专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明专利

JP2006124192A Method for processing glass by laser beam irradiation and method for manufacturing glass substrate 审中-公开
标题翻译：通过激光束辐照处理玻璃的方法和制造玻璃基板的方法
公开(公告)号：JP2006124192A
公开(公告)日：2006-05-18
申请号：JP2004310835
申请日：2004-10-26
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： NISHI MIZUKI , AKAMATSU YOSHINORI , TAWARA MASAKI
IPC分类号： C03B29/04 , B23K26/00 , C03B27/012
CPC分类号： C03B29/08 , C03B29/025 , C03B29/16 , Y02P40/57
摘要： PROBLEM TO BE SOLVED: To provide a method for processing the edge of glass by laser beam irradiation at a room temperature in a simple way without using a large-scale apparatus. SOLUTION: In a method for processing a glass edge by softening at least the corner of the glass edge with heat by laser beam irradiation and then solidifying the softened part by cooling, the glass is clamped by members which are unbreakable and unmelted by laser beam irradiation and laser beam irradiation is applied to the members as well when laser beam irradiation is applied to the glass edge, by which the glass edge is softened and solidified at a room temperature without preheating the glass. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种在不使用大型装置的情况下以简单的方式在室温下通过激光束照射来处理玻璃边缘的方法。解决方案：在通过激光束照射使至少玻璃边缘的角部至少软化玻璃边缘然后通过冷却固化软化部分的方法中，玻璃被不可破坏和未熔化的部件夹紧当激光束照射施加到玻璃边缘时，激光束照射和激光束照射也施加到构件上，玻璃边缘在室温下软化和固化，而不预热玻璃。版权所有（C）2006，JPO＆NCIPI

42. 发明专利

JP2005281091A Easily washable glass for building and its producing method 有权
标题翻译：易于清洗的玻璃及其制造方法
公开(公告)号：JP2005281091A
公开(公告)日：2005-10-13
申请号：JP2004099789
申请日：2004-03-30
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： KUMON SOICHI , AKAMATSU YOSHINORI
IPC分类号： A47L1/15 , B08B7/04 , C03C17/25
摘要： PROBLEM TO BE SOLVED: To provide glass (easily washable glass) from which stuck pollutants can be easily removed.
SOLUTION: The easily washable glass is composed of a glass substrate and a film formed on the glass substrate. The film comprises silica being a matrix, a fluoroalkylsilane and dimethylsilicone. The ratio of the content of the fluoroalkylsilane to the content of silica is 0.05-0.30 by weight, and the ratio of the content of dimethylsilicone to the content of silica is 0.001-0.050 by weight.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供易于清除卡住的污染物的玻璃（容易洗涤的玻璃）。解决方案：易于洗涤的玻璃由玻璃基板和形成在玻璃基板上的膜组成。该膜包括二氧化硅作为基质，氟代烷基硅烷和二甲基硅氧烷。氟烷基硅烷的含量与二氧化硅含量的比例为0.05-0.30重量比，二甲基硅氧烷的含量与二氧化硅含量之比为0.001-0.050重量％。版权所有（C）2006，JPO＆NCIPI

43. 发明专利

JP2003064309A Film having high water droplet-slipping property and method for applying the same 有权
标题翻译：具有高水浸滑液性的薄膜及其应用方法
公开(公告)号：JP2003064309A
公开(公告)日：2003-03-05
申请号：JP2001260705
申请日：2001-08-30
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： AKAMATSU YOSHINORI , KUMON SOICHI , ARAI HIROAKI , HAMAGUCHI SHIGEO
IPC分类号： B32B27/00 , C03C17/30 , C09D5/00 , C09D183/08 , C09K3/18
摘要： PROBLEM TO BE SOLVED: To obtain a film having high water droplet-slipping property, excellent in light resistance and abrasion resistance and having high durability.
SOLUTION: A water droplet-slipping component comprising a fluoroalkyl group-containing silanized dimethylsilicone obtained by binding a silanized dimethylsilicone as a reaction product of a silanol-terminal dimethylsilicone with an isocyanate group-containing alkoxysilane to a fluoroalkylsilane is dispersed into a silica matrix. Thereby, the water droplet-slipping component is hybridized to a silica film so as to improve retaining property of the component in the film and the fluoroalkylsilane is introduced into the water droplet- slipping component to form the highly water droplet-slipping film having high durability.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了获得具有高水滑滑性的薄膜，耐光性和耐磨性优异并具有高耐久性。解决方案：将通过将硅烷醇二甲基硅氧烷与含异氰酸酯基的烷氧基硅烷的反应产物的硅烷化的二甲基硅氧烷与氟烷基硅烷结合而获得的含氟烷基的硅烷化二甲基硅氧烷的水滴滑动组分分散到二氧化硅基质中。由此，将水滴滑动成分与二氧化硅膜杂交，提高成分在膜中的保持性，将氟代烷基硅烷引入水滴滑动成分，形成高耐久性的高水滴滑动膜。

