专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明专利

JP2005035920A Polymerizable adamantane derivative, method for producing the same and polymer compound 审中-公开
标题翻译：可聚合ADAMANTANE衍生物，其制备方法和聚合物化合物
公开(公告)号：JP2005035920A
公开(公告)日：2005-02-10
申请号：JP2003273943
申请日：2003-07-14
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , TSUTSUMI KIYOHARU
IPC分类号： C07C69/533 , C07C20060101 , C07C67/08 , C07C67/14 , C07C69/00 , C08F20/16 , C08F20/18 , G03C1/76
CPC分类号： C07C67/14 , C07C69/653 , C07C2603/74 , C08F220/18
摘要： PROBLEM TO BE SOLVED: To obtain a fluorine atom-containing polymerizable unsaturated monomer useful for providing a polymer compound having high transmission of a vacuum ultraviolet light such as a light at ≤300 nm wavelength, especially an F
2 excimer laser (157 nm), etc.
SOLUTION: The polymerizable adamantane derivative is represented by formula (1) (R
1 is a fluorine atom or a fluoroalkyl group; the adamantane ring in the formula may contain a substituent group; for example, trifluoromethyl, pentafluoroethyl, 2,2,2-trifluoroethyl, 2,2,2-trifluoro-1-(trifluoromethyl)ethyl, pentafluoropropyl group or the like may be cited as the fluoroalkyl group).
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决问题的方法为了获得可用于提供具有高透射率的高分子化合物的含氟原子的可聚合不饱和单体，所述高分子化合物具有例如在≤300nm波长的光，例如F 2 < / SB>准分子激光器（157nm）等。解决方案：聚合性金刚烷衍生物由式（1）表示（R 1 SP＆lt; SP＆gt;是氟原子或氟代烷基;金刚烷环在该式中可以含有取代基;例如三氟甲基，五氟乙基，2,2,2-三氟乙基，2,2,2-三氟-1-（三氟甲基）乙基，五氟丙基等作为氟代烷基组）。版权所有（C）2005，JPO＆NCIPI

12. 发明专利

JP2005029516A 6-trifluoromethyl-2-vinyloxy-4-oxatricyclo[4.2.1.03,7]nonan-5-one, and macromolecular compound 有权
标题翻译： 6-三氟甲基-2-氰基-4-氧杂环[4.2.1.03,7] NONAN-5-ONE和大分子化合物
公开(公告)号：JP2005029516A
公开(公告)日：2005-02-03
申请号：JP2003271352
申请日：2003-07-07
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , TSUTSUMI KIYOHARU
IPC分类号： C07D307/77 , C07D307/93 , C08F16/26
CPC分类号： C07D307/93 , C08F16/26
摘要： PROBLEM TO BE SOLVED: To provide a new lactone ring-containing polymerizable monomer useful when obtaining a macromolecular compound having excellent adhesion to a substrate, and high transparency to a light having ≤300 nm wavelength, especially vacuum ultraviolet rays such as F
2 excimer laser (157 nm).
SOLUTION: The 6-trifluoromethyl-2-vinyloxy-4-oxatricyclo[4.2.1.0
3,7 ]nonan-5-one represented by formula (1) is provided. The compound is produced by reacting 6-trifluoromethyl-2-hydroxy-4-oxatricyclo[4.2.1.0
3,7 ]nonan-5-one represented by formula (2) with a compound represented by formula (3a) or (3b) (wherein, R
a and R
b are each a hydrogen atom or a hydrocarbon group).
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种新的含内酯环的可聚合单体，当获得对基材具有优异粘合性的高分子化合物时，对于具有≤300nm波长的光，尤其是真空紫外线如F 2 准分子激光（157nm）。解决方案：提供了由式（1）表示的6-三氟甲基-2-乙烯基氧基-4-氧杂三环[4.2.1.0 3,5-己二醇]壬-5-酮。该化合物通过使由式（2）表示的6-三氟甲基-2-羟基-4-氧杂三环[4.2.1.0 3,6-己二醇]壬烷-5-酮与式（2）表示的化合物反应 3a）或（3b）（其中，R a 和R b 各自为氢原子或烃基）。版权所有（C）2005，JPO＆NCIPI

