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31. 发明专利

JP2002356346A QUARTS GLASS HAVING HIGH DURABILITY AND MEMBER AND APPARATUS USING THE SAME 失效
公开(公告)号：JP2002356346A
公开(公告)日：2002-12-13
申请号：JP2001166310
申请日：2001-06-01
申请人： TOSOH CORP , TOSOH QUARTZ CORP
发明人： HARADA YOSHINORI , MIZUTANI SHUZO , KUDO MASAKAZU , MIURA NAOKI
IPC分类号： C03C3/06 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide high purity quarts glass having high durability usable preferably for apparatuses for manufacturing semiconductors and liquid crystals using a halide gas and its plasma without losing good procesability and low dust generation intrinsic to quarts glass, and to provide an apparatus using such an excellent quarts glass. SOLUTION: This quarts glass for an apparatus utilizing plasma is characterized by containing 0.01 wt.% to 2 wt.% of at least one kind element selected from the group consisting of Mg, Ca, Sr, Ba, Y, Hf and Zr. The quarts glass member and apparatus for manufacturing semiconductors and liquid crystals using the quarts glass are also provided.

32. 发明专利

JP2002356339A HIGHLY ENDURABLE QUARTS GLASS MEMBER 失效
公开(公告)号：JP2002356339A
公开(公告)日：2002-12-13
申请号：JP2001166311
申请日：2001-06-01
申请人： TOSOH CORP , TOSOH QUARTZ CORP , TOHOS SGM KK
发明人： HARADA YOSHINORI , HASHIMOTO SHINKICHI , MIZUTANI SHUZO
IPC分类号： C03B20/00 , C03B8/00 , C03C3/06 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a quarts glass member having high durability preferably utilizable not only as a member of apparatuses for manufacturing semiconductor or liquid crystal using plasma but also as a member requiring transparency of the above apparatuses. SOLUTION: This quarts glass member for apparatuses utilizing a halide gas and its plasma is characterized in that the quarts glass member contains 0.01 wt.% to 2 wt.% of Zr and is transparent.

33. 发明专利

JP2002356335A METHOD FOR PRODUCING COMPOSITE QUARTS GLASS CONTAINING ZIRCONIUM AND APPARATUS THEREFOR 失效
公开(公告)号：JP2002356335A
公开(公告)日：2002-12-13
申请号：JP2001166307
申请日：2001-06-01
申请人： TOSOH CORP , TOSOH QUARTZ CORP , TOHOS SGM KK
发明人： KIYOHARA HIDEKI , HARADA YOSHINORI , MIZUTANI SHUZO
IPC分类号： C03B20/00 , C03B19/01 , C03C3/06
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a zirconium-based composite quarts glass ingot containing zirconium, a plasma resisting element, uniformly dispersed therein and containing less impurities, and to provide an apparatus using the method. SOLUTION: This method for producing a zirconium-containing composite quarts glass comprises dropping silica powder containing zirconium into a furnace using oxygen/hydrogen flame as the heat source, piling it up and thereafter extending it toward the outer circumferential direction to obtain an ingot containing zirconium and silica dispersed therein uniformly. The apparatus used therefor is also provided.

34. 发明专利

JP2002195823A FLATNESS MEASURING DEVICE 失效
公开(公告)号：JP2002195823A
公开(公告)日：2002-07-10
申请号：JP2000395284
申请日：2000-12-26
申请人： TOSOH QUARTZ CORP
发明人： HONDA KEIJI
IPC分类号： G01B21/30 , G01B21/00
摘要： PROBLEM TO BE SOLVED: To precisely measure the flatness of a plate body without damaging the surface or causing the deformation of a measuring matter by a retaining means. SOLUTION: The plate body 4 to be measured is vertically raised, and the plate body 4 is retained by a sucking pad 13 equipped with a contact pin 14 to prevent its deformation by the dead weight. The outer shape of the surface of the plate body 4 is measured by a contact type three-dimensional measuring device 2 to determine the flatness.

