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1. 发明专利

JP2008046515A Resin composition for forming resist protective film, and method for forming pattern using the same 有权
标题翻译：用于形成耐腐蚀膜的树脂组合物及其形成图案的方法
公开(公告)号：JP2008046515A
公开(公告)日：2008-02-28
申请号：JP2006223698
申请日：2006-08-19
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： OKUMURA ARIMICHI , KOYAMA YUTAKA
IPC分类号： G03F7/11 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resin composition for forming a resist protective film for forming a protective film that does not have affinity with respect to an immersion liquid, can suppress the elution of low-molecular weight components from a resist layer or swelling in a resist film, can be removed easily in a process of alkali development after exposure, and can provide a preferable pattern profile. SOLUTION: The resin composition for forming a resist protective film contains a polymer having a repeating unit, having at least a lactone structure. The resin composition preferably contains a polymer, having a repeating unit having a lactone structure together with a repeating unit having a fluorine atom. Additionally, the composition more preferably contains a polymer having a repeating unit, having a lactone structure together with a repeating unit that has a fluorine atom, and a repeating unit that has a sulfo group or a carboxyl group. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种用于形成用于形成对浸液不具有亲和性的保护膜的抗蚀保护膜的树脂组合物，可以抑制低分子量组分从抗蚀剂层的洗脱或抗蚀剂膜中的溶胀，可以在曝光后的碱显影过程中容易地除去，并且可以提供优选的图案轮廓。解决方案：用于形成抗蚀保护膜的树脂组合物含有至少具有内酯结构的具有重复单元的聚合物。树脂组合物优选含有具有内酯结构的重复单元和具有氟原子的重复单元的聚合物。此外，组合物更优选含有具有内酯结构与具有氟原子的重复单元的重复单元的聚合物和具有磺基或羧基的重复单元。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2006036892A α-UNSATURATED ACYLOXY-γ-BUTYLOLACTONE DERIVATIVE, POLYMER COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST 审中-公开
标题翻译： α-不饱和聚氨酯-γ-丁氧基酮衍生物，聚合物化合物和树脂组合物
公开(公告)号：JP2006036892A
公开(公告)日：2006-02-09
申请号：JP2004217766
申请日：2004-07-26
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , MURAI YOSHIYUKI , NISHIMURA MASAMICHI
IPC分类号： C08F220/28 , C07B61/00 , C07D307/94 , C08F232/00 , G03F7/039
摘要： PROBLEM TO BE SOLVED: To provide a compound having a new lactone skeleton which is useful as a constituent monomer for photoresist resins. SOLUTION: The α-unsaturated acyloxy-γ-butylolactone derivative is represented by formula (1) (wherein R a is a hydrogen atom, a halogen atom, a 1-6C alkyl group or a 1-6C haloalkyl group; R 1 and R 2 are same or different and they are each a hydrocarbon group and R 1 and R 2 may mutually be combined to form a ring together with an adjacent carbon atom; R 3 and R 4 are same or different and they are each hydrogen atom or a hydrocarbon group; the carboxyl group represented in the formula may be a form of a salt). COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：待解决的问题：提供具有新的内酯骨架的化合物，其可用作光致抗蚀剂树脂的构成单体。解决方案：α-不饱和酰氧基-γ-丁基内酯衍生物由式（1）表示（其中R a 是氢原子，卤素原子，1-6C烷基或 1-6C卤代烷基; R 1 和R 2 相同或不同，它们各自为烃基，R 1 和R SP > 2 可以相互组合以与相邻的碳原子一起形成环; R 3和R 4相同或不同，它们各自为氢原子或烃基;式中表示的羧基可以是盐的形式）。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2005112824A Fluorine-containing polymerizable adamantane derivative, method for producing the same and polymer compound 审中-公开
标题翻译：含氟聚合性聚氨酯衍生物，其制备方法和聚合物化合物
公开(公告)号：JP2005112824A
公开(公告)日：2005-04-28
申请号：JP2003352587
申请日：2003-10-10
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , TSUTSUMI KIYOHARU
IPC分类号： C07C69/653 , C07C67/14 , C08F20/22
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a new fluorine-containing polymerizable unsaturated monomer useful for producing a polymer compound having high transparency to the light having wavelength of ≤300 nm, especially vacuum ultraviolet rays of F
2 excimer laser (157 nm), or the like.
