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11. 发明专利

JPH0729881A METHOD AND APPARATUS FOR DETECTING END POINT OF ENERGY BEAM PROCESSING 失效
公开(公告)号：JPH0729881A
公开(公告)日：1995-01-31
申请号：JP15479493
申请日：1993-06-25
申请人： HITACHI LTD
发明人： YAMAGUCHI HIROSHI , AZUMA JUNZO , ITO FUMIKAZU
IPC分类号： B23K15/00 , B23K15/06 , B23K31/00 , G01N21/63 , H01L21/302 , H01L21/3065
摘要： PURPOSE:To prevent stray light from other sources from entering a detection optical system to hinder the detection of exciting light, and prevent the deterioration in the equipment due to reactive gases, by accurately aligning the detection optical system for monitor the machining area with the position of energy beam application in micrormachining through the application of an energy beam to multilayer interconnection structures, such as LSI. CONSTITUTION:An optical system B to observe specimens 102a and an illumination optical system A are placed on the same optical axis as a detection optical system C. The detection optical system C is lengthened and detection solid angle is reduced. A spatial filter is placed at a midpoint in the detection optical system C, the major part of which is located outside a vacuum vessel 101.

12. 发明专利

JPH06295910A IC ELEMENT AND CONNECTION OF WIRING IN IC ELEMENT 失效
公开(公告)号：JPH06295910A
公开(公告)日：1994-10-21
申请号：JP6787593
申请日：1993-03-26
申请人： HITACHI LTD
发明人： YAMAGUCHI HIROSHI , HONGO MIKIO , MIYAUCHI TAKEOKI , SHIMASE AKIRA , HARAICHI SATOSHI , TAKAHASHI TAKAHIKO , SAITOU KEIYA
IPC分类号： H01L21/3205 , H01L21/768 , H01L23/52 , H01L21/90
摘要： PURPOSE:To provide an IC element made to complete by a method, wherein after a chip, not normally actuated as a whole, is manufactured in a semiconductor integrated circuit (Hereafter, the circuit is called an IC.) having a multilayer wiring layer, such as an LSI, a lower layer wiring in the interior of the chip is connected with an upper layer wiring without causing short circuit between the wirings to perform debug, correction, a failure analysis and the like and the whole chip is normally actuated, and a method of connecting the wirings in the IC element. CONSTITUTION:An IC element is provided with a fine hole bored in a place, where a lower layer wiring 81 is connected, with a focussed energy beam so as to expose the lower layer wiring 81 to be connected to an upper layer insulating film 60, an insulating film 83 being at least applied on an upper layer wiring 80 having its end parts exposed in the fine hole and a metal wiring part 85 formed by filling the hole with a metal precipitated by an energy beam induction CVD method so that the wiring part 85 is connected with the wirings in the hole. The wiring 81 is electrically connected with the wiring 80 by the wiring part 85 in a state that it is made to insulate from the wiring 80 by the film 83 and is led to the surface insulating film 60.

13. 发明专利

JPH06244177A METHOD FOR MODIFYING IC 失效
公开(公告)号：JPH06244177A
公开(公告)日：1994-09-02
申请号：JP28466393
申请日：1993-11-15
申请人： HITACHI LTD
发明人： YAMAGUCHI HIROSHI , SHIMASE AKIRA , MIYAUCHI TAKEOKI , HONGO MIKIO
IPC分类号： H01L21/302 , H01L21/31 , H01L21/3205 , H01L23/52
摘要： PURPOSE:To provide an IC modifying method by which the developing period can be remarkably shortened and the yield of ICs can be improved at the time of development by analyzing and modifying a defective part by locally forming an insulating film or wiring layer at a desired part after cutting wiring of less than 1mum in width under a step-like protective layer of an IC. CONSTITUTION:By taking out the central part of a high-luminance ion beam emitted from a liquid metal ion source 65 and converging the taken-out ion beam through a charged particle optical systems 71 and 72, and then, narrowing down the diameter of the beam through an aperture 69, an area to be observed on the surface of a protective film of an IC at a location where a film is to be formed IC is irradiated with the ion beam and the area to be observed is canned by controlling deflecting electrodes 75 and 76. Then secondary charged particles generated from the area to be observed are detected with a particle detector 86 and the enlarged SIM image of the area to be observed is displayed on a scanning ion microscope upon receiving the signals which control the electrodes 75 and 76. Based on the enlarged image, an insulating film or wiring film is locally formed on the IC so as to modify the IC while the scanning area is controlled through the electrodes 75 and 76 and irradiating the area with the converged ion beam.

