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    • 27. 发明专利
    • Method of forming compound semiconductor buffer layer and method of manufacturing compound semiconductor thin-film solar cell
    • 形成化合物半导体缓冲层的方法和制备化合物半导体薄膜太阳能电池的方法
    • JP2011171653A
    • 2011-09-01
    • JP2010036156
    • 2010-02-22
    • Tdk CorpTdk株式会社
    • KURIHARA MASAHITO
    • H01L31/04
    • Y02E10/541Y02P70/521
    • PROBLEM TO BE SOLVED: To provide a method of forrming a compound semiconductor buffer layer for forming a uniform CdS buffer layer. SOLUTION: The method of forming a compound semiconductor buffer layer includes: a process of obtaining a gel sheet A by impregnating a highly hygroscopic polymer sheet with a liquid mixture including a cadmium salt water solution and an ammonium salt water solution including an anion common to a cadmium salt; a process of obtaining a gel sheet B by impregnating the highly hygroscopic polymer sheet with a liquid mixture including an aqueous solution of thiourea and ammonia water; a process of heating a compound semiconductor light absorption layer comprising a compound semiconductor including group Ib, IIIb, and VIb elements or Cu 2 ZnSnS 4 to not lower than 30°C, adhering the gel sheet A to the light absorption layer, and then overlapping the gel sheet B; a process of separating the gel sheets A, B; and a process of forming a compound semiconductor buffer layer formed of cadmium sulfide on the light absorption layer by cleaning and drying the light absorption layer. COPYRIGHT: (C)2011,JPO&INPIT
    • 待解决的问题:提供一种锻造用于形成均匀的CdS缓冲层的化合物半导体缓冲层的方法。 解决方案:形成化合物半导体缓冲层的方法包括:通过用包含镉盐水溶液和包含阴离子的铵盐水溶液的液体混合物浸渍高吸湿性聚合物片材来获得凝胶片材A的方法 常见于镉盐; 通过用包含硫脲和氨水的水溶液的液体混合物浸渍高吸湿性聚合物片材来获得凝胶片材B的方法; 将包含Ib族,IIIb族和VIb族元素的化合物半导体的化合物半导体光吸收层加热至不低于30℃的方法,或者将CuSi2SbSnSnS 4 将凝胶片A粘附到光吸收层,然后与凝胶片B重叠; 分离凝胶片A,B的工序; 以及通过清洗和干燥光吸收层,在光吸收层上形成由硫化镉形成的化合物半导体缓冲层的工艺。 版权所有(C)2011,JPO&INPIT
    • 28. 发明专利
    • Method of forming compound semiconductor light absorption layer and method of manufacturing compound semiconductor thin-film solar cell
    • 形成化合物半导体光吸收层的方法和制备化合物半导体薄膜太阳能电池的方法
    • JP2011171652A
    • 2011-09-01
    • JP2010036152
    • 2010-02-22
    • Tdk CorpTdk株式会社
    • KURIHARA MASAHITO
    • H01L31/04
    • Y02E10/541Y02P70/521
    • PROBLEM TO BE SOLVED: To provide a method of forming a compound semiconductor light absorption layer for performing etching using potassium cyanide improved in working efficiency and obtaining a uniformly etched light absorption layer. SOLUTION: The method of forming a compound semiconductor light absorption layer includes: a process of obtaining a gel sheet by impregnating a highly hygroscopic polymer sheet with a potassium cyanide solution; a process of adhering the gel sheet to a layer comprising a compound semiconductor including a group Ib element, a group IIIb element, and a group VIb element, or Cu 2 ZnSnS 4 for etching the layer; a process of separating the gel sheet from the layer; and a process of obtaining an etched compound semiconductor light absorption layer by cleaning and drying the layer. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种形成化合物半导体光吸收层的方法,其用于使用氰化钾进行蚀刻以提高工作效率并获得均匀蚀刻的光吸收层。 解决方案:形成化合物半导体光吸收层的方法包括:通过用氰化钾溶液浸渍高吸湿性聚合物片而获得凝胶片的方法; 将凝胶片粘附到包含Ib族元素,IIIb族元素和VIb族元素的化合物半导体的层或Cu ZnSnS SB“4 用于蚀刻该层; 从该层分离凝胶片的方法; 以及通过清洗和干燥该层来获得蚀刻的化合物半导体光吸收层的工艺。 版权所有(C)2011,JPO&INPIT