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1. 发明专利

JP2013003439A Negative resist composition for ion beam drawing and pattern forming method 审中-公开
标题翻译：用于离子束绘图和图案形成方法的负极性组合物
公开(公告)号：JP2013003439A
公开(公告)日：2013-01-07
申请号：JP2011136222
申请日：2011-06-20
申请人： Shibaura Institute Of Technology , 学校法人芝浦工業大学 , Maruzen Petrochem Co Ltd , 丸善石油化学株式会社
发明人： NISHIKAWA HIROYUKI , IIZUKA TETSUYA , MITA TAKAHITO , NISHIURA TAKAO , TAKEMORI TOSHIIKU
IPC分类号： G03F7/038 , G03F7/029 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a negative resist composition for ion beam drawing, the composition having suitable sensitivity to an ion beam, capable of forming a fine structure with a high aspect ratio and a narrow pitch interval, and giving a resist pattern with less degradation of the pattern with time after exposure, and to provide a pattern forming method using the composition.SOLUTION: The negative resist composition for ion beam drawing comprises: an epoxy resin, which is obtained by glycidylation of a polyaddition product between an unsaturated alicyclic compound having two or more unsaturated double bonds in the molecule and phenols; a photo-cation polymerization initiator; and an organic solvent. The pattern forming method includes: a first step of obtaining a resist film by applying the above resist composition on a substrate and then removing the organic solvent by volatilization; a second step of obtaining a desired exposure pattern by irradiating the obtained resist film with an ion beam; and a third step of obtaining a pattern layer by developing the exposed resist film to dissolve and remove the resist in an unexposed area.
摘要翻译：要解决的问题：为了提供用于离子束拉伸的负性抗蚀剂组合物，该组合物对离子束具有适当的灵敏度，能够形成具有高纵横比和窄间距间隔的精细结构，并提供抗蚀剂并且提供使用该组合物的图案形成方法。解决方案：用于离子束拉伸的负型抗蚀剂组合物包括：通过在分子中具有两个或更多个不饱和双键的不饱和脂环族化合物和酚之间的加聚产物缩水甘油化得到的环氧树脂; 光阳离子聚合引发剂; 和有机溶剂。图案形成方法包括：通过将上述抗蚀剂组合物涂布在基材上，然后通过挥发除去有机溶剂来获得抗蚀剂膜的第一步骤; 通过用离子束照射获得的抗蚀剂膜来获得期望的曝光图案的第二步骤; 以及第三步骤，通过显影曝光的抗蚀剂膜以在未曝光区域中溶解和除去抗蚀剂来获得图案层。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2012012529A Polymerizable composition, method of manufacturing metal nanoparticle using the same, and cured film holding the metal nanoparticle 有权
标题翻译：可聚合组合物，使用其制备金属纳米颗粒的方法和固化的金属纳米材料
公开(公告)号：JP2012012529A
公开(公告)日：2012-01-19
申请号：JP2010151598
申请日：2010-07-02
申请人： Maruzen Petrochem Co Ltd , 丸善石油化学株式会社
发明人： NISHIURA TAKAO
IPC分类号： C08F2/44 , B22F1/02 , B22F9/24 , C08F20/00 , H01B5/14 , H01B13/00
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing simply and easily a metal nanoparticle which excels in dispersion stability and can control the particle size by a wet process without need of special equipment or the like.SOLUTION: A polymerizable composition includes: a metal compound [A] which can form a metal fine particle by reduction; a radical polymerization nature vinyl monomer [B] which interacts with a metal ion or a metal complex which composes the metal compound [A], and has a functional group (Q) which can stick to the surface of a metal fine particle which has deposited by reduction; a photo-radical polymerization initiator [C]; and a solvent [D]. The method of manufacturing a metal nanoparticle is characterized in that an active energy ray is irradiated at the polymerizable composition to perform the forming of a metal nanoparticle and the forming of a protecting polymer at one process.
