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1. 发明专利

JP2007306013A Automatic focusing device 有权
标题翻译：自动聚焦装置
公开(公告)号：JP2007306013A
公开(公告)日：2007-11-22
申请号：JP2007159288
申请日：2007-06-15
申请人： Toshiba Corp , 株式会社東芝
发明人： SUGIHARA SHINJI , OGAWA TSUTOMU , TOJO TORU
IPC分类号： H01L21/027 , G01B11/02
摘要： PROBLEM TO BE SOLVED: To suppress the measuring error caused by the spot position shift of reflection light, and to improve reliability for focusing.
SOLUTION: An automatic focusing device for focusing an objective lens on the surface of the object to be examined, comprises: an irradiation optical system 1 for emitting spot-like light onto the surface of the object 8 to be examined from an oblique direction; a photo detector 5 for detecting the reflection light of the object 8 to be examined; a photo detector 26 for detecting a polarized component in the reflection light of the object 8 to be examined; a position detection circuit 6 for detecting a position in the height direction of the object 8 to be examined from an electric signal obtained by the photo detector 5; and a correction circuit 20 for monitoring the position detection signal obtained by the position detection circuit 6, and correcting a surplus exceeding a value corresponding to the surface shape of the object 8 to be examined from the position detection signal when the amount of change per unit time in the position detection signal following the movement in the horizontal direction of a stage 9 exceeds an fixed level, and the strength of the electric signal obtained by the photo detector 26 exceeds a normal range.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：抑制由反射光的位置偏移引起的测量误差，并提高聚焦的可靠性。解决方案：一种用于将物镜聚焦在待检查物体的表面上的自动聚焦装置，包括：照射光学系统1，用于从倾斜的物体发射点状光到待检查物体8的表面上方向; 用于检测待检查物体8的反射光的光电检测器5; 用于检测待检查物体8的反射光中的偏振分量的光电检测器26; 位置检测电路6，用于从由光电检测器5获得的电信号中检测待检测物体8的高度方向的位置; 以及校正电路20，用于监视由位置检测电路6获得的位置检测信号，并且当每单位变化量时，从位置检测信号中校正超过与待检查对象8的表面形状对应的值的剩余量在阶段9的水平方向移动之后的位置检测信号中的时间超过固定水平，并且由光电检测器26获得的电信号的强度超过正常范围。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2005244048A Electrically-charged particle beam plotting device and method 审中-公开
标题翻译：电充电颗粒光束显示装置及方法
公开(公告)号：JP2005244048A
公开(公告)日：2005-09-08
申请号：JP2004053961
申请日：2004-02-27
申请人： Toshiba Corp , 株式会社東芝
发明人： AKENO MASANOBU , HIRANO RYOICHI , MITSUI SOICHIRO , TOJO TORU
IPC分类号： H01J37/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To realize a type of an electrically-charged particle beam plotting device where a substrate surface evaluating device is connected to a plotting device itself with the high detecting precision of foreign matters.
SOLUTION: This electrically-charged particle beam plotting device is provided with a plotting chamber 11, a preliminary chamber 41 equipped with a substrate supporting part 42 rotatable at each of almost 90 degrees or almost 180 degrees, a substrate surface evaluating chamber 49 in which the substrate is stored, a substrate surface evaluating device 19 equipped with a substrate surface evaluating part which evaluates the surface of the substrate by scanning the surface of the substrate by a laser beam while uni-directionally moving the substrate in the substrate surface evaluating chamber 49 and a conveyance robot 15 for moving the substrate between the plotting chamber 11 and the preliminary chamber 41, and between the preliminary chamber 41 and the evaluating chamber 49.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了实现一种具有高异物检测精度的基板表面评估装置与绘图装置本身连接的带电粒子束绘图装置。该带电粒子束绘图装置设置有绘图室11，预备室41，其配备有可在大约90度或几乎180度的每一个旋转的衬底支撑部分42，衬底表面评估室49 其中存储有基板的基板表面评估装置19，该基板表面评估装置19装备有基板表面评估部分，该基板表面评估部分通过在基板表面中的基板的单向移动的同时通过激光束扫描基板的表面来评估基板的表面，室49和用于在绘图室11和预备室41之间以及预备室41和评价室49之间移动衬底的输送机器人15.（C）2005，JPO＆NCIPI

