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1. 发明专利

JP2014095725A Automatic multi-point probe operation 有权
标题翻译：自动多点探头操作
公开(公告)号：JP2014095725A
公开(公告)日：2014-05-22
申请号：JP2014015965
申请日：2014-01-30
申请人： Capres A S , カプレス・アクティーゼルスカブCapres A/S
发明人： HENRIK BAEKBO , PETER FOLMER NIELSEN , CHAKER CHALFOUI , LAUGE GAMMELGAARD , HANS HENRIK JANKJAR , LARS NORREGAARD
IPC分类号： G01R1/073 , G01B7/16 , G01R1/06
CPC分类号： G01R3/00 , G01R1/06733 , G01R1/073 , G01R31/2887
摘要： PROBLEM TO BE SOLVED: To provide a probe holder or the like capable of reducing risk of a human error.SOLUTION: The present invention provides a multi-point probe specifically appropriate for an automatic operation, and an automatic multi-point measuring system including the multi-point probe and a probe manipulator head. The present invention further provides an automatic multi-point probe gripping system including a probe holder and a probe manipulator head, and a loaded probe loader including a probe loader for operating the multi-point probe and a probe cassette. The probe cassette includes a probe holder for fixing the multi-point probe.
摘要翻译：要解决的问题：提供能够降低人为错误风险的探针支架等。解决方案：本发明提供一种特别适合于自动操作的多点探针，以及一种自动多点测量系统，包括多点探头和探头操纵头。本发明还提供了一种自动多点探针夹持系统，其包括探针支架和探针操纵器头部，以及装载的探针装载器，其包括用于操作多点探针的探针装载器和探针盒。探针盒包括用于固定多点探针的探针支架。

2. 发明专利

JP2012211911A Method for providing alignment of probe 审中-公开
标题翻译：提供探针对准的方法
公开(公告)号：JP2012211911A
公开(公告)日：2012-11-01
申请号：JP2012130076
申请日：2012-06-07
申请人： Capres A S , カプレス・アクティーゼルスカブCapres A/S
发明人： PETER FOLMER NIELSEN , PETER R E PETERSEN , JESPER ERDMAN HANSEN
IPC分类号： G01R1/073 , G01R3/00
CPC分类号： G01R1/07392 , G01R1/06727 , G01R3/00 , G01R31/2887 , Y10T29/49204 , Y10T29/49222
摘要： PROBLEM TO BE SOLVED: To provide a method for providing alignment of a probe relative to a supporting substrate.SOLUTION: The method comprises the steps of: providing the supporting substrate defining a planar surface and an edge, the substrate further defining a first crystal plane; providing a first mask at the surface of the supporting substrate, the first mask defining a first exposed area on the surface at the edge; and providing a specific etch reagent and a recess formed by the etch reagent etching the first exposed area, the recess defining a first sidewall, an opposing second sidewall, an end wall remote from the edge, and a bottom wall. The method further comprises providing a probe substrate defining a planar surface and a second crystal plane identical to the first crystal plane and positioning the probe substrate so that the first and the second crystal planes are positioned identically when forming the probe from the probe substrate using the specific etch reagent, and the probe defines congruent surfaces to the first sidewall and the second sidewall.
摘要翻译：要解决的问题：提供一种用于提供探针相对于支撑衬底的对准的方法。解决方案：该方法包括以下步骤：提供限定平坦表面和边缘的支撑衬底，所述衬底还限定第一晶体平面; 在所述支撑衬底的表面处提供第一掩模，所述第一掩模在所述边缘的所述表面上限定第一暴露区域; 并且提供特定的蚀刻试剂和由蚀刻剂蚀刻第一暴露区域形成的凹部，凹部限定第一侧壁，相对的第二侧壁，远离边缘的端壁和底壁。该方法还包括提供限定平面的探针衬底和与第一晶面相同的第二晶面并定位探针衬底，使得当使用该探针衬底从探针衬底形成探针时，使第一和第二晶面相同地定位特定的蚀刻试剂，并且探针限定了与第一侧壁和第二侧壁相同的一致表面。版权所有（C）2013，JPO＆INPIT

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