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11. 发明专利

JP2004133029A Halftone phase shift mask blank and method for manufacturing the sane 有权
公开(公告)号：JP2004133029A
公开(公告)日：2004-04-30
申请号：JP2002294863
申请日：2002-10-08
申请人： Shin Etsu Chem Co Ltd , 信越化学工業株式会社
发明人： OKAZAKI SATOSHI , ISHIHARA TOSHINOBU
IPC分类号： B32B9/00 , C23C14/06 , C23C14/08 , C23C14/35 , G03F1/32 , G03F1/68 , G03F1/08
CPC分类号： G03F1/32 , C23C14/0676 , C23C14/08 , G03F1/68
摘要： PROBLEM TO BE SOLVED: To provide a halftone phase shift mask blank which excels in workability, and has an excellent chemical resistance, and resistance to alkaline chemicals in particular, and a method for manufacturing the same.
SOLUTION: The halftone phase shift mask blank has a phase shifter film consisting of a metal silicide compound containing one or more metals selected from molybdenum, tantalum, zirconium, chromium, and tungsten, and one or more elements selected from oxygen, nitrogen and carbon on a transparent substrate.
COPYRIGHT: (C)2004,JPO

12. 发明专利

JPS6197357A Silicon carbide precursor composition 失效
标题翻译：碳化硅前体组合物
公开(公告)号：JPS6197357A
公开(公告)日：1986-05-15
申请号：JP21814084
申请日：1984-10-17
申请人： Shin Etsu Chem Co Ltd
发明人： TAKAMIZAWA MINORU , KOBAYASHI YASUSHI , ISHIHARA TOSHINOBU , TAKEDA YOSHIFUMI , HAYASHIDA AKIRA
IPC分类号： C08L83/00 , C04B35/571 , C08G79/00 , C08L83/02 , C08L83/16 , D01F9/10
CPC分类号： C08G79/00 , C04B35/571 , C08L83/16 , C08L83/00
摘要： PURPOSE: To provide the title compsn. which has improved spinnability and is freed from the problem of brittleness, consisting of a polycarbosilane polymer (organometallic copolymer) and an organosilicon high-molecular compd.
CONSTITUTION: An organosilicon compd. having a polysilane skeleton of formula I (wherein R
5 is methylene, phenylene; R
6 , R
7 are each a 1W6C monovalent hydrocarbon group; x, y, z are each a positive number; x≥y) or a mixture thereof with an organometallic compd. (e.g. tetrabutoxytitanium) is subjected to a heat-decomposing polycondensation reaction to obtain a polycarbosilane polymer or its organometallic copolymer (A). 80W99.9wt% component A is blended with 20W0.1wt% linear organosilicon high-molecular compd. having a weight-average MW of 10,000W1,000,000 and formula II (wherein R
1 , R
2 are each a monovalent hydrocarbon group; R
3 is OH, amino, trialkylsiloxy, monova lent hydrocarbon group; m≥100).
COPYRIGHT: (C)1986,JPO&Japio
摘要翻译：目的：提供标题compsn。其具有改善的可纺性，并且不含由聚碳硅烷聚合物（有机金属共聚物）和有机硅高分子化合物组成的脆性问题。构成：有机硅化合物具有式I的聚硅烷骨架（其中R 5是亚甲基，亚苯基; R 6，R 7各自是1-6C单价烃基; x，y，z各自为正数; x> = y）或其与有机金属化合物的混合物。（例如四丁氧基钛）进行热分解缩聚反应，得到聚碳硅烷聚合物或其有机金属共聚物（A）。 80-99.9wt％组分A与20-0.1wt％线性有机硅高分子化合物混合。重均分子量为10,000-1,000,000和式II（其中R 1，R 2各自为一价烃基; R 3为OH，氨基，三烷基甲硅烷氧基，单未取代的烃基; m = 100）。

