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61. 发明专利

JPS63243804A GAP SETTING DEVICE 失效
公开(公告)号：JPS63243804A
公开(公告)日：1988-10-11
申请号：JP7870187
申请日：1987-03-31
申请人： TOSHIBA CORP , TOKYO OPTICAL
发明人： ISHIBASHI YORIYUKI , HIRANO RYOICHI , SHIMOZONO HIROAKI
IPC分类号： G01B11/14 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/68
摘要： PURPOSE:To suppress a ripple component at the zero-cross point of a detection signal and to improve the setting accuracy of a gap by providing 1st and 2nd bodies with 1st and 2nd diffraction gratings and setting the longitudinal and lateral pitches of the 2nd diffraction gratings equal to each other. CONSTITUTION:A mask 13 and a wafer 12 are provided with diffraction gratings 31a and 31b, and 32a and 32b, and laser light C from a laser light source 17 is diffracted through the operation of the double diffraction grating while transmitted through the gratings 31a and 31b, reflected by the gratings 32a and 32b, and then transmitted through the gratings 31a and 31b again. Those diffracted light beams are inputted to a signal processing circuit 20 through mirrors 19a and 19b and the gap between the mask 13 and wafer 12 is adjusted 21. At this time, the longitudinal and lateral pitches of the diffraction gratings 32a and 32b are set equal to each other. Consequently, the ripple component at the zero-cross point is suppressed and the proper gap is set.

62. 发明专利

JP2001217301A SUBSTRATE TRANSFER DEVICE AND PROCESSING METHOD 失效
公开(公告)号：JP2001217301A
公开(公告)日：2001-08-10
申请号：JP2000028720
申请日：2000-02-07
申请人： TOSHIBA CORP
发明人： YOSHITAKE HIDESUKE , TOJO TORU , HIRANO RYOICHI
IPC分类号： H01L21/677 , H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a substrate transfer device and a method, where foreign objects can be restrained from adhering to a mask in a preparatory chamber and a robot chamber. SOLUTION: A substrate transfer device 20 is composed of a robot chamber 6 as a closed vessel and a preparatory chamber as a closed vessel, and the robot chamber 6 and the preparatory chamber 4 are connected together with a gate valve 2. The robot chamber 6 is connected to an electron beam drawing device main body 30 with a gate valve 1. A movable vacuum robot 5 provided with a stage 12 on which a mask 7 transferred from the preparatory chamber 4 is placed is installed inside the robot chamber 6. A surface electrometer 9 which measures the surface potential of the mask 7 and a static eliminator which eliminates static electricity from the surface of the mask 7 are provided in the preparatory chamber 4, and the surface electrometer 9 and the static eliminator 10 are connected to a controller 11 which controls them.

63. 发明专利

JPH1055950A SPECIMEN SUPPORTING MECHANISM IN ELECTRONIC BEAM ALIGNER 失效
公开(公告)号：JPH1055950A
公开(公告)日：1998-02-24
申请号：JP21250596
申请日：1996-08-12
申请人： TOSHIBA CORP
发明人： MATSUKI KAZUTO , TAWARAYAMA KAZUO , TAKAHASHI YOSHIHIKO , HIRANO RYOICHI
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To enable a specimen to be supported adding no excessive load to the same while making alignment of the specimen within an electronic beam aligner. SOLUTION: A specimen 12 is inserted into a specimen container 11 provided on a frame 10. In the frame 10, abutted parts 13a-13c are provided on the three positions of the specimen container 11 for making alignment of the specimen 12 in the horizontal direction. Furthermore, three each of clamp mechanisms 14a-14c are provided on the frame 10 wherein the specimen 12 inserted into the specimen container 11 is held from front and back, thereby specimen 12 to be fixed and held as well as the alignment thereof in the vertical direction to be made.

