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51. 发明专利

JP2004198993A Energy-sensitive negative resin composition and photosensitive element used for organic layer having roughened surface for liquid crystal display device 审中-公开
公开(公告)号：JP2004198993A
公开(公告)日：2004-07-15
申请号：JP2002370627
申请日：2002-12-20
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： IWAMURO MITSUNORI , KIZAWA KEIKO , NOJIRI TAKESHI
IPC分类号： G03F7/004 , C08F291/00 , G02F1/1333 , G03F7/027 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an energy-sensitive negative resin composition and a photosensitive element which has superior shape characteristics and with which an organic layer having a roughened surface can easily be formed by an inexpensive method for a substrate for liquid crystal display.
SOLUTION: The energy-sensitive negative resin composition is a substrate for a liquid crystal display device having an image-corresponding roughened surface formed through a stage (I) of forming an energy-sensitive negative resin composition layer on a substrate, a stage (II) of irradiating the energy-sensitive negative resin composition layer with an active light beam in the form of an image, and a stage (III) of heating the layer, a step on the surface after the heating stage is 0.1 to 0.5 hμm, while the thickness h of the energy-sensitive negative resin composition layer is 0.1 to 20 μm.
COPYRIGHT: (C)2004,JPO&NCIPI

52. 发明专利

JP2004198992A Energy-sensitive negative resin composition to be used for organic substance layer having rugged surface pattern of substrate for liquid crystal display, and photosensitive element 审中-公开
公开(公告)号：JP2004198992A
公开(公告)日：2004-07-15
申请号：JP2002370626
申请日：2002-12-20
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： IWAMURO MITSUNORI , KIZAWA KEIKO , NOJIRI TAKESHI
IPC分类号： G03F7/004 , C08F291/00 , G02F1/1335 , G03F7/027 , G03F7/36 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an energy-sensitive negative resin composition for forming an organic substance layer having a surface rugged pattern with an excellent shape characteristics by an easy and low-cost method on a substrate for a liquid crystal display, and to provide a photosensitive element.
SOLUTION: The energy-sensitive negative resin composition is subjected to processes of: forming a layer of the energy-sensitive negative resin composition on a substrate; image-wisely irradiating the energy-sensitive negative resin composition layer with active rays; and heating, so as to form a surface rugged pattern corresponding to the image. The surface level difference after the heating can be controlled to (0.1 to 0.5)h μm with respect to the thickness h (h= 0.1 to 20 μm) of the energy-sensitive negative resin composition layer.
COPYRIGHT: (C)2004,JPO&NCIPI

53. 发明专利

JP2004198987A Surface unevenness forming method, optical film obtained by the same, and diffuse reflective plate 审中-公开
公开(公告)号：JP2004198987A
公开(公告)日：2004-07-15
申请号：JP2002370618
申请日：2002-12-20
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： KIZAWA KEIKO , NOJIRI TAKESHI , IWAMURO MITSUNORI
IPC分类号： G02B5/02 , G02B5/08 , G02F1/1335 , G03F7/20 , G03F7/40 , G09F9/30
摘要： PROBLEM TO BE SOLVED: To provide a method of easily and inexpensively forming an uneven shape on a resin surface simultaneously with formation of a substrate exposed surface, and to provide an optical film, a diffuse reflective plate, and a film having an uneven surface which are obtained by the method.
SOLUTION: The method of forming unevenness on a surface in accordance with a mask pattern comprises a surface unevenness forming step group (A) and a step group (B), and the step group (A) includes steps of; forming an energy-sensitive negative resin composition layer containing one or more kinds of polymerizable monomers or oligomers; irradiating the energy-sensitive negative resin composition layer with active energy rays except parts which should be removed; and etching (developing) and preheating the non-irradiated parts of the energy-sensitive resin composition layer, and the step group (B) includes a step of radiating active energy rays at least once through a mask having a pattern formed and a step of postheating, and step groups (A) and (B) are performed in order.
COPYRIGHT: (C)2004,JPO&NCIPI