13. 发明专利

JPS591432A Preparation of triacontyl halide 失效
标题翻译：三氯乙烯的制备
公开(公告)号：JPS591432A
公开(公告)日：1984-01-06
申请号：JP11136582
申请日：1982-06-28
申请人： Shin Etsu Chem Co Ltd
发明人： YAMAMOTO AKIRA , ISHIHARA TOSHINOBU , OOSHIMA MITSUYOSHI
IPC分类号： C07C17/263 , B01J27/00 , C07C17/00 , C07C17/26 , C07C19/01 , C07C19/075 , C07C67/00
摘要： PURPOSE: To obtain the titled compound useful as a raw material for triacontanol, a plant growth regulator, by one process simply using easily obtainable raw materials, by reacting a Grignard reagent of n-octadecyl chloride, etc. with a specific compound.
CONSTITUTION: Anhydrous tetrahydrofuran and I
2 pieces are added to metal Mg, ethyl bromide is added to them, the reaction product is reacted with n-octadecyl chloride to give a Grignard reagent of n-octadecyl chloride or n-octadecyl bromide, which is coupled with a compound such as 1,12-dibromododecane, 1-bromo- 12-chlorododecane, etc. shown by the formula I (X is Cl or Br) in a solvent such as tetrahydrofuran, etc. in the presence of preferably Li
2 CuCl
4 or LiCuCl
2 at 0W40°C, to give a triacontyl halide shown by the formula II.
COPYRIGHT: (C)1984,JPO&Japio
摘要翻译：目的：通过将正十八烷基氯化物的格氏试剂等与特定化合物反应，得到用作三十烷醇原料的标题化合物，植物生长调节剂，通过简单使用容易获得的原料的一种方法。构成：将无水四氢呋喃和I2片加入到金属Mg中，向其中加入乙基溴，使反应产物与正十八烷基氯反应，得到正十八烷基氯或正十八烷基溴的格利雅试剂，其与在优选Li 2 CuCl 4或LiCuCl 2的存在下，在溶剂如四氢呋喃等中由式I（X为Cl或Br）所示的化合物如1,12-二溴十二烷，1-溴代 - 十二烷等化合物 0-40℃，得到式II所示的三十烷基卤化物。

14. 发明专利

JPS58183601A Sexual pheromone or agricultural chemical processed into microcapsule 失效
标题翻译：有机农药或农业化学品加工成微生物
公开(公告)号：JPS58183601A
公开(公告)日：1983-10-26
申请号：JP6701382
申请日：1982-04-21
申请人： Shin Etsu Chem Co Ltd
发明人： YAMAMOTO AKIRA , ISHIHARA TOSHINOBU , CHIBA TOORU
IPC分类号： A01N25/28 , B01J13/08
CPC分类号： B01J13/08
摘要： PURPOSE:The titled substance or agricultural chemical capable of releasing continuously for a long time at a constant rate without loss, cousing no environmertal pollution, and having resistance to wind and rain, obtained by processing a sexual pheromone substance or agricultural chemical into microcapsules using a cellulose derivative containing a carboxyl group. CONSTITUTION:A sexual pheromone substance or agricultural chemical is processed into microcapsules using a carboxyl group-containing cellulose derivative (e.g., hydroxypropyl methyl cellulose acetate succinate, hydroxypropyl methyl cellulose phthalate, etc.), to give a sexual pheromone or agricultural chemical processed into microcapsules. The cellulose derivative is soluble in an alkali aqueous solution but insoluble in an acid or neutral water. Soluble in an organic solvent such as ethylene glycol monoethyl ether, etc. The pheromone substance or agricultural chemical is suspended in water, and a small amount of the organic solvent is added to the suspension. The suspension is applied to crops, and the agent to form capsules is well attached to the crops.
摘要翻译：目的：能够长时间不间断地释放长时间不间断地释放环境污染，耐风雨的物质或农药，其特征在于：通过将有害信息素物质或农业化学品加工成微胶囊，使用含有羧基的纤维素衍生物。构成：使用含羧基的纤维素衍生物（例如，羟丙基甲基纤维素乙酸琥珀酸酯，羟丙基甲基纤维素邻苯二甲酸酯等）将性信息素物质或农业化学品加工成微胶囊，以将性信息素或农业化学品加工成微胶囊。纤维素衍生物可溶于碱性水溶液，但不溶于酸或中性水。可溶于乙二醇单乙醚等有机溶剂中。将信息素物质或农药悬浮于水中，向该悬浮液中加入少量有机溶剂。悬浮液应用于作物，并且形成胶囊的试剂很好地附着于作物。

