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31. 发明专利

JP2003203597A SCANNING ELECTRON MICROSCOPE 审中-公开
公开(公告)号：JP2003203597A
公开(公告)日：2003-07-18
申请号：JP2002375808
申请日：2002-12-26
申请人： HITACHI LTD
发明人： SATO MITSUGI , OSE YOICHI , FUKUHARA SATORU , TODOKORO HIDEO , ESUMI MAKOTO
IPC分类号： H01L21/66 , H01J37/244 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To restrain the occurrence of a chromatic aberration when detecting a reflected electron and a high speed secondary electron in a scanning electron microscope of adopting an orthogonal electromagnetic field generator for reducing an axial aberration. SOLUTION: For attaining the purpose, a secondary electron converting electrode is arranged on an orbit of an electron deflected by the orthogonal electromagnetic field generator, and is constituted so as to deflect and detect the secondary electron converted by the secondary electron converting electrode. COPYRIGHT: (C)2003,JPO

32. 发明专利

JP2000173519A ELECTRON BEAM DEVICE 失效
公开(公告)号：JP2000173519A
公开(公告)日：2000-06-23
申请号：JP34254998
申请日：1998-12-02
申请人： HITACHI LTD
发明人： MURAKOSHI HISAYA , MAKINO HIROSHI , SHINADA HIROYUKI , IWABUCHI HIROKO , FUKUHARA SATORU
IPC分类号： H01J37/04
摘要： PROBLEM TO BE SOLVED: To independently align the optical axis relative to an objective lens and a decelerating lens and to quickly and accurately perform complicated optical axis alignment by providing a means changing a voltage applied to the decelerating means for decelerating the electron beam between a sample and a convergence means, in a decelerating lens power supply. SOLUTION: An optical axis alignment of an electron beam for an electron beam device is so constituted that at first, the optical axis of a primary electron beam 101 is coincided with the center of an objective lens 5 and secondly, the optical axis relative to a sample and a decelerating lens 8 constituted of an opposite electrode arranged opposed to the sample 6 is aligned. When the voltage fed from the decelerating lens power supply 16 is fluctuated so as to diagonally irradiate the electron beam to the decelerating lens 8, the image is largely moved by the voltage fluctuation, however, the electron beam is perpendicularly irradiated by the alignment of the decelerating lens aligner. When the decelerating lens aligner is positioned on the objective lens 5 or between the objective lens 5 and decelerating lens 8, the optical axis alignment relative to the decelerating lens 8 can be independently implemented without changing the current center of the objective lens 5.

33. 发明专利

JPH0643885B2 失效
公开(公告)号：JPH0643885B2
公开(公告)日：1994-06-08
申请号：JP10453384
申请日：1984-05-25
申请人： HITACHI LTD
发明人： ICHIHASHI MIKIO , OKUMURA MASAHIDE , FUKUHARA SATORU
IPC分类号： H01J37/22 , G01B15/00 , G01B15/04 , G01B15/08 , G01N23/225 , H01J37/28

34. 发明专利

JPH0636726A SCANNING MICROSCOPE 失效
公开(公告)号：JPH0636726A
公开(公告)日：1994-02-10
申请号：JP18655092
申请日：1992-07-14
申请人： HITACHI LTD
发明人： FUKUHARA SATORU , TODOKORO HIDEO
IPC分类号： G02B7/28 , G01Q30/02 , G01Q60/10 , G02B21/00 , H01J37/21 , H01J37/28
摘要： PURPOSE:To focus a scan image at any point even when the height of each point of the scanning region of a sample is changed by providing a means storing the sample irregularity information of the scanning region and a means controlling the focal distance of an objective lens based on the irregularity information. CONSTITUTION:Irregularities of a sample 4 are measured by a scanning tunnel microscope 18 before the sample 4 is scanned by an electron beam 1, and the distance of the surface of the sample 4 from an objective lens 13 can be primarily determined by this measurement. The focal point of the lens 13 is determined, and the optimum beam diameter can be obtained on the surface of the sample 4. The irregularity information of the scanning region 5 of the sample 4 obtained by the microscope 18 is converted into the distance from the lens 13 and stored in an irregularity information memory 15 in the order of scanning. When the beam 1 is scanned and the scan image is focused by the lens 13 via an objective lens control circuit 14, the irregularity information of the memory 15 is read out for focusing. The scan image scanned with the optimum electron beam diameter can be obtained in each region 5.

35. 发明专利

JPH0547335A SCANNING ELECTRON MICROSCOPE 失效
公开(公告)号：JPH0547335A
公开(公告)日：1993-02-26
申请号：JP32187991
申请日：1991-12-05
申请人： HITACHI LTD
发明人： TODOKORO HIDEO , FUKUHARA SATORU , ICHIHASHI MIKIO
IPC分类号： G01R31/302 , H01J37/141 , H01J37/143 , H01J37/244 , H01J37/28 , H01L21/66
摘要： PURPOSE:To detect the correct signal without deflecting the secondary electrons from a sample by providing a deflector and a detector between the first focusing lens and the second focusing lens adjacent to the sample so that the detector is located below the deflector. CONSTITUTION:The focusing lens 3 constituted of an exciting coil 1 and a magnetic path 2 is arranged immediately above a sample 15, semi-spherical grids 13, 14 are provided above the lens 3, and DC power sources 11, 12 are connected. A detector constituted of a scintillator 6 and a photo-multiplier 8 is arranged between the first focusing lens 5 and the second focusing lens 3 and below the deflector 24 above both sides of the grids 13, 14. For an operation function test, a beam 16 is focused on the sample 15 with only the lens 5. For a high-resolution mode test, the lenses 5, 3 are operated for short-focal point operation, and the secondary electrons passing through the magnetic field of the lens 3 are detected. The correct signal is detected while the secondary electrons from the sample 15 are not deflected, the work distance is reduced, and a high-magnifying power image can be provided.

