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    • 1. 发明专利
    • ELECTRON BEAM DEVICE
    • JPH01143128A
    • 1989-06-05
    • JP29950087
    • 1987-11-27
    • JEOL LTD
    • KUDOU MASATOOTSU IKUZO
    • H01J37/147G01N23/22H01J37/22H01J37/244
    • PURPOSE:To perform electron beam scanning in an electron beam scanning region with no irregularity by making the X-direction scanning signal and the Y-direction scanning signal asynchronous and repeatedly scanning a sample when the average analysis mode is selected. CONSTITUTION:When the analysis mode to obtain the average information is specified, a switch S1 and a switch S2 are first connected to the contact (b) side, and the connection between a Y-direction scanning signal generator 4y and a synchronization circuit 7 is cut off. The scanning signal generated by the Y-direction scanning signal generator 4y and the scanning signal generated by an X-direction scanning signal generator 4x are fed to deflectors 2x and 2y in the asynchronous state. When the X-direction scanning signal and the Y-direction scanning signal are in the asynchronous state, the loci of the scanned electron beams are not overlapped even if the scanning is repeated, and the region on the sample surface can be scanned with no irregularity.
    • 2. 发明专利
    • ANALYSER USING CHARGED PARTICLE BEAM
    • JPS62184753A
    • 1987-08-13
    • JP2552686
    • 1986-02-07
    • JEOL LTD
    • KUDOU MASATOOTSU YUZONAGASAWA YUJI
    • H01J37/147H01J37/252
    • PURPOSE:To shorten time of etching by ion beams both to shorten analysis time and to simplify analysis operation, by changing an ion beams-scanning direction in accordance with a sample-inclined angle so that horizontal and vertical scanning directions on a sample plane become unchangeable. CONSTITUTION:A sample-inclined angle theta is inputted from a key board 19, an operational controller 18 actuates a sample stage 16 through a driven circuit 17 to incline the sample 4 by theta. Then, the operational controller 18 computes a ratio R of deflection amount in accordance with the inclined angle theta. While the result is outputted to a D/A converter 20, a signal of constant ratio value is sent to a D/A converter 21. The analog signal converted here is supplied into multipliers 10 and 11, to multiply output signals of the D/A converters 20 and 21 by respectively a X-axis scanning signal and a Y-axis scanning one. Therefore, an amplitude of the X-axis scanning signal is regulated in accordance with the inclined angle theta. These X and Y-axis scanning signals are respectively added to X and Y-axis scanning signals at adders 12 and 13, and supplied into a deflector 3 through respective inverter circuits 14 and 15.
    • 3. 发明专利
    • Surface analyzer
    • 表面分析仪
    • JP2005181175A
    • 2005-07-07
    • JP2003424323
    • 2003-12-22
    • Jeol Ltd日本電子株式会社
    • KUDOU MASATOKATO MAKOTO
    • G01N23/227H01J37/147H01J37/153
    • PROBLEM TO BE SOLVED: To provide a surface analyzer capable of preventing an orbit of a primary electron beam from being deflected by a leakage electric field from an input lens, free of mesh disturbing the advancing path of a secondary electron beam between the input lens and a sample, and capable of high precision analysis of micro areas of the sample.
      SOLUTION: This surface analyzer is provided with a primary beam irradiation means for irradiating the sample with the primary beam, an input lens for collecting secondary charged particles generated from the sample, a spectroscopic means for spectrally separating the secondary charged particles collected by the input lens, and a primary beam correction means for correcting the influence imparted to the primary beam by the input lens.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种能够防止一次电子束的轨道被来自输入透镜的泄漏电场偏转的表面分析器,没有网扰动二次电子束的行进路径 输入透镜和样品,并能够对样品的微小区域进行高精度分析。 解决方案:该表面分析仪设置有用于用一次光束照射样品的一次射线照射装置,用于收集从样品产生的二次带电粒子的输入透镜,用于光谱分离由 输入透镜和用于校正由输入透镜赋予主光束的影响的主光束校正装置。 版权所有(C)2005,JPO&NCIPI
    • 5. 发明专利
    • AUGER ELECTRON SPECTROSCOPIC DEVICE
    • JPH03176649A
    • 1991-07-31
    • JP31594889
    • 1989-12-05
    • JEOL LTD
    • KUDOU MASATO
    • G01N23/227
    • PURPOSE:To prevent the influence of electrification by irradiation with ions by irradiating a sample holder with an electron beam and generating the secon dary electron beam to neutralize the electrification of an insulating sample at the time of etching by the irradiation with the ions. CONSTITUTION:The electron beam E1 generated from an electron beam project ing system 5 is projected to the position to be analyzed on the insulating sample 3 by the control of a computer 14 and the generated auger electrons are ana lyzed by an auger electron spectroscopic system 11 and, therefore, the analysis of the extreme surface of the sample is executed. The electron beam E2 generat ed from the electron beam projecting system 5 projects a secondary electron releasing member 4 fixed to the insulating edge part on a sample holder 2. Since ions I are generated from an ion generating means 12 and project the surface of the sample 3, the sample surface is etched. A large quantity of the secondary electrons are released from the member 4 by the irradiation with the electron beam E2 at the time of this etching and, therefore, the electrification of the sample 3 by the ions is prevented.