15. 发明专利

JP2009217250A Double patterning method 有权
标题翻译：双重图案方法
公开(公告)号：JP2009217250A
公开(公告)日：2009-09-24
申请号：JP2009022350
申请日：2009-02-03
申请人： Shin Etsu Chem Co Ltd , 信越化学工業株式会社
发明人： TAKEMURA KATSUYA , HATAKEYAMA JUN , NISHI TSUNEHIRO , KATAYAMA KAZUHIRO , ISHIHARA TOSHINOBU
IPC分类号： G03F7/40 , C08F220/28 , C08G77/14 , G03F7/039 , G03F7/075 , H01L21/027
CPC分类号： H01L21/0337 , G03F7/0035 , G03F7/0046 , G03F7/0397 , G03F7/0757 , G03F7/11 , G03F7/40 , H01L21/0338
摘要： PROBLEM TO BE SOLVED: To attain double patterning by forming an extremely fine space pattern by transferring a fine line of a first resist to a second resist by positive/negative reversal and carrying out resolution of the second resist. SOLUTION: This double patterning method includes processes for applying a chemically amplified positive resist composition onto a processable substrate to form a resist film; obtaining a first positive pattern on the film; providing the positive pattern with resistance to an organic solvent used for a reversal film forming composition; and forming a reversal film of a second chemically amplified positive resist material to obtain a second positive pattern on the film, wherein an alkaline developer process for obtaining a second positive resist pattern includes dissolving away the first positive pattern reversed to be soluble in the alkaline developer and achieving reversal transfer of the first resist pattern in a process of obtaining a second pattern. Consequently, even if the second resist film for the reversal film is formed using a solvent containing a hydroxy group or a high polar solvent, the second resist material can be embedded in a clearance without damaging the first positive resist pattern, and the first positive pattern can be dissolved away in the alkaline developer, and positive/negative reversal of high accuracy can be carried out in a simple process. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：通过正/负反转将第一抗蚀剂的细线转移到第二抗蚀剂并且执行第二抗蚀剂的分辨率，通过形成极细的空间图案来实现双重图案化。解决方案：该双重图案化方法包括将化学放大正性抗蚀剂组合物施加到可加工基材上以形成抗蚀剂膜的方法; 在电影上获得第一个正面图案; 提供对用于反转成膜组合物的有机溶剂的耐性的正型图案; 以及形成第二化学放大的正性抗蚀剂材料的反转膜以在膜上获得第二阳性图案，其中用于获得第二正性抗蚀剂图案的碱性显影剂方法包括将逆向可溶于碱性显影剂的第一阳性图案并且在获得第二图案的过程中实现第一抗蚀剂图案的反转移动。因此，即使使用含有羟基或高极性溶剂的溶剂形成反转膜的第二抗蚀剂膜，也可以将第二抗蚀剂材料嵌入间隙而不会损伤第一正性抗蚀剂图案，并且第一阳性图案可以溶解在碱性显影剂中，并且可以在简单的过程中进行高精度的正/负反转。版权所有（C）2009，JPO＆INPIT

16. 发明专利

JP2008232905A Method for manufacturing substrate for microarray preparation 有权
标题翻译：用于制造微晶制备基板的方法
公开(公告)号：JP2008232905A
公开(公告)日：2008-10-02
申请号：JP2007074668
申请日：2007-03-22
申请人： Shin Etsu Chem Co Ltd , 信越化学工業株式会社
发明人： KUSAKI WATARU , KANOU TAKESHI , ISHIHARA TOSHINOBU
IPC分类号： G01N37/00
CPC分类号： G03F7/0397
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing substrates for microarray preparation and capable of regioselectively and easily forming a monomolecular film for the immobilization of a target molecule in the manufacture of substrates for microarray preparation.
SOLUTION: The method for manufacturing substrates for microarray preparation includes at least a step of forming a resist film on a substrate through the use of a chemical amplification type positive resist composition using as a binding agent a copolymer of which the monomer unit content having a hydroxide group is 5 mol% or less to a whole monomer unit; a step of patterning the resist film; a process for depositing a monomolecular film having a silicon oxide chain on the substrate having the patterned resist film; and a step of removing the resist film thereafter.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决问题：提供一种制造微阵列制备用基板的方法，能够区域选择地容易地形成用于固定靶分子的单分子膜，以制造微阵列制备用基板。解决方案：用于制造微阵列制备用基板的方法至少包括通过使用化学放大型正性抗蚀剂组合物在基材上形成抗蚀剂膜的步骤，该组合物使用作为粘合剂的共聚物，其单体单元含量氢氧化物基团相对于整个单体单元为5摩尔％以下; 图案化抗蚀剂膜的步骤; 在具有图案化抗蚀剂膜的基板上沉积具有氧化硅链的单分子膜的方法; 以及之后除去抗蚀剂膜的步骤。版权所有（C）2009，JPO＆INPIT

