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11. 发明专利

JP2006277996A Electron beam device and device manufacturing method using it 审中-公开
标题翻译：电子束装置和使用它的装置制造方法
公开(公告)号：JP2006277996A
公开(公告)日：2006-10-12
申请号：JP2005091514
申请日：2005-03-28
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , SATAKE TORU , MURAKAMI TAKESHI , KARIMATA TSUTOMU
IPC分类号： H01J37/29 , G01N23/225 , H01J37/145 , H01J37/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide objective lenses preventing discharging between an electrostatic lens and a test piece, which can have high voltage applied to them and are provided with parameters which can be adjusted so that the absolute value of axial chromatic aberration in the objective lenses and the absolute value of axial chromatic aberration in an axial chromatic aberration compensating lens are equivalent.
SOLUTION: The electron beam device is provided with the objective lenses focusing the electron beams and irradiating the test piece. The objective lenses are provided with at least one conical electrode with a radius which is made smaller going toward the test piece side and an axial symmetrical electrode. The axial symmetrical electrode is an approximately grounded electrode installed more to the test piece side than the conical electrode and is installed in a position making the intensity of an electric field smaller on a test piece surface. Furthermore, a multi-pole lens producing negative axial chromatic aberration and a voltage control apparatus are provided and the absolute value of the axial chromatic aberration in the objective lenses and the axial chromatic aberration in the multi-pole lens are made equivalent by having the voltage of the axial symmetrical electrode adjusted by the voltage control device or having both the voltage of the axial symmetrical electrode and the voltage of at least one of the conical electrodes adjusted.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供防止静电透镜和测试片之间的放电的物镜，其可以施加高电压并提供可以调节的参数，使得轴向色差的绝对值物镜和轴向色差补偿透镜中的轴向色差的绝对值是等效的。解决方案：电子束装置设有聚焦电子束并照射试片的物镜。物镜设置有至少一个圆锥形电极，其半径越小，朝向测试片侧和轴向对称电极。轴向对称电极是比锥形电极更多地安装在测试片侧的大致接地电极，并且被安装在使得测试片表面上的电场强度更小的位置。此外，提供了产生负轴向色差的多极镜头和电压控制装置，并且通过使电极中的电压使多极透镜中的轴向色差的绝对值和多极透镜中的轴向色差成为等效的由电压控制装置调节的或具有轴对称电极的电压和调整的至少一个锥形电极的电压的轴向对称电极。版权所有（C）2007，JPO＆INPIT

12. 发明专利

JP2005064335A Inspecting and recovering methods of semiconductor integrated circuit, and apparatus therefor 审中-公开
标题翻译：半导体集成电路的检测和恢复方法及其设备
公开(公告)号：JP2005064335A
公开(公告)日：2005-03-10
申请号：JP2003294557
申请日：2003-08-18
申请人： Ebara Corp , 株式会社荏原製作所
发明人： TERAO KENJI , NOMICHI SHINJI , SATAKE TORU , MURAKAMI TAKESHI
IPC分类号： H01L21/66 , H01J37/28 , H01J37/305 , H01J37/317 , H01L21/027 , H01L21/3205 , H01L21/82 , H01L23/52
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus whereby the inspection and recovery of defects are performed at proper speeds by using charged-particle beams having the same diameter.
SOLUTION: The wiring inspecting and recovering apparatus for inspecting and recovering the wiring portion of an integrated circuit formed on a semiconductor wafer 20 has a wiring-defect-portion sensing means for so inspecting the wiring pattern of the integrated circuit by using a charged-particle beam 34 fed from a charged-particle source 12 as to sense a wiring-defect portion, a wiring removing means for so etching by the irradiation of the charged-particle beam 34 at least one of the wiring-defect portion and the peripheral portion thereof as to remove them therefrom, an organic gas container 24, a gas gun 26 for so spraying an organic gas as to bring the atmosphere of at least the vicinity of the removed wiring-portion into the organic gas, a film forming means for forming a film in the removed wiring-portion by the irradiation of the charged-particle beam, and a wiring shaping and processing means for so etching protruding portions by the irradiation of the charged-particle beam as to form a matched wiring-portion.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种通过使用具有相同直径的带电粒子束以适当速度进行缺陷检查和回收的方法和装置。解决方案：用于检查和恢复形成在半导体晶片20上的集成电路的布线部分的布线检查和恢复装置具有布线缺陷部分检测装置，用于通过使用从带电粒子源12馈送以感测布线缺陷部分的带电粒子束34，用于通过照射带电粒子束34进行蚀刻的布线去除装置，至少一个布线缺陷部分和其周边部分从其中除去，有机气体容器24，用于喷射有机气体的气枪26将至少将去除的配线部分的气氛带入有机气体中的成膜装置用于通过照射带电粒子束在去除的配线部分中形成膜;以及布线成形和处理装置，用于通过照射带电粒子bea来蚀刻突出部分以形成匹配的布线部分。版权所有（C）2005，JPO＆NCIPI

