaura Institute Of Technology学校法人 芝浦工業大学Maruzen Petrochem Co Ltd丸善石油化学株式会社
    • NISHIKAWA HIROYUKIIIZUKA TETSUYAMITA TAKAHITONISHIURA TAKAOTAKEMORI TOSHIIKU
    • G03F7/038G03F7/029H01L21/027
    • PROBLEM TO BE SOLVED: To provide a negative resist composition for ion beam drawing, the composition having suitable sensitivity to an ion beam, capable of forming a fine structure with a high aspect ratio and a narrow pitch interval, and giving a resist pattern with less degradation of the pattern with time after exposure, and to provide a pattern forming method using the composition.SOLUTION: The negative resist composition for ion beam drawing comprises: an epoxy resin, which is obtained by glycidylation of a polyaddition product between an unsaturated alicyclic compound having two or more unsaturated double bonds in the molecule and phenols; a photo-cation polymerization initiator; and an organic solvent. The pattern forming method includes: a first step of obtaining a resist film by applying the above resist composition on a substrate and then removing the organic solvent by volatilization; a second step of obtaining a desired exposure pattern by irradiating the obtained resist film with an ion beam; and a third step of obtaining a pattern layer by developing the exposed resist film to dissolve and remove the resist in an unexposed area.
    • 要解决的问题:为了提供用于离子束拉伸的负性抗蚀剂组合物,该组合物对离子束具有适当的灵敏度,能够形成具有高纵横比和窄间距间隔的精细结构,并提供抗蚀剂 并且提供使用该组合物的图案形成方法。 解决方案:用于离子束拉伸的负型抗蚀剂组合物包括:通过在分子中具有两个或更多个不饱和双键的不饱和脂环族化合物和酚之间的加聚产物缩水甘油化得到的环氧树脂; 光阳离子聚合引发剂; 和有机溶剂。 图案形成方法包括:通过将上述抗蚀剂组合物涂布在基材上,然后通过挥发除去有机溶剂来获得抗蚀剂膜的第一步骤; 通过用离子束照射获得的抗蚀剂膜来获得期望的曝光图案的第二步骤; 以及第三步骤,通过显影曝光的抗蚀剂膜以在未曝光区域中溶解和除去抗蚀剂来获得图案层。 版权所有(C)2013,JPO&INPIT
    • 6. 发明专利
    • Polymerizable composition, method of manufacturing metal nanoparticle using the same, and cured film holding the metal nanoparticle
    • 可聚合组合物,使用其制备金属纳米颗粒的方法和固化的金属纳米材料
    • JP2012012529A
    • 2012-01-19
    • JP2010151598
    • 2010-07-02
    • Maruzen Petrochem Co Ltd丸善石油化学株式会社
    • NISHIURA TAKAO
    • C08F2/44B22F1/02B22F9/24C08F20/00H01B5/14H01B13/00
    • PROBLEM TO BE SOLVED: To provide a method of manufacturing simply and easily a metal nanoparticle which excels in dispersion stability and can control the particle size by a wet process without need of special equipment or the like.SOLUTION: A polymerizable composition includes: a metal compound [A] which can form a metal fine particle by reduction; a radical polymerization nature vinyl monomer [B] which interacts with a metal ion or a metal complex which composes the metal compound [A], and has a functional group (Q) which can stick to the surface of a metal fine particle which has deposited by reduction; a photo-radical polymerization initiator [C]; and a solvent [D]. The method of manufacturing a metal nanoparticle is characterized in that an active energy ray is irradiated at the polymerizable composition to perform the forming of a metal nanoparticle and the forming of a protecting polymer at one process.