54. 发明专利

JP2004198986A Surface unevenness forming method, optical film obtained thereby, diffuse reflective plate, and film having surface unevenness 审中-公开
标题翻译：表面无损成型方法，获得的光学薄膜，折射板和具有表面不透气性的膜
公开(公告)号：JP2004198986A
公开(公告)日：2004-07-15
申请号：JP2002370617
申请日：2002-12-20
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： KIZAWA KEIKO , IWAMURO MITSUNORI , NOJIRI TAKESHI
IPC分类号： G02B5/02 , G03F7/20 , G03F7/36 , G03F7/38
摘要： PROBLEM TO BE SOLVED: To provide a method of easily and inexpensively forming an uneven shape on a resin surface simultaneously with formation of a substrate exposed face, and to provide an optical film, a diffuse reflective plate, and a film having surface unevenness which are obtained by the method.
SOLUTION: The method of forming surface unevenness in accordance with a mask pattern comprises a surface unevenness forming step group (A) including steps of; forming an energy-sensitive negative resin composition layer containing one or more kinds of polymerizable monomers or oligomers; radiating active energy rays at least once through a mask having a pattern formed thereon; and preheating without etching operation and an etching step group (B) including steps of; radiating active energy rays to parts other the parts where the energy-sensitive negative resin composition layer should be removed; etching the energy-sensitive negative resin composition layer in the position to which active energy rays have not been radiated; and postheating, and step groups (A) and (B) are executed in order.
COPYRIGHT: (C)2004,JPO&NCIPI
摘要翻译：要解决的问题：提供一种在形成基板暴露面的同时在树脂表面上容易且低成本地形成不均匀形状的方法，并且提供光学膜，漫反射板和具有表面的膜通过该方法获得的不均匀性。解决方案：根据掩模图案形成表面凹凸的方法包括表面凹凸形成步骤组（A），包括以下步骤：形成含有一种或多种可聚合单体或低聚物的能量敏感性负树脂组合物层; 通过具有形成在其上的图案的掩模将至少一次的活性能量射线照射; 和无蚀刻操作的预热和蚀刻步骤组（B），包括以下步骤：向能够去除能量敏感的负极树脂组合物层的其它部分辐射活性能量射线; 在活性能量射线未被辐射的位置上蚀刻能量敏感性负树脂组合物层; 和后加热，步骤组（A）和（B）依次执行。版权所有（C）2004，JPO＆NCIPI

55. 发明专利

JP2004037521A Surface unevenness forming method, optical film and diffuse reflection plate each obtained by the same and method for manufacturing diffuse reflection plate 审中-公开
公开(公告)号：JP2004037521A
公开(公告)日：2004-02-05
申请号：JP2002190515
申请日：2002-06-28
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： IWAMURO MITSUNORI , TAI SEIJI , TSURUOKA YASUO , KIZAWA KEIKO
IPC分类号： G02F1/1335 , C08J5/18 , G03F7/38
摘要： PROBLEM TO BE SOLVED: To provide a method for easily and stably obtaining a surface uneven shape having a through hole at low cost and to provide an optical film and a diffuse reflection plate using the same. SOLUTION: The surface unevenness forming method is achieved by sequentially carrying out a group (A) of surface unevenness forming steps including a step for forming an energy-sensitive negative resin composition layer containing one or more polymerizable monomers or oligomers, a step for irradiating the layer once or more with active energy rays through a patterned mask and a step for postbaking the layer without carrying out etching and a group (B) of through hole forming steps including a step for irradiating the energy-sensitive negative resin composition layer once or more with active energy rays through a mask in which a light shielding pattern for a through hole has been formed and a step for removing the layer in the through hole portion by prescribed etching. COPYRIGHT: (C)2004,JPO

