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61. 发明专利

JP2012006690A Car of elevator 有权
标题翻译：电梯车
公开(公告)号：JP2012006690A
公开(公告)日：2012-01-12
申请号：JP2010142648
申请日：2010-06-23
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ITO HIROYUKI , SAKURAI KENJI , OGASAWARA TAKESHI , KAWAMURA YOSUKE
IPC分类号： B66B11/02
摘要： PROBLEM TO BE SOLVED: To provide a car of an elevator which can perform the gap adjustment work between baseboards.SOLUTION: A car of an elevator of a baseboard mounting device includes: a side face baseboard 13a which is disposed on both side ends of a car floor; a back face baseboard 13b which is disposed on a depth side end of the car floor to orthogonally cross the side face baseboard 13a; and joining means (15) provided on the back face of respective baseboards 13a, and 13b and the baseboards 13a and 13b are joined to a floor frame. Either end of the back face baseboard 13b and the side face baseboard 13a which is disposed to opposite to be adjacent to a design face of the other baseboard and the other end of the baseboard is extended to the one back side of the baseboard. The other baseboard end opposed to one baseboard end on the design face of the other baseboard includes gap adjustment means (17) which pushes the end of the other baseboard to the other direction.
摘要翻译：要解决的问题：提供一种能够在底板之间执行间隙调整工作的电梯的轿厢。解决方案：踢脚板安装装置的电梯的轿厢包括：设置在轿厢地板的两侧端部的侧面基板13a; 背面基板13b，其设置在轿厢地板的深度侧端部，以正交地横过侧面基板13a; 并且设置在各个基板13a，13b和底板13a和13b的背面上的接合装置（15）接合到地板框架上。背面基板13b和设置成与另一踢脚板的设计面相邻的相对侧并且基板的另一端的侧面基板13a的任一端延伸到基板的一个后侧。与另一个基板的设计面上的一个基板端相对的另一个基板端包括间隙调节装置（17），其将另一个基板的端部推向另一个方向。版权所有（C）2012，JPO＆INPIT

62. 发明专利

JP2008234983A Flat image display device, its manufacturing method, and spacer 审中-公开
标题翻译：平面图像显示设备，其制造方法和间隔器
公开(公告)号：JP2008234983A
公开(公告)日：2008-10-02
申请号：JP2007072491
申请日：2007-03-20
申请人： Hitachi Displays Ltd , Hitachi Ltd , 株式会社日立ディスプレイズ , 株式会社日立製作所
发明人： HOJO FUSAO , NAITO TAKASHI , YAMAMOTO HIROTAKA , SAWAI YUICHI , MIYATA MOTOYUKI , HONBO MICHIKO , ITO HIROYUKI , HATORI AKIRA , HOSOYA NOBUHIKO
IPC分类号： H01J31/12 , H01J29/87
摘要： PROBLEM TO BE SOLVED: To provide a flat image display device capable of satisfying a resistance temperature characteristic, a withstand voltage and a beam deflection suppression effect at the same time, and having a spacer, and the spacer.
SOLUTION: This flat image display device is provided with: a cathode substrate having an electron source; an anode substrate having a phosphor emitting light by receiving electrons emitted from the electron source; and the spacer arranged between the cathode substrate and the anode substrate to support both the substrates. The spacer is composed of a glass base material and a thin film formed on its side surface. The thin film comprises particles exhibiting metal conductivity, a metal oxide layer covering surfaces of the particles and having an electric characteristic like that of an insulator, and a composite metal oxide dispersing them, and the composite metal oxide is formed of a solid solution of a metal oxide having electric conductivity like that of a semiconductor, and a metal oxide having electric conductivity like that of an insulator.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供能够同时满足电阻温度特性，耐受电压和光束偏转抑制效果以及具有间隔物和间隔物的平面图像显示装置。该平面图像显示装置设置有：具有电子源的阴极基板; 具有通过接收从电子源发射的电子发射光的荧光体的阳极基板; 并且间隔物布置在阴极衬底和阳极衬底之间以支撑两个衬底。间隔件由玻璃基材和在其侧表面上形成的薄膜组成。薄膜包括显示金属导电性的颗粒，覆盖颗粒表面并具有类似于绝缘体的电特性的金属氧化物层和分散它们的复合金属氧化物，并且复合金属氧化物由具有类似于半导体的导电性的金属氧化物和具有类似于绝缘体的导电性的金属氧化物。版权所有（C）2009，JPO＆INPIT

