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1. 发明公开

EP3141953A2 APPARATUS AND METHOD FOR MAINTAINING IMMERSION FLUID IN THE GAP UNDER THE PROJECTION LENS DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE 无效
标题翻译： DEVICE AND METHOD FOR列浸没式光刻机浸液维护下的投影透镜晶圆交换期间
公开(公告)号：EP3141953A2
公开(公告)日：2017-03-15
申请号：EP16186292.5
申请日：2004-03-17
申请人： Nikon Corporation
发明人： Binnard, Michael
IPC分类号： G03B27/32 , G03B27/42 , G03B27/58 , G03F7/20 , G03B27/52
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70716 , G03F7/70725 , G03F7/70733
摘要： An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece (208) and a stage assembly (202) including a work piece table (204) configured to support the work piece (208) adjacent the optical assembly (16). An environmental system (26) is provided to supply and remove an immersion fluid (212) from a gap between the optical assembly (16) and the work piece (208) on the stage assembly (202). After exposure of the work piece (208) is complete, an exchange system (216) removes the work piece (208) and replaces it with a second work piece. An immersion fluid containment system (214) is provided to maintain the immersion liquid (212) in the gap during removal of the first work piece (208) and replacement with the second work piece.
摘要翻译：用于对工件（208）的在光刻机的交换期间维持浸没流体（212）在所述间隙相邻的投影透镜（16）的装置和方法（10）游离缺失盘。该装置和方法包括：在被配置成将图像投影到工件（208）和一个级组件（202）包括被配置为支持所述工件（208）邻近光学工件表（204）的光学组件（16）组件（16）。环境系统（26）被提供给供给和从所述光学组件（16）和在舞台上的组件（202）该工件（208）之间的间隙中移除到浸没流体（212）。工件（208）的曝光完成后，交换系统（216）移除所述工件（208）和与第二工件替换它。浸没流体容纳系统（214）被设置去除第一工件（208）和替换与第二工件的过程中保持在间隙中的浸没液体（212）。

2. 发明授权

EP2937893B1 EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：比利时广播电视台
公开(公告)号：EP2937893B1
公开(公告)日：2016-09-28
申请号：EP15165192.4
申请日：2004-06-11
申请人： Nikon Corporation
发明人： Owa, Soichi , Magome, Nobutaka , Hirukawa, Shigeru , Kudo, Yoshihiko , Inoue, Jiro , Kohno, Hirotaka , Nei, Masahiro , Imai, Motokatsu , Nagasaka, Hiroyuki , Shiraishi, Kenichi , Nishii, Yasufumi , Takaiwa, Hiroaki
IPC分类号： H01L21/027 , G03F7/20 , H01L21/02 , G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： In exposing substrate P by projecting an image of a pattern onto substrate P via projection optical system PL and liquid 1, side surface PB and underside surface PC of substrate P are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.
摘要翻译：通过经由投影光学系统PL和液体1将图案的图像投影到基板P上来曝光基板P，在基板P的侧表面PB和下表面PC上进行拒液处理。通过这样的结构，可以防止曝光在基板的边缘区域曝光的曝光方法，其中，可以防止在液浸区域形成良好并从液体流出到基板台外部的状态下进行曝光被提供。

3. 发明公开

EP2738792A2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
标题翻译： Belichtungsverfahren，Substratstufe，Belichtungsvorrichtung und Verfahren zur Herstellung einer Vorrichtung
公开(公告)号：EP2738792A2
公开(公告)日：2014-06-04
申请号：EP14150747.5
申请日：2004-06-11
申请人： Nikon Corporation
发明人： Owa, Soichi , Magome, Nobutaka , Hirukawa, Shigeru , Kudo, Yoshihiko , Inoue, Jiro , Kohno, Hirotaka , Nei, Masahiro , Imai, Motokatsu , Nagasaka, Hiroyuki , Shiraishi, Kenichi , Nishii, Yasufumi , Takaiwa, Hiroaki
IPC分类号： H01L21/027 , G03F7/20 , H01L21/02 , G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure method is proposed for exposing a substrate P by projecting an image of a pattern onto the substrate P via a projection optical system and a liquid 1, whereby side surface PB and underside surface PC of the substrate P are provided with liquid-repellent treatment. By such a configuration, during exposure of edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage is prevented.
摘要翻译：提出了通过投影光学系统和液体1将图案的图像投影到基板P上来曝光基板P的曝光方法，由此基板P的侧表面PB和下表面PC设置有拒液处理。通过这样的结构，在曝光基板的边缘区域的同时，可以在形成液浸区域并且从液体流出到基板载台外部的状态下进行曝光。

