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    • 77. 发明专利
    • Method for providing alignment of probe
    • 提供探针对准的方法
    • JP2012211911A
    • 2012-11-01
    • JP2012130076
    • 2012-06-07
    • Capres A Sカプレス・アクティーゼルスカブCapres A/S
    • PETER FOLMER NIELSENPETER R E PETERSENJESPER ERDMAN HANSEN
    • G01R1/073G01R3/00
    • G01R1/07392G01R1/06727G01R3/00G01R31/2887Y10T29/49204Y10T29/49222
    • PROBLEM TO BE SOLVED: To provide a method for providing alignment of a probe relative to a supporting substrate.SOLUTION: The method comprises the steps of: providing the supporting substrate defining a planar surface and an edge, the substrate further defining a first crystal plane; providing a first mask at the surface of the supporting substrate, the first mask defining a first exposed area on the surface at the edge; and providing a specific etch reagent and a recess formed by the etch reagent etching the first exposed area, the recess defining a first sidewall, an opposing second sidewall, an end wall remote from the edge, and a bottom wall. The method further comprises providing a probe substrate defining a planar surface and a second crystal plane identical to the first crystal plane and positioning the probe substrate so that the first and the second crystal planes are positioned identically when forming the probe from the probe substrate using the specific etch reagent, and the probe defines congruent surfaces to the first sidewall and the second sidewall.
    • 要解决的问题:提供一种用于提供探针相对于支撑衬底的对准的方法。 解决方案:该方法包括以下步骤:提供限定平坦表面和边缘的支撑衬底,所述衬底还限定第一晶体平面; 在所述支撑衬底的表面处提供第一掩模,所述第一掩模在所述边缘的所述表面上限定第一暴露区域; 并且提供特定的蚀刻试剂和由蚀刻剂蚀刻第一暴露区域形成的凹部,凹部限定第一侧壁,相对的第二侧壁,远离边缘的端壁和底壁。 该方法还包括提供限定平面的探针衬底和与第一晶面相同的第二晶面并定位探针衬底,使得当使用该探针衬底从探针衬底形成探针时,使第一和第二晶面相同地定位 特定的蚀刻试剂,并且探针限定了与第一侧壁和第二侧壁相同的一致表面。 版权所有(C)2013,JPO&INPIT