56. 发明专利

JP2004037519A Surface unevenness formation method, optical film and diffusion reflecting plate obtained by the method, and diffusion reflecting plate production method 审中-公开
公开(公告)号：JP2004037519A
公开(公告)日：2004-02-05
申请号：JP2002190509
申请日：2002-06-28
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： KIZAWA KEIKO , TAI SEIJI , TSURUOKA YASUO , IWAMURO MITSUNORI
IPC分类号： G02B5/02 , B05D5/06 , B05D7/04 , B05D7/24 , C08F291/00 , G02B5/08 , G02F1/1335 , G03F7/36 , G03F7/38
摘要： PROBLEM TO BE SOLVED: To provide a method for easily rendering a resin surface uneven at a low cost, and a transfer original pattern using the method, and to provide a transfer prototype for forming the transfer original pattern, transfer base film, transfer film, diffusion reflecting plate, and an optical film. SOLUTION: The surface unevenness formation method comprises: the step of forming an energy-sensitive, negative type resin composition layer containing (a) at least one or more kinds of polymerizable binder resin, (b) at least one or more kinds of polymerizable monomer or oligomers, and (c) at least one or more kinds of polymerization initiator which forms a free radical by the emission of active energy rays, the compounding composition of (c) the polymerization initiator forming the free radical by the emission of the active energy rays being 0.1 to 10 wt.% of the total of the solid contents of (a) + (b); the step of carrying out the emission of the active energy rays at least one or more times via a mask formed in a pattern; and the step of subjecting to post-heating without an etching operation. COPYRIGHT: (C)2004,JPO

57. 发明专利

JP2004035593A Method of forming surface unevenness, optical film obtained therefrom, diffusion reflecting plate and method of producing diffusion reflecting plate 审中-公开
公开(公告)号：JP2004035593A
公开(公告)日：2004-02-05
申请号：JP2002190512
申请日：2002-06-28
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： TSURUOKA YASUO , IWAMURO MITSUNORI , KIZAWA KEIKO , TAI SEIJI
IPC分类号： G02B5/02 , C08F2/44 , C08F291/00 , C08J5/18 , G02B5/08 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide a method by which a resin surface uneven shape can simply be formed at a low cost, a transfer prototype using the surface uneven shape forming method, a transfer prototype forming another transfer prototype, a transfer base film, a transfer film, a diffusion reflecting plate and an optical film. SOLUTION: The method of forming the surface unevenness includes the following steps. A step for forming an energy-sensitive negative type resin composition layer comprising (a) a binder resin, (b) one or more kinds of polymerizable monomers or oligomers having at least ≥1 ethylenically unsaturated groups, (c) a polymerization initiator producing free radicals by irradiation with active energy rays and (d) a black colorant, a step for irradiating the resultant layer through a patterned mask with the active energy rays at least once or more and a step for postheating the irradiated layer without performing etching operation. COPYRIGHT: (C)2004,JPO

58. 发明专利

JP2012227185A Paste composition for electrode, solar cell element, and solar cell 有权
标题翻译：电极，太阳能电池组件和太阳能电池组合物
公开(公告)号：JP2012227185A
公开(公告)日：2012-11-15
申请号：JP2011090522
申请日：2011-04-14
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： ADACHI SHUICHIRO , YOSHIDA MASATO , NOJIRI TAKESHI , IWAMURO MITSUNORI , KIZAWA KEIKO , AOYAGI TAKUYA , YAMAMOTO HIROTAKA , NAITO TAKASHI , KATO TAKAHIKO
IPC分类号： H01L31/04 , H01B1/22
CPC分类号： H01L31/02245 , H01B1/026 , H01B1/16 , H01L31/022441 , H01L31/022458 , Y02E10/50
摘要： PROBLEM TO BE SOLVED: To provide a paste composition for electrodes capable of forming copper-containing electrodes in which oxidation of a copper at the time of calcination is suppressed, the electrodes exhibiting low resistance can be formed, and further formation of a reaction phase between the copper and a silicon substrate is suppressed to obtain good ohmic contact, and also to provide a solar cell element and a solar cell which have the electrodes formed using the paste composition for the electrodes.SOLUTION: The paste composition for the electrodes is arranged so as to include phosphorus-containing copper alloy particles, tin-containing particles, glass particles having a particle size (D50%) of 0.5 μm or more and 10 μm or less, a solvent, and a resin. The solar cell element and the solar cell which have the electrodes formed by using the paste composition for the electrodes are provided.
摘要翻译：要解决的问题：为了提供一种能够形成含铜电极的电极用糊料组合物，其中在煅烧时氧化氧化铜，可以形成低电阻的电极，并进一步形成铜和硅衬底之间的反应相被抑制以获得良好的欧姆接触，并且还提供具有使用电极用糊剂组合物形成的电极的太阳能电池元件和太阳能电池。溶液：电极用糊剂组合物包括含磷铜合金粒子，含锡粒子，粒径（D50％）为0.5μm以上且10μm以下的玻璃粒子，溶剂和树脂。提供了通过使用电极用糊剂组合物形成电极的太阳能电池元件和太阳能电池。版权所有（C）2013，JPO＆INPIT

