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21. 发明专利

JPH058546B2 失效
公开(公告)号：JPH058546B2
公开(公告)日：1993-02-02
申请号：JP27673884
申请日：1984-12-26
申请人： RIKAGAKU KENKYUSHO
发明人： HARA TAMIO , HAMATSUNE MANABU , KIN HITSUGEN , NANBA SUSUMU
IPC分类号： H01J37/077

22. 发明专利

JPS63190229A ELECTRON BEAM-EXCITED ION SOURCE 失效
公开(公告)号：JPS63190229A
公开(公告)日：1988-08-05
申请号：JP2130287
申请日：1987-01-31
申请人： TOKYO ELECTRON LTD , RIKAGAKU KENKYUSHO
发明人： ISHII NOBUO , TAKAYAMA NAOKI , KAWAMURA GOHEI , HARA TAMIO , HAMAGAKI MANABU , NANBA SUSUMU , AOYANAGI KATSUNOBU
IPC分类号： H05H1/24 , H01J27/20 , H01J37/08
摘要： PURPOSE:To efficiently generate a large quantity of ions and obtain an ion beam with low energy and a large current by providing an ion generation chamber, a means radiating an electron beam to generate ions, and a means forming the multi-pole magnetic field in the chamber. CONSTITUTION:An anode 2 made of a Mo thin plate disk arranged with many small through holes 2b, 3b except on the periphery and an accelerating electrode 3 are arranged at a fixed distance in an enclosed container 1. A cathode tube 4 made of Ta with a through hole 5 is arranged on a side wall 1a facing the electrode 2. A conductive plate with a narrow path 6 (fine hole) is inserted between the electrodes 4 and 2, and the most portion of the anode 2 side is covered with an insulating material 7. Ar is introduced through the electrode 4, and the discharge voltage 8 is applied across the electrodes 4 and 2 to generate plasma. The electrode 3 extracts and accelerates electrons and feeds them into a chamber 10. Many permanent magnets 10a with different polarity at adjacent positions are arranged on the conductor wall of the chamber 10 having the same potential as the electrode 3, As gas is fed, the introduced electron beam collides with As molecules to generate dense plasma, which is enclosed by the magnets 10a and extracted through slits 11, 12.

23. 发明专利

JPS6070787A LASER OSCILLATOR 失效
公开(公告)号：JPS6070787A
公开(公告)日：1985-04-22
申请号：JP17763483
申请日：1983-09-26
申请人： RIKAGAKU KENKYUSHO
发明人： HARA TAMIO , HAMAGAKI MANABU , SADAMOTO YOSHIROU , TSUCHIDE TOSHIHIKO
IPC分类号： H01S3/038 , H01S3/036 , H01S3/09 , H01S3/0959 , H01S3/097
摘要： PURPOSE:To obtain a device having high laser-oscillation efficiency and a large laser output by mounting an electron beam source contaning a region generating ions for neutralizing space changes and a means, etc. adjusting acceleration voltage applied for accelerating electron beams projecting to a laser tube. CONSTITUTION:Argon gas is introduced from an introducing port 14, and stationary discharge is executed among a hollow cathode 8 and anodes 9, 10, 11. When acceleration voltage is applied in an accelerating region (between the electrode 11 and an electrode 12), electron beams are generated, pass through an ion generating region (between the electrode 12 and an electrode 13) for neutralizing space charges, and project into a laser tube 4. Argon gas is introduced from an introducing port 15, plasma having high density is generated by electron beams in an optical resonator arranged while conforming the axis of the laser tube 4 and an optical axis, and monovalent ions of argon are laser- oscillated.

24. 发明专利

JP2879343B2 失效
公开(公告)号：JP2879343B2
公开(公告)日：1999-04-05
申请号：JP7751989
申请日：1989-03-29
申请人： RIKAGAKU KENKYUSHO
发明人： HARA TAMIO , ANDO GOZO , AOYANAGI KATSUNOBU
IPC分类号： H01S3/094 , H01S4/00

25. 发明专利

JP2860253B2 失效
公开(公告)号：JP2860253B2
公开(公告)日：1999-02-24
申请号：JP16575094
申请日：1994-06-27
申请人： RIKAGAKU KENKYUSHO , KAWASAKI JUKOGYO KK
发明人： HARA TAMIO , HAMAGAKI MANABU , AOYANAGI KATSUNOBU , RYUJI MAKOTO , TOKAI MASAKUNI
IPC分类号： H05H1/24 , C23F4/00 , H01L21/027 , H01L21/302 , H01L21/3065

26. 发明专利

JP2587629B2 失效
公开(公告)号：JP2587629B2
公开(公告)日：1997-03-05
申请号：JP2130387
申请日：1987-01-31
申请人： TOKYO EREKUTORON KK , RIKAGAKU KENKYUSHO
发明人： ISHII NOBUO , TAKAYAMA NAOKI , KAWAMURA GOHEI , HARA TAMIO , HAMAGAKI MANABU , NANBA SUSUMU , AOYANAGI KATSUNOBU
IPC分类号： H05H1/24 , H01J37/32 , H01L21/302

