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    • 1. 发明专利
    • CLEAN ROOM
    • JPH10238833A
    • 1998-09-08
    • JP4098497
    • 1997-02-25
    • MITSUBISHI ELECTRIC CORP
    • EZAKI KOJIFUKUMOTO HAYAAKIIZUMI SEISHI
    • F24F7/06
    • PROBLEM TO BE SOLVED: To provide a clean room which prevent the diffusion of a foreign matter produced during the maintenance time of a device or when changing a chemical and prevent the contamination of a semiconductor wafer on the way of a manufacturing process and prevent the contamination inside the device disassembled for maintenance. SOLUTION: A maintenance area formation device 16, which is mobile and can be housed, is provided inside a clean room 1 while an air conditioning system, which can supply air different from the air supplied to a working zone 9 as an occasion demands, is provided inside a maintenance area 17 formed with the maintenance area formation device 16. During the maintenance of a device 10a or exchange time of a chemical, the maintenance area formation device 16 is transferred to a required place, thereby forming the maintenance area 17 and supplying air having a required degree of cleanses into the maintenance area 17.
    • 2. 发明专利
    • METHOD FOR PRODUCING PURE WATER AND APPARATUS THEREFOR
    • JPH0596277A
    • 1993-04-20
    • JP25729191
    • 1991-10-04
    • ORGANO KKMITSUBISHI ELECTRIC CORP
    • MANABE TOSHIKIYAME HIROSHIKAWADA KAZUHIKOBAN KOJIYANAGI MOTONORIFUKUMOTO HAYAAKI
    • C02F1/20C02F1/32C02F1/42C02F1/78C02F9/00
    • PURPOSE:To reduce a nonionic silica component in pure water or ultrapure water as low as possible by subjecting the nonionic silica component to the catalytic reaction with ozone and irradiating the reacted component with ultraviolet rays simultaneously with or after this reaction process to ionize the same and passing the ionized component through an ion exchange resin tower. CONSTITUTION:Untreated water is passed through an untreated water feed pipe 2 from a raw water tank 1 to be fed to a reaction tank 3 by a pump P and an ejector 4 made of acid-resistant and ozone-resistant material quality is provided on the way of the untreated water feed pipe 2, and ozone is sucked by the aspirator action of the ejector 4 to efficiently perform gas-liquid mixing. Untreated water having ozone dissolved therein is supplied to the reaction tank 3 from the lower part thereof and aerated by ozone from the air diffusion pipe 5 provided to the bottom part of the tank 3 to hold the concn. of ozone in the reaction tank 3 to a predetermined value or more. The treated water after ozone aeration is guided to a gas-liquid separation tank 6 to be subjected to gas-liquid separation and further passed through an ultraviolet irradiation device 7 to be supplied to a membrane treatment device 9 by a dustless pump 8 and the filtered water from the device 9 is treated in a mixed bed type ion exchange resin tower 10.
    • 5. 发明专利
    • SEMICONDUCTOR WAFER CLEANING DEVICE
    • JPH04171818A
    • 1992-06-19
    • JP30190890
    • 1990-11-05
    • TAIYO SANSO CO LTDMITSUBISHI ELECTRIC CORP
    • TADA MASUTAFUKUMOTO HAYAAKIOMORI TOSHIAKI
    • H01L21/304
    • PURPOSE:To lead a clean liquid coolant only to an ice-making container by measuring the amount of dust contained in the liquid coolant sampled from a sampling pipeline and stopping the supply of the liquid coolant to the container by actuating a three-way valve when the amount exceeds a prescribed value. CONSTITUTION:While liquid nitrogen 3 is used to obtain fine ice particles by freezing pure water finely atomized from a spray nozzle 6, the amount of dust contained in the liquid nitrogen 3 in a nitrogen supply pipeline 20 is always measured with a dust counter 17. When the occurrence of dust is conformed, the liquid nitrogen 3 is led to the external part of the hopper 1a of an ice- making container 1 by switching a three-way valve 14 so as to stop the supply of the liquid nitrogen 3 into the container 1. When the supply of the liquid nitrogen 3 into the container 1 is stopped, the supply of the pure water from the nozzle 6 is also stopped simultaneously. The liquid nitrogen 3 led to the external part of the hopper 1a of the container 1 cools the hopper 1a and prevents temperature rise of the ice particles 8 contained in the hopper 1a.
    • 10. 发明专利
    • CLEANING OF SURFACE OF SOLID
    • JPH0394427A
    • 1991-04-19
    • JP23221589
    • 1989-09-06
    • TAIYO SANSO CO LTDMITSUBISHI ELECTRIC CORP
    • TADA MASUTAFUKUMOTO HAYAAKIHATTORI NOBUMI
    • B08B7/00H01L21/304
    • PURPOSE:To prevent an environment from being polluted by a method wherein either fine ice particles of ultrapure water or fine ice particles of a liquid in which ozone gas, hydrogen peroxide and the like have been dissolved in ultrapure water as a main component are sprayed to and collided with the surface of a solid in order to clean and remove oils and fats, pigments, dyes and the like on the surface of the solid. CONSTITUTION:A fine ice-particle production container 9 is cooled to a low temperature by using liquid nitrogen or the like; a mixture of ultrapure water supplied from a liquid source 11 or of a liquid in which ozone gas and the like have been dissolved in ultrapure water and of a medium gas supplied from a gas bomb 12 is sprayed from a spray nozzle 10; then, liquid drops are transformed into ice because a temperature inside the container is low; fine ice particles 14 are produced. The fine ice particles 14 are taken out from another exit 9a inside the container 9; they are mixed with the medium gas supplied form the gas bomb 12; they are sprayed from a spray nozzle 13 by a gas pressure of the medium gas. When the fine ice particles 14 sprayed at this time are collided with an object 15 to be cleaned, oils and fats and the like are stripped off from the object 15 to be cleaned by an impulsive force of the fine ice particles 14. Thereby, it is not required to use a solvent such as triclene or the like which causes a danger of environmental pollution.