35. 发明专利

JP2001146434A OPTICAL MATERIAL FOR ULTRAVIOLET RAY AND METHOD FOR PRODUCING THE MATERIAL 失效
公开(公告)号：JP2001146434A
公开(公告)日：2001-05-29
申请号：JP2000014223
申请日：2000-01-20
申请人： TOSOH CORP , TOHOS SGM KK , TOSOH QUARTZ CORP
发明人： KONDO SHINICHI , NAKAMURA TAKAYUKI , FUKUDA KAZUHIKO , KAMISUGI NAOYOSHI , KUZUU SHIN , IHARA YOSHINAO , WAKAMATSU HIDETOSHI
IPC分类号： G02B1/02 , C03B8/04 , C03B19/14 , C03B20/00 , C03C3/06
摘要： PROBLEM TO BE SOLVED: To obtain a synthesized silica glass having high transparency for a vacuum-ultraviolet light represented by F2 excimer laser of 147 nm wave length and excellent in uniformity and tolerance. SOLUTION: This optical material for ultraviolet ray comprises a synthetic glass obtained by heating a porous silica preform obtained by accumulating soot produced by flaming thermal decomposition of a silicide, includes substantially no impurity except OH group and has =60% transmissivity of ultraviolet ray of 157 nm wave length at 10 mm optical path length and another version of the optical material for ultraviolet ray comprises a synthetic silica glass having 1-70 ppm OH group content,

36. 发明专利

JP2012201590A Method for producing quartz glass molding 有权
标题翻译：生产石英玻璃模具的方法
公开(公告)号：JP2012201590A
公开(公告)日：2012-10-22
申请号：JP2011071041
申请日：2011-03-28
申请人： Tosoh Quartz Corp , 東ソー・クォーツ株式会社
发明人： CHIBA KAZUYUKI
IPC分类号： C03B19/02 , C03B20/00
摘要： PROBLEM TO BE SOLVED: To produce inexpensively each quartz glass molding having various outer diameters.SOLUTION: A quartz glass material 16 is placed on the center of circular bottom plate 12 made of carbon having a thickness of 1 cm and a diameter of 50 cm, and on the outside thereof, each one end of plate materials 14 is combined sa many as eight successively on a position 8 cm separated from the end of the plate material of polygonal adjacent sides, and fastened by a string-like body made of carbon fibers, to thereby compose an outer cylinder. Then, the quartz glass material 16 is installed in the outer cylinder, moved into an electric furnace, and heated and melted for 2 hours at 1,800°C in a nitrogen gas atmosphere, to thereby obtain a quartz glass molding 16a which is a regular octagonal pillar whose one side is 8 cm, and whose average height is 7.9 cm.
摘要翻译：要解决的问题：为了廉价地生产具有各种外径的每个石英玻璃模制品。解决方案：将石英玻璃材料16放置在由碳制成的圆形底板12的中心，其厚度为1cm，直径为50cm，在其外侧，板材14的每一端为在与多边形相邻侧的板材的端部隔开8cm的位置上连续多达8个，并且由碳纤维制成的线状体紧固，从而构成外筒。然后，将石英玻璃材料16安装在外筒中，移入电炉中，在氮气气氛中，在1,800℃下加热熔融2小时，得到石英玻璃成形体16a，其为正八边形其一侧为8厘米，平均高度为7.9厘米。版权所有（C）2013，JPO＆INPIT