3. 发明专利

JP2005045164A Automatic focusing device 审中-公开
标题翻译：自动聚焦装置
公开(公告)号：JP2005045164A
公开(公告)日：2005-02-17
申请号：JP2003279875
申请日：2003-07-25
申请人： Toshiba Corp , 株式会社東芝
发明人： SUGIHARA SHINJI , OGAWA TSUTOMU , TOJO TORU
IPC分类号： G01B11/02 , G02B7/28 , G02B21/26 , G03B27/52 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F9/7088 , G03F7/70725 , G03F9/7003 , G03F9/7026 , G03F9/7034
摘要： PROBLEM TO BE SOLVED: To suppress a measuring error caused by a change in the spot position of reflection light occurring when making luminous flux impinge on a fine pattern having line width that is nearly the same as a light source wavelength on an object to be examined.
SOLUTION: An automatic focusing device for focusing an objective lens 2 on the surface of the object 8 to be examined retained by a stage 9 movable in horizontal and height directions comprises an irradiation optical system for emitting spot-like light onto the surface of the object 8 to be examined from an oblique direction; a light reception sensor 5 for detecting the reflection light of the object 8 to be examined; a position detection circuit 6 for detecting a position in the height direction of the object 8 to be examined from an electric signal obtained by the light reception sensor 5; a correction circuit 20 for monitoring the position detection signal obtained by the position detection circuit 6, and correcting a surplus exceeding a value corresponding to the surface shape of the object 8 to be examined from the position detection signal, when the amount of change per unit time in the position detection signal following the movement in the horizontal direction of a stage 9 exceeds an allowable level; and a stage control circuit 7 for controlling the position in the height direction of the stage 9, based on the position detection signal obtained via the correction circuit 20.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了抑制当使光束照射在具有与物体上的光源波长几乎相同的线宽的微细图案上时产生的反射光的光点位置的变化引起的测量误差要检查解决方案：一种用于将物镜2聚焦在由水平和高度方向可移动的台架9保持的待检查物体8的表面上的自动对焦装置包括：将点状光发射到表面上的照射光学系统从倾斜方向检查物体8; 用于检测待检查物体8的反射光的光接收传感器5; 位置检测电路6，用于从由光接收传感器5获得的电信号中检测待检测物体8的高度方向的位置; 校正电路20，用于监视由位置检测电路6获得的位置检测信号，并且当每单位变化量时，从位置检测信号中校正超过与待检查对象8的表面形状对应的值的剩余量在阶段9的水平方向移动之后的位置检测信号中的时间超过允许水平; 以及基于经由校正电路20获得的位置检测信号来控制台9的高度方向的位置的平台控制电路7.（C）2005，JPO＆NCIPI

4. 发明专利

JP2004214415A Pattern plotting method and device 有权
公开(公告)号：JP2004214415A
公开(公告)日：2004-07-29
申请号：JP2002382390
申请日：2002-12-27
申请人： Toshiba Corp , 株式会社東芝
发明人： HIRANO RYOICHI , TACHIKAWA YUICHI , MITSUI SOICHIRO , OGASAWARA MUNEHIRO , TOJO TORU
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To improve pattern transferring precision using a stepper by performing plotting added with the position deviation of a pattern formation face when the back face of a substrate is adhered to a predetermined standard face.
SOLUTION: This pattern plotting method for plotting a desired pattern on a substrate to be plotted held by a substrate holding part by an energy beam is provided to measure the distribution of the height position of a back face opposite to the face where the pattern of a substrate 11 is formed in a status that the substrate 11 is held by a substrate holding part 12, to calculate the position deviation value of the face where the pattern is formed generated in a status that the back face of the substrate 11 is corrected to a flat face based on the measured distribution of the height position, and to correct the pattern plotting position at the time of plotting the pattern based on the calculated position deviation value.
COPYRIGHT: (C)2004,JPO&NCIPI