13. 发明专利

JP2004363085A Inspection apparatus by charged particle beam and method for manufacturing device using inspection apparatus 审中-公开
公开(公告)号：JP2004363085A
公开(公告)日：2004-12-24
申请号：JP2004031749
申请日：2004-02-09
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NOMICHI SHINJI , SATAKE TORU , SOFUGAWA TAKUJI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , YOSHIKAWA SEIJI , MURAKAMI TAKESHI , WATANABE KENJI , KARIMATA TSUTOMU , SUEMATSU KENICHI , TANABE YUTAKA , TAJIMA RYO , TOYAMA KEIICHI
IPC分类号： G01B15/00 , G01N23/20 , G01N23/225 , H01J37/05 , H01J37/06 , H01J37/09 , H01J37/12 , H01J37/147 , H01J37/153 , H01J37/16 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01J37/29 , H01L21/66
CPC分类号： G01N23/225 , H01J37/05 , H01J37/28 , H01J2237/2441 , H01J2237/2446 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a system for further increasing an inspection speed of an inspection apparatus in an SEM system, namely for increasing throughput. SOLUTION: The inspection apparatus for inspecting the surface of a substrate creates a crossover from electrons generated from an electron source 25-1, then, an image is formed with a desired magnification in the direction of a sample W, and the crossover is created. When the crossover is passed, an electron that becomes noise is removed from the crossover by an aperture, the crossover is set to have a desired magnification, an adjustment is made so that the crossover becomes a parallel electron beam, and a substrate is irradiated with light in a desired sectional shape. Electron rays are created so that irregularities in illumination in the electron rays is 10% or less. Electrons discharged from the sample W are detected by a detector 25-11. COPYRIGHT: (C)2005,JPO&NCIPI

14. 发明专利

JP2004335190A Electron beam equipment and device manufacturing method using the same 有权
公开(公告)号：JP2004335190A
公开(公告)日：2004-11-25
申请号：JP2003126900
申请日：2003-05-02
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , KATO TAKAO , SATAKE TORU , MURAKAMI TAKESHI , WATANABE KENJI
IPC分类号： G01B15/00 , G01B15/08 , G01N23/225 , H01J37/05 , H01J37/073 , H01J37/244 , H01J37/29 , H01L21/027 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To prevent a beam blurring caused by an interval between an MCP (micro channel plate) and a scintillator as well as a space charge effect.
SOLUTION: The electron beam equipment is provided with an electron gun 1 having a TaC (titanium alloy casting) cathode, a primary optical system (2, 6, 12, 13) forming primary beams in rectangular beams (3, 4, 5), deflecting them by an E×B separator 11 and irradiating them on a target of a sample 15, a secondary optical system (13, 12, 18, 20) extending and projecting an image of either secondary electrons, back scattering electrons, or reflected electrons on a scintillator plate 21 without an intervention of the MCP, and a TDI (time delayed integration) sensor 24 detecting a secondary electron image projected. Provided that angles α, β, γ are positive real numbers smaller than 90°, and α>β, the primary electron beams are made incident at an angle α against a light axis of the secondary optical system up to the vicinities of the E×B separator 11, deflected by an angle (α-β) by the E×B separator 11, and then radiated toward the target at an angle γ against the normal line of the sample 15 by lenses 12, 13.
COPYRIGHT: (C)2005,JPO&NCIPI