SOLUTION: The monomer expressed by formula (4) (R
1 is fluorine atom or a fluoroalkyl group; an adamantane thereof ring may have substituents) is produced by reacting a compound expressed by formula (1) (the adamantane ring may have substituents) with a methylation agent expressed by the formula (2): CH
3 -M (M is a metal atom or MgX
1 group (X
1 is a halogen atom)) and reacting the reaction product with an unsaturated acyl halide expressed by formula (3) (R
1 is same as defined above; and X
2 is a halogen atom).
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决问题的方法：提供一种新型含氟聚合性不饱和单体的制造方法，所述新型含氟聚合性不饱和单体可用于制造对波长≤300nm的光具有高透明性的高分子化合物，特别是F 2 准分子激光（157nm）等。解决方案：式（4）表示的单体（R 1 SP 1是氟原子或氟代烷基;其金刚烷环可以具有取代基）是通过使由式（1）表示的化合物）（金刚烷环可以具有取代基）与由式（2）表示的甲基化试剂：CH 3 SB（M）是金属原子或MgX 1 并且使反应产物与由式（3）表示的不饱和酰基卤反应（R 1 SP 1与上述定义相同）; X 1 SP> 2 是卤素原子）。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2005008757A Polymerizable monomer, macromolecular compound, resin composition for photoresist, and method for producing semiconductor 审中-公开
标题翻译：聚合单体，大分子化合物，光催化剂树脂组合物，以及生产半导体的方法
公开(公告)号：JP2005008757A
公开(公告)日：2005-01-13
申请号：JP2003174691
申请日：2003-06-19
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , TSUTSUMI KIYOHARU
IPC分类号： C07D493/04 , C08F16/26 , C08F20/26 , C08F20/30 , G03F7/039
CPC分类号： C07D493/04 , C08F20/30 , G03F7/0397
摘要： PROBLEM TO BE SOLVED: To provide a new polymerizable monomer capable of imparting proper hydrophilicity, or hydrophilicity and transparency to a polymer for a photoresist. SOLUTION: The polymerizable monomer is represented by formula (1) (wherein, R 1 , R 2 and R 3 are each a hydrogen atom, a fluorine atom, an alkyl group or a fluoroalkyl group; W is a single bond or a linking group; n is 0 or 1; with the proviso that when n is 1, at least one of R 1 , R 2 and R 3 is a fluorine atom or a fluoroalkyl group; and the ring in the formula may have a substituent). COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供能够赋予光致抗蚀剂的聚合物适当的亲水性或亲水性和透明性的新的可聚合单体。解决方案：可聚合单体由式（1）表示（其中R 1，R 2，R 2，R 3和R 3各自为氢原子，氟原子，烷基或氟烷基; W是单键或连接基团; n是0或1;条件是当n是1时，R“ / SP>，R 2 和R 3 是氟原子或氟代烷基;并且式中的环可以具有取代基）。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2005008756A Lactone ring-containing polymerizable monomer, macromolecular compound, resin composition for photoresist, and method for producing semiconductor 有权
标题翻译：含有环聚合的聚合单体，大分子化合物，光催化剂的树脂组合物和生产半导体的方法
公开(公告)号：JP2005008756A
公开(公告)日：2005-01-13
申请号：JP2003174690
申请日：2003-06-19
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , TSUTSUMI KIYOHARU
IPC分类号： G03F7/039 , C07D307/00 , C08F16/24 , C08F220/28 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a new lactone ring-containing polymerizable monomer useful for obtaining a macromolecular compound having excellent adhesion to a substrate, and high transparency to a light having ≤300 nm wavelength, especially a vacuum ultraviolet light of an F2 excimer laser (157 nm) or the like. SOLUTION: The lactone ring-containing polymerizable monomer is a compound represented by formula (1) (wherein, ring Z1 is a nonaromatic monocycle or polycycle having at least a lactone ring; R1, R2 and R3 are each a hydrogen atom, a fluorine atom, an alkyl group or a fluoroalkyl group; R4 is a substituent bonding to a carbon atom at the α-position to -COO- group in the lactone ring, and denotes a fluorin atom or a fluoroalkyl group; W is a single bond or a linking group; n is 0 or 1; and the ring in the formula may have a substituent) (with the proviso that 6-trifluoromethyl-2-vinyloxy-4-oxatricyclo[4. 2. 1. 03, 7]nonan-5-one is excluded). COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种新的含内酯环的可聚合单体，其可用于获得对基材具有优异粘附性的高分子化合物，并且对具有≤300nm波长的光，特别是具有 F2准分子激光（157nm）等。解决方案：含内酯环的可聚合单体是由式（1）表示的化合物（其中，环Z1是至少具有内酯环的非芳族单环或多环; R 1，R 2和R 3各自为氢原子，氟原子，烷基或氟代烷基; R4是与内酯环中的-C1--基的α-位上的碳原子键合的取代基，表示氟原子或氟代烷基; W是单键或连接基团; n是0或1;并且式中的环可以具有取代基）（条件是6-三氟甲基-2-乙烯基氧基-4-氧杂三环[4.2.1,0.37] 非5碱基不包括在内）。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2004182890A Polylmer compound for photoresist, and resin composition for photoresist 审中-公开