44. 发明专利

JPH11278867A Formation of thin film 失效
标题翻译：形成薄膜
公开(公告)号：JPH11278867A
公开(公告)日：1999-10-12
申请号：JP8529598
申请日：1998-03-31
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： HAMAGUCHI SHIGEO , AKAMATSU YOSHINORI
IPC分类号： C01G23/00 , C03C17/00 , C03C17/25 , C03C17/30
CPC分类号： C03C17/256 , C03C2217/212 , C03C2217/213 , C03C2217/23 , C03C2218/113
摘要： PROBLEM TO BE SOLVED: To ensure good film forming property and to enhance and stabilize film quality by regulating the surface temp. of a substrate immediately before coating with a chemical soln. to a temp. at least exceeding ambient temp.
SOLUTION: A thin film is preferably formed in an environment at 25±15°C ambient temp. and ≤70% relative humidity. The temp. of the substrate at the time of coating with a chemical soln. is regulated to a temp. at least exceeding the ambient temp. The temp. difference ΔT°C between the temp. of the substrate at the time of coating and the ambient temp. of a coating chamber is preferably >0 to 80°C. An alcoholic soln. of ter- and quarterfunctional metal alkoxides or a soln. contg. a fluoroalkyl-contg. silane compd. is used as the chemical soln. A glass, plastic, metallic or ceramic substrate is used as the substrate. The temp. regulating method is not particularly limited and heating with an electric heater or hot water may be adopted.
COPYRIGHT: (C)1999,JPO
摘要翻译：要解决的问题：为了确保良好的成膜性能，通过调节表面温度来提高和稳定膜质量。在用化学溶剂涂覆之前立即进行。到温度至少超过环境温度。解决方案：优选在环境温度为25±15℃的环境中形成薄膜。和<= 70％相对湿度。温度在用化学溶剂涂覆时的基材。被调到温度至少超过环境温度。温度温差ΔT℃ 的涂层时的基材和环境温度。的涂布室优选为0〜80℃。一个酒精溶胶三官能和四官能金属醇盐或溶胶。 contg。氟代烷基硅烷化合物用作化学溶剂。使用玻璃，塑料，金属或陶瓷基板作为基板。温度调节方法没有特别限制，可以采用电加热器或热水进行加热。

45. 发明专利

JP2013220956A Method and apparatus for producing calcium fluoride 审中-公开
标题翻译：生产氟化钙的方法和装置
公开(公告)号：JP2013220956A
公开(公告)日：2013-10-28
申请号：JP2012091756
申请日：2012-04-13
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： MIYAZAKI TATSUO , TOKUNAGA ATSUSHI , IDE TOSHIHISA , AKAMATSU YOSHINORI
IPC分类号： C01F11/22
CPC分类号： C01B33/18 , C01C1/26 , C01D7/00 , C01F11/22 , C01P2002/72 , C01P2002/80 , C01P2004/61
摘要： PROBLEM TO BE SOLVED: To provided a method for producing, from drain water containing hydrosilicofluoric acid, calcium fluoride having a particle size and high purity suitable as a material for producing hydrofluoric acid.SOLUTION: A method for producing calcium fluoride using hydrosilicofluoric acid-containing water includes: a step [1] of reacting the hydrosilicofluoric acid-containing water with an ammonium compound and producing a first reaction product that includes insoluble silica and an ammonium fluoride aqueous solution; a step [2] of separating the insoluble silica from the first reaction product; a step [3] of reacting the first reaction product from which the insoluble silica has been separated, with calcium carbonate and producing a second reaction product that includes calcium fluoride and an ammonium carbonate aqueous solution; and a step [4] of separating the ammonium carbonate aqueous solution from the second reaction product.
摘要翻译：要解决的问题：提供一种从含氟硅氟酸的排水中制备具有适合作为制备氢氟酸的材料的粒度和高纯度的氟化钙的方法。溶液：使用含氢氟酸的氟化钙的制造方法水包括：使含硅氟酸的水与铵化合物反应的步骤[1]，并产生包含不溶性二氧化硅和氟化铵水溶液的第一反应产物; 将不溶性二氧化硅与第一反应产物分离的步骤[2] 使不溶性二氧化硅分离的第一反应产物与碳酸钙反应的步骤[3]，并产生包含氟化钙和碳酸铵水溶液的第二反应产物; 和从第二反应产物中分离出碳酸铵水溶液的步骤[4]。