15. 发明专利

JP2004214044A Electron ray apparatus and manufacturing method for semiconductor device using the same 审中-公开
公开(公告)号：JP2004214044A
公开(公告)日：2004-07-29
申请号：JP2003000178
申请日：2003-01-06
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , SATAKE TORU , MURAKAMI TAKESHI , NOMICHI SHINJI
IPC分类号： G01N23/04 , G01N23/225 , H01J37/09 , H01J37/141 , H01J37/147 , H01J37/22 , H01J37/29 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an electron ray apparatus whose secondary electron transmission in a secondary optical system is large and beam focusing is sharp, and to provide a manufacturing method for a semiconductor device in which high precision inspection can be carried out by checking a detected picture that has little aberration. SOLUTION: For solving the above problem, the electron ray apparatus 10 detects an expanded image of an electronic image which is formed by a secondary electron ray emitted from an inspection object testpiece 34 whose surface 34a is irradiated by primary electrons emitted from an electron gun 12. A NA aperture 40 is arranged on a common path of the primary and the secondary electron rays, and an electron lens 32 is arranged near the testpiece surface 34a, wherein a crossover point which is formed by the electron gun 12, the electron lens 32 and the NA aperture 40 are in conjugate relations with the primary electron ray respectively. COPYRIGHT: (C)2004,JPO&NCIPI

16. 发明专利

JP2014239050A 荷電粒子線による検査装置及びその検査装置を用いたデバイス製造方法审中-公开
标题翻译：通过充电颗粒的检查装置和使用其的装置制造方法
公开(公告)号：JP2014239050A
公开(公告)日：2014-12-18
申请号：JP2014147706
申请日：2014-07-18
申请人：株式会社荏原製作所 , Ebara Corp
发明人： NOJI NOBUHARU , SATAKE TORU , SOFUGAWA TAKUJI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , YOSHIKAWA SEIJI , MURAKAMI TAKESHI , WATANABE KENJI , KARIMATA TSUTOMU , SUEMATSU KENICHI , TABE YUTAKA , TAJIMA RYO , TOYAMA KEIICHI
IPC分类号： H01J37/20 , G01N23/225 , H01J37/29 , H01L21/66
摘要：【課題】試料表面の帯電量のむらを防止することができる検査装置を提供する。【解決手段】一次電子ビームを試料Wに照射していないときに、電極59.18と電荷検出器59.23とを切換スイッチ59.19を介して接続した状態で、該電極59.18の帯電量を電荷検出器59.23により検出し、その後、切換スイッチ59.19を切り換えて電極59.18と電圧発生器59.21とを接続して、帯電量の電荷を相殺するための電圧を電圧発生器59.21から発生して電極59.18に印加する。上記した処理は、検出系59.4のCCD59.16が画像の1走査分を補足した後の空き時間に実行される。【選択図】図59
摘要翻译：要解决的问题：提供一种能够防止产生样品表面的不一致充电量的检查装置。解决方案：当样品W未被一次电子束照射时，电极59.18的充电量由电荷检测器 59.23在电极59.18通过转换开关59.19与充电检测器59.23连接的状态下，转换开关59.19然后被切换，电极59.18与电压发生器59.21连接，以产生电压从电压发生器59.21取消充电量的电荷并将电压施加到电极59.18。在检测系统59.4的CCD 59.16补充一次扫描的图像之后的空闲时间期间执行上述处理。