13. 发明专利

JP2010150448A Lactone skeleton-containing polymeric compound and photoresist composition 有权
标题翻译：含有骨架的聚合物和光催化剂组合物
公开(公告)号：JP2010150448A
公开(公告)日：2010-07-08
申请号：JP2008331894
申请日：2008-12-26
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , TANAKA HIROMI
IPC分类号： C08F220/28 , C07D307/00 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a new lactone skeleton-containing polymeric compound which is excellent in chemical resistance and solubility in an organic solvent and can improve hydrolyzability and/or solubility in water after hydrolysis. SOLUTION: The polymeric compound contains a lactone skeleton-containing monomer unit represented by formula (1) (wherein R a denotes H or the like; A denotes 1-6C alkylene or the like; and Y denotes a ≥5C divalent organic group) and a monomer unit which is eliminated by the action of an acid and becomes alkali-soluble. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种在有机溶剂中耐化学性和溶解性优异的新的含内酯骨架的聚合化合物，并且可以提高水解后水中的水解性和/或水溶性。解决方案：聚合物含有由式（1）表示的含内酯骨架的单体单元（其中R a 表示H等; A表示1-6C亚烷基等; Y表示≥5C二价有机基团）和通过酸的作用而被除去而变成碱溶性的单体单元。版权所有（C）2010，JPO＆INPIT

14. 发明专利

JP2010013652A Unsaturated carboxylic acid hemiacetal ester, polymer compound and resin composition for photoresist 有权
标题翻译：不饱和羧酸乙酯酯，聚合物化合物和树脂组合物
公开(公告)号：JP2010013652A
公开(公告)日：2010-01-21
申请号：JP2009193140
申请日：2009-08-24
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , INOUE KEIZO , IWAHAMA TAKAHIRO
IPC分类号： C08F220/28 , C07C69/54 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a polymer compound showing excellent acid releasing property when used for photoresist. SOLUTION: This polymer compound contains a repeating unit corresponding to the unsaturated carboxylic acid hemiacetal ester represented by formula (1) (wherein R a shows a hydrogen atom, a halogen atom, a 1-6C alkyl group or a 1-6C haloalkyl group, R b shows a hydrocarbon group having a hydrogen atom at 1-site, R c shows a hydrogen atom or a hydrocarbon group, and R d shows an organic group containing a cyclic skeleton). This polymer compound may further contain a repeating unit corresponding to at least a monomer selected from the group consisting of a monomer containing a lactone skeleton, a monomer containing a cyclic ketone skeleton, a monomer containing an acid anhydride, and a monomer containing an imide group, and/or a repeating unit corresponding to at least a monomer selected from the group consisting of a monomer containing a hydroxyl group, a monomer containing a mercapto group and a monomer containing a carboxyl group. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供当用于光致抗蚀剂时显示出优异的脱酸性能的聚合物化合物。解决方案：该高分子化合物含有对应于由式（1）表示的不饱和羧酸半缩醛酯的重复单元（其中R a 表示氢原子，卤素原子，1-6C 烷基或1-6C卤代烷基，R b 表示在1-位具有氢原子的烃基，R表示氢原子或烃基，并且R d 表示含有环状骨架的有机基团）。该高分子化合物还可以含有对应于至少一种选自由含有内酯骨架的单体，含有环酮骨架的单体，含有酸酐的单体和含有酰亚胺基的单体的单体的重复单元，和/或对应于至少一种选自含有羟基的单体，含有巯基的单体和含有羧基的单体的单体的重复单元。版权所有（C）2010，JPO＆INPIT