公开(公告)号：JP2004182890A
公开(公告)日：2004-07-02
申请号：JP2002352528
申请日：2002-12-04
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： NISHIMURA MASAMICHI , KOYAMA YUTAKA , TSUTSUMI KIYOHARU
IPC分类号： C08F220/18 , C08F220/28 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a polymer compound for photoresist, which is excellent in acid elimination property when used for photoresist and exhibits a high etching resistance and adhesiveness to substrates and also has these properties in a good balance, and a resin composition for photoresist containing the polymer compound for photoresist.
SOLUTION: The polymer compound for photoresist comprises (A) a monomer unit represented by formula(I) and (B) a monomer unit corresponding to a (meth)acrylic acid ester whose oxygen atom constructing the ester bond is combined with a group containing a lactone ring. The above-mentioned polymer compound for photoresist can also contain (C) a monomer unit corresponding to a (meth)acrylic acid ester whose oxygen atom constructing the ester bond is combined with an alicyclic hydrocarbon group having a polar substituent group. However, in formula(I), R represents a hydrogen atom or methyl group, R
x and R
y are same or different and each represent a 1-10C alkyl group.
COPYRIGHT: (C)2004,JPO&NCIPI

7. 发明专利

JP2010150447A Lactone skeleton-containing monomer, polymeric compound and photoresist composition 审中-公开
标题翻译：含骨架单体，聚合物和光电组合物
公开(公告)号：JP2010150447A
公开(公告)日：2010-07-08
申请号：JP2008331893
申请日：2008-12-26
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , TANAKA HIROMI
IPC分类号： C08F20/28 , C07D307/00 , C07D307/33 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a new lactone skeleton-containing monomer useful as a monomer component or the like of a highly functional polymer or the like which, when applied to a resist resin or the like, is excellent in solubility in an organic solvent, while retaining stability such as chemical resistance, and which can improve hydrolyzability and/or solubility in water after hydrolysis.
SOLUTION: The lactone skeleton-containing monomer is represented by formula (1), wherein R
a denotes H, halogen or 1-6C alkyl which may have a substituent; R
1 denotes a group having a lactone skeleton; and Y denotes a 1-6C divalent organic group.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：待解决的问题：提供一种新的含内酯骨架的单体，其可用作高功能性聚合物等的单体组分等，当应用于抗蚀剂树脂等时，其溶解度优异有机溶剂，同时保持诸如耐化学性的稳定性，并且其可以在水解后改善水解性和/或在水中的溶解度。解决方案：含内酯骨架的单体由式（1）表示，其中R a 表示H，可以具有取代基的卤素或1-6C烷基; R 1 表示具有内酯骨架的基团; Y表示1〜6元的二价有机基团。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2008274070A Polymerizable monomer and polymer compound, having fluorine atom-containing hemiacetal ester structure 有权
标题翻译：可聚合单体和聚合物化合物，具有含氟原子的乙酸酯结构
公开(公告)号：JP2008274070A
公开(公告)日：2008-11-13
申请号：JP2007118345
申请日：2007-04-27
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , TERANISHI TADASHI
IPC分类号： C08F220/28 , C07C69/54 , C08F220/22