14. 发明专利

JPH0698409A INVERTER CONTROLLED TYPE ELECTRIC ROLLING STOCK 失效
公开(公告)号：JPH0698409A
公开(公告)日：1994-04-08
申请号：JP26788992
申请日：1992-09-11
申请人： HITACHI LTD
发明人： MIYASHITA TOMOJI , YAMAGUCHI HIROSHI
IPC分类号： B60L9/18
摘要： PURPOSE:To furnish an inverter controlled type electric rolling vehicle which can execute alone the operations for a plurality of purposes which have been executed so far by separate vehicles, by making an inverter controlled device operate even when a power is supplied from another power source of which the voltage is lower than that of an aerial line. CONSTITUTION:In an electric rolling vehicle 9 having a single or a plurality of inverter controlled devices 3 and a single or a plurality of three-phase AC motors 7 which are driven by these devices and generate a tractive force as a rolling vehicle, a power is supplied to the same inverter controlled devices from another power source 6 having a lower voltage than an aerial line and the three-phase AC motors are driven through the inverter controlled devices, separately from an operation mode in which the three-phase AC motors are driven by a power supply from the aerial line 1 through the inverter controlled devices.

15. 发明专利

JPH0557020B2 失效
公开(公告)号：JPH0557020B2
公开(公告)日：1993-08-23
申请号：JP8477682
申请日：1982-05-21
申请人： HITACHI LTD
发明人： SHIMASE AKIRA , ISHITANI TOORU , TAMURA HIFUMI , YAMAGUCHI HIROSHI , MYAUCHI TAKEOKI
IPC分类号： B01J19/08 , B23K15/00 , G03F1/00 , H01J37/30 , H01J37/305 , H01L21/302 , H01L21/3065

16. 发明专利

JPH05100407A PHASE SHIFTER MASK AND METHOD AND DEVICE FOR CORRECTING DEFECT OF PHASE SHIFTER MASK 失效
公开(公告)号：JPH05100407A
公开(公告)日：1993-04-23
申请号：JP26180491
申请日：1991-10-09
申请人： HITACHI LTD
发明人： YAMAGUCHI HIROSHI , SAITOU KEIYA , ITO FUMIKAZU , HARAICHI SATOSHI
IPC分类号： G03F1/30 , G03F1/40 , G03F1/68 , G03F1/72 , G03F1/74 , H01L21/027 , H01L21/30
摘要： PURPOSE:To provide the phase shifter mask constituted in such a manner that various kinds of defects can be efficiently corrected with high accuracy. CONSTITUTION:Patterns are formed of light shielding films 112 on a substrate 111 and a 1st transparent conductive thin film 161 is formed therein. Further, a 1st phase shift film 113, a 2nd transparent thin film 162 and a 2nd phase shifter film 152 are successively formed thereon to complete the phase shifter mask. A material which is extremely higher in etching speed than the 2nd phase shifter film 152 is selected for the 2nd transparent thin film 162. Then, this phase shifter mask is fairly complex in constitution but in turn etching can be ended eventually with good accuracy at the boundaries at the time of etching the 2nd phase shifter film 152 in the stage of the defect correction. The prevention of static electricity and the monitor of the etching by the detection of absorbed currents are thus possible. Then, various kinds of the defects can be efficiently corrected with the high accuracy.

17. 发明专利

JPH0514416B2 失效
公开(公告)号：JPH0514416B2
公开(公告)日：1993-02-25
申请号：JP4212683
申请日：1983-03-16
申请人： HITACHI LTD
发明人： YAMAGUCHI HIROSHI , SHIMASE AKIRA , MYAUCHI TAKEOKI , PPONGO MIKIO
IPC分类号： H01L21/3213 , B23K15/08 , B23K17/00 , G03F1/00 , H01J37/305 , H01L21/28 , H01L21/302 , H01L21/3065 , H01L21/66 , H01L21/768

18. 发明专利

JPH0512851B2 失效
公开(公告)号：JPH0512851B2
公开(公告)日：1993-02-19
申请号：JP23431883
申请日：1983-12-14
申请人： HITACHI LTD
发明人： SHIMASE AKIRA , YAMAGUCHI HIROSHI , KADOOKA HIDESHI , HARAICHI SATOSHI , MYAUCHI TAKEOKI
IPC分类号： B23K15/00 , H01L21/302 , H01L21/3065

19. 发明专利

JPH0466347B2 失效
公开(公告)号：JPH0466347B2
公开(公告)日：1992-10-22
申请号：JP21500385
申请日：1985-09-30
申请人： HITACHI LTD
发明人： SHIMASE AKIRA , HARAICHI SATOSHI , YAMAGUCHI HIROSHI , MYAUCHI TAKEOKI
IPC分类号： G03F1/00 , G03F1/72 , G03F1/74 , H01L21/027

20. 发明专利

JPH0427539B2 失效
公开(公告)号：JPH0427539B2
公开(公告)日：1992-05-12
申请号：JP24406888
申请日：1988-09-30
申请人： HITACHI LTD
发明人： YAMAGUCHI HIROSHI , MYAUCHI TAKEOKI , SHIMASE AKIRA , PPONGO MIKIO
IPC分类号： G03F1/00 , G03F1/68 , G03F1/84 , G03F1/86 , H01L21/027 , H01L21/30

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