46. 发明专利

JP2013220955A Method and apparatus for producing calcium fluoride 审中-公开
标题翻译：生产氟化钙的方法和装置
公开(公告)号：JP2013220955A
公开(公告)日：2013-10-28
申请号：JP2012091755
申请日：2012-04-13
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： MIYAZAKI TATSUO , TOKUNAGA ATSUSHI , IDE TOSHIHISA , AKAMATSU YOSHINORI
IPC分类号： C01F11/22 , C01B33/18
CPC分类号： C01B33/18 , C01D3/02 , C01D7/00 , C01F11/22 , C01P2002/72 , C01P2006/80
摘要： PROBLEM TO BE SOLVED: To provided a method for producing, from drain water containing hydrosilicofluoric acid, calcium fluoride having a particle size and high purity suitable as a material for producing hydrofluoric acid.SOLUTION: A method for producing calcium fluoride comprises: a step [1] of reacting hydrosilicofluoric acid-containing water with a potassium compound and producing a first reaction product that includes insoluble silica and a potassium fluoride aqueous solution; a step [2] of separating the insoluble silica from the first reaction product; a step [3] of reacting the first reaction product, from which the insoluble silica has been separated, with calcium carbonate and producing a second reaction product that includes calcium fluoride and a potassium carbonate aqueous solution; and a step [4] of separating the potassium carbonate aqueous solution from the second reaction product.
摘要翻译：要解决的问题：提供一种从含有硅氟酸的排水中制备具有适合作为制备氢氟酸的材料的粒度和高纯度的氟化钙的方法。溶解：一种氟化钙的制备方法，包括：步骤[ 1]使含硅氟酸的水与钾化合物反应，并制备包含不溶性二氧化硅和氟化钾水溶液的第一反应产物; 将不溶性二氧化硅与第一反应产物分离的步骤[2] 将不溶性二氧化硅从其中分离的第一反应产物与碳酸钙反应的步骤[3]，并产生包括氟化钙和碳酸钾水溶液的第二反应产物; 和从第二反应产物分离碳酸钾水溶液的步骤[4]。

47. 发明专利

JP2012233174A Siloxane compound and cured product thereof 有权
标题翻译：硅氧烷化合物及其固化产物
公开(公告)号：JP2012233174A
公开(公告)日：2012-11-29
申请号：JP2012090665
申请日：2012-04-12
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： HONJO KEIJI , IDE TOSHIHISA , AKAMATSU YOSHINORI , EGUCHI HIROSHI , NAKATSUJI JUNYA , MATSUURA MAKOTO , OGAWA TAKESHI , YAMANAKA KAZUHIRO
IPC分类号： C08G77/38 , C08G77/48 , H01L23/29 , H01L23/31
CPC分类号： H01L33/56 , C07F7/21 , C08G77/045 , C08G77/12 , C08G77/20 , C08G77/26 , H01L33/641 , H01L2924/0002 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide a siloxane compound which can be easily molded and has fluidity at low temperature compared to conventional silsequioxanes.SOLUTION: The siloxane compound is represented by general formula (1) (wherein: X each independently is represented by X1 or X2; at least one X is X2; Rto Rare each independently a hydrogen atom or an organic group; m and n are each independently an integer from 1 to 10; and Y is a specific crosslinked group).
摘要翻译：要解决的问题：提供与常规硅二恶烷相比可以容易地模塑并且在低温下具有流动性的硅氧烷化合物。解决方案：硅氧烷化合物由通式（1）表示（其中：X各自独立地由X 1或X 2表示;至少一个X为X 2; R 1为SP 1 = 至R 6各自独立地为氢原子或有机基团; m和n各自独立地为1〜10的整数，Y为特定的交联基团）。版权所有（C）2013，JPO＆INPIT

48. 发明专利

JP2012033873A Chemical for formation of protective film 有权
标题翻译：形成保护膜的化学品
公开(公告)号：JP2012033873A
公开(公告)日：2012-02-16
申请号：JP2011091952
申请日：2011-04-18
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： KUMON SOICHI , SAIO TAKASHI , ARATA SHINOBU , SAITO MASANORI , RYOKAWA ATSUSHI , YAMADA SHUHEI , NANAI HIDETOSHI , AKAMATSU YOSHINORI
IPC分类号： H01L21/304
CPC分类号： H01L21/02057 , C09D183/08 , H01L21/0206 , H01L21/302 , H01L21/3105
摘要： PROBLEM TO BE SOLVED: To provide a chemical for formation of a water-repellent protective film in order to improve a cleaning process which induces pattern collapse easily in a manufacturing method of a wafer having a fine concave-convex pattern on the surface and containing a silicon element in at least a part of the concave-convex pattern.SOLUTION: The chemical forms a water-repellent protective film at least on the surface of recesses of a concave-convex pattern when a wafer having a fine concave-convex pattern on the surface and containing a silicon element in at least a part of the concave-convex pattern is cleaned. The chemical contains a silicon compound A represented by a general formula RSi(H)(X)and an acid, or a silicon compound C represented by a general formula RSi(H)(CH)(Z)and a base having a water content of 35 mass% or less. Total amount of moisture content in the starting material of the chemical is 5000 mass ppm or less for the total amount of material.
摘要翻译：要解决的问题：为了提供一种用于形成防水保护膜的化学品，以便在表面上具有微细凹凸图案的晶片的制造方法中容易地改善引起图案塌陷的清洁过程并且在所述凹凸图案的至少一部分中含有硅元素。解决方案：当表面上具有微细凹凸图案的晶片并且在至少一部分中含有硅元素时，化学品至少在凹凸图案的凹部的表面上形成防水保护膜的凹凸图案被清洁。该化学物质含有由通式R表示的硅化合物A，其中Si（H） 4-ab 和由通式R 7表示的酸或硅化合物C，（SBB =“POST”> 3 ）（Z） 4ghw 和水含量为35质量％以下的碱。化学品原料中水分含量的总量对于总量为5000质量ppm以下。版权所有（C）2012，JPO＆INPIT