17. 发明专利

JP2014138163A Electronic exposure apparatus 审中-公开
标题翻译：电子曝光装置
公开(公告)号：JP2014138163A
公开(公告)日：2014-07-28
申请号：JP2013007434
申请日：2013-01-18
申请人： Ebara Corp , 株式会社荏原製作所
发明人： MURAKAMI TAKESHI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU
IPC分类号： H01L21/027 , G03F7/20 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To provide an electronic exposure apparatus which allows for drastic reduction in the time required for stage movement or stage establishment, while enhancing the throughput drastically.SOLUTION: An electronic exposure apparatus 1 includes: a surface pattern electron generation unit 2 for generating electrons in planar pattern; a surface pattern control unit 3 for controlling the pattern of electrons generated from the surface pattern electron generation unit 2; and a mapping projection unit 9 for projection mapping the electrons generated from the surface pattern electron generation unit 2 to an imaging position on the exposed surface of an exposed member S. The mapping projection unit 9 is arranged in the vicinity of the surface pattern electron generation unit 2, and includes an electromagnetic lens 14 for generating magnetic field lines penetrating the surface pattern electron generation unit 2, and a magnetic field control unit 15 for making the electrons generated from the surface pattern electron generation unit 2 form an image a plurality of times by the magnetic field of the electromagnetic lens 14 alone, by controlling the strength of a magnetic field generated from the electromagnetic lens 14.
摘要翻译：要解决的问题：提供一种电子曝光装置，其能够大幅度减少舞台移动或舞台建立所需的时间，同时大幅提高吞吐量。电子曝光装置1包括：表面图案电子产生单元2，用于以平面图形生成电子; 用于控制从表面图案电子产生单元2产生的电子图案的表面图案控制单元3; 以及映射投影单元9，用于将从表面图案电子产生单元2产生的电子投射到暴露部件S的暴露表面上的成像位置。映射投影单元9布置在表面图案电子生成单元2，并且包括用于产生穿过表面图案电子产生单元2的磁场线的电磁透镜14和用于使从表面图案电子产生单元2产生的电子多次形成图像的磁场控制单元15 仅通过电磁透镜14的磁场，通过控制从电磁透镜14产生的磁场的强度。

18. 发明专利

JP2014120675A Electronic exposure device 审中-公开
标题翻译：电子曝光装置
公开(公告)号：JP2014120675A
公开(公告)日：2014-06-30
申请号：JP2012275970
申请日：2012-12-18
申请人： Ebara Corp , 株式会社荏原製作所
发明人： MURAKAMI TAKESHI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU
IPC分类号： H01L21/027 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To provide an electronic exposure device in which the time required for movement control of a stage can be reduced significantly, while enhancing the throughput significantly.SOLUTION: An electronic exposure device 1 includes a surface pattern electron generation part 2 for generating electrons in a planar pattern, a surface pattern control unit 3 for controlling the pattern of electrons generated from the surface pattern electron generation part 2, a stage 7 on which an exposed member is mounted, a stage movement control unit 8 for controlling movement of the stage 7, and a mapping projection unit 9 for projection mapping the electrons generated from the surface pattern electron generation part 2 to the imaging position on the exposed surface of an exposed member S. When performing electronic exposure to the exposed surface while moving the stage 7 continuously, the surface pattern control unit 3 changes the pattern of electrons generated from the surface pattern electron generation part 2 synchronously with the movement of the stage 7.
摘要翻译：要解决的问题：提供一种电子曝光装置，其中能够显着降低舞台的移动控制所需的时间，同时显着提高吞吐量。电子曝光装置1包括：表面图案电子产生部分2，用于产生平面图形中的电子，用于控制从表面图案电子产生部分2产生的电子图案的表面图案控制单元3，安装有暴露部件的台架7，用于控制表面图案电子产生部分2的移动的台架移动控制单元8 阶段7和映射投影单元9，用于将从表面图案电子产生部分2产生的电子投射到暴露部件S的暴露表面上的成像位置。当在移动台架7的同时执行电子暴露于暴露表面表面图案控制单元3连续地改变从表面图案生成的电子的图案电子产生部分2与舞台7的运动同步。