64. 发明专利

JPH08255744A CIRCUIT PATTERN TRANSFER METHOD OF SEMICONDUCTOR DEVICE AND DEVICE USED FOR IT 失效
公开(公告)号：JPH08255744A
公开(公告)日：1996-10-01
申请号：JP5949895
申请日：1995-03-17
申请人： TOSHIBA CORP
发明人： YOSHITAKE HIDESUKE , HIRANO RYOICHI , MATSUKI KAZUTO , TOJO TORU
IPC分类号： G03F1/42 , G03F1/60 , H01L21/027 , G03F1/08 , G03F1/14
摘要： PURPOSE: To obtain desired accuracy by making first, second and third holding means support the same two opposing sides of an original pattern, respectively. CONSTITUTION: In a drawing device, a reticle 1 is supported in a direction of an arrow 5 by pressing it to a reference piece provided to a reticle holder upper part from a holder lower part so that a drawing surface becomes a reference. Here, a reticle holding part 4 of a reticle holder of a drawing device, a reticle holding part 4 of a coordinate position measuring device and a reticle holding part 4 of a transfer device are provided each at the same position as the reticle 1. Furthermore, a pattern surface when held is divided up and down. It is enlarged in a drawing device and a coordinate position measuring device and is reduced in a transfer device by a dead-weight.

65. 发明专利

JPH05251297A 失效
公开(公告)号：JPH05251297A
公开(公告)日：1993-09-28
申请号：JP4862092
申请日：1992-03-05
申请人： TOSHIBA CORP , TOPCON CORP
发明人： ISHIBASHI YORIYUKI , HIRANO RYOICHI , NISHISAKA TAKESHI , YOSHINO TOSHIKAZU
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To provide a relative position aligning device which is capable of restraining the decrease of a mark image in contrast level liable to occur due to external factors, where the images of aligning marks are detected, and the position data are obtained from the contrast level of the detected mark image to carry out a position aligning operation. CONSTITUTION:A position aligning wafer mark 21 is provided on the upside of a wafer 1. The wafer mark 21 is composed of a combination of first light reflecting regions 31a and 31b demarcated in belts by setting in a Y axis and second light reflecting regions 32a, 32b, and 32c of two-dimensional type diffraction grating structure arranged sandwiching the first light reflecting regions 31a and 31b between them.

66. 发明专利

JPH0434917A ALIGNMENT OPTICAL SYSTEM 失效
公开(公告)号：JPH0434917A
公开(公告)日：1992-02-05
申请号：JP13960090
申请日：1990-05-31
申请人： TOSHIBA CORP , TOPCON CORP
发明人： ISHIBASHI YORIYUKI , HIRANO RYOICHI , NAGAI HIDEO , MURATA TAKAHIRO , KIKUIRI NOBUTAKA , YOSHINO TOSHIKAZU
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To stabilize the phase of a light and to improve an alignment accuracy by spatially separating an optical component for an alignment and a laser light source. CONSTITUTION:A laser oscillation tube 1 is disposed in a cylindrical holder 10, and mounted by a regulating screw 13. In the holder 10, a cooling medium inlet 11 and a discharge port 12 are provided, the air is, for example, fed into the holder 10 to cool the tube 1. A ringlike plate 15 is secured to one end side of the holder 10 through an O-ring 14 to seal the tube 1 with the holder 10. Optical components formed of a mirror 2, a lens 3 and a prism 4 are covered with a cover 21 except the prism 4. Since the prism 4 is disposed in a position relatively farther from the tube 1, influence of heat generated from the tube 1 is not almost affected, but this prism 4 may be disposed in the cover 21.

67. 发明专利

JPH0432217A INCIDENT ANGLE SETTING DEVICE 失效
公开(公告)号：JPH0432217A
公开(公告)日：1992-02-04
申请号：JP13918590
申请日：1990-05-29
申请人： TOSHIBA CORP , TOPCON CORP
发明人： ISHIBASHI YORIYUKI , HIRANO RYOICHI , NAGAI HIDEO , MURATA TAKAHIRO , YOSHINO TOSHIKAZU
IPC分类号： G03F9/00 , H01L21/027
摘要： PURPOSE:To obtain an incident angle setting device by which an incident angle can be set accurately and be adjusted quickly by emitting two beams of light from a first lens after converging them on the lens for casting the two beams of light on a target symmetrically about an optical axis and at the specified incident angle with the optical axis. CONSTITUTION:Two parallel beams of light emitted from a light source are focalized on pin holes 65 by a second lens 66. After that, the two beams of light are diffused and then cast on a first lens 63, each decentered at the speci fied distance epsilon from an optical axis. Due to the converging work of the first lens 63, two beams of light emitted from the first lens 63 are converged at one point on an alignment mark 11, 12 of a mask symmetrically about the optical axis 64 and at the incident angle theta. By using the optical heterodyne method, an alignment can be done accurately since an incident angle can be set accurately and adjusted quickly.