15. 发明专利

JP2005248153A Unsaturated carboxylic hemiacetal ester, macromolecular compound and resin composition for photoresist 有权
标题翻译：不饱和羧酸乙酯，大分子化合物和光催化剂树脂组合物
公开(公告)号：JP2005248153A
公开(公告)日：2005-09-15
申请号：JP2004303478
申请日：2004-10-18
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , SUMITA MARI
IPC分类号： C07D307/77 , C07D307/94 , C08F20/28 , C08F220/10 , C08F220/28 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To obtain a macromolecular compound which exhibits an excellent acid desorption property when it is used for photoresist. SOLUTION: The macromolecular compound contains a repeating unit corresponding to an unsaturated carboxylic acid hemiacetal ester shown in formula (1) (wherein R a is hydrogen atom, a halogen atom, a 1-6C alkyl group or a 1-6C haloalkyl group; R b is a hydrocarbon group having a hydrogen atom on its first position; R c is hydrogen or a hydrocarbon group; and R d is an organic group containing a lactone backbone). The macromolecular compound can contain a repeating unit corresponding to at least one monomer selected from the group consisting of lactone backbone-containing monomers, cyclic ketone backbone-containing monomers, acid anhydride group-containing monomers and imide group-containing monomers [excluding the repeating unit corresponding to the unsaturated carboxylic acid hemiacetal ester] and/or a repeating unit corresponding to at least one monomer selected from the group consisting of hydroxyl group-containing monomers, and the like. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：获得当用于光致抗蚀剂时显示出优异的酸解吸性的高分子化合物。解决方案：高分子化合物包含对应于式（1）所示的不饱和羧酸半缩醛酯的重复单元（其中R SP为氢原子，卤素原子，1-6C烷基基团或1-6C卤代烷基; R 2是在其第一位上具有氢原子的烃基; R 2是氢或烃基; SP> d 是含有内酯骨架的有机基团）。高分子化合物可以含有对应于至少一种选自含有内酯主链的单体，含有环酮骨架的单体，含酸酐基的单体和含酰亚胺基的单体的单体的重复单元[不包括重复单元对应于不饱和羧酸半缩醛酯]和/或对应于至少一种选自含羟基单体的单体的重复单元等。版权所有（C）2005，JPO＆NCIPI

16. 发明专利

JP2005029520A Polymerizable adamantane derivative, macromolecular compound, resin composition for photoresist, and method for producing semiconductor 审中-公开
标题翻译：聚合物衍生物，大分子化合物，光催化剂用树脂组合物，以及生产半导体的方法
公开(公告)号：JP2005029520A
公开(公告)日：2005-02-03
申请号：JP2003272029
申请日：2003-07-08
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , ADACHI TOMOKO , TSUTSUMI KIYOHARU
IPC分类号： G03F7/039 , C07C67/08 , C07C69/54 , C08F16/26 , C08F20/28 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a new polymerizable monomer capable of imparting adhesion to a substrate, proper hydrophilicity and transparency to a polymer for a photoresist. SOLUTION: The polymerizable adamantane derivative is represented by formula (1a) or (1b) (wherein, R 1 and R 2 are each a hydrogen atom, a fluorine atom, an alkyl group or a fluoroalkyl group; R 3 is a fluorine atom or a fluoroalkyl group; and the ring in the formula may have a substituent). COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供能够赋予基材粘合性的新的可聚合单体，对光致抗蚀剂的聚合物具有适当的亲水性和透明性。解决方案：可聚合金刚烷衍生物由式（1a）或（1b）表示（其中，R SP 1和R SP 2各自为氢原子，氟原子，烷基或氟代烷基; R 3是氟原子或氟烷基;式中的环可以具有取代基）。版权所有（C）2005，JPO＆NCIPI

17. 发明专利

JP2008105955A Method for producing (meth)acrylic ester 审中-公开
标题翻译：生产（甲基）丙烯酸酯的方法
公开(公告)号：JP2008105955A
公开(公告)日：2008-05-08
申请号：JP2006287414
申请日：2006-10-23
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , KOJIMA HIROYOSHI
IPC分类号： C07C67/14 , C07C69/003 , C07C69/54
摘要： PROBLEM TO BE SOLVED: To provide a production method for effectively synthesizing a (meth)acrylic ester monomer constituted from acrylic acid and a cyclohexane ring bonded thereto through an alkyl group. SOLUTION: It is possible to produce a (meth)acrylic ester represented by the formula (wherein R 1 , R 2 , and R 3 are each a methyl group or an ethyl group; and R is a hydrogen atom or a methyl group) by reacting (meth)acrylic chloride with a corresponding alcohol [e.g., 2-(4-methylcyclohexyl)propan-2-ol] in the presence of a dechlorinating agent. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过烷基有效合成由丙烯酸和与其结合的环己烷环构成的（甲基）丙烯酸酯单体的制备方法。解决方案：可以制备由式（其中R 1，R 2，R 2，R 2和R 3）表示的（甲基）丙烯酸酯，通过使（甲基）丙烯酸氯化物与相应的醇[例如2-（4-甲基环己基）丙-2-醇]反应，各自为甲基或乙基; R为氢原子或甲基）在脱氯剂的存在下。版权所有（C）2008，JPO＆INPIT