19. 发明专利

JP2014052379A Specimen observation method and device, and inspection method and device using them 有权
标题翻译：标本观察方法和装置，以及使用它们的检查方法和装置
公开(公告)号：JP2014052379A
公开(公告)日：2014-03-20
申请号：JP2013203667
申请日：2013-09-30
申请人： Ebara Corp , 株式会社荏原製作所
发明人： HATAKEYAMA MASACHIKA , MURAKAMI TAKESHI , NAITO YOSHIHIKO , TERAO KENJI , KIMURA NORIO , WATANABE KENJI
IPC分类号： G01N23/225 , H01J37/09 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01J37/29
CPC分类号： H01J37/28 , H01J37/22 , H01J37/244 , H01J37/29 , H01J2237/24475 , H01J2237/24585 , H01J2237/24592 , H01J2237/2805 , H01J2237/2806 , H01J2237/2817 , H01L22/12
摘要： PROBLEM TO BE SOLVED: To provide a technique capable of improving observation ability of a specimen using an electron beam in an energy region conventionally not interested.SOLUTION: The sample observation method comprises: irradiating a specimen with an electron beam; detecting electrons to be observed generated by the irradiation with the electron beam and having information on the specimen; and forming an image of the specimen from the detected electrons to be observed. The irradiation with the electron beam intermingles secondary emission electrons and mirror electrons as the electrons to be observed by irradiating the specimen with the electron beam having landing energy set in a transition region between a secondary emission electron region where the secondary emission electrons are detected, and a mirror electron region where the mirror electrons are detected. The electrons to be observed are detected in the state where the secondary emission electrons and the mirror electrons are intermingled. A fine foreign matter or pattern of 100 nm or less can be observed and inspected at a high speed.
摘要翻译：要解决的问题：提供一种能够改善通常不感兴趣的能量区域中的电子束的样本的观察能力的技术。解决方案：样本观察方法包括：用电子束照射样本; 检测通过电子束的照射产生的待观察的电子，并且具有关于样本的信息; 并从所检测的电子形成待观察的样品的图像。电子束的照射将二次发射电子和镜面电子作为待观察的电子，通过用检测到二次发射电子的二次发射电子区域之间的过渡区域中设置着电能的电子束照射样品，检测镜电子的镜电子区域。在二次发射电子和镜电子混合的状态下检测待观察的电子。可以高速观察和检查100nm以下的微细异物或图案。

20. 发明专利

JP2013145748A Electron beam apparatus and sample observation method using the same 有权
标题翻译：电子束装置和采用该方法的样品观测方法
公开(公告)号：JP2013145748A
公开(公告)日：2013-07-25
申请号：JP2013032082
申请日：2013-02-21
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KAGA TORU , TERAO KENJI , HATAKEYAMA MASAKI , WATANABE KENJI , NAITO YOSHIHIKO , MURAKAMI TAKESHI , KIMURA NORIO
IPC分类号： H01J37/29 , H01J37/20
摘要： PROBLEM TO BE SOLVED: To provide an electron beam device which allows a primary optical system to have a precharge function and controls a region and an amount of the precharge to a sample.SOLUTION: An electron beam apparatus includes: a stage 30 on which a sample S is placed and including a moving mechanism; a primary optical system 10 generating an electronic beam having a predetermined radiation region and radiating the electronic beam to the sample S; a secondary optical system 20 detecting an electron obtaining structural information of the sample S and obtaining an image of the sample S for a predetermined visual region; and radiation region change means 13, 14 which change a position of the predetermined radiation region relative to the predetermined visual region. The radiation region change means 13, 14 change the visual region along the moving direction of the sample.
摘要翻译：要解决的问题：提供一种电子束装置，其允许主光学系统具有预充电功能并且控制对样品的预充电的区域和量。解决方案：电子束装置包括：阶段30，其上具有样品S被放置并包括移动机构; 生成具有预定辐射区域的电子束并将电子束辐射到样品S的主光学系统10; 第二光学系统20，检测获取样品S的结构信息的电子，并获得用于预定视觉区域的样本S的图像; 以及改变预定辐射区域相对于预定视觉区域的位置的辐射区域改变装置13,14。辐射区域改变装置13,14沿着样品的移动方向改变视觉区域。

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