17. 发明专利

JP2005284213A Phase shift mask blank, phase shift mask and method for transferring pattern 有权
标题翻译：相位移屏蔽区域，相位移屏蔽和传输模式的方法
公开(公告)号：JP2005284213A
公开(公告)日：2005-10-13
申请号：JP2004102219
申请日：2004-03-31
申请人： Shin Etsu Chem Co Ltd , Toppan Printing Co Ltd , 信越化学工業株式会社 , 凸版印刷株式会社
发明人： YOSHIKAWA HIROKI , ISHIHARA TOSHINOBU , OKAZAKI SATOSHI , INAZUKI SADAOMI , SAGA TADASHI , OKADA KIMIHIRO , IWAKATA MASAHIDE , HARAGUCHI TAKASHI , FUKUSHIMA YUICHI
IPC分类号： G03F1/32 , G03F1/54 , G03F1/68 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To provide a phase shift mask blank which can be easily processed to obtain transmittance, reflectance and a phase with higher accuracy, and to provide a phase shift mask using the blank and a method for transferring a pattern.
SOLUTION: The phase shift mask blank is a multilayer phase shift mask blank which has a film mainly having a light absorbing function on a substrate and has one or more layers of films mainly having a phase shift function thereon. The film having the light absorbing function contains a group 4A metal, with the metal content higher in the upper part of the film than in the lower part. When the phase shift mask blank is processed into a phase shift mask, the light absorbing film is easily detected during dry etching in a drying etching process and selectivity against a substrate is advantageously obtained, which results in high-accuracy processing. Thus, a mask having the transmittance and a phase shift with higher accuracy can be obtained, and thereby, a larger focal depth can be kept in photolithography using the mask.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种可以容易地处理以获得更高精度的透射率，反射率和相位的相移掩模坯料，并且提供使用坯料的相移掩模和用于转印图案的方法。解决方案：相移掩模空白是一种多层相移掩模坯料，其具有在基板上主要具有光吸收功能的膜，并且具有主要具有相移功能的一层或多层膜。具有光吸收功能的膜包含4A族金属，其上部的金属含量高于下部的金属含量。当相移掩模空白处理成相移掩模时，在干蚀刻工艺中的干蚀刻期间容易检测光吸收膜，有利地获得对基板的选择性，这导致高精度的处理。因此，可以获得具有更高精度的透射率和相移的掩模，从而可以使用掩模在光刻中保持较大的焦点深度。版权所有（C）2006，JPO＆NCIPI

18. 发明专利

JP2004083873A Silicon-containing polymeric compound, resist material and method for forming pattern 有权
公开(公告)号：JP2004083873A
公开(公告)日：2004-03-18
申请号：JP2003180392
申请日：2003-06-25
申请人： Shin Etsu Chem Co Ltd , 信越化学工業株式会社
发明人： HATAKEYAMA JUN , TAKEDA TAKANOBU , ISHIHARA TOSHINOBU
IPC分类号： G03F7/039 , C08F230/08 , G03F7/075 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a silicon-containing polymeric compound suitable as a base resin for a chemical amplification positive-type resist material used for precision working in production processes of a semiconductor element, etc., to provide a resist material capable of being suitably used, when high energy rays, such as far ultraviolet rays, KrF excimer laser beams (248 nm), electron beams, and X-rays, are used as an exposure light source, capable of being used, especially, as the chemical amplification positive-type resist material for a multilayer process, and to provide a method for forming a pattern. SOLUTION: This silicon-containing polymeric compound contains a repeating unit expressed by formula (1) [R 1 is a single bond or an alkylene; R 2 is H or an alkyl; R 3 , R 4 , and R 5 are each an alkyl, a haloalkyl, an aryl or a silicon-containing group; R 6 is H, methyl, cyano or -C(=O)OR 8 (R 8 is H, an alkyl or a group unstable to an acid); R 7 is an alkyl, -NR 9 R 10 or -OR 11 , R 9 , R 10 and R 11 are each H or an alkyl; and (a) and (b) are each a positive number, provided that 0 COPYRIGHT: (C)2004,JPO

