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11. 发明专利

JPH05160009A CHARGED BEAM LITHOGRAPHY DEVICE AND PATTERN FORMING METHOD USING CHARGED BEAM 失效
公开(公告)号：JPH05160009A
公开(公告)日：1993-06-25
申请号：JP32460591
申请日：1991-12-09
申请人： MITSUBISHI ELECTRIC CORP
发明人： KAMIYAMA KINYA , MORIIZUMI KOICHI
IPC分类号： G03F7/20 , H01L21/027
摘要： PURPOSE:To correct the deflection of a charged beam based on the position on a lithography field, and the prescribed pattern is drawn in a highly precise manner without deterioration of lithography efficiency by controlling an electrooptical system based on the above-mentioned correction. CONSTITUTION:A shot-time correcting/computing part 19 and the correction table 20 in a patterning field are additionally provided on the electrooptical system control part which has been heretofore in use. The relation between the amount of exposure and the position on the patterning field, which is necessary for drawing of pattern, is housed as the data in the correction table 20 in the patterning field. On the shot time correction/computing part 19, the exposure amount information is corrected based on the data of in-pattering field correction table 20 and the deflection positioning information is given to the beam position high speed D/A converter 16 from the high speed data controller 17, and the corrected information is sent to a blanking control circuit 14. As a result, the amount of exposure in each part of each patterning field 12 is adjusted, and the deviation from the design size can be reduced on the pattern which is drawn on each patterning field 12 irrespective of its position.

12. 发明专利

JPH01140969A PRODUCTION AND INJECTION DEVICE FOR ULTRA-MICRO FROZEN PARTICLE 失效
公开(公告)号：JPH01140969A
公开(公告)日：1989-06-02
申请号：JP30043687
申请日：1987-11-27
申请人： MITSUBISHI ELECTRIC CORP
发明人： OMORI HISAAKI , YANAGI MOTONORI , MORIIZUMI KOICHI , HYONO TADASHI , FUKUMOTO HAYAAKI
IPC分类号： B24C1/00 , B24C5/00 , B24C11/00
摘要： PURPOSE:To make it possible to inject ultra-micro frozen particles with a high energy by providing a means for conveying the ultra-micro particles after charge due to static electricity being removed, and means for ionizing and accelerating these ultra-micro frozen particles. CONSTITUTION:Frozen particles 16b which are frozen through heat-exchange with coolant 12 are transferred into the bottom part of a recovering container 17. In this phase, the frozen particles charged due to friction during transfer thereof is neutralized or discharged by an ionizable air jetting part 20 disposed in the upper section of the recovering container 17. Then, thus discharged frozen particles are injected from an injection nozzle 19 by drive gas 18. Thus, jetted frozen particles are ionized when they pass through a corona discharge section 21, and are then accelerated by an accelerating section 22 so as to be beaten onto a member to be injected. Thus it is possible to subject the member to be injected to a blasting process or a cleaning process by the micro frozen particles injected under a high energy with a high degree of efficiency.

13. 发明专利

JPS62229648A SCANNING TYPE ELECTRON MICROSCOPE 失效
公开(公告)号：JPS62229648A
公开(公告)日：1987-10-08
申请号：JP5429986
申请日：1986-03-11
申请人： MITSUBISHI ELECTRIC CORP
发明人： MORIIZUMI KOICHI
IPC分类号： H01J37/244 , H01J37/28
摘要： PURPOSE:To make it possible to observe the surface of a sample accurately even though the sample has a deep groove-form pattern, by furnishing a collector to collect the secondary electrons close to and parallel to the surface of the sample. CONSTITUTION:When electron beams are scanned over the surface of a sample 3, secondary electrons are generated. The secondary electrons are collected by a collector 9 on the surface of the sample 3 in the direction vertical to the sample surface. Therefore, such secondary electrons that are generated from the bottom of a deep groove-form pattern can be collected easily by the collector 9. The secondary electrons collected by the collector 9 are further collected by a collector 5a in the direction of a scintillator 6, output from a photoelectron multiplier tube 8 as a secondary electron detecting signal, after passing through the scintillator 6 and a photopipe 7, and the sample surface is displayed on a CRT. Since the secondary electrons generated even at the bottom of the deep groove-form pattern can be collected easily in such a way an accurate observation can be realized.