5. 发明专利

JP2002353116A CHARGED PARTICLE BEAM LITHOGRAPHIC APPARATUS 失效
公开(公告)号：JP2002353116A
公开(公告)日：2002-12-06
申请号：JP2001158796
申请日：2001-05-28
申请人： TOSHIBA CORP
发明人： AKENO MASANOBU , OGASAWARA MUNEHIRO , TOJO TORU
IPC分类号： G03F7/20 , H01J37/20 , H01J37/305 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam lithographic apparatus that can accurately control temperature of the sample mount in the sample chamber, and further can measure the temperature difference between the sample and the sample mount for setting the temperature difference within a required range, as soon as to achieve superior drawing position accuracy, and to provide a drawing apparatus using the charged particle beam lithographic apparatus. SOLUTION: In this charged particle beam lithographic apparatus, having a sample mount 3 for retaining a sample 7, and stages 9 and 11 that mount the sample mount 3 and can be moved at least in one direction, an electric heater element and at least one temperature measuring instrument are provided on an upper surface opposite to the sample 7 on the sample mount 3, a heat conductive plate 40 is connected, and an apparatus 22 for cooling a base 13 is provided in a base 13 on the stage. In this case, the heat conductive plate 40 can be maintained at an arbitrary temperature by a temperature control apparatus for controlling the calorific value, in the electric heater element, based on the temperature measured by the temperature-measuring instrument.

6. 发明专利

JP2002110515A DUST COLLECTION METHOD FOR PATTERN-DRAWING DEVICE 失效
公开(公告)号：JP2002110515A
公开(公告)日：2002-04-12
申请号：JP2000296739
申请日：2000-09-28
申请人： TOSHIBA CORP , TOSHIBA MACHINE CO LTD
发明人： HIRANO RYOICHI , YOSHITAKE HIDESUKE , OGASAWARA MUNEHIRO , TOJO TORU , FUKUTOME SHUICHIRO , YAMAMOTO TERUAKI , CHOKAI MASAKI
IPC分类号： G03F7/20 , H01J37/305 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a dust collection method for a pattern-drawing device for washing the inside of a drawing chamber even without breaking a vacuum. SOLUTION: This dust collection method for the pattern-drawing device has the drawing chamber 10, and a stage 15 placed in the drawing chamber 10. A dummy substrate is conveyed into the drawing chamber for placing on the stage 15. The dummy substrate has a conductive member 4 placed onto a substrate 1, and a dielectric member 3 placed onto the conductive member 4. Then, potential is generated in the conductive member 4, thus sucking dust in the drawing chamber 10 onto the surface of the dielectric member 3.

7. 发明专利

JPH11274035A Substrate treating apparatus 失效
标题翻译：基板处理装置
公开(公告)号：JPH11274035A
公开(公告)日：1999-10-08
申请号：JP7388798
申请日：1998-03-23
申请人： Toshiba Corp , 株式会社東芝
发明人： YOSHITAKE HIDESUKE , TSUKUMO YOSHIAKI , MURATA TAKAHIRO , TOJO TORU , OKI KENJI , TADA YOSHIAKI , YAMADA NOBORU , YAMAMOTO TERUAKI
IPC分类号： H01L21/677 , H01L21/02 , H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To always maintain a local clean environment even in a transfer process by transferring substrates while keeping locally clean condition in the open air, and directly transferring the substrate in vacuum. SOLUTION: A reticle smear pod 2 for keeping an inner cleanness by closing a pod opening mechanism 42, and reticle case 3 for keeping an internal cleanliness by closing a case opening mechanism 43, are provided. A reticle management system 5 is provided for locally cleaning the inner atmosphere in the reticle smear pod 2, including a clean robot 4 for transferring a substrate 27 to the reticle case 3. After transferring the substrate 27 to the reticle case 3, a transfer mechanism 11 transports the reticle case 3 to an I/O chamber 10 and, after evacuating the I/O chamber 10, the reticle case 3 is opened to transport the substrate 27 to a writing processor chamber 12 by a vacuum robot 14.
摘要翻译：要解决的问题：即使在转印过程中始终保持局部清洁环境，通过转印基材同时保持露天的局部清洁状态，并在真空中直接转印基板。解决方案：提供一种用于通过关闭容器打开机构42来保持内部清洁的掩模版涂抹盒2和用于通过关闭壳体打开机构43来保持内部清洁度的标线罩壳体3。提供了一种掩模版管理系统5，用于局部清洁标线涂抹盒2中的内部气氛，包括用于将基板27传送到掩模版壳体3的清洁机器人4.将基板27传送到掩模版壳体3之后，传送机构 11将标线箱3传送到I / O室10，并且在抽空I / O室10之后，打开掩模版壳体3，通过真空机器人14将基板27输送到写入处理器室12。