摘要翻译：要解决的问题：提供简单且容易地制造分散稳定性优异并且可以通过湿法控制粒度而不需要特殊设备等的金属纳米粒子的制造方法。解决方案：可聚合组合物包括：可通过还原形成金属微粒的金属化合物[A] 自由基聚合性乙烯基单体[B]与构成金属化合物[A]的金属离子或金属络合物相互作用，并且具有能粘附到沉积的金属微粒表面的官能团（Q）减少光自由基聚合引发剂[C]; 和溶剂[D]。金属纳米粒子的制造方法的特征在于，在聚合性组合物上照射活性能量射线，进行金属纳米粒子的形成，并在一个工序中形成保护性聚合物。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2009256554A Curable resin composition and its cured product 有权
标题翻译：可固化树脂组合物及其固化产品
公开(公告)号：JP2009256554A
公开(公告)日：2009-11-05
申请号：JP2008110377
申请日：2008-04-21
申请人： Maruzen Petrochem Co Ltd , Univ Of Fukui , 丸善石油化学株式会社 , 国立大学法人福井大学
发明人： HASHIMOTO TAMOTSU , AOKI SEI , NISHIURA TAKAO , KAMATA AMI , HABA KAZUHIKO , SAWADA GORO
IPC分类号： C08F20/28 , C08F16/22
摘要： PROBLEM TO BE SOLVED: To provide a curable resin composition giving a cured product exhibiting excellent solvent resistance, hardness, dimensional stability, low water absorbency, and heat resistance, causing no curing shrinkage, and having optophysical properties suitable for optical materials. SOLUTION: The curable resin composition contains a vinyl ether-based copolymer, which comprises a repeating unit having a (meth)acryloyl group in the side chain and a repeating unit having an alicyclic skeleton in the side chain. The cured product is obtained by curing the curable resin composition. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种固化产物，其具有优异的耐溶剂性，硬度，尺寸稳定性，低吸水性和耐热性，不产生固化收缩，并具有适用于光学材料的光物理性能的固化产物。解决方案：可固化树脂组合物含有乙烯基醚类共聚物，其包含在侧链具有（甲基）丙烯酰基的重复单元和在侧链具有脂环骨架的重复单元。固化产物通过固化可固化树脂组合物获得。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2012129133A Photocurable composition, metal nano particle-dispersed film using photocurable composition, and method of manufacturing conductive thin film 有权
标题翻译：光刻胶组合物，使用光刻胶组合物的金属纳米颗粒分散膜，以及制造导电薄膜的方法
公开(公告)号：JP2012129133A
公开(公告)日：2012-07-05
申请号：JP2010281283
申请日：2010-12-17
申请人： Maruzen Petrochem Co Ltd , 丸善石油化学株式会社
发明人： NISHIURA TAKAO
IPC分类号： H01B1/20 , B22F9/24 , H01B13/00 , H05K1/09 , H05K3/10
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing a metal nano particle-dispersed film which is excellent in dispersibility of metal nano particles and is uniform in particle diameter simply and handily, and readily.SOLUTION: The photocurable composition is used for manufacturing a metal nano particle-dispersed film, and comprises at least the following [A]-[C]. [A] a metal compound which allows the production of a metal microparticle by reduction; [B] a polyfunctional monomer which interacts with a metal ion or metal complex that the metal compound [A] includes, has a functional group (Q) which can be adsorbed onto the surface of a metal microparticle deposited as a result of reduction, and has two or more radical-polymerizable groups; and [C] an optical radical polymerization initiator. In the photocurable composition, the blending volume of the polyfunctional monomer [B] in the composition is in a range of over 50 to under 95 mass% based on 100 mass% of the whole composition. Further, provided are a method of manufacturing a metal nano particle-dispersed film and a method of manufacturing a conductive thin film both using the photocurable composition.
摘要翻译：要解决的问题：提供一种制造金属纳米颗粒的分散性优异且金属纳米颗粒的分散性优异且容易且容易地粒径均匀的方法。光固化性组合物用于制造金属纳米粒子分散膜，至少包含以下[A] - [C]。 [A]金属化合物，其允许通过还原制造金属微粒; [B]与金属化合物[A]所含的金属离子或金属络合物相互作用的多官能单体具有可以吸附在作为还原结果沉积的金属微粒的表面上的官能团（Q），以及具有两个或更多个可自由基聚合的基团; 和[C]光自由基聚合引发剂。在光固化性组合物中，组合物中的多官能单体[B]的配合体积相对于整个组合物的100质量％为50质量％〜95质量％以下的范围。此外，提供了制造金属纳米颗粒分散膜的方法和使用该可光固化组合物的导电薄膜的制造方法。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2019094367A オニウム塩を用いたビニルエーテルポリマーの製造方法审中-公开
公开(公告)号：JP2019094367A
公开(公告)日：2019-06-20
申请号：JP2017222127
申请日：2017-11-17
申请人： MARUZEN PETROCHEM CO LTD
发明人： NISHIURA TAKAO
IPC分类号： C08F16/14
摘要：【課題】金属触媒と有機溶媒とを使用せず、かつ低温反応を必要としないビニルエーテルポリマーの製造方法の提供。【解決手段】式(1)で表されるモノマーの少なくとも1種、及び/又は、式(2)で表されるモノマーの少なくとも1種を、重合開始剤としてオニウム塩を用いて、無溶媒下で重合させる工程を含んでなる、ビニルエーテルポリマーの製造方法。オニウム塩がヨードニウム塩、オキソニウム塩、スルフォニウム塩又はブロモニウム塩から選択されるビニルエーテルポリマーの製造方法。(R1はC1〜3のアルキル基;nは1〜10の整数)(R2はC1〜10の脂肪族炭化水素基、脂環式炭化水素基又はアリル基)【選択図】なし

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