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1. 发明专利

JPH0521321A ALIGNMENT DEVICE OF EXPOSURE DEVICE 失效
公开(公告)号：JPH0521321A
公开(公告)日：1993-01-29
申请号：JP17143891
申请日：1991-07-11
申请人： TOSHIBA CORP , TOPCON CORP
发明人： ISHIBASHI YORIYUKI , MURATA TAKAHIRO , YOSHINO TOSHIKAZU
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01S3/00
摘要： PURPOSE:To provide a device which enables easy and highly accurate alignment of the center of laser light and the center of a lens, etc., without moving a lens, etc., while preventing an optical axis of laser light of maximum intensity projected from an acoustic optical modulation element from deviating. CONSTITUTION:An alignment optical system which carries out alignment of a mask and a semiconductor wafer and detection of a gap by irradiating laser light to an alignment mark provided to each of a mask and a semiconductor wafer is provided. In an exposure device which transcribes a mask pattern generated in a mask using X-ray and light onto a semiconductor wafer, optical elements 16c, 16d which shift laser light 13 right and left, and up and down in parallel and an optical element 17b which changes inclination of the laser light 13 are arranged in a rear step of an acoustic optical modulation element 14 which is provided to alignment optical system.

2. 发明专利

JPH0442007A RELATIVE POSITION ALIGNING APPARATUS 失效
公开(公告)号：JPH0442007A
公开(公告)日：1992-02-12
申请号：JP14746490
申请日：1990-06-07
申请人： TOSHIBA CORP , TOPCON CORP
发明人： MURATA TAKAHIRO , NAGAI HIDEO , ISHIBASHI YORIYUKI , HIRANO RYOICHI , SAITO SUSUMU
IPC分类号： G01B11/00 , G01B11/14 , G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To improve the position aligning accuracy of a reticle and a wafer, i.e. the overlapping accuracy in light transfer by setting the specified relationship between the intersecting angle formed by two reflecting surfaces and the angle formed by an incident light beam and an emitting light beam. CONSTITUTION:A pentagonal prism has a reflecting surface 31 which receives and reflects an incident beam and a reflecting surface 32 which receives the reflected light beam and reflects the beam again. The reflecting surface 32 guides the reflected and emitted light beam to positioning marks 22 and 25 to two bodies of a reticle and a wafer. The reflecting surfaces 31 and 32 are arranged so that the intersecting angle alpha formed by the reflecting surfaces 31 and 32 and the angle theta formed by both beams of the incident light beam and the emitted light beam have the relationship of theta = 2alpha. Even if the incident angle of the light beam with respect to the reflecting surface 31 is changed, the angle theta formed by the incident light beam and the emitted light beam is kept constant. The incident angles of thelight beam emitted from the reflecting surface 32 at the position aligning marks 22 and 25 are kept constant. Therefore, the detecting error caused by the position deviation data between the reticle and the wafer does not occur.

3. 发明专利

JPH0521316A ALIGNMENT DEVICE OF EXPOSURE DEVICE 失效
公开(公告)号：JPH0521316A
公开(公告)日：1993-01-29
申请号：JP17143291
申请日：1991-07-11
申请人： TOSHIBA CORP , TOPCON CORP
发明人： ISHIBASHI YORIYUKI , MURATA TAKAHIRO , YOSHINO TOSHIKAZU
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To provide a device which enables easy detection of natural diffraction spectrum (signal light) alone by preventing a diffraction image from developing at diffraction spectrum at a Fourier transformation side. CONSTITUTION:An alignment optical system 6 is provided which carries out positioning of a mask 1 and a semiconductor wafer 2 and detection of a gap by irradiating diffraction grating marks 1a, 2a provided to the mask 1 and the semiconductor wafer 2, respectively with laser light 5. In an exposure device which transcribes a mask pattern generated on the mask 1 onto the semiconductor wafer 2 by using X rays and light, a field diaphragm mechanism 9 is provided in the inside to control irradiation size of laser light 5 to put an irradiation range of laser light 5 within both diffraction grating marks la, 2a which are provided to the mask 1 and the semiconductor wafer 2, respectively.

4. 发明专利

JPH04328821A X-RAY ALIGNER 失效
公开(公告)号：JPH04328821A
公开(公告)日：1992-11-17
申请号：JP9918891
申请日：1991-04-30
申请人： TOSHIBA CORP , TOPCON CORP
发明人： ISHIBASHI YORIYUKI , HIRANO RYOICHI , KIKUIRI NOBUTAKA , NAGAI HIDEO , MURATA TAKAHIRO , YOSHINO TOSHIKAZU
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
摘要： PURPOSE:To facilitate the optical axial adjustment of an alignment optical system without repeating the needless disconnecting steps of an X-ray mask itself while enabling the reproducibility of the net alignment precision to be evaluated. CONSTITUTION:Within the title X-ray exposure device, a mask chuck 9 free disconnectably holding an X-ray mask provided with a free disconnectable adjusting dammy mask 16 with an alignment mask made inside adjusts the optical axis of an alignment optical system while holding said dammy mask or optical elements 17, 18 adjusting the incident position of alignment light incident on a mark 14a for alignment are arranged on the optical path of the alignment light.