14. 发明专利

JPS6286718A ELECTRON BEAM EXPOSURE DEVICE 失效
公开(公告)号：JPS6286718A
公开(公告)日：1987-04-21
申请号：JP22719885
申请日：1985-10-11
申请人： MITSUBISHI ELECTRIC CORP
发明人： SAITO KAZUNORI , MORIIZUMI KOICHI
IPC分类号： H01L21/027 , H01J37/305 , H01L21/30
摘要： PURPOSE:To form a resist pattern perfectly coinciding with a specified pattern by one time scanning by a method wherein picture element data to form a pattern are stored in a storage means while the irradiation level in a picture element unit is processed according to the picture element data to modulate the irradiation level of electron beams to that processed in the picture element unit. CONSTITUTION:Electron beams radiated from an electron gun 1 are converged on condenser lenses 2 and object lenses 3 to irradiate a mask or a wafer substrate arranged on a stage 4. Besides, picture drawing data stored in a computer 9 are fed to a picture data control circuit 10 to be stored in an irradiation level storage circuit 12 as picture element data with floating decimal points. When a series of picture drawing data is transmitted from the computer 9 to the picture element data control circuit 10, an irradiation level processing circuit 11 correction-processes the irradiation level of picture element data stored in the irradiation level storage circuit 12. Therefore the irradiation level d lm for each picture element equivalent to specified irradiation level stored can be decided to form a resist pattern corresponding to a specified pattern 31.

15. 发明专利

JPS61273011A VARIABLE CLOCK GENERATOR 失效
公开(公告)号：JPS61273011A
公开(公告)日：1986-12-03
申请号：JP11500785
申请日：1985-05-27
申请人： MITSUBISHI ELECTRIC CORP
发明人： MORIIZUMI KOICHI , TAKEUCHI SUSUMU
IPC分类号： H03K3/02
摘要： PURPOSE:To generate many kinds of clocks with less number of components by providing a computer outputting a digital signal corresponding to a clock frequency to be obtained, a D/A converter and a V/F converter. CONSTITUTION:A digital signal corresponding to a required clock frequency is sent to a D/A converter 2 from a computer 1. A signal converted from the digital signal into an analog voltage by the D/A converter 2 is inputted to a V/F converter 3. Thus, the clocks having many kinds of frequencies are generated from the converter 3 by less number of components.

16. 发明专利

JPH10223526A METHOD AND SYSTEM FOR GENERATING CHARGED BEAM LITHOGRAPHIC DATA AND MECHANICALLY READABLE MEDIUM STORING PROGRAM FOR EXECUTING LITHOGRAPHIC DATA GENERATION THROUGH COMPUTER 失效
公开(公告)号：JPH10223526A
公开(公告)日：1998-08-21
申请号：JP13494797
申请日：1997-05-26
申请人： MITSUBISHI ELECTRIC CORP
发明人： TAOKA HIRONOBU , KAMIYAMA KINYA , MORIIZUMI KOICHI
IPC分类号： G03F1/68 , G03F1/70 , G06F17/50 , H01J37/302 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To enhance the dimensional accuracy of a writing data by cutting a basic figure on the boundary of figure processing region, searching a micro writing figure satisfying a given dimensional condition integrating the searched figure wit adjacent figures, distributing a repaired figure to writing fields and converting the figure into a charged beam writing data. SOLUTION: A basic figure processing section 106 converts a design layout data into a basic figure data, and a micro figure repairing section 108 searches micro writing figures, integrates the micro writing figures with adjacent figures and divides the basic figure again optimally to remove the micro writing figures. Subsequently, redundant region removing section 112 cuts off a figure extending across a figure processing region forcibly on the boundary thereof and divides the figure into two figure processing regions on the opposite sides of the boundary before a micro figure repairing section 118 removes the micro writing figures in the vicinity of the boundary of figure processing region. Finally, a distributing section 120 distributes the repaired figure to an improved writing field on the oblique side of a trapezoid.