19. 发明专利

JP2003066612A Resist material and patterning process 有权
标题翻译：耐材料和图案处理
公开(公告)号：JP2003066612A
公开(公告)日：2003-03-05
申请号：JP2002168143
申请日：2002-06-10
申请人： Shin Etsu Chem Co Ltd , 信越化学工業株式会社
发明人： KOBAYASHI TOMOHIRO , NISHI TSUNEHIRO , WATANABE SATOSHI , KANOU TAKESHI , NAGURA SHIGEHIRO , ISHIHARA TOSHINOBU
IPC分类号： G03F7/039 , C08G61/12 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist material having both high resolution and high etching resistance and useful in precision microfabrication and to provide a patterning process using the resist material.
SOLUTION: The resist material comprises a hydrogenated body of a ring- opened metathesis polymer and a poly(meth)acrylic acid derivative as base resins.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供具有高分辨率和高耐蚀刻性的抗蚀剂材料，并且可用于精密微细加工，并提供使用抗蚀剂材料的图案化工艺。解决方案：抗蚀剂材料包括开环复分解聚合物的氢化体和聚（甲基）丙烯酸衍生物作为基础树脂。

20. 发明专利

JPS5951231A Stabilization of higher aliphatic aldehyde compound 失效
标题翻译：更高级的ALDEHYDE化合物的稳定性
公开(公告)号：JPS5951231A
公开(公告)日：1984-03-24
申请号：JP16040082
申请日：1982-09-14
申请人： Shin Etsu Chem Co Ltd
发明人： ISHIHARA TOSHINOBU , YAMAMOTO AKIRA , OOSHIMA MITSUYOSHI , AIBA NOBORU
IPC分类号： C07C45/90 , C07C45/00 , C07C47/02 , C07C47/542 , C07C67/00
摘要： PURPOSE: To prepare the titled stabilized compound useful as an agent for controlling vermin, without casuing the insufficient control of vermin, poor stability with time, etc., by adding a tertiary amine compound acting as an acid scavenger or acid neutralizing agent to a higher aliphatic aldehyde compound.
CONSTITUTION: The titled compound can be stabilized by adding a tertiary amine compound and preferably an oxidation inhibitor to the aldehyde compound. The tertiary amine compound is, e.g. triethylamine, pyridine, quinoline, nicotinic acid amide, etc., and its amount is preferably 0.01W10wt% based on the higher aliphatic aldehyde compound. The oxidation inhibitor is, e.g. p-hydroxyanisole, butyl hydroxyanisole, di-t-butyl-p-cresol, etc., and its amount is preferably 0.01W5wt% based on the higher aliphatic aldehyde compound.
COPYRIGHT: (C)1984,JPO&Japio
摘要翻译：目的：为了制备作为防治害虫的药剂的标题稳定化合物，通过将作为酸清除剂或酸中和剂的叔胺化合物加入到较高的水中，不影响害虫的控制不足，时间稳定性差等脂族醛化合物。构成：可以通过向醛化合物中加入叔胺化合物，优选氧化抑制剂来稳定标题化合物。叔胺化合物是例如。三乙胺，吡啶，喹啉，烟酰胺等，其用量优选为0.01〜10重量％，基于高级脂肪族醛化合物。氧化抑制剂是例如。对羟基苯甲醚，丁基羟基苯甲醚，二叔丁基对甲酚等，其用量优选为0.01-5重量％，基于高级脂肪族醛化合物。

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