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31. 发明专利

JP2004292916A Method and apparatus for manufacturing microstructure 审中-公开
公开(公告)号：JP2004292916A
公开(公告)日：2004-10-21
申请号：JP2003089162
申请日：2003-03-27
申请人： Fuji Xerox Co Ltd , Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社 , 富士ゼロックス株式会社
发明人： HOTTA HIROYUKI , YAMADA TAKAYUKI , TAKAHASHI MUTSUYA , GOTO TAKAYUKI , TSUNO TAKESHI
IPC分类号： B81C3/00 , C23C26/00 , C23C28/00
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a microstructure, which can layer an extremely thin film at a high transferring rate, and to provide an apparatus therefor.
SOLUTION: This manufacturing method comprises measuring the distance and adjusting the angle between a donor substrate 12 and a target substrate 16, at three points. Distance-measuring portions 9a, 9b and 9c measure the distance between the donor substrate 12 and the target substrate 16, and angle-adjusting portions 10a, 10b and 10c adjust the distance between a substrate holder 5 connected to a substrate holder 4 for holding the target substrate 16 and a substrate holder 6 to adjust the angle between the donor substrate 12 and the target substrate 16. The distance-measuring portions 9a, 9b and 9c, and the angle-adjusting portions 10a, 10b and 10c are each connected to a control part 11, and the control part 11 controls the angle-adjusting portions 10a, 10b and 10c on the basis of measured values from the distance-measuring portions 9a, 9b and 9c, so that the angle between the donor substrate 12 and the target substrate 16 becomes 0-degree.
COPYRIGHT: (C)2005,JPO&NCIPI

32. 发明专利

JP2004223637A Method for manufacturing laminated structure and laminated structure 有权
公开(公告)号：JP2004223637A
公开(公告)日：2004-08-12
申请号：JP2003012690
申请日：2003-01-21
申请人： Fuji Xerox Co Ltd , Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社 , 富士ゼロックス株式会社
发明人： YAMADA TAKAYUKI , TAKAHASHI MUTSUYA , HOTTA HIROYUKI , OZAWA TAKASHI , SUZUKI SADAICHI , NAGAO TASUKE , GOTO TAKAYUKI , TSUNO TAKESHI
IPC分类号： B81C3/00 , B29C67/00 , B81B1/00
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a laminated structure for manufacturing even the laminated structure having a laminating direction height more than a few hundred μm in a short time and the laminated structure.
SOLUTION: A pattern member 1 in which a plurality of cross-sectional shape members 11-1 to 11-3 corresponding to a cross-sectional pattern of the structure are integrally connected to a frame shaped member 12 by a connecting member 13 is formed by patterning a planar metal member. The pattern member 1 is fixed to a supporting table 3 via an adhesive sheet 2. The structure 5 is manufactured by laminating each of the cross-sectional shape members 11-1 to 11-3 in the pattern member 1 on a target substrate 4, while transferring the members 11-1 to 11-3 in order.
COPYRIGHT: (C)2004,JPO&NCIPI

33. 发明专利

JP2003042946A Surface plasmon resonance sensor, surface plasmon resonance sensor system using the surface plasmon resonance sensor 审中-公开
标题翻译：表面等离子体共振传感器，表面等离子体共振传感器系统使用表面等离子体共振传感器
公开(公告)号：JP2003042946A
公开(公告)日：2003-02-13
申请号：JP2001232169
申请日：2001-07-31
申请人： Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社
发明人： INUZUKA HIROMASA , UCHIUMI ATSUSHI , TAWARA SATOSHI , GOTO TAKAYUKI , NAKAYAMA HIROYUKI
IPC分类号： G01N33/543 , G01N21/27
摘要： PROBLEM TO BE SOLVED: To measure and process a large number of samples at once, to measure with proper precision, and to reduce cost to enable disposable use due to its simple constitution. SOLUTION: This surface plasmon resonance sensor 20 is provided with a light guide panel 21 provided with a light reflecting face 21a, a light incident face 21b for making light beam get incident into the light reflecting face 21a, and a light-emitting face 21c for emitting reflected light of the light beam reflected by the light-reflecting face 21a. A metal thin film 23 for causing surface plasmon resonance, and a biochemical reaction detecting portion 24 provided on the metal thin film 23 to contact with a DNA sample 25, are provided in the light-reflecting face 21a. The surface plasmon resonance sensor 20 is also provided with a light-extracting part 22, arranged in the emitting face 21c of the light guide panel 21, and comprising a transparent thin film, such as resin having a refractive index which is higher than that of the light guide panel 21.
摘要翻译：要解决的问题：一次性测量和处理大量样品，以适当的精度进行测量，并且由于其简单的构造而降低成本以使一次性使用。解决方案：该表面等离子体共振传感器20设置有导光板21，该导光板21设置有光反射面21a，用于使光束入射到光反射面21a中的光入射面21b和用于发射由光反射面21a反射的光束的反射光。在光反射面21a中设置有用于引起表面等离子体共振的金属薄膜23和设置在金属薄膜23上以与DNA样品25接触的生化反应检测部分24。表面等离子体共振传感器20还具有配置在导光板21的发光面21c上的光提取部22，其具有透明薄膜，树脂的折射率高于导光板21。