    • 要解决的问题:提供简单且容易地制造分散稳定性优异并且可以通过湿法控制粒度而不需要特殊设备等的金属纳米粒子的制造方法。 解决方案:可聚合组合物包括:可通过还原形成金属微粒的金属化合物[A] 自由基聚合性乙烯基单体[B]与构成金属化合物[A]的金属离子或金属络合物相互作用,并且具有能粘附到沉积的金属微粒表面的官能团(Q) 减少 光自由基聚合引发剂[C]; 和溶剂[D]。 金属纳米粒子的制造方法的特征在于,在聚合性组合物上照射活性能量射线,进行金属纳米粒子的形成,并在一个工序中形成保护性聚合物。 版权所有(C)2012,JPO&INPIT
    • 8. 发明专利
    • Method of manufacturing copolymer for semiconductor lithography
    • 制备用于SEMICONDUCTOR LITHOGRAPHY的共聚物的方法
    • JP2010209338A
    • 2010-09-24
    • JP2010095217
    • 2010-04-16
    • Maruzen Petrochem Co Ltd丸善石油化学株式会社
    • OIKAWA SATORUOKADA TAKENORIKUDO MASAAKIYAMAGISHI TAKANORI
    • C08F220/10G03F7/039
    • PROBLEM TO BE SOLVED: To provide a method of manufacturing a copolymer for chemical amplification positive type semiconductor lithography, which has high developing contrast and excellent resolution in a fine pattern. SOLUTION: The method of manufacturing the copolymer, having at least a repeating unit (A) with a structure for protecting the group with alkali solubility with an acid-dissociable dissolution-inhibiting group, a repeating unit (B) with a lactone structure, and a repeating unit (C) having an alcoholic hydroxy group, includes the steps of: bringing at least one of monomers selected from those which give the repeating units (A), (B), and (C) into contact with water in a condition of being dissolved in an organic solvent to separate the liquid, or bringing the above monomer into contact with an ion exchange resin in a condition of being dissolved in the solvent; carrying out copolymerization to dissolve the copolymer obtained into a solvent; and carrying out neutralization titration with alkali metal hydroxide-containing solution using bromothymol blue as an indicator to obtain an acid value of 0.01 mmol/g or less. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种制造用于化学放大正型半导体光刻的共聚物的方法,其具有高显影对比度和优异的精细图案分辨率。 解决方案:制备共聚物的方法,至少具有用酸保护基团与酸解离的溶解抑制基团具有碱溶性的结构的重复单元(A),具有内酯的重复单元(B) 结构和具有醇羟基的重复单元(C)包括以下步骤:使选自产生重复单元(A),(B)和(C)的单体中的至少一种与水接触 在溶解在有机溶剂中以分离液体的条件下,或者使上述单体在溶解于溶剂中的条件下与离子交换树脂接触; 进行共聚以使得到的共聚物溶解到溶剂中; 并用溴百里酚蓝作为指标,用含碱金属氢氧化物的溶液进行中和滴定,得到0.01mmol / g以下的酸值。 版权所有(C)2010,JPO&INPIT
    • 9. 发明专利
    • Alicyclic vinyl ether copolymer
    • ALICYCLIC VINYL ETHER COPOLYMER
    • JP2010189654A
    • 2010-09-02
    • JP2010097563
    • 2010-04-21
    • Maruzen Petrochem Co Ltd丸善石油化学株式会社
    • AOSHIMA SADATOKANEOKA SHOKYOKUSHIONO SHOHEITAKATANI YOSHITERUTAKEMORI TOSHIIKU
    • C08F216/16C08F216/18
    • PROBLEM TO BE SOLVED: To provide a stimulation-responsive material excellent in film formability and transparency. SOLUTION: An alicyclic vinyl ether copolymer comprises at least one alicyclic vinyl ether represented by formula (1) and at least one 10-30C long-chain alkyl group-containing vinyl ether in the main chain. In the formula, R 1 to R 12 each independently represent a hydrogen atom, a deuterium atom, or a 1-15C hydrocarbon group; A 1 to A 4 each independently represent a hydrogen atom, a deuterium atom, or a 1-15C hydrocarbon group; R 1 to R 12 and A 1 to A 4 may together form an aliphatic ring; n represents an integer of 0-3; and m represents an integer of 0-2. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供成膜性和透明性优异的刺激响应性材料。 解决方案:脂环族乙烯基醚共聚物在主链中包含至少一种由式(1)表示的脂环族乙烯基醚和至少一种含10-30个长链烷基的乙烯基醚。 在该式中,R 1至R 12各自独立地表示氢原子,氘原子或1-15C烃基; A 1 至A 4 各自独立地表示氢原子,氘原子或1-15C烃基; R 1 至R 12 和A 1 至A 4 可一起形成脂族环; n表示0-3的整数; m表示0〜2的整数。 版权所有(C)2010,JPO&INPIT