8. 发明专利

JPH10261560A METHOD FOR CARRYING IN/OUT SAMPLE AND DEVICE SUPPORTING CARRY-IN/OUT OF SAMPLE 失效
公开(公告)号：JPH10261560A
公开(公告)日：1998-09-29
申请号：JP6447297
申请日：1997-03-18
申请人： TOSHIBA CORP
发明人： YOSHITAKE HIDESUKE , TSUKUMO YOSHIAKI , TOJO TORU , KANDA MAKOTO , HIRANO RYOICHI , TADA YOSHIAKI
IPC分类号： G01N1/00 , G03F1/76 , G03F7/20 , H01L21/027 , H01L21/677 , H01L21/68 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To provide a method and device for carrying in and out a sample that can carry in a sample into a treatment room that is maintained in a vacuum atmosphere through a preliminary room in which pressure can be adjusted without causing a foreign object to be adhered to the sample and for example, can contribute to the realization of the local cleaning of a system for producing a mask that is used in a process for manufacturing a semiconductor device. SOLUTION: A container 24 for carrying a sample where a ventilation property is secured by a filter for eliminating dust/dirt is used, and a sample 23 is accommodated in the container 24 for carrying a sample in an atmosphere 22 that is maintained to be clean when carrying the sample 23 into a treatment room 7. After the container 24 for carrying the sample is carried into a preliminary room 3, the inside of the preliminary room 3 is evacuated to a vacuum atmosphere and then the sample 23 is taken out of the container 24 for carrying a sample and is carried into the treatment room 7.

9. 发明专利

JPH1027753A CHARGED PARTICLE BEAM EXPOSURE SYSTEM 失效
公开(公告)号：JPH1027753A
公开(公告)日：1998-01-27
申请号：JP5766697
申请日：1997-03-12
申请人： TOSHIBA CORP
发明人： HIRANO RYOICHI , YOSHITAKE HIDESUKE , KOJIYOU SOUJI , MATSUKI KAZUTO , TOJO TORU
IPC分类号： G21K5/04 , G01Q30/00 , G01Q70/02 , G03F7/20 , H01J37/317 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an electron beam exposure system capable of forming a pattern with high positional precision by avoiding the shifting of electron beam orbit near the periphery of a processed substrate in the case of pattern exposure on the processed substrate. SOLUTION: The surface of a glass substrate 1 is coated with a photoresist film 8 through the intermediary of a Cr film 7. A member 4 made of a conductive material is arranged to cover above the periphery of the glass substrate 1 along the periphery to be fitted to a holder 2 through the intermediary of an insulating member 3b. The member 4 is connected to a DC voltage feeding power supply 5b. An earth knife 9 comes into contact with the Cr film 7 on the periphery of the glass substrate 1 to be fitted to the holder 2 through the intermediary of another insulating member 3a. The earth knife 9 is connected to the DC voltage feeding power supply 5a. In such a constitution, the shifting amount at the arrival position of electron beams on the surface of the glass substrate 1 can be minimized by pertinently adjusting the voltage fed to the member 4 and the earth knife 9.

10. 发明专利

JPH09203710A INSPECTING METHOD AND DEVICE FOR MICRO-FLAW IN PHOTO-MASK PATTERN 失效
公开(公告)号：JPH09203710A
公开(公告)日：1997-08-05
申请号：JP30447296
申请日：1996-11-15
申请人： TOPCON CORP , TOSHIBA CORP
发明人： YOSHINO TOSHIKAZU , SEKINE AKIHIKO , TOJO TORU , TABATA MITSUO
IPC分类号： G01N21/88 , G01N21/93 , G01N21/956 , G03F1/84
摘要： PROBLEM TO BE SOLVED: To provide an inspecting method and device for micro-flaw in a photo- mask, which can sense pinholes under 0.35μm certainly. SOLUTION: An inspecting method for micro-flaws in a photo-mask is formed from a light transmission part 41 having a glass base board 2, on which a pattern projected in the specified place by an illumination light P1 for photo- exposure is formed, and a light shutoff part 42 which transmits part of the illumination light with its phase delayed relative to the phase of the illumination light P1 having passed through the transmission part 41, and flaw is detected on the basis of the signal obtained by irradiating with an inspection light having such a wavelength that the transmittance T of the part 42 at the wavelength of inspection light different from the wavelength for photo-exposure meets the following formula based upon the signal detecting limit Thr; T>=(Thr-0.01) . The signal sensing limit Thr is decided on the condition that the signal level due to the inspection light passing through the part 41 is 1.

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