37. 发明专利

JP2011125949A Method of peeling quartz glass workpiece from surface plate 审中-公开
标题翻译：从表面板剥离石墨玻璃工件的方法
公开(公告)号：JP2011125949A
公开(公告)日：2011-06-30
申请号：JP2009286028
申请日：2009-12-17
申请人： Tosoh Quartz Corp , 東ソー・クォーツ株式会社
发明人： CHIBA KAZUYUKI
IPC分类号： B24B41/06
摘要： PROBLEM TO BE SOLVED: To securely fix a workpiece such as a quartz glass plate to a surface plate, and also easily peel that during machining such as grinding. SOLUTION: On a quartz glass surface plate cleaned by degreasing, a quarts glass plate which is a workpiece cleaned by degreasing is installed through ultraviolet curing epoxy resin. Ultraviolet ray with a wavelength of 365 nm generated from a high pressure mercury vapor lamp of 500 W is irradiated on that for 30 seconds, thereby securely bonding the quartz glass plate on the surface plate. After bonding, an opposite side surface to a bonding surface is subjected to grooving by using a diamond wheel. Then, grinding fluid on a surface is removed, and ultraviolet ray with a wavelength of 185 nm having the output of 100 W is irradiated on the bonding surface for 30 minutes, thereby peeling the surface plate and the quarts glass plate. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：将诸如石英玻璃板的工件牢固地固定到表面板上，并且在诸如研磨的加工期间也容易地剥离。解决方案：在通过脱脂清洁的石英玻璃表面板上，通过脱脂清洁的工件的石英玻璃板通过紫外线固化环氧树脂安装。从500W的高压水银蒸汽灯产生的波长为365nm的紫外线照射30秒，从而将石英玻璃板牢固地接合在表面板上。在接合之后，通过使用金刚石砂轮使与接合表面相对的侧表面进行切槽。然后，除去表面上的研磨液，将输出为100W的波长为185nm的紫外线照射在接合面上30分钟，由此剥离表面板和石英玻璃板。版权所有（C）2011，JPO＆INPIT

38. 发明专利

JP2010100493A Mold material and method for forming glass material using the mold material 审中-公开
标题翻译：使用模具材料形成玻璃材料的模具材料和方法
公开(公告)号：JP2010100493A
公开(公告)日：2010-05-06
申请号：JP2008274667
申请日：2008-10-24
申请人： Tosoh Quartz Corp , 東ソー・クォーツ株式会社
发明人： ONUKI YUKIO
IPC分类号： C03B11/10
摘要： PROBLEM TO BE SOLVED: To reduce production cost by acquiring a formed body at a high yield when a cylindrical glass product is formed. SOLUTION: Regarding a mold material wherein a glass material is heated and melted so as to form the outline of a cylindrical glass product, the mold material comprises: a bottom plate; a cylindrical part arranged on the bottom plate in such a manner that either opening part is in contact with the bottom plate; a guide member having an outer diameter almost same as the inside diameter of the cylindrical part and freely slidably movable on the inner circumferential face of the cylindrical part to the upper and lower directions; a pressing fixture with an almost columnar shape arranged at the lower face of the guide member and in which the corner parts of a pressing face pressing the upper face of the glass material placed on the bottom plate in the cylindrical part are subjected to chamfering; and a load plate applying a load on the pressing fixture. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：通过在形成圆柱形玻璃制品时以高产率获得成形体来降低生产成本。解决方案：关于将玻璃材料加热熔融以形成圆筒形玻璃制品轮廓的模具材料，模具材料包括：底板; 圆柱形部件，其布置在底板上，使得任一开口部分与底板接触; 引导构件，其外径与所述圆筒部的内径大致相同，并且能够在所述圆筒部的内周面向上下方向自由滑动地移动; 具有布置在引导构件的下表面处的几乎为柱状的压制固定装置，其中挤压位于圆柱形部分中的底板上的玻璃材料的上表面的按压面的角部进行倒角; 以及在所述按压装置上施加负载的负载板。版权所有（C）2010，JPO＆INPIT

