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    • 123. 发明专利
    • Nitride semiconductor surface emitting laser and manufacturing method of the same
    • 氮化物半导体表面发射激光及其制造方法
    • JP2014112654A
    • 2014-06-19
    • JP2013209355
    • 2013-10-04
    • Canon Incキヤノン株式会社
    • KAWASHIMA TAKESHI
    • H01S5/183H01L21/205H01S5/323
    • H01S5/18358B82Y20/00H01S5/18308H01S5/18341H01S5/18369H01S5/18383H01S5/3063H01S5/34333H01S2301/173
    • PROBLEM TO BE SOLVED: To provide a nitride semiconductor surface emitting laser which can inhibit a memory effect occurring when an intermediate layer is Mg doped and which can inhibit decrease in luminous efficiency.SOLUTION: A surface emitting laser in which a plurality of nitride semiconductor layers including a lower reflector 102, a plurality of active layers 104 for generating gains by current injection and an upper reflector 107 are stacked on a substrate 101 comprises an n-type spacer layer 103 formed between the lower reflector and the active layer closest to the lower reflector among the plurality of active layers; a p-type space layer 106 formed between the upper reflector and the active layer closest to the upper reflector among the plurality of active layers; and intermediate layers 105 each arranged between the plurality of active layers. The intermediate layer includes at least an Mg-doped layer 105a containing Mg and an In-containing nitride semiconductor layer 105b, in which the Mg-doped layer and the In-containing nitride semiconductor layer are stacked in this order from the substrate side.
    • 要解决的问题:提供一种氮化物半导体表面发射激光器,其可以抑制当中间层是Mg掺杂时发生的记忆效应,并且可以抑制发光效率的降低。解决方案:一种表面发射激光器,其中多个氮化物半导体层 包括下反射器102,用于通过电流注入产生增益的多个有源层104和堆叠在基板101上的上反射器107包括形成在下反射器和最靠近下反射器的有源层之间的n型间隔层103 多个有源层中的反射器; 形成在所述多个有源层中的上反射体和最靠近上反射体的有源层之间的p型空间层106; 以及每个布置在多个有源层之间的中间层105。 中间层至少包含含有Mg和含In的氮化物半导体层105b的Mg掺杂层105a,其中从衬底侧依次层叠Mg掺杂层和含In氮化物半导体层。
    • 127. 发明专利
    • Semiconductor laminate and surface emitting laser element
    • 半导体层压板和表面发射激光元件
    • JP2013219323A
    • 2013-10-24
    • JP2013006259
    • 2013-01-17
    • Ricoh Co Ltd株式会社リコー
    • HARA TAKASHI
    • H01S5/183
    • H01S5/343H01S5/041H01S5/14H01S5/18358H01S5/18383H01S5/2009H01S5/3202H01S5/3406H01S5/3407H01S5/34313H01S5/34326H01S5/3434H01S5/34373
    • PROBLEM TO BE SOLVED: To provide a semiconductor laminate which has a high carrier confinement effect, an excellent heat radiation characteristic and a high gain.SOLUTION: A semiconductor laminate comprises: a semiconductor DBR formed on a substrate; and a resonator layer which is formed on the semiconductor DBR and includes wideband semiconductor layers and active layers which are alternately laminated one by one. The active layer includes an MQW layer and a two-layer spacer layers formed on both surfaces of the MQW layer. The MQW layer includes barrier layers and quantum well layers which are alternately laminated one by one. When assuming that n layers of wideband gap layers are formed, a band gap of the m-th wideband semiconductor layer from the substrate side is Eg, and a band gap of the (m-1)-th wideband semiconductor layer from the substrate side among the wideband semiconductor layers is Eg, and numerals n and m are integers of 2 or more and 1
    • 要解决的问题:提供具有高载流子限制效应,优异的散热特性和高增益的半导体层叠体。解决方案:半导体层叠体包括:形成在基板上的半导体DBR; 以及谐振器层,其形成在半导体DBR上,并且包括逐个交替层叠的宽带半导体层和有源层。 有源层包括形成在MQW层的两个表面上的MQW层和两层隔离层。 MQW层包括交替叠层的势垒层和量子阱层。 当假设形成n层宽带间隙层时,第m宽带半导体层与衬底侧的带隙为Eg,并且第(m-1)个宽带半导体层与衬底侧的带隙 在宽带半导体层之中,Eg,数字n和m是2以上且1