    • 6. 发明专利
    • ELECTRONIC SPECTROGRAPH
    • JP2002340827A
    • 2002-11-27
    • JP2001140818
    • 2001-05-11
    • JEOL LTD
    • KUDOU MASATO
    • G01N23/227
    • PROBLEM TO BE SOLVED: To provide an electronic spectrograph for mapping analysis capable of simplifying an analysis over the whole and capable of remarkably shortening the time to be required for the analysis. SOLUTION: This electronic spectrograph is formed of an electronic spectroscope for energy disperse of the electron emitted from a sample, several detectors for detecting intensity of the electron dispersed by the spectroscope, a means for obtaining single spectral for the element composition analysis by correcting and adding a displacement of each detected real data obtained by the several detectors and for obtaining the addition spectral by simply adding the detected real data obtained by each detector, and a means for performing the mapping analysis of the element distribution of the sample on the basis of the simple addition spectral. With this structure, a necessity of separately providing a simple addition spectral between the spectral analysis for the element composition analysis and the mapping analysis of the element distribution is eliminated to shorten the time for analysis.
    • 8. 发明专利
    • ANALYZER FOR ELECTRONIC ENERGY
    • JPH0772102A
    • 1995-03-17
    • JP21998993
    • 1993-09-03
    • JEOL LTD
    • KUDOU MASATOSEKINE SATORUMURAKAMI KOJI
    • G01N23/225H01J49/02H01J49/44H01J49/48
    • PURPOSE:To make it possible to freely set an increment of sweep energy, and to accurately improve the sensitivity of analysis, by providing a plurality of detectors and by carrying out interpolation calculation at each energy value on the basis of detected electronic strength data. CONSTITUTION:A sample 1 is irradiated with an electron beam and X-ray, and electrons 2 of Auger electrons and photo-electrons are emitted. Electrons 2 are decelerated and converged by an input lens 3, and made incident on an incident slit 4 of a semi-spherical analyzer 5. The analyzer 5 is equipped with an internal ball 6 and external ball 7. On a focal plane, a plurality of detectors 8 are juxtaposed. A microprocessor 9 for controlling potentials, etc., of several components 3-8 and also for carrying out data processing is provided. The electrons 2 passed through the slit 4 receive the action of an electrostatic field applied to the internal ball 6 and the external ball 7, while making energy dispersion arrive at the focal plane, and detect strength data. By carrying out the interpolation calculation of the electron strength data from the several detectors 8, the setting of a sweep energy increment can be freely carried out.
    • 9. 发明专利
    • JPH05290778A
    • 1993-11-05
    • JP8217192
    • 1992-04-03
    • JEOL LTD
    • MATSUMOTO SHIGEOKUDOU MASATO
    • H01J37/18H01J37/20H01J49/04H01J49/24
    • PURPOSE:To provide the ultra-high-vacuum corresponding analyzing device, which can easily change the two-chamber structure type and the three-chamber structure type with a sequence of the same control system. CONSTITUTION:Flanges 7, 8 for connecting vacuum exhaust systems of sample exchange chambers 2, 3 are formed at the same dimension, and vacuum exhaust systems 4, 5, V2, TMP 1, RP 1 of the sample exchange chamber 3 for leading the sample under the atmospheric condition are formed integrally and moved in response to the judgement that the sample exchange chamber 2 as a spare chamber is provided or not. A control means of the vacuum exhaust system has a judgement step for judging that the sample exchange chamber 2 as a spare chamber exists or not at the time of moving the sample from the sample exchange chamber 3 to a measurement chamber 1, and a first step for operating the movement of the sample to the measurement chamber through the spare chamber, and a second step for operating the direct movement of the sample to the measurement chamber, and either of the first step and the second step is selected in response to a result of the judgement step.
    • 10. 发明专利
    • SAMPLE DEVICE FOR LOCAL SURFACE ANALYZER
    • JPS6251143A
    • 1987-03-05
    • JP18879185
    • 1985-08-28
    • JEOL LTD
    • SEKINE SATORUKUDOU MASATOKAMIMURA EISUKE
    • G01N23/22H01J37/20H01J37/252
    • PURPOSE:To move a sample without changing the position of irradiation of a beam, by coupling a carrousel-like sample rest to a driver for which the quantity of the movement on the sample mounting surface of the rest is calculated into that of equivalent movement of a sample moving unit so as to be applied to the driver. CONSTITUTION:A carrousel-like sample rest 1 is shaped as a polygonal truncated pyramid to mount samples on the plurality of oblique mounting surfaces of the rest. The rest 1 is fitted to a sample moving unit 14 so that the rest is moved in directions x, y, z and rotated. The rest 1 and the unit 14 are housed in an analysis chamber to constitute a local surface analyzer. The quantities of movement of the mounting surface in the directions x', z' are computed into those of equivalent movement of the sample moving unit 14 in the directions x, z by a vector calculator 29. The quantities of the equivalent movement are applied to drivers 17, 19 through controllers 25, 27. The sample is thus moved within the area of the sample mounting surface without changing the position of irradiation of a beam, so that the operating property of the analyzer is improved.