摘要： PROBLEM TO BE SOLVED: To provide a polymerizable monomer for photoresist. SOLUTION: A polymerizable monomer represented by formula (1) [wherein, R a is H or methyl; and R b is an aliphatic or alicyclic hydrocarbon group substituted with a fluorine atom, or a group comprising a plurality of aliphatic or alicyclic hydrocarbon groups (at least one is an aliphatic or alicyclic hydrocarbon group substituted with a fluorine atom) bonded through a coupler containing a hetero atom] is provided. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供光致抗蚀剂的可聚合单体。解决方案：由式（1）表示的可聚合单体[其中，R SP = H或甲基; 并且R b 是被氟原子取代的脂肪族或脂环族烃基，或包含多个脂肪族或脂环族烃基的基团（至少一个是被氟取代的脂肪族或脂环族烃基原子）通过包含杂原子的成色剂结合]。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2007284535A Polymer and antireflection film-forming composition using the same 审中-公开
标题翻译：聚合物和抗反射膜成膜组合物
公开(公告)号：JP2007284535A
公开(公告)日：2007-11-01
申请号：JP2006112392
申请日：2006-04-14
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： OKUMURA ARIMICHI , KOYAMA YUTAKA
IPC分类号： C08F20/28 , G03F7/11 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an antireflection film-forming composition which effectively prevents reflection and furthermore can inhibit pattern collapse when a photoresist is developed and dissolved in using various irradiation lights such as far ultraviolet rays such as a KrF excimer laser and an ArF excimer laser, X-rays such as synchrotron radiation, and a charged particle beam such as an electron beam in micro fabrication, and is used in forming an antireflection film having improved adhesion to the photoresist, and a polymer which can be utilized in the composition. SOLUTION: This antireflection film-forming polymer has at least one monomer unit represented by formula (1). COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种有效地防止反射的抗反射膜形成组合物，并且当光致抗蚀剂显影并溶解时可以抑制图案塌陷，使用诸如KrF准分子激光器等远紫外线的各种照射光， ArF准分子激光器，诸如同步加速器辐射的X射线和微加工中的电子束等带电粒子束，并且用于形成具有改善的与光致抗蚀剂的粘附性的抗反射膜，以及可用于组成。该防反射膜形成用聚合物具有至少一个由式（1）表示的单体单元。版权所有（C）2008，JPO＆INPIT

10. 发明专利

JP2005054162A Fluorine atom-containing polymerizable unsaturated monomer, fluorine atom-containing polymer and resin composition for photoresist 有权
标题翻译：含荧光原子聚合的不饱和单体，含氟聚合物和光致抗蚀剂树脂组合物
公开(公告)号：JP2005054162A
公开(公告)日：2005-03-03
申请号：JP2003322602
申请日：2003-09-16
申请人： Daicel Chem Ind Ltd , ダイセル化学工業株式会社
发明人： KOYAMA YUTAKA , TSUTSUMI KIYOHARU
IPC分类号： C07C67/03 , C07C69/013 , C07C69/54 , C08F20/22 , C08F220/18 , C08F220/22 , G03F7/004 , G03F7/039
CPC分类号： C08F20/22 , G03F7/0046 , G03F7/0397
摘要： PROBLEM TO BE SOLVED: To provide a new fluorine-containing polymerizable unsaturated monomer useful for obtaining a polymer having high transparency to a light of a wavelength not more than 300 nm, especially of vacuum ultraviolet light such as F 2 excimer laser (157 nm) etc. SOLUTION: The fluorine-containing polymerizable unsaturated monomer is represented by formula (1a) or (1b), wherein rings Z 1 and Z 2 show each an alicyclic carbon ring; R 1 , R 2 and R 3 show each an alkyl group or a fluoroalkyl group; W shows a single bond or a linking group; R shows a specified unsaturated acyl group; provided that, in formula (1a), at least one of R 1 and R 2 etc., is a fluorine atom or a fluoroalkyl group and, in formula (1b), (i) a fluorine atom or a fluoroalkyl group is bound with the ring Z 2 or (ii) R 3 is a fluoroalkyl group. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种新的含氟聚合性不饱和单体，其可用于获得对波长不大于300nm的光，特别是真空紫外光如F 2具有高透明度的聚合物准分子激光器（157nm）等。解决方案：含氟可聚不饱和单体由式（1a）或（1b）表示，其中环Z 1 SP> 2 显示每个脂环碳环; R 1 ，R 2 和R 3 分别表示烷基或氟代烷基; W表示单键或连接基团; R表示特定的不饱和酰基; 条件是在式（1a）中，R 1和R 2中的至少一个是氟原子或氟代烷基，而在式（1b）中，，（i）氟原子或氟烷基与环Z 2结合，或（ii）R 3是氟烷基。版权所有（C）2005，JPO＆NCIPI

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