68. 发明专利

JPH02288324A REDUCTION PROJECTION ALIGNER 失效
公开(公告)号：JPH02288324A
公开(公告)日：1990-11-28
申请号：JP11010389
申请日：1989-04-28
申请人： TOSHIBA CORP , TOPCON CORP
发明人： ISHIBASHI YORIYUKI , HIRANO RYOICHI , TAKASU NOBORU , YOSHINO TOSHIKAZU
IPC分类号： G03B27/32 , G03F1/42 , G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To shorten exposure time and improve alignment accuracy requiring no high-power light source by providing a mirror guiding light emitted from a light source of monochromatic light while diverting to a light path for exposure and a light path for alignment. CONSTITUTION:A mirror 41 guiding light A emitted from a light source 19 while diverting to a light path B for exposure and a light path for alignment is provided. Accordingly, when the relative positional relation between a reticle alignment optical system and a wafer-off-axis alignment optical system is to be corrected, the whole of light A emitted from the light source 19 can be guided to the light path C for alignment by switching the mirror 41, and when exposure is actually performance, the mirror 41 is switched to enable the whole of the light A emitted from the light source 19 to be guided to the light path B for exposure. Thereby, exposure time can be shortened while improving alignment accuracy requiring no high-power light source of monochromatic light.

69. 发明专利

JPH0293307A GAP SETTING METHOD AND APPARATUS THEREFOR, ALIGNING METHOD AND APPARATUS THEREFOR, RELATIVE ALIGNING METHOD AND APPARATUS THEREFOR 失效
公开(公告)号：JPH0293307A
公开(公告)日：1990-04-04
申请号：JP24381088
申请日：1988-09-30
申请人： TOSHIBA CORP
发明人： ISHIBASHI YORIYUKI , HIRANO RYOICHI
IPC分类号： G01B11/00 , G01B11/14 , G03F9/00 , H01L21/027
摘要： PURPOSE:To avoid deterioration of aligning accuracy even affected by external disturbances by allowing a reference light not including information related to a gap between a first and a second objects and a detecting light including said information to follow approximately the same optical path in an optical heterodyne interference method. CONSTITUTION:When the gap length between a wafer 12 and a mask 13 is to be set, the light from a light source 17 is divided into a light 20 having a frequency f1 and a light 21 having a frequency f2. The lights 20 and 21 pass through a diffraction grating 15a provided at a predetermined position of the mask 13 thereby to be diffracted, and then they are reflected and diffracted by a diffraction grating 16a on the wafer 12, and again pass through the direction grating 15a to be diffracted. A light IG in a specific direction of the diffracted light is guided to a signal processor unit 32 as a detecting light 29G, while a light IR in a specific direction is guided to the signal processor unit 32 as a reference light 29R. Accordingly, an outer disturbance (fluctuation) can be cancelled between the reference and detecting signals, thus making it possible to set the gap between the wafer and the mask, position and relatively position them stably with high accuracy.

70. 发明专利

JPH028704A RELATIVE POSITIONING AND APPARATUS THEREFOR 失效
公开(公告)号：JPH028704A
公开(公告)日：1990-01-12
申请号：JP6430389
申请日：1989-03-16
申请人： TOSHIBA CORP
发明人： ISHIBASHI YORIYUKI , HIRANO RYOICHI , YAMASHITA KYOJI
IPC分类号： G01B11/00 , G01B11/14 , G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To enable the positioning of two objects within a plane and the setting of a gap length at a high accuracy by a method wherein two objects are provided each with a diffraction grating of a specified shape and light with different frequencies is made incident thereon to obtain a positional deviation signal by reflected diffraction light thereof. CONSTITUTION:A mask 23 is provided with a striped diffraction grating 25 while a wafer 22 is provided with a check-patterned diffraction grating 27 and a striped grating 28 orthogonal to the grating 25. Light with frequencies f1 and f2 is made incident from a light source 29 to generate diffraction light. One (0th-order, + or -1st-order) of the diffraction light is detected as detection light 39 and when a change in the phase thereof is measured with a phase meter 55, the phase change is related to a positional deviation within an X-plane of the two objects and a positioning is made with a driver 57 according to the deviation. In addition, when the diffraction light (+ or -mth-order, + or -1st-order) is detected as detection light 40, the phase change is only related to a gap length of the two objects and so a gap adjustment is performed with a driver 58.

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