27. 发明专利

JPH08194100A X-RAY MICROSCOPE AND X-RAY GENERATING APPARATUS 失效
公开(公告)号：JPH08194100A
公开(公告)日：1996-07-30
申请号：JP547795
申请日：1995-01-18
申请人： SHIMADZU CORP , RIKAGAKU KENKYUSHO
发明人： HIROSE HIDEO , HARA TAMIO , ANDO KOZO , AOYANAGI KATSUNOBU
IPC分类号： G21K5/02 , G21K7/00 , H05G1/26
摘要： PURPOSE: To provide an x-ray generating apparatus which can prevent scattered particulates from being emitted by keeping a distance in one side of a target material and forming an x-ray transmissive film with just enough thickneess to prevent damage by effects following an x-ray generating process. CONSTITUTION: Plasma generated by laser beam irradiation is closed in a space 14 surrounded with an x-ray generating target 11 and an x-ray transmissive film 12 and efficient x-ray generation is performed. In this case, a hole as small as 0.1μm diameter is opened in the x-ray generating target 11 by laser beam 30. The generated x-ray is emitted to a specimen side after being transmitted through the x-ray transmissive film 12 and at the same time radiates the laser source side through the hole. On the other hand, the particulates generated from plasma come into collision against the x-ray transmissive film 12 and the kinetic energy of the particles are absorbed and the particulates are retarded, do not pass the x-ray transmissive film 12, and are captured by the x-ray transmissive film 12. Consequently, scattered particulates adhere to the x-ray transmissive film 12 and emission of the scattered particulates are inhibited.

28. 发明专利

JPH06302291A ELECTRON BEAM SOURCE 失效
公开(公告)号：JPH06302291A
公开(公告)日：1994-10-28
申请号：JP11098393
申请日：1993-04-14
申请人： RIKAGAKU KENKYUSHO
发明人： HAMAGAKI MANABU , HARA TAMIO
IPC分类号： H01J37/077 , H05H1/46
摘要： PURPOSE:To concentrate plasma generation on a porous site only and to enhance the output efficiency of electron beams by covering the surface of the cathode side for generating plasma of a porous anode for generating plasma except the porous site with an insulating member. CONSTITUTION:A cathode 18 for generating plasma, a porous anode 14 for generating plasma, and a porous electrode 16 for accelerating electron beams are placed in that order. The porous electrode 14 for generating plasma generates plasma between the porous electrode 14 for generating plasma and the cathode 18 for generating plasma and is provided with a porous site (A) having many punched transmitting holes 14 for transmitting generated plasma electrons. The porous electrode 16 for accelerating electron beams pulls out electrons from the transmitting holes 14a of the porous anode 14 for generating plasma for acceleration and has a porous site having many punched transmitting holes 16a for transmitting the pulled out and accelerated electrons. The surface of the cathode side 18 for generating plasma of the porous anode 14 for generating plasma, except the porous site (A), is covered with an insulating member 50. Thus, discharged plasma is concentrated on the porous site only to enhance the pulling out efficiency of the electron beams.

29. 发明专利

JPH06267694A CONTROLLING METHOD FOR ION ENERGY AND ITS DEVICE 失效
公开(公告)号：JPH06267694A
公开(公告)日：1994-09-22
申请号：JP7530393
申请日：1993-03-09
申请人： RIKAGAKU KENKYUSHO
发明人： HAMAGAKI MANABU , HARA TAMIO
IPC分类号： H05H1/00 , H05H1/24 , H05H1/46 , H05H5/00
摘要： PURPOSE:To eliminate the need for applying an external bias voltage to a treated material and to reduce production costs by controlling an electron beam incident angle to the treated material or incident ion energy. CONSTITUTION:Ions in a plasma emitted in an ion chamber 12c collide with a treated material 22 supported by a supporting device 24 for a treatment such as etching. Where, control is made to adjust ion energy incoming to the material 22 by turning the device 24 to change the angle between electron beams and the surface of the material 22 from vertical to horizontal. The ion energy incoming to the material 22 is also controlled by controlling an acceleration power supply 30 to adjust the acceleration Va of the electron beams. Namely, insulating support to the material 22 by means of the device 24 applies a negative bias to the material 22 under a normal state due to the difference between the electron beams and the ions in diffusion coefft. Thus, the problem such as turbulent plasma due to the external bias voltage is solved.

30. 发明专利

JPH06174660A FORMING APPARATUS OF X-RAY IMAGE 失效
公开(公告)号：JPH06174660A
公开(公告)日：1994-06-24
申请号：JP1019693
申请日：1993-01-25
申请人： RIKAGAKU KENKYUSHO
发明人： HARA TAMIO , ANDO KOZO , AOYANAGI KATSUNOBU
IPC分类号： G01N23/04
摘要： PURPOSE:To furnish a small-sized and highly practical forming apparatus of an X-ray image by obtaining a practical X-ray strength by using an excitation laser device being smaller in size and having a lower output than a usual one. CONSTITUTION:A titanium target 2 is provided in a vacuum vessel 1, and an Al filter 3 for cutting a long wave light, a sample 4 and a base plate 6 on the surface of which an X-ray resist layer 5 is formed as an X-ray detecting means are provided below the titanium target 2. Outside the vacuum vessel 1, a pulse train YAG laser (Nd-YAG laser) 7 and a lens 9 for converging a laser light 8 are provided. A pulse waveform of the laser light 8 is formed of sixteen pulse trains in which the width of discrete pulses is about 100ps and the interval of the pulses is about 300ps.

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