36. 发明专利

JPH0425664B2 失效
公开(公告)号：JPH0425664B2
公开(公告)日：1992-05-01
申请号：JP19581482
申请日：1982-11-08
申请人： HITACHI LTD
发明人： TODOKORO HIDEO , FUKUHARA SATORU , ICHIHASHI MIKIO
IPC分类号： H01J37/244 , G01R31/302 , H01J37/141 , H01J37/26 , H01J37/28

37. 发明专利

JPH04127001A SCANNING TUNNEL MICROSCOPE 失效
公开(公告)号：JPH04127001A
公开(公告)日：1992-04-28
申请号：JP24697990
申请日：1990-09-19
申请人： HITACHI LTD
发明人： FUKUHARA SATORU , YAMADA OSAMU , NAKAIZUMI YASUSHI , FUTAMOTO MASAAKI
IPC分类号： G01B7/34 , G01N37/00 , G01Q60/10 , G01Q60/16 , H01J37/28
摘要： PURPOSE:To prevent a break of a probe and to improve the operating convenience of the probe by employing lanthanum hexaboride as the probe. CONSTITUTION:A gap between a sample 6 and a probe 5 is controlled in the following manner. A Z-axis piezo 2 for rough adjustment is driven by a Z-axis piezo control circuit 11 to make the probe 5 close to the tunnel area of the sample 6. At this time, a tunnel current of several nA is allowed to flow between the sample 6 and probe 5 by impressing an optional voltage between the sample and probe. Since this tunnel current is a function of the gap between the sample 6 and probe 5, if the piezo 2 is controlled according to the feedback method so as to make the tunnel current constant, the roughness information of the sample 5 is obtained from the displacement of the piezo 2. The maximum extension of the Z-axis of piezo is prescribed for the using piezo. Therefore, when the height exceeding the operable limit is measured, the servo control is not effected, resulting in a collision of the probe against the sample. The probe may be eventually broken. Therefore, a single crystal of considerably hard lanthanum hexaboride is employed as the probe 5, thereby preventing the probe from being broken.

38. 发明专利

JPH04104439A AXIAL ADJUSTMENT OF CHARGED BEAM DEVICE 失效
公开(公告)号：JPH04104439A
公开(公告)日：1992-04-06
申请号：JP21891090
申请日：1990-08-22
申请人： HITACHI LTD
发明人： TODOKORO HIDEO , SHINADA HIROYUKI , FUKUHARA SATORU , YAMADA OSAMU
IPC分类号： H01J37/04 , H01L21/027 , H01L21/66
摘要： PURPOSE:To quantitatively measure transfer of an image due to axial deviation to perform automation axial adjustment by using a two-dimensional position detector formed of a semiconductor as a detector of beam axis adjustment. CONSTITUTION:Transfer of an irradiation position of an electron beam 1 due to an excitaion current change of an object lens 2 is detected by a semiconductor positional detector 13. A positional detection circuit 14 practices amplification and division to output a positional change. A control circuit 16 performs control of an XY driving mechanism 15 of an objective stop 4. While changing an excitation current of the lens 2, the stop 4 is scanned to XY. A position according in the axis of the lens 2 is within this scanning range. By using transfer amount of irradiation positions of various points, that is, the square sum of a variation Xd in the X-direction and a variation Yd in the Y-direction to set up the stop 4 in the smallest position thereof, axis adjustment can be finished.

39. 发明专利

JPH03229182A OBSERVING DEVICE FOR MAGNETIC DOMAIN WITH USE OF CHARGED PARTICLE BEAM 失效
公开(公告)号：JPH03229182A
公开(公告)日：1991-10-11
申请号：JP2197190
申请日：1990-02-02
申请人： HITACHI LTD
发明人： FUKUHARA SATORU , SHINADA HIROYUKI
IPC分类号： G01N23/225 , G01N27/72 , G01R33/00 , G01R33/028 , H01J37/28 , H01J49/00
摘要： PURPOSE:To attain observation of the magnetized state in a minute are by irradiating a sample with a primary charged particle beam while converging it finely and scanning, and detecting the amount of deflection generated by a magnetic field caused from the magnitized state of the sample, as the vector amount. CONSTITUTION:A primary electron beam 2 emitted from an electron gun 1 are finely converged by an objective lens 3, and the sample (magnetic material) 5 is irradiated therewith while being two-dimentionally scanning by a scanning coil 4. The relation between the position on sample 5 irradiated with the elec tron beam and the incident position on a position detector of secondary electron is measured at first by using a sample having non-leak magnetic field as the sample 5. Next, the magnetic material to be measured is provided on the sample 5 and the incident position of secondary electron is detected by the position detector. Then, only a positional signal depending on the structure of magnetic domain can be extracted by means of subtracting a scanning signal measured beforehand from the output of position detector, thereby an information of the structure of magnetic domain can be detected.

40. 发明专利

JPH0349042B2 失效
公开(公告)号：JPH0349042B2
公开(公告)日：1991-07-26
申请号：JP3738983
申请日：1983-03-09
申请人： HITACHI LTD
发明人： ICHIHASHI MIKIO , FUKUHARA SATORU , OKUMURA MASAHIDE , MURAKOSHI HISAYA
IPC分类号： G01B15/00 , G01R31/305 , H01J37/28

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