63. 发明专利

JP2008218086A Image display device and spacer for the image display device 审中-公开
标题翻译：用于图像显示装置的图像显示装置和间隔件
公开(公告)号：JP2008218086A
公开(公告)日：2008-09-18
申请号：JP2007051387
申请日：2007-03-01
申请人： Hitachi Displays Ltd , Hitachi Ltd , 株式会社日立ディスプレイズ , 株式会社日立製作所
发明人： SAWAI YUICHI , YAMAMOTO HIROTAKA , NAITO TAKASHI , HATORI AKIRA , ITO HIROYUKI
IPC分类号： H01J29/87 , H01J31/12
摘要： PROBLEM TO BE SOLVED: To suppress a shadow of a spacer from being projected in a screen as constituent elements of glass frits for fixing the spacer move to an electron emission source down the spacer, which causes deterioration in the electron emission source. SOLUTION: The image display device is provided with a back substrate, equipped with the electron emission source at an inner surface and a front substrate wherein a phosphor pattern, provided to face against the back substrate, having an array corresponding to the electron source is provided in its inner surface, and an outer surface thereof is provided as a display surface. The space between the substrates is held by a glass spacer; in the image display device having oxide crystal grains fixed on the surface of the spacer and the constituent elements of the glass frits for fixing the spacer are blocked from moving to the electron emission source going down the spacer. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了抑制间隔物的阴影被投影在屏幕中，因为用于固定间隔物的玻璃料的构成元件沿着间隔物移动到电子发射源，这导致电子发射源的劣化。解决方案：图像显示装置设置有在内表面配备有电子发射源的背面基板和前面基板，其中设置为面对背面基板的荧光体图案具有对应于电子的阵列源设置在其内表面中，并且其外表面被设置为显示表面。基板之间的空间由玻璃间隔件保持; 在具有固定在间隔物的表面上的氧化物晶粒的图像显示装置中，用于固定间隔物的玻璃料的构成元件被阻止移动到沿间隔物向下的电子发射源。版权所有（C）2008，JPO＆INPIT

64. 发明专利

JP2008192489A Image forming device and spacer used for it 审中-公开
标题翻译：图像形成设备和间隔器
公开(公告)号：JP2008192489A
公开(公告)日：2008-08-21
申请号：JP2007026641
申请日：2007-02-06
申请人： Hitachi Displays Ltd , Hitachi Ltd , 株式会社日立ディスプレイズ , 株式会社日立製作所
发明人： YAMAMOTO HIROTAKA , NAITO TAKASHI , SAWAI YUICHI , SHIONO OSAMU , MIYATA MOTOYUKI , ITO HIROYUKI , HATORI AKIRA , HOSOYA NOBUHIKO
IPC分类号： H01J31/12 , H01J29/87
摘要： PROBLEM TO BE SOLVED: To provide an image display device equipped with a spacer excellent in anti-static effect, with electron beams hardly dependent on temperature, and a spacer used for it.
SOLUTION: The spacer of the image display device is to be an oxide thin film showing electron conductivity on the surface of a glass substrate, and that oxide thin film is formed of solid solution of an oxide showing metallic electric conductivity and another oxide with higher resistance than the former. As an oxide showing metallic electric conductivity, there is ruthenium oxide, and as oxides with higher resistance, there are titanium oxide, iridium oxide, hafnium oxide and zirconium oxide.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有防静电效果优异的间隔物，几乎不依赖于温度的电子束的图像显示装置和用于其的间隔物。解决方案：图像显示装置的间隔物是在玻璃基板的表面上显示电子传导性的氧化物薄膜，并且氧化物薄膜由表现出金属导电性的氧化物的固溶体和另一种氧化物形成具有比前者更高的阻力。作为显示金属导电性的氧化物，存在氧化钌，作为具有较高电阻的氧化物，存在氧化钛，氧化铱，氧化铪和氧化锆。版权所有（C）2008，JPO＆INPIT