5. 发明专利

JPH04208802A ALIGNING APPARATUS 失效
公开(公告)号：JPH04208802A
公开(公告)日：1992-07-30
申请号：JP34061390
申请日：1990-11-30
申请人： TOSHIBA CORP , TOPCON CORP
发明人： NAGAI HIDEO , MURATA TAKAHIRO , TABATA MITSUO , ISHIBASHI YORIYUKI , TOJO TORU , YOSHINO TOSHIKAZU , SAITO SUSUMU
IPC分类号： G01B11/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To enhance the relative aligning accuracy and efficiency of a mask and a wafer by always superposing two diffracted beams at a predetermined position by correcting the light path lengths of diffracted beams between a guide means and a beam mixing means. CONSTITUTION:Laser beams having frequencies f1, f2 are respectively diffracted by mask aligning marks 4, 5 and condensed to a wafer aligning mark 6 through a projection lens 3. The heterodyne signal obtained from the diffracted beam having the position data of a wafer 1 and a mask 2 among reflected diffracted beams is sent to a phase detector. At the same time, the diffracted beams L1, L2 are guided to the beam synthesizing point on a half mirror 10 to be superposed one upon another and the obtained beat signal component is detected by a reference signal detector 13 to be sent to a phase detector as a beam heterodyne reference signal and the alignment of both of them is performed on the basis of phase difference. At this time, the shift of the light path length of L1 is corrected through a prism 14 and the light path length difference l' of L1, L2 can be held to a predetermined value.

6. 发明专利

JPH04208514A DEVICE AND METHOD OF DETERMINING OPTICAL AXIS OF ALIGNMENT OPTICAL SYSTEM 失效
公开(公告)号：JPH04208514A
公开(公告)日：1992-07-30
申请号：JP34061290
申请日：1990-11-30
申请人： TOSHIBA CORP , TOPCON CORP
发明人： NAGAI HIDEO , MURATA TAKAHIRO , TOUKI TATSUHIKO , TABATA MITSUO , YOSHINO TOSHIKAZU , SAITO SUSUMU
IPC分类号： H01L21/30 , H01L21/027
摘要： PURPOSE:To improve the accuracy of axial alignment and adjustment by conducting the axial alignment of each optical central axis and the adjustment of the position of projection and projection angle of the alignment light or each alignment optical system by regulating an entrance pupil in a space. CONSTITUTION:When the entrance pupil 41 of a reduction projection lens 40 is positioned outside the reduction projection lens 40, when the entrance pupil 41 is positioned at a section lower than the surface of a wafer, an optical-axis determining device 45, to which a plane mirror 44 is installed so as to run parallel with a reticle and the wafer and so that reference beams 42 are projected vertically, is used. According to the optical-axis determining device, the entrance pupil 41 is shifted to a position 46 symmetric regarding the plane mirror 45 by reflecting reference beams by the plane mirror 45. The axial alignment, etc., of an optical central axis are enabled similarly by placing a pinhole plate 47 having a pinhole having the same diameter as the diameter of reference beams at the position 46. Consequently, the axial alignment of each optical central axis and the adjustment of the position of projection and projection angle of the alignment light of each alignment optical system are performed simply with high accuracy.

7. 发明专利

JPH0312913A LIGHT SOURCE DEVICE FOR EXPOSURE AND ALIGNMENT OF OPTICAL AXIS IN EXPOSURE DEVICE 失效
公开(公告)号：JPH0312913A
公开(公告)日：1991-01-21
申请号：JP14806189
申请日：1989-06-09
申请人： TOSHIBA CORP , TOPCON CORP
发明人： ISHIBASHI YORIYUKI , HIRANO RYOICHI , NAGAI HIDEO , MURATA TAKAHIRO , YOSHINO TOSHIKAZU , SAITO SUSUMU
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
摘要： PURPOSE:To obtain stable alignment of optical axes with high accuracy on the occasion of performing optical alignment with respective optical system elements that are incorporated into an exposure device by providing the 1st light source which outputs invisible ray beams for exposure and the 2nd light source which outputs visible ray laser beams having the same optical axes as those of the invisible ray beams. CONSTITUTION:Visible ray laser beams 14 which are outputted from a visible ray laser light source 12 are outputted after passing through the same axes as those 15 of excimer laser beams 13 which are outputted from an excimer laser light source 11. When the alignment operations of positions and optical axes between a light source device 10 and other optical system are performed, the above operations are achieved by operating only visible ray laser light source 12 and are performed by using the visible ray laser beams 14 that are outputted from the above light source. Highly accurate alignment of the positions and optical axes are thus performed without using invisible rays; besides, the excimer laser beams 13, i. e., ultraviolet rays that are harmful to eyes.

