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    • 72. 发明专利
    • MONITORING OF PROCESS ABNORMALITY AND APPARATUS THEREOF
    • JPH09191032A
    • 1997-07-22
    • JP273696
    • 1996-01-11
    • HITACHI LTD
    • YOSHITAKE YASUHIRONAGAISHI HIROSHIWATANABE KENJI
    • H01L21/66G01N21/88G01N21/93G01N21/94G01N21/956G06T1/00G06T7/00
    • PROBLEM TO BE SOLVED: To automatically judge an abnormality in processes of a semiconductor wafer and judge the necessity or non-necessity of its review. SOLUTION: The apparatus stores defect/foreign matter coordinate data in a data storage means DB through a network Nt from an appearance detector GK and a foreign matter detector, converts the data in an X-Y coordinate system to divided elements in an rθ coordinate system, computes a defect density in each of the divided elements at an operating part 9, and judges distribution abnormality based on a chi-square distribution. In the case of the distribution abnormality, the operating part 9 groups the distribution and computes an average value and a standard deviation for each of in defect density distributions in the groups, and compares these values with a preset conditional expression. A main controller 12, on the basis of an output received from the operating part 9, judges the necessity or non-necessity of its review. When judging the necessity of the review, the main controller 12 issues a signal to an alarm generator 10 to issue an alarm therefrom. The defect coordinate data is automatically transmitted to a review station, and the standard deviation and average are stored in the data storage means DB.
    • 73. 发明专利
    • RELATIVE POSITION DETECTING DEVICE AND METHOD, AND EXPOSURE METHOD
    • JPH08241844A
    • 1996-09-17
    • JP4512395
    • 1995-03-06
    • HITACHI LTD
    • YOSHITAKE YASUHIROIRIKITA NOBUYUKIWATANABE KENJI
    • G03F9/00H01L21/027
    • PURPOSE: To enable a relative position of a reference mark to a measurement mark on a wafer to be accurately detected by a method wherein a measurement mark and a reference mark illuminated by the reflected light from a semiconductor wafer are imaged through imaging optical paths different from each other in focal distance respectively. CONSTITUTION: A reflected light C2 from a semiconductor wafer 2 illuminated by an illuminating light C1 is made to branch into reflected lights C2a and C2b by a half mirror 11 passing through an object lens 9, a beam splitter 8, and an imaging lens 10. At this point, an X stage 6a, a Y stage 6b, and a Z stage 6c are moved so as to make a measurement mark and a reference mark on the wafer 2 located in the fields of view of a first and a second image sensing device, 12 and 13, and the measurement mark optimally focused on the first image sensing device 12. By this setup, an optical image formed by the reflected light C2a which passes through the half mirror 11 is formed on the first image sensing device 12, and another optical image formed by the reflected light C2b , reflected from the half mirror 11 is formed on the second image sensing device 13.
    • 76. 发明专利
    • LEAD FORMING DEVICE
    • JPH01162521A
    • 1989-06-27
    • JP31880287
    • 1987-12-18
    • HITACHI LTD
    • WATANABE KENJIHAGIWARA TAKATOSHI
    • H01L23/50B21D5/01
    • PURPOSE:To prevent a group of leads from being constrained and to release the external force by putting one of 1st and 2nd group of leads between a supporting base and a pressure member and performing a bending step by a forming tool at its external end part separately to every group of leads. CONSTITUTION:A ramp 4 is lifted and the pressure member 3 is separated from the supporting base 2. Then, a root part to a package 1a of the 1st group 1d of leads and the 2nd group 1e of leads which are projected respectively, is positioned on supporting pieces 2a, 2b of a supporting base 2. Then, when the ramp 4 is lowered, a pressure piece 3a of the pressure member 3 comes into contact with the root part of the 1st group 1d of leads and the 1st group 1d of leads is put by the energizing force of a spring 6 between the supporting piece 2a and the pressure piece 3a. When the ramp 4 falls further, the external end part of the 1st group of leads is bent downward by a forming tool 7 falling with the ramp 4. Then, the 2nd group 1e of leads are bent in the same way by reversing the direction of the semiconductor device 1.
    • 78. 发明专利
    • Semiconductor manufacturing apparatus
    • 半导体制造设备
    • JPS6147646A
    • 1986-03-08
    • JP16782484
    • 1984-08-13
    • Hitachi Ltd
    • WATANABE KENJIYAMAZAKI ISAMU
    • H01L21/50
    • PURPOSE: To obtain an apparatus which ensures high efficiency as the through- system by making it possible to replace a part of a variety of conveyors which are capable of transferring the materials to be processed with a cassette for loader or unloader.
      CONSTITUTION: A loader side flame transfer conveyor 18 is provided in the front-to-rear direction between a loading conveyor 15 and a frame supply conveyor 9. The conveyor 18 transfers lead frame on the frame supply conveyor 9 when it is a little moved by a frame 19. The conveyors 15 and 18 can be separated from a base 2 and after these are separated, a loader side cassette B accommodating the lead frame can be loaded to the position of loading conveyor 15. In the same way, when the unloading conveyor 22 is separated, a cassette C for unloader can be loaded. Thereby, an apparatus can be used as a through- system providing a plurality of wire bonders and it can also be used as a single wire bonder which improves working efficiency of apparatus.
      COPYRIGHT: (C)1986,JPO&Japio
    • 目的:为了获得一种确保通过系统高效率的设备,可以通过使用能够用装载机或卸载机的盒子传送待处理材料的各种输送机的一部分进行更换。 构成:装载机侧火焰传送输送机18沿着前后方向设置在装载输送机15和框架供给输送机9之间。输送机18在框架供给传送带9稍微移动时将引导框架传送到框架供给传送带9上 输送机15和18可以与基座2分离,并且在它们分离之后,容纳引线框架的装载机侧盒B可以被装载到装载传送器15的位置。以相同的方式,当卸载 输送机22被分离,可以装载用于卸载机的盒C。 因此,可以将装置用作提供多个引线接合器的通孔,并且其也可以用作提高装置的工作效率的单线焊接机。