34. 发明专利

JP2003042944A Surface plasmon resonace sensor system 审中-公开
标题翻译：表面等离子体共振传感器系统
公开(公告)号：JP2003042944A
公开(公告)日：2003-02-13
申请号：JP2001232154
申请日：2001-07-31
申请人： Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社
发明人： NAKAYAMA HIROYUKI , GOTO TAKAYUKI , TAWARA SATOSHI , INUZUKA HIROMASA , UCHIUMI ATSUSHI
IPC分类号： G01N21/27
摘要： PROBLEM TO BE SOLVED: To continuously measure and process a large number of samples, to simplify constitution, to facilitate relative movement, to measure with proper precision, and to reduce cost.
SOLUTION: This surface plasmon resonace sensor system is provided with a first optical system 20, provided with a light reflecting face 23 having a thin film 25 for causing surface plasmon resonance, and a biochemical reaction detecting portion 27 provided on the thin film 25 to contact with the sample 29, and a second optical system 30 having a light source part 31 for emitting a light beam 35 to provide various incident angles with respect to the light reflecting face 23, and a photodetecting means 33 for phtoreceiving, for each reflecting angle of the various angles, a reflected light 37 of the light beam 35 reflected in the light-reflecting face 23. The first optical system 20 is moved relative to the second optical system 30 under contactless condition.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了连续测量和处理大量样品，简化结构，便于相对运动，以适当的精度进行测量并降低成本。解决方案：该表面等离子体共振传感器系统设置有第一光学系统20，其设置有具有用于引起表面等离子体共振的薄膜25的光反射面23和设置在薄膜25上的生化反应检测部分27，以接触具有样品29的第二光学系统30和具有用于发射光束35的光源部31以提供相对于光反射面23的各种入射角的第二光学系统30以及用于进行摄像的光检测装置33，各种角度，在光反射面23中反射的光束35的反射光37.第一光学系统20在非接触状态下相对于第二光学系统30移动。

35. 发明专利

JP2002252212A SURFACE PROCESSING METHOD, AND METHOD AND APPARATUS FOR MANUFACTURING PHOTOVOLTAIC POWER GENERATOR 失效
公开(公告)号：JP2002252212A
公开(公告)日：2002-09-06
申请号：JP2001048677
申请日：2001-02-23
申请人： MITSUBISHI HEAVY IND LTD
发明人： ASANO SHIN , SHIGENAKA TOSHIAKI , TAWARA SATOSHI , FUNAYAMA MASAHIRO , GOTO TAKAYUKI
IPC分类号： C23F4/02 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a surface processing method, which can remove defects from the surface portion of a work without damaging the work, and to provide a method and an apparatus for manufacturing a photovoltaic power generator. SOLUTION: The surface processing method comprises: a step of plasma surface processing, where high frequency power is applied across a discharge electrode and the work in a reaction gas atmosphere to generate discharge plasma so that the discharge plasma forms reaction products on the surface of the work; and a step of local heating, where the surface of the work is locally heated by a local heating means so that the reaction products are removed from the surface of the work.

36. 发明专利

JP2001168069A CUTTING METHOD AND CUTTER 失效
公开(公告)号：JP2001168069A
公开(公告)日：2001-06-22
申请号：JP35328899
申请日：1999-12-13
申请人： MITSUBISHI HEAVY IND LTD
发明人： ASANO SHIN , SHIGENAKA TOSHIAKI , GOTO TAKAYUKI , UKAI OSAMU
IPC分类号： H01L21/302 , H01L21/301 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a cutting method and a cutter in which a work can be cut only through pure chemical reaction without causing any damage while enhancing the efficiency of machining work, simplifying the arrangement and reducing the cost. SOLUTION: In an atmosphere being supplied with active radicals, high frequency discharge is generated between one or more disc-like rotator 2 rotating at high speed and an electrode 4 spaced apart by a specified distance radially from the outer edge of the disc-like rotator 2. Neutral radicals generated in high frequency discharge are supplied to a work 1 located closely to the electrode 4 utilizing rotation of the disc-like rotator 2. While removing volatile reaction products between the neutral radicals and the work 1, the work 1 and the disc-like rotator 2 are brought close relatively thus cutting the work 1.

