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1. 发明专利

JP2008251557A Ion beam processing device 有权
标题翻译：离子束加工装置
公开(公告)号：JP2008251557A
公开(公告)日：2008-10-16
申请号：JP2008188040
申请日：2008-07-22
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： MUTO HIROYUKI , ISHITANI TORU , ONISHI TAKESHI , UMEMURA KAORU
IPC分类号： H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide an ion beam processing device in which height information is conveyed to an operator when one or a plurality of specific positions within a beam scanning region is/are shifted and adjusted to a required height and a work efficiency in a height adjustment can be improved.
SOLUTION: The ion beam processing device is provided with a lens power source in which a lens strength of an ion beam irradiating means is adjusted and focused to one or a plurality of specific positions within a beam scanning region and a display means which calculates a focus height of the specific position based on the lens strengths and displays at least one or more information out of information such as a focus height of the specific positions, a relative height between the specific positions, a judgement result whether or not the focus height or the relative height is within a predetermined value including an allowable tolerance.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种离子束处理装置，其中在光束扫描区域内的一个或多个特定位置被移位并调整到所需高度和工作时，高度信息被传送到操作者可以提高高度调整的效率。解决方案：离子束处理装置设置有透镜电源，其中离子束照射装置的透镜强度被调整并聚焦到光束扫描区域内的一个或多个特定位置和显示装置，基于透镜强度计算特定位置的焦点高度，并且显示诸如特定位置的焦点高度，特定位置之间的相对高度，无论焦点的判断结果的信息中的至少一个或多个信息高度或相对高度在包括容许公差的预定值内。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2001084947A ION BEAM PROCESSING APPARATUS 失效
公开(公告)号：JP2001084947A
公开(公告)日：2001-03-30
申请号：JP25840199
申请日：1999-09-13
申请人： HITACHI LTD
发明人： MUTO HIROYUKI , ISHITANI TORU , ONISHI TAKESHI , UMEMURA KAORU
IPC分类号： H01J37/20 , H01J37/30 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To perform height adjustment by an operator with high efficiency and durability by calculating the focused position in a specific part from lens strength and displaying information of the focused position in the specific part, a relative position, and a determined result whether the focused position or the relative position is within a set value. SOLUTION: Lens voltage of an objective lens when ion beam is focused on a sample is read, and the height of the sample is calculated automatically. The number 'one' 17a of a height display bar 17 is displayed to a Z-axis scale 19 at a position corresponding to the height of the sample, and the calculated value of the height is displayed in the number 'one' 18a column in a section to display the height. The lens voltage of the objective lens at the time, when ion beam is focused on a tip of a probe is read and a height of the tip of he probe is calculated. The number two 17b of the height display bar 17 is displayed to the Z-axis scale 19 at a position corresponding to the height of the tip of the probe, and the calculated value of the height of the tip of the probe is displayed in the number 'two' 18b column in the section to display the height. A relative height of the position number one and the position number 'two' is displayed in a section to display the relative height 20.

3. 发明专利

JPH11219680A CONVERGED ION BEAM MACHINING METHOD 失效
公开(公告)号：JPH11219680A
公开(公告)日：1999-08-10
申请号：JP2173598
申请日：1998-02-03
申请人： HITACHI LTD
发明人： ISHITANI TORU , ONISHI TAKESHI , IWATA KOJI
IPC分类号： H01J37/22 , H01J37/31 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To satisfy required high machining position accuracy by setting a machining region with a sample display image capable of changing the image magnifying power ratio between the X direction and Y direction of the image on a display. SOLUTION: A sample is guided into the sample chamber of a focused ion beam(FIB) device, and an image of a low-magnifying power scanning ion microscope(SIM) is acquired. A sample stage is moved and rotated so that four sides of rectangular patterns (a), (b), (d), (e) are made nearly parallel with the X-axis and Y-axis of the SIM image, a SIM image is acquired again, then the drift of the rotation angle θis corrected. The magnifying power ratio (m) between the X direction and Y direction is kept at 1, the image magnifying power is increased four times, a SIM image with m=4 is acquired, then the pattern (d) is obtained. Even when a machining region setting mark and a machining region are separated and they are not included in the visual field of the high-magnifying power SIM image, the magnifying power in the Y direction only is reduced to 1/4 times, thus the opposite end sections of the patterns (b), (d), (e) are included in the same visual field, and the set position accuracy in the X direction is made four times the accuracy in the Y direction in the machining region (f).

4. 发明专利

JPH0992196A SCANNING ION MICROSCOPE 失效
公开(公告)号：JPH0992196A
公开(公告)日：1997-04-04
申请号：JP24907495
申请日：1995-09-27
申请人： HITACHI LTD
发明人： ONISHI TAKESHI , ISHITANI TORU
IPC分类号： H01J37/22 , H01J37/147 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To obtain a scan ion microscopy image with its less regent damage, better operationality and high time efficiency. SOLUTION: An ion is thinly focused and scanned on a regent, and an observation image is formed by means of a secondary particulate signal emitted from the regent. A scan speed variable function and an image multiplication function are so provided that a scan ending method can be selected from among forcible scan cancellation when frame scanning is on its way or scan cancellation at the point of time when a frame being scanned is ended.