18. 发明专利

JP2007284381A Methacrylic or acrylic monomer for photoresist, polymer compound from the same, and resin composition for photoresist 审中-公开
标题翻译：用于光催化剂的甲基丙烯酸或丙烯酸单体，其聚合物组合物和光催化剂的树脂组合物
公开(公告)号：JP2007284381A
公开(公告)日：2007-11-01
申请号：JP2006114129
申请日：2006-04-18
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , MURAI YOSHIYUKI , NISHIMURA MASAMICHI
IPC分类号： C07C69/54 , C07C309/66 , C08F220/28 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a polymer compound for a photoresist which is not only satisfactory in the adhesion to a substrate, acid eliminating property and dry etching resistance, but also in the balance between the solubility in a resist solvent and the alkali solubility and a photoresist resin composition containing the polymer compound for photoresist, and also, to provide a polymer compound for a photoresist capable of precisely forming fine patterns, a photoresist resin composition, and a method of manufacturing a semiconductor.
SOLUTION: The polymer compound for a photoresist comprises a repeating unit corresponding to a (meth)acrylic or acrylic monomer for a photoresist expressed by formula (1).
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供光致抗蚀剂的高分子化合物，其不仅对基材的粘附性，酸消除性和耐干蚀刻性，而且在抗蚀剂溶剂中的溶解度和碱溶解性和含有光致抗蚀剂用高分子化合物的光致抗蚀剂树脂组合物，以及提供能够精确形成精细图案的光致抗蚀剂的高分子化合物，光致抗蚀剂树脂组合物和半导体的制造方法。解决方案：用于光致抗蚀剂的聚合物化合物包含对应于由式（1）表示的光致抗蚀剂的（甲基）丙烯酸或丙烯酸单体的重复单元。版权所有（C）2008，JPO＆INPIT

19. 发明专利

JP2006063239A Macromolecular compound, resin composition for photoresist and method for producing semiconductor 有权
标题翻译：大分子化合物，光催化剂树脂组合物及其生产方法
公开(公告)号：JP2006063239A
公开(公告)日：2006-03-09
申请号：JP2004249492
申请日：2004-08-30
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA
IPC分类号： C08F220/28 , C07C69/54 , C08F220/16 , C08F232/08 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a macromolecular compound for photoresists capable of forming highly water-resistant resist film.
SOLUTION: The macromolecular compound is composed of monomer units each represented by formula (I) (wherein, R
a is H, a halogen atom, 1-6C alkyl or 1-6C haloalkyl; A is a 1-20C straight-chain or branched-chain alkylene group; the carboxy group in the formula may be in a salt form) and monomer units each having such a group as to be alkaline soluble by eliminating part thereof by the action of an acid.
COPYRIGHT: (C)2006,JPO&NCIPI

20. 发明专利

JP2006036891A α-UNSATURATED ACYLOXY-γ-BUTYLOLACTONE DERIVATIVE, POLYMER COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST 审中-公开
标题翻译： α-不饱和聚氨酯-γ-丁氧基酮衍生物，聚合物化合物和树脂组合物
公开(公告)号：JP2006036891A
公开(公告)日：2006-02-09
申请号：JP2004217765
申请日：2004-07-26
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , SUMITA MARI
IPC分类号： C08F220/28 , C07B61/00 , C07D307/33 , C08F232/00 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a compound having a new lactone skeleton which is useful as a constituent monomer for photoresist resins. SOLUTION: The α-unsaturated acyloxy-γ-butylolactone derivative is represented by formula (1) (wherein R a is a hydrogen atom, a halogen atom, a 1-6C alkyl group or a 1-6C haloalkyl group;R b is an acid-leaving group; R 1 and R 2 are same or different and they are each a hydrocarbon group and R 1 and R 2 may mutually be combined to form a ring together with an adjacent carbon atom; R 3 and R 4 are same or different and they are each hydrogen atom or a hydrocarbon group). COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：待解决的问题：提供具有新的内酯骨架的化合物，其可用作光致抗蚀剂树脂的构成单体。解决方案：α-不饱和酰氧基-γ-丁基内酯衍生物由式（1）表示（其中R a 是氢原子，卤素原子，1-6C烷基或 1-6C卤代烷基; R b是酸离去基团; R 1 SP 1和R 2 SP 2是相同或不同的，它们各自为烃基和R 1 和R 2 可以相互组合以与相邻的碳原子一起形成环; R 3和R SP > 4 相同或不同，它们各自为氢原子或烃基）。版权所有（C）2006，JPO＆NCIPI

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式