65. 发明专利

JP2008171739A Image display device 审中-公开
标题翻译：图像显示设备
公开(公告)号：JP2008171739A
公开(公告)日：2008-07-24
申请号：JP2007005333
申请日：2007-01-15
申请人： Hitachi Displays Ltd , Hitachi Ltd , 株式会社日立ディスプレイズ , 株式会社日立製作所
发明人： MORIYAMA TOMOHIRO , KATO TATSURO , HATORI AKIRA , ITO HIROYUKI , HOSOYA NOBUHIKO
IPC分类号： H01J31/12 , H01J29/87
摘要： PROBLEM TO BE SOLVED: To prevent a stray current and partial discharge caused by electric field concentration in the terminal part (17) of a spacer, in an image display device composed of a front substrate (1), a back substrate (2), a support frame (3), and a space keeping member (4).
SOLUTION: A raised electrode for suppressing an electric field, the surface of which has one or more suitable radiuses of curvature, no corner, no protrusion, and a gentle shape as a whole, is used. The end face of the spacer and the side face of the spacer in the vicinity of the end face are surrounded by the almost U-shaped raised electrode without making contact with these faces.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题为了防止在由前基板（1），后基板（1）构成的图像显示装置中由间隔件的端子部（17）中的电场集中引起的杂散电流和局部放电 2），支撑框架（3）和空间保持构件（4）。解决方案：使用用于抑制电场的凸起电极，其表面具有一个或多个合适的曲率半径，没有角部，没有突出部以及整体上平缓的形状。间隔件的端面和端面附近的间隔件的侧面被几乎U形的凸起电极围绕，而不与这些面接触。版权所有（C）2008，JPO＆INPIT

66. 发明专利

JP2007220419A Image display device and spacer for it 审中-公开
标题翻译：图像显示装置及其间隔件
公开(公告)号：JP2007220419A
公开(公告)日：2007-08-30
申请号：JP2006038137
申请日：2006-02-15
申请人： Hitachi Displays Ltd , Hitachi Ltd , 株式会社日立ディスプレイズ , 株式会社日立製作所
发明人： NAITO TAKASHI , SHIONO OSAMU , SAWAI YUICHI , AKATA HIROYUKI , HAYASHIBARA MITSUO , ITO HIROYUKI , HOSOYA NOBUHIKO , SHIRAI MASAJI , KANAZAWA KEIICHI
IPC分类号： H01J29/87 , H01J31/12
摘要： PROBLEM TO BE SOLVED: To obtain an image display of high quality by correcting deflection of an electron flow caused by electrification of a spacer to prevent the shadow of the spacer from being displayed.
SOLUTION: This image display device has a cathode substrate SUB1 on which a plurality of cathodes comprising thin film type electron sources are formed, an anode substrate SUB2 on which a plurality of phosphors PH facing the cathode and an anode AD are formed, and a spacer SPC interposed in a gap facing the surface on which the thin film type electron sources of the cathode substrate SUB1 are formed and the surface on which the phosphors PH of the anode substrate SUB 2 and the anode AD are formed to keep a prescribed gap between the cathode substrate and the anode substrate. The secondary electron emission coefficient of the spacer is set to 1 or less in the half value of a voltage V
A impressed between the cathode and the anode.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了通过校正由间隔物的带电引起的电子流的偏转来获得高质量的图像显示，以防止间隔物的阴影显示。解决方案：该图像显示装置具有阴极基板SUB1，在其上形成有多个阴极，其中形成有多个薄膜型电子源的阴极，阳极基板SUB2上形成有多个荧光体PH面向阴极和阳极AD，以及间隔物SPC，其插入在与形成阴极基板SUB1的薄膜型电子源的表面相对的间隙中，并且形成有阳极基板SUB 2和阳极AD的荧光体PH保持规定的表面阴极基板和阳极基板之间的间隙。间隔物的二次电子发射系数在阴极和阳极之间施加的电压V SB A A的半值中设定为1以下。版权所有（C）2007，JPO＆INPIT

67. 发明专利

JP2000011911A COLOR CATHODE-RAY TUBE HAVING SHADOW MASK 失效
公开(公告)号：JP2000011911A
公开(公告)日：2000-01-14
申请号：JP18094598
申请日：1998-06-26
申请人： HITACHI LTD
发明人： ITO HIROYUKI , HOSOYA NOBUHIKO , WATANABE MITSURU , YOSHIDA HARUHIKO
IPC分类号： H01J29/07 , H01J29/02
摘要： PROBLEM TO BE SOLVED: To provide a color cathode-ray tube having a shadow mask that prevents the deformation of the perforated part of the shadow mask by reducing the warpage of the skirt part of the shadow mask and thereby improving the fitting workability of the skirt part to a support frame. SOLUTION: This color cathode-ray tube comprises a shadow mask 5 equipped with a curved surface-shaped perforated part 14 having multiple electron beam passing holes, a curved surface-shaped non-perforated part 15 communicating with all the peripheries of the perforated part 14, and a skirt part 16 vertically extended and bent from all the outside peripheries of the non- perforated part 15 and wherein the skirt part 16 is spot-welded to a support frame to fix it to the inside of a panel part. In this case, a stepped region 20 lowered along its entire outside peripheries in the form of a step is formed on the non-perforated part 15 of the shadow mask 5, the skirt part 16 is extended vertically and made to bend from all the outside peripheries of the stepped region 20, and multiple beads 175-178, 1810-1812 which extend in the height direction of the skirt part 16 and swelled inward in a circular or rectangular form are formed on the respective sides of the skirt part 16.