39. 发明专利

JP2007067005A Aperture and its manufacturing method 有权
标题翻译：孔及其制造方法
公开(公告)号：JP2007067005A
公开(公告)日：2007-03-15
申请号：JP2005248228
申请日：2005-08-29
申请人： Tosoh Quartz Corp , 東ソー・クォーツ株式会社
发明人： SAKKA TOSHIAKI
IPC分类号： H01L21/3065
摘要： PROBLEM TO BE SOLVED: To uniformize the atmosphere in a reaction vessel by reducing an influence of a through hole provided in an aperture for introducing and discharging reaction gas into and from the reaction vessel to the outside of the reaction vessel. SOLUTION: The through-holes 21 of the aperture 2 provided at a port for reaction gas in the closed reaction vessel are arranged in a circle and are inclined with respect to a central axis, so that an influence of reaction produced in the reaction vessel is prevented from being transmitted to the outside through the aperture 2. Since the plurality of through-holes 21 are formed symmetrically on concentric circles and inclined with respect to a vertical axis, the gas passing through the aperture forms a spiral flow and uniformizes the atmosphere in the reaction vessel. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：通过减少设置在用于将反应气体引入反应容器和从反应容器排出到反应容器外部的孔中的通孔的影响，使反应容器中的气氛均匀化。解决方案：设置在封闭反应容器中用于反应气体的孔口处的孔2的通孔21布置成圆形并相对于中心轴线倾斜，使得在反应容器被防止通过孔2传递到外部。由于多个通孔21对称地形成在同心圆上并且相对于垂直轴线倾斜，所以通过孔的气体形成螺旋流并均匀化反应容器中的气氛。版权所有（C）2007，JPO＆INPIT

40. 发明专利

JP2006266958A Method and instrument for measuring unevenness in thickness of flat plate 有权
标题翻译：用于测量平板厚度无法测量的方法和仪器
公开(公告)号：JP2006266958A
公开(公告)日：2006-10-05
申请号：JP2005087495
申请日：2005-03-25
申请人： Tosoh Corp , Tosoh Quartz Corp , 東ソー・クォーツ株式会社 , 東ソー株式会社
发明人： TAKATO SHUJI , ASANO MUTSUMI , UCHIUMI YOSHIO
IPC分类号： G01B11/06
摘要： PROBLEM TO BE SOLVED: To solve a problem wherein it is complicated that unevenness determination for unevenness in a thickness, which is a shape difference between a surface of a flat plate such as a wafer of an object to be measured and a backface thereof, is measured using an interference fringe. SOLUTION: The wafer 5 is illuminated with illumination light of a light source 1 through a collimator lens 4, reflected light of the illumination light reflected from the wafer 5 is imaged as the interference fringe by an imaging means 3, a plurality of inspection areas partitioned into a prescribed size is correlated with an image obtained with the imaging by the imaging means 3, when measuring the unevenness in the thickness of the wafer, based on the interference fringe, the unevenness in the thickness of the object to be measured is determined to exceed a predetermined acceptable value, when an interval of the interference fringe existing in the inspection area exceeds a prescribe value, the generation of the interference fringe is changed when the light source 1 and the imaging means 3 are changed to make an angle equal with respect to an optical axis center line L 0 , and the unevenness of the wafer is determined based on the change. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：解决的问题为了解决这样一个问题，即对于被测量物体的晶片等平板的表面和背面的形状差是厚度的不均匀性的不均匀性判定是复杂的使用干涉条纹测量。解决方案：通过准直透镜4照射光源1的照明光，通过成像装置3将从晶片5反射的照明光的反射光成像为干涉条纹，多个分割成规定尺寸的检查区域与通过成像装置3成像获得的图像相关联，当基于干涉条纹测量晶片的厚度不均匀性时，测量对象物的厚度不均匀性被确定为超过预定的可接受值，当存在于检查区域中的干涉条纹的间隔超过规定值时，当光源1和成像装置3改变成角度时改变干涉条纹的产生相对于光轴中心线L 0 ，并且基于该变化来确定晶片的不平坦度。版权所有（C）2007，JPO＆INPIT

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