17. 发明专利

JPH07195046A METHOD AND DEVICE FOR REMOVING FOREIGN MATTER 失效
公开(公告)号：JPH07195046A
公开(公告)日：1995-08-01
申请号：JP157094
申请日：1994-01-12
申请人： MITSUBISHI ELECTRIC CORP
发明人： MORIIZUMI KOICHI
IPC分类号： B08B6/00 , H01L21/304
摘要： PURPOSE:To surely remove foreign matter by one piece each and to omit the repetition of washing by electrifying a needle, bringing the needle in proximity to a work piece and attracting the foreign matter on the front surface thereof, then bringing the needle in proximity to an electrified foreign matter collecting plate and atracting the foreign matter attracted to this foreign matter collecting plate. CONSTITUTION:A base 3 to be placed with a photomask 2 which is the work piece is installed atop a stage 1. The needle 4 is freely, three-dimensionally, movably arranged above the stage 1. Further, the needle 4 is connected to a DC power source 7 by a switching means 6. The foreign matter collecting plate 8 is arranged around the photomask 2 atop the stage 1. The charge reverse from the charge of the needle 4 is, thereupon, generated on the surface of the foreign matter by electrostatic induction when the needle 4 is electrified and is brought near to the foreign matter atop the photomask 2 and, therefore, the foreign matter is attracted to the needle 4 by Coulomb force. The foreign matter is thereafter attracted to the foreign matter collecting plate 8 by the similar effect when the needle 4 is brought near to the foreign matter collecting plate 8.

18. 发明专利

JPH04326168A GRAPHIC DATA PROCESSOR 失效
公开(公告)号：JPH04326168A
公开(公告)日：1992-11-16
申请号：JP9586891
申请日：1991-04-25
申请人： MITSUBISHI ELECTRIC CORP
发明人： MORIIZUMI KOICHI , FUJINO TAKESHI , KAMIYAMA KINYA , MORIMOTO HIROAKI , WATAKABE YAICHIRO
IPC分类号： G06F15/16 , G06F15/80 , G06F17/50 , G06T1/20
摘要： PURPOSE:To improve efficiency at the time of the parallel processing of graphic data, and to execute graphic processing in a shorter time. CONSTITUTION:Input graphic data is divided into plural graphic data of small area by a graphic data area dividing device 3. After the divided graphic data are processed by one of graphic processors 11a to 11d, they are integrated into the graphic data 7 after processing by a graphic data integrating device 13. Each graphic processor 11a to 11d operates in parallel as being controlled by a graphic processing controller 9, and the controller 9 monitors the working state of the processors 11a to 11d, and every time the processor capable of working and in an idle state appears, it distributes one of the divided data to the processor. If the processor incapable of working appears, the controller 9 excludes the processor from the distribution after that.

19. 发明专利

JPH03206638A CORRECTION METHOD FOR ELECTRON-BEAM DRAWING 失效
公开(公告)号：JPH03206638A
公开(公告)日：1991-09-10
申请号：JP228590
申请日：1990-01-08
申请人： MITSUBISHI ELECTRIC CORP
发明人： MORIIZUMI KOICHI , FUJINO TAKESHI
IPC分类号： H01L21/66 , H01L21/027
摘要： PURPOSE:To reduce the computing time of a computer when many of identical figures are arranged repeatedly by a method wherein an electron-beam exposure is corrected by taking a proximity effect into consideration. CONSTITUTION:A repetition region 4 where eight each of aggregates 1 of identical figures are arranged repeatedly side by side longitudinally and transversely is recognized after it is distinguished from a peripheral region 5 where different figures 2 and 3 around it are arranged. Regarding distinguished regions 6 and 7 and the peripheral region 5, the region 7 and the regions 6 and 5 other than it are corrected by taking a proximity effect into consideration separately from each other. As a result, a computing processing process can be saved sharply.

20. 发明专利

JPH03166713A ELECTRON-BEAM EXPOSURE METHOD 失效
公开(公告)号：JPH03166713A
公开(公告)日：1991-07-18
申请号：JP30478889
申请日：1989-11-27
申请人： MITSUBISHI ELECTRIC CORP
发明人： MORIIZUMI KOICHI
IPC分类号： H01L21/027 , G03F7/20 , H01J37/302
摘要： PURPOSE:To correct a proximity effect with high accuracy in a short time by dividing a drawing pattern into a plurality of unit patterns, correcting the proximity effect and connecting a unit pattern in the same quantity of exposure. CONSTITUTION:A drawing pattern 1 is divided into unit patterns 1a-1n and a central pattern 1p and a drawing pattern 3 into unit patterns 3a-3h and a central pattern 3i respectively, and a drawing pattern 2 is not divided and drawing pattern 2 itself is formed in a unit pattern 2a because the drawing pattern 2 has the same size as the unit pattern. A proximity effect is corrected at every unit pattern, the optimum quantities of electron beams irradiated to each unit pattern are arithmetically operated respectively, mutually adjacent unit patterns, the arithmetically operated quantities of irradiation of which are equalized, are connected and drawing data are prepared, and electron-beam exposure is conducted by using the drawing data. Accordingly, the exposure method of electron beams, by which the proximity effect is corrected with high accuracy in a short time, can be acquired.

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