37. 发明专利

JP2000043150A PHOTO FABRICATION METHOD, APPARATUS THEREFOR AND COMPOSITE MACHINE COMPONENT 失效
公开(公告)号：JP2000043150A
公开(公告)日：2000-02-15
申请号：JP21797298
申请日：1998-07-31
申请人： MITSUI KIMIYUKI , MITSUBISHI HEAVY IND LTD
发明人： MITSUI KIMIYUKI , HAYASHI TATSUNORI , ASANO SHIN , GOTO TAKAYUKI
IPC分类号： B29C35/08 , B29C67/00 , B29K105/24
摘要： PROBLEM TO BE SOLVED: To obtain a machine component with high axial strength by forming an central axis member of a rotational axis with a material different from a photo-setting resin and by repeatedly laminating the photo-setting resin at the outer peripheral side, so as to integrally shape the rotational member and the rotational axis. SOLUTION: A metal axis is used as a rotational axis 26, and a photo-setting resin is repeatedly laminated in a predetermined part around it. In the manufacturing method, the rotational axis 26 is attached to a rotational actuator 20 and then rotated, and a shutter 16 is opened to irradiate the laser beam 11. The laser beam 11 is focused in the entire circumference of the metal axis 26 through a reflector 4 and a condenser lens 5, thereby setting the resin. The shutter 16 is then closed again, an X-stage 33 is transferred by the resin width set by the single irradiation and the shutter is the opened again to irradiate the laser beam. This repetition lasts by the dimension (w) is irradiated. A Z- stage driving actuator 9 lowers a Z-stage 18 to lower the metal axis 26 by the thickness (t) of the resin-set single layer, so as to form a second resin layer. Thereafter, the operation is repeated.

38. 发明专利

JPH09131665A ULTRA-PRECISION GRINDING DEVICE 失效
公开(公告)号：JPH09131665A
公开(公告)日：1997-05-20
申请号：JP28829595
申请日：1995-11-07
申请人： MITSUBISHI HEAVY IND LTD
发明人： TSUNO TAKESHI , GOTO TAKAYUKI
IPC分类号： B24B47/20
摘要： PROBLEM TO BE SOLVED: To enable grinding machining for which high machining accuracy is demanded and precision machining of a hard and brittle material by providing high rigidity which allows the maintenance of cut-in amount even when an object to be ground receives machining reaction force and realizing high precision minute cut-in. SOLUTION: As a minute cut-in device 7 which cuts a workpiece 4 in minutely, a minute cut-in device 7 having high precision and high rigidity in which a piezoelectric element having high resolution is used in an actuator and an elastic hinge which is free from friction and a backlash component is used in a guide mechanism is used, and it is brought into interlocking relationship with a slide 1 for cut-in having less precision, but high rigidity and large stroke to compensate insufficient precision of the slide 1 for cut-in.

39. 发明专利

JPH06147093A TURBINE INLET VALVE GEAR 失效
公开(公告)号：JPH06147093A
公开(公告)日：1994-05-27
申请号：JP29130592
申请日：1992-10-29
申请人： MITSUBISHI HEAVY IND LTD , KORYO ENG KK
发明人： GOTO TAKAYUKI , IKUTA KIYOSHI
IPC分类号： F03B11/00
摘要： PURPOSE:To secure a turbine inlet valve gear which is easily installed in a penstock set up in an incline and inexpensively manufactured. CONSTITUTION:An inlet valve 1 is dropped vertically on a flange 3 of a penstock downstream 2 positioned of this inlet valve 1 from an arrow A direction and installed on an inclined base 4. In addition, an O-ring 6 and a packing presser or the like are attached to a flange 5 located of the inlet valve 1. A short pipe 7 disposed upstream of the inlet valve 1 is vertically lowered as an arrow B on this upstream flange and installed with a bolt or the like. In this case, a sleeve joint 8 is being slidably fitted in this upstream short pipe 7, and thereby this operation is carried out in a state that this sleeve joint 8 is superposed on the upstream short pipe 7. Judging from as drawing state, using a lug 10 of the sleeve joint 8 and another lug 11 of a penstock 9, the sleeve joint 8 is drawn out upward and installed after being superposed on this penstock 9. Doing like this, a standard type inlet valve is installable in the inclined penstock.

40. 发明专利

JPH034348B2 失效
公开(公告)号：JPH034348B2
公开(公告)日：1991-01-22
申请号：JP15715283
申请日：1983-08-30
申请人： MITSUBISHI HEAVY IND LTD
发明人： ROTSUKAKU TADASHI , GOTO TAKAYUKI
IPC分类号： B23Q35/12 , B23Q15/00 , B23Q33/00 , B23Q35/123

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