8. 发明专利

JPH0434408A OPTICAL AXIS ADJUSTOR FOR OPTICAL SYSTEM USING ACOUSTOOPTIC MODULATING ELEMENT 失效
公开(公告)号：JPH0434408A
公开(公告)日：1992-02-05
申请号：JP13959890
申请日：1990-05-31
申请人： TOSHIBA CORP , TOPCON CORP
发明人： ISHIBASHI YORIYUKI , NAGAI HIDEO , MURATA TAKAHIRO , YOSHINO TOSHIKAZU
IPC分类号： G02B7/00 , G02F1/11 , G02F1/33 , G02F2/02 , H01L21/027 , H01L21/30
摘要： PURPOSE:To easily and finely adjust the position and angle of light which is made incident on the acoustooptic element by providing plane parallels for shifting the optical axis of the light incident on the modulating element in parallel on the light incidence side of the acoustooptic element. CONSTITUTION:The plane parallels 41 and 42 and a compensator 43 are arranged between the acoustooptic modulating element(AOM) 40 and a half-mirror 31. The AOM 40 is arranged almost at a specific position and a table 45 where the AOM is fixed is moved in an (x) direction so that a light beam O1 comes to the center of a light guide-in opening. At this time, the (z)-directional position of the AOM 40 is obtained with the machining accuracy of the table 45. Then the AOM 40 is rotated in a theta direction with a pin 46 so that the light beam O1 is made incident on the AOM 40 at a specific angle of incidence (twice as large as Bragg angle), and the position where the maximum intensity (of + or -1st order light) of projection light is obtained is found. Consequently, the position and angle of the incident light can easily and finely be adjusted.

9. 发明专利

JPH03259507A OPTICAL TRANSFER EQUIPMENT 失效
公开(公告)号：JPH03259507A
公开(公告)日：1991-11-19
申请号：JP5844290
申请日：1990-03-09
申请人： TOSHIBA CORP , TOPCON CORP
发明人： MURATA TAKAHIRO , NAGAI HIDEO , ISHIBASHI YORIYUKI , HIRANO RYOICHI , SAITO SUSUMU
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To simply and precisely align the optical center axis of each element, by installing a reference light beam forming means, and previously positioning a formed reference light beam, on the optical center axis of an alignment optical system for a wafer. CONSTITUTION:An alignment optical system 11a for a wafer is constituted of a light source 21, an alignment optical system main body 22, a reference light beam forming mechanism 24, etc. The mechanism 24 is constituted as follows: after the diameter of the other beam 32 being a part of light quantity of a beam 29 obtained via a beam splitter 30 is made sufficiently small by using a stop mechanism, the beam 32 is guided on the optical center axis of the optical system 11a toward the side of a wafer table 3 by using a mirror 33 and the like. That is, a reference light beam 23 formed by the mechanism 24 has been already adjusted so as to be positioned on the optical center axis of the optical system 11a. Hence, by conforming the lens center axis of a demagnification projection lens 7 and the optical center axis of an alignment optical system 10 for a reticle to the beam 23, the optical center axis of each element can be simply and precisely aligned.

10. 发明专利

JPH04208513A ALIGNER 失效
公开(公告)号：JPH04208513A
公开(公告)日：1992-07-30
申请号：JP34061190
申请日：1990-11-30
申请人： TOSHIBA CORP , TOPCON CORP
发明人： NAGAI HIDEO , MURATA TAKAHIRO , TABATA MITSUO , ISHIBASHI YORIYUKI , TOJO TORU , YOSHINO TOSHIKAZU , SAITO SUSUMU
IPC分类号： H01L21/30 , H01L21/027
摘要： PURPOSE:To improve alignment accuracy by providing a guide means, which can be moved in the first direction in response to movement in the first direction of diffracted light with the variation of an alignment mark formed by a mask and a wafer and has length including the movement stroke of diffracted light in the second direction orthogonal to the first direction. CONSTITUTION:When the size of a mask is changed with the variation of a circuit pattern and the position of an alignment mark 4 is altered, a mirror 7 is followed up by a moving means 6 in response to the movement of the location of reflected diffracted light by a second alignment mark 5. Since the mirror 7 has length including the movement stroke of reflected diffracted light even when the position of reflected diffracted light is shifted in the direction (the Y direction in the graph) orthogonal to the direction of movement at that time, the mirror 7 need not be moved in the Y direction. Accordingly, the direction of movement of the moving means 6 is directed in one direction, thus improving alignment accuracy.

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