49. 发明专利

JP2011132314A Polysiloxane thermoplastic material 审中-公开
标题翻译：聚硅氧烷热塑性材料
公开(公告)号：JP2011132314A
公开(公告)日：2011-07-07
申请号：JP2009291445
申请日：2009-12-22
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： ITAKURA NOBUYUKI , TAKIMOTO CHIHARU , EGUCHI HIROSHI , MIYAZAWA AKIMICHI , HONJO KEIJI , AKAMATSU YOSHINORI
IPC分类号： C08G77/04 , C08L83/06
摘要： PROBLEM TO BE SOLVED: To provide a polysiloxane thermoplastic material that can be molded at a low temperature compared to a conventional inorganic glass, has high heat resistance compared to a conventional organic polymeric material, and has excellent molding property.
SOLUTION: The polysiloxane thermoplastic material contains at least one kind of component comprising a tri-functional siloxane having a substituent selected from a hydrocarbon group containing no aromatic ring and a hydrocarbon group containing an aromatic ring, and at least one kind of component of bifunctional siloxane having a substituent selected from a hydrocarbon group containing no aromatic ring and a hydrocarbon group containing an aromatic ring; and the polysiloxane thermoplastic material shows a softening temperature of 300 to 350°C.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：待解决的问题：提供与常规无机玻璃相比可以在低温下成型的聚硅氧烷热塑性材料，与常规的有机聚合物材料相比具有高耐热性，并且具有优异的成型性能。解决方案：聚硅氧烷热塑性材料包含至少一种包含具有选自不含芳环的烃基的取代基的三官能硅氧烷和含有芳环的烃基的组分，以及至少一种组分具有选自不含芳环的烃基和含有芳环的烃基的取代基的双官能硅氧烷; 聚硅氧烷热塑性材料的软化温度为300〜350℃。版权所有（C）2011，JPO＆INPIT

50. 发明专利

JP2010192878A Silicon wafer cleaning agent 有权
标题翻译：硅胶清洗剂
公开(公告)号：JP2010192878A
公开(公告)日：2010-09-02
申请号：JP2009293916
申请日：2009-12-25
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： KUMON SOICHI , SAITO MASANORI , SAIO TAKASHI , NANAI HIDETOSHI , AKAMATSU YOSHINORI
IPC分类号： H01L21/304 , C11D7/28 , C11D7/50 , C11D17/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a silicon wafer cleaning agent for improving a cleaning process easily inducing a pattern collapse in a method for manufacturing a silicon wafer having a fine uneven pattern on the surface. SOLUTION: The silicon wafer cleaning agent includes: at least a water-based cleaning liquid, and a water-repellent cleaning liquid for making water-repellent at least the recessed portions of an uneven pattern during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound, which contains a reactive moiety which can chemically bind with Si in the silicon wafer, and a hydrophobic group, or is a liquid wherein 0.1 mass% or more of the water-repellent compound to the total quantity of 100 mass% of the water-repellent cleaning liquid and an organic solvent are mixed and contained therein. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种硅晶片清洗剂，用于改善在表面上具有微细凹凸图案的制造硅晶片的方法中容易引起图案塌陷的清洁过程。解决方案：硅晶片清洗剂包括：至少一种水基清洗液和至少在清洗过程中至少具有凹凸图案的凹陷部分的防水剂的防水清洗液体。防水性清洗液是由防水化合物构成的液体，该防水化合物含有与硅晶片中的Si化学结合的反应性部分和疏水性基团，或者为0.1质量％以上的液体，斥水性化合物与防水性清洗液和有机溶剂的总量为100质量％混合并包含在其中。版权所有（C）2010，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式