68. 发明专利

JPH1187221A ELECTRON BEAM EXPOSURE METHOD AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING THE SAME 失效
公开(公告)号：JPH1187221A
公开(公告)日：1999-03-30
申请号：JP24436397
申请日：1997-09-09
申请人： HITACHI LTD
发明人： HAYAKAWA HAJIME , ITO HIROYUKI , IWASAKI TERUO
IPC分类号： G03F7/20 , H01J37/147 , H01J37/305 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To realize high precision exposure by exposing a resist film on a wafer set on a specimen base, in a state of deflection distance in the continuous shifting direction of a specimen base corresponding to a rectangular short side in the deflection region of electron beams. SOLUTION: A wafer 2 is set on a specimen base 1 of an electron beam aligner, so as to expose a resist film coated on the wafer 2 by electron beam 4. At this time, the resist film is exposed using the electron beam 4 by making rectangular the deflection region of the electron beams 4 emitted from an electron beam source 3 and deflected by using a deflector 7, while continuously shifting the specimen base 1. In the electron beam exposure method in this constitution, the exposing step is started, when the electron beam 4 enters in the allowable deflection region (deflection width) in the shifting (advancing) direction of the specimen base 1.

69. 发明专利

JPH10284389A METHOD AND SYSTEM FOR ELECTRON BEAM EXPOSURE 失效
公开(公告)号：JPH10284389A
公开(公告)日：1998-10-23
申请号：JP9637697
申请日：1997-04-01
申请人： HITACHI LTD
发明人： HAYAKAWA HAJIME , IWASAKI TERUO , ITO HIROYUKI
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To prevent the wafer temperature from lowering due to adiabatic expansion incident to evacuation without sacrificing of throughput. SOLUTION: A wafer 1 is transferred from a vacuum prechamber, i.e., a sample replacing chamber 23, into a processing chamber 12 where the wafer 1 is irradiated with an electron beam 15 under evacuated state and exposed. The sample replacing chamber 23 is provided with a lamp 27 for heating the wafer 1 during or before and after evacuation of the sample replacing chamber 23. Since the wafer is heated by means of a lamp during or before and after evacuation, the heat being deprived by a gas having temperature lowered through adiabatic expansion incident to evacuation can be supplemented and the water temperature can be prevented from lowering. Consequently, fluctuation of length due to temperature fluctuation can be prevented and the accuracy of exposure can be enhanced. Furthermore, exhaust rate is not suppressed but enhanced and the evacuation time can be shortened resulting in the enhancement of throughput.

70. 发明专利

JPH10259160A PRODUCTION OF AROMATIC POLYCARBOXYLIC ACID AND APPARATUS THEREFOR 失效
公开(公告)号：JPH10259160A
公开(公告)日：1998-09-29
申请号：JP6610097
申请日：1997-03-19
申请人： HITACHI LTD
发明人： ATSUMI KENJI , ITO HIROYUKI
IPC分类号： B01J23/26 , B01J23/34 , B01J23/75 , B01J23/755 , C07B61/00 , C07C51/16 , C07C51/265 , C07C51/43 , C07C51/47 , C07C63/26
摘要： PROBLEM TO BE SOLVED: To provide both a method for producing terephthalic acid, capable of effectively carrying out cleaning and drain treatment even in production of terephthalic acid requiring a large amount of cleaning solution. SOLUTION: This production method comprises a mixing step for mixing p-xylene with acetic acid and an oxidation promoting catalyst to form a mixed raw material, an oxidizing/crystallizing step for oxidizing the mixed raw material to form a terephthalic acid slurry, a solid-liquid separating step for washing the slurry in a placed state on a rotary filter medium by a cleaning solution while rotating to carry out solid-liquid separation and individually forming wet terephthalic acid, a slurry separated mother liquid and a cleaning waste solution, an acetic acid recovering/returning step for recovering an acetic acid component contained in the slurry separated mother liquid and returning the recovered acetic acid component to the mixing step and a direct returning step for directly returning the cleaning waste solution to the mixing step.

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