5. 发明专利

JPH0757678A SAMPLE OBSERVING DEVICE 失效
公开(公告)号：JPH0757678A
公开(公告)日：1995-03-03
申请号：JP19581393
申请日：1993-08-06
申请人： HITACHI LTD
发明人： SATO HITOMI , ONISHI TAKESHI , ISHITANI TORU
IPC分类号： H01J37/06 , H01J37/08 , H01J37/15 , H01J37/22
摘要： PURPOSE:To increase speed and efficiency in positioning a charged corpuscular beam source by displaying deviation of the charged corpuscular beam source as a map on two-dimensional (x and y) coordinates of a display. CONSTITUTION:A charged corpuscular beam emitted from a charged corpuscular beam source 1 is focused/deflected by electrostatic lenses 2a and 2b and electrostatic deflecting systems 3a and 3b, and is radiated to an optional position on a sample 5. Next, a secondary electron or a secondary ion emitted from the sample 5 is detected by a secondary electron detector 4, and is displayed on a display 307 as a secondary electron image according to a secondary electron signal 104. A position of the charged corpuscular beam source 1 is detected by a detecting mechanism 102 by using a potentiometer, and the value is read in a computer 308, and is displayed as a map on (x and y) coordinates of the display 307 Optical axis adjustment control is carried out on the position of the charged corpuscular beam source 1 according to an image screen of the computer by a charged corpuscular beam source position driving mechanism 103 or manual operation.

6. 发明专利

JPH0729539A FOCUSED ION BEAM DEVICE 失效
公开(公告)号：JPH0729539A
公开(公告)日：1995-01-31
申请号：JP19187193
申请日：1993-07-07
申请人： HITACHI LTD
发明人： ONISHI TAKESHI , ISHITANI TORU
IPC分类号： H01J37/256 , B23K15/08 , G01Q90/00 , H01J37/22 , H01J37/252 , H01J37/30
摘要： PURPOSE:To observe a grain at low cost with excellent resolution by dividing an observation object area imaginarily into plural small areas, and radiating a surface working beam and an observing beam at time series time. CONSTITUTION:An observation object area is divided imaginarily into prescribed spaces, and these are made to correspond to respective addresses of an image memory in the separately designated enlargement ratio. Deflecting points of positions 1(1st) to 9(9th) are defined so that beam spots are superposed half by half upon each other with a beam deflecting point (a position 5) corresponding to an address of the image memory as its center, and radiation is carried out in order. Thereby, a surface oxide film in the vicinity of respective beam deflcting points corresponding to the addresses can be removed. When the radiation of FIB to the positions 1 to 9 is completed, the FIB (for collecting data) is radiated (10th) to a deflecting point (a position 5 of surface work) corresponding to the address, and a generating secondary electron is detected, and is written in the image memory. By constituting in this way, a beam distributing weakly outside of a beam diameter is radiated to an oxide film on a sample, and the secondary electron is not emitted, so that the quality of an SIM image is not deteriorated.

7. 发明专利

JPH06123469A OPERATION CONTROLLER FOR DEHUMIDIFYING UNIT WITH AIR CONDITIONING AND VENTILATING FUNCTION 失效
公开(公告)号：JPH06123469A
公开(公告)日：1994-05-06
申请号：JP27047792
申请日：1992-10-08
申请人： HITACHI LTD , TOHOKU ELECTRIC POWER CO
发明人： ONISHI TAKESHI , SHINDO YASUHIRO , ISHIZUKA TAKAHISA , ISHIKAWA YASUO , SATO AKIO , TSUSHIMA MASAAKI
IPC分类号： F24F11/02
摘要： PURPOSE:To give the highest priority to ventilation at a fully automatic mode or an automatic mode. CONSTITUTION:During dehumidification or circulation at a fully automatic mode or an automatic mode, a dirt sensor 44 arranged in the vicinity of an indoor suction port 7 always detects whether inside air in a room 14 is dirty or not, and whenever the fully automatic mode or the automatic mode is started or when the air in the room 14 is detected to be dirty by the dirt sensor 44, ventilation is started without fail. When the ventilation is started, a first air passage is formed from outdoor, through a suction duct 4, an air conditioning ventilation element 63, a heat exchanger 52 and an indoor diffusing fan 59, up to the inside of the room 14, and also a second air passage is formed from the inside of the room 14, through an air conditioning ventilation element 63, a heat exchanger 54, an outdoor diffusing fan 60 and a diffusing duct 5 up to the outdoor. Thus, fresh air is suctioned from the outdoor into the indoor, so that dirty air is discharged out of the room 14 to the outdoor. At the time of cooling in the summertime and heating in the wintertime, the heat exchangers 52 and 54 of a freezing cicle are operated additionally.