59. 发明专利

JP2012160696A Composition for forming p-type diffusion layer, method of producing p-type diffusion layer, method of manufacturing solar cell element, and solar cell 有权
标题翻译：用于形成P型扩散层的组合物，P型扩散层的制造方法，制造太阳能电池元件的方法和太阳能电池
公开(公告)号：JP2012160696A
公开(公告)日：2012-08-23
申请号：JP2011157229
申请日：2011-07-15
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： ODA AKIHIRO , YOSHIDA MASATO , NOJIRI TAKESHI , MACHII YOICHI , IWAMURO MITSUNORI , KIZAWA KEIKO , ADACHI SHUICHIRO , SATO TETSUYA
IPC分类号： H01L31/04 , H01L21/225
CPC分类号： H01L31/1804 , H01L21/2225 , H01L21/2254 , H01L21/228 , H01L31/068 , Y02E10/547 , Y02P70/521
摘要： PROBLEM TO BE SOLVED: To provide a composition for forming a p-type diffusion layer capable of forming the p-type diffusion layer while suppressing occurrence of warpage of a silicon substrate, and to provide a method of producing a p-type diffusion layer, and a method of manufacturing a solar cell element.SOLUTION: The composition for forming a p-type diffusion layer is composed to contain a boron nitride having a hexagonal crystal form, and a dispersion medium. The p-type diffusion layer, and a solar cell element having the p-type diffusion layer are produced by applying the composition for forming a p-type diffusion layer onto a silicon substrate, and then performing thermal diffusion processing.

60. 发明专利

JP2012160695A Composition for forming p-type diffusion layer, method of producing p-type diffusion layer, method of manufacturing solar cell element, and solar cell 有权
标题翻译：用于形成P型扩散层的组合物，P型扩散层的制造方法，制造太阳能电池元件的方法和太阳能电池
公开(公告)号：JP2012160695A
公开(公告)日：2012-08-23
申请号：JP2011157228
申请日：2011-07-15
申请人： Hitachi Chem Co Ltd , 日立化成工業株式会社
发明人： ODA AKIHIRO , YOSHIDA MASATO , NOJIRI TAKESHI , MACHII YOICHI , IWAMURO MITSUNORI , KIZAWA KEIKO , ADACHI SHUICHIRO , SATO TETSUYA
IPC分类号： H01L21/225 , H01L31/04
CPC分类号： H01L31/1804 , H01L21/2225 , H01L21/2254 , H01L21/228 , H01L31/068 , Y02E10/547 , Y02P70/521
摘要： PROBLEM TO BE SOLVED: To provide a composition for forming a p-type diffusion layer capable of forming a low resistance p-type diffusion layer by suppressing reaction of the composition for forming a p-type diffusion layer and a substrate while suppressing occurrence of warpage of a silicon substrate during thermal diffusion, and to provide a method of producing a p-type diffusion layer using the composition, a method of manufacturing a solar cell element, and a solar cell.SOLUTION: The composition for forming a p-type diffusion layer is composed to contain at least one kind of boron compound selected from a boron nitride and a boron carbide, and a dispersion medium. The p-type diffusion layer and a solar cell element having the p-type diffusion layer are produced by applying the composition for forming a p-type diffusion layer onto a silicon substrate, and then performing thermal diffusion processing.
摘要翻译：解决的问题：提供一种通过抑制用于形成p型扩散层的组合物和基板的反应而形成低电阻p型扩散层的p型扩散层的组合物，同时抑制在热扩散期间发生硅基板的翘曲，并且提供使用该组合物制造p型扩散层的方法，制造太阳能电池元件的方法和太阳能电池。
解决方案：用于形成p型扩散层的组合物包含至少一种选自氮化硼和碳化硼的硼化合物和分散介质。 p型扩散层和具有p型扩散层的太阳能电池元件通过将用于形成p型扩散层的组合物施加到硅衬底上，然后进行热扩散处理来制造。版权所有（C）2012，JPO＆INPIT

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