8. 发明专利

JPH0552721A SAMPLE SEPARATING METHOD AND METHOD FOR ANALYZING SEPARATED SAMPLE OBTAINED BY THE SEPARATING METHOD 失效
公开(公告)号：JPH0552721A
公开(公告)日：1993-03-02
申请号：JP21080391
申请日：1991-08-22
申请人： HITACHI LTD
发明人： ONISHI TAKESHI , ISHITANI TORU
IPC分类号： G01N1/28 , G01N23/22 , H01J37/20 , H01J37/305 , H01J37/31
摘要： PURPOSE:To shorten the time of analysis by performing focused-ion-beam (FIB) machining on the surface of a sample substrate at least at two kinds of angles, mechanically connecting the sample of analyzing part to a probe which is introduced from the outside, taking out only the analyzing part, and performing the analysis from the arbitrary direction. CONSTITUTION:An FIB 1 is orthgonally cast on the surface of a sample 2 and run in a rectangular pattern. A square hole 3 having the specified depth is formed in the surface of the sample 2. Then, the sample 2 is inclined, and a bottom hole 4 is formed. The sample 2 is set so that the sample is orthogonal to the FIB 1 again, and a cut groove 5 is formed. Then, the tip of a probe 31 is brought into contact with the separating part of the sample 2. Thereafter, gas 7 is supplied through a gas nozzle 6. The FIB 1 is locally case on the region including the tip part of the probe 31, and a volume film 8 is formed. Then, a separated material 9 is cut out of the sample 2 with the FIB 1. The separated sample 9 which in held with the probe 31 can be inserted into various kinds of analyzing devices differently with respect to the sample 2, and the separated sample 9 can be measured.

9. 发明专利

JPH04353327A AIR-CONDITIONING DEVICE WITH VENTILATING FUNCTION 失效
公开(公告)号：JPH04353327A
公开(公告)日：1992-12-08
申请号：JP15382591
申请日：1991-05-30
申请人： HITACHI LTD , TOHOKU ELECTRIC POWER CO
发明人： ONISHI TAKESHI , SHINDO YASUHIRO , KIKUCHI MASAYUKI , MINAMI KAZUNARI , HATANO ISAMU , ISHIKAWA YASUO , SATO AKIO , TSUSHIMA MASAAKI
IPC分类号： F24F1/02
摘要： PURPOSE:To facilitate air-conditioning which is combined with a freezing cycle and performs automatic control as the efficiency of temperature exchange is always kept at 100% so that not only ventilation is solely effected but also disturbance is prevented from being exerted on indoor hot heat environment in the situation wherein the degree of secrecy and heat insulation of a housing is increased. CONSTITUTION:During cooling operation in a summer season, air at the exterior 1 of a room is fed through an air-conditioning ventilating element 8, a cooler 11 located therebehind, an indoor discharge blower 13, and an indoor discharge 22. Air from the interior 2 of a room is heat-exchanged through the air-conditioning ventilating element 8, a reheater 12 located therebehind, an outdoor discharge blower 16, and an outdoor discharge port 5 and discharged to the exterior 1 of a room. During heating operation in a winter season, the cooler 11 and the reheater 12 are switched by means of a four-way valve to perform air-conditioning ventilation operation. Heat exchange during dehumidifying operation is effected in a similar manner described in that during cooling in a summer season and is carried out in a state that dehumidifying switching dampers 26a and 26b are changed over and the outdoor discharge port 5 and an outdoor suction port 4 are closed.

10. 发明专利

JPH04111338A MANUFACTURE OF DEVICE USING DEVICE BLANKING INSPECTION MONITORING METHOD 失效
公开(公告)号：JPH04111338A
公开(公告)日：1992-04-13
申请号：JP22812590
申请日：1990-08-31
申请人： HITACHI LTD
发明人： ISHITANI TORU , ONISHI TAKESHI , OKURA OSAMU
IPC分类号： H01J37/31 , H01L21/66
摘要： PURPOSE:To reduce the number of substrates used for inspection monitor so as to reduce the cost per device when devices are manufactured through various processes by processing a plurality of substrates as one lot by selecting at least one substrate for inspection monitor out from the plurality of substrates and performing inspection monitor by using unit devices blanked out from the substrate for inspection monitor at every kind of inspection monitor. CONSTITUTION:An FIB processing section 7 blanks out unit devices 2 and 3 from a substrate 1 for inspection monitor. When cross-sectional observation is required on the unit devices, the section 7 also produces necessary cross sections by using an FIB. Only the blanked out unit devices are carried to a SEM observing section by opening a gate valve 8. At the section 9 device manufacturing processes are monitored by observing and inspecting desired parts. When the unit devices are required to be returned to the substrate for inspection monitor, the devices are carried to the FIB processing section 7 where the unit devices are returned and fixed to the punched holes of the substrate for inspection monitor.

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