4. 发明公开

EP2613194A2 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine 有权
标题翻译：用于在浸没式光刻机中在晶片交换期间将浸没流体保持在投影透镜下方的间隙中的设备和方法
公开(公告)号：EP2613194A2
公开(公告)日：2013-07-10
申请号：EP13154186.4
申请日：2004-03-17
申请人： Nikon Corporation
发明人： Binnard, Michael
IPC分类号： G03B27/32 , G03B27/42 , G03B27/58 , G03F7/20 , G03B27/52
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70716 , G03F7/70725 , G03F7/70733
摘要： An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece (208) and a stage assembly (202) including a work piece table (204) configured to support the work piece (208) adjacent the optical assembly (16). An environmental system (26) is provided to supply and remove an immersion fluid (212) from a gap between the optical assembly (16) and the work piece (208) on the stage assembly (202). After exposure of the work piece (208) is complete, an exchange system (216) removes the work piece (208) and replaces it with a second work piece. An immersion fluid containment system (214) is provided to maintain the immersion liquid (212) in the gap during removal of the first work piece (208) and replacement with the second work piece.
摘要翻译：公开了一种用于在光刻机器（10）中更换工件（208）期间将浸没流体（212）保持在邻近投影透镜（16）的间隙中的装置和方法。该设备和方法包括被配置成将图像投影到工件（208）上的光学组件（16）和包括工件台（204）的工作台组件（202），工件台（204）被配置为支撑与光学器件组件（16）。提供环境系统（26）以从台组件（202）上的光学组件（16）和工件（208）之间的间隙供应和移除浸没流体（212）。在工件（208）的暴露完成之后，交换系统（216）移除工件（208）并用第二工件替换它。提供浸没流体容纳系统（214）以在移除第一工件（208）和用第二工件替换期间将浸没液体（212）保持在间隙中。

5. 发明公开

EP2613193A2 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine 有权
标题翻译：装置和方法用于在浸没式光刻机晶片交换期间保持浸没流体在列的投影透镜下
公开(公告)号：EP2613193A2
公开(公告)日：2013-07-10
申请号：EP13154185.6
申请日：2004-03-17
申请人： Nikon Corporation
发明人： Binnard, Michael
IPC分类号： G03B27/32 , G03B27/42 , G03B27/58 , G03F7/20 , G03B27/52
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70716 , G03F7/70725 , G03F7/70733
摘要： An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece (208) and a stage assembly (202) including a work piece table (204) configured to support the work piece (208) adjacent the optical assembly (16). An environmental system (26) is provided to supply and remove an immersion fluid (212) from a gap between the optical assembly (16) and the work piece (208) on the stage assembly (202). After exposure of the work piece (208) is complete, an exchange system (216) removes the work piece (208) and replaces it with a second work piece. An immersion fluid containment system (214) is provided to maintain the immersion liquid (212) in the gap during removal of the first work piece (208) and replacement with the second work piece.
摘要翻译：用于对工件（208）的在光刻机的交换期间维持浸没流体（212）在所述间隙相邻的投影透镜（16）的装置和方法（10）游离缺失盘。该装置和方法包括：在被配置成将图像投影到工件（208）和一个级组件（202）包括被配置为支持所述工件（208）邻近光学工件表（204）的光学组件（16）组件（16）。环境系统（26）被提供给供给和从所述光学组件（16）和在舞台上的组件（202）该工件（208）之间的间隙中移除到浸没流体（212）。工件（208）的曝光完成后，交换系统（216）移除所述工件（208）和与第二工件替换它。浸没流体容纳系统（214）被设置去除第一工件（208）和替换与第二工件的过程中保持在间隙中的浸没液体（212）。

6. 发明授权

EP1616220B1 APPARATUS AND METHOD FOR MAINTAINING IMMERSION FLUID UNDER A LITHOGRAPHIC PROJECTION LENS 有权
标题翻译： DEVICE AND METHOD FOR浸液下光刻镜头保持在一起
公开(公告)号：EP1616220B1
公开(公告)日：2013-05-01
申请号：EP04721260.0
申请日：2004-03-17
申请人： NIKON CORPORATION
发明人： BINNARD, Michael
IPC分类号： G03B27/32 , G03B27/42 , G03B27/58 , G03F7/20
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70716 , G03F7/70725 , G03F7/70733
摘要： An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece (208) and a stage assembly (202) including a work piece table (204) configured to support the work piece (208) adjacent the optical assembly (16). An environmental system (26) is provided to supply and remove an immersion fluid (212) from a gap between the optical assembly (16) and the work piece (208) on the stage assembly (202). After exposure of the work piece (208) is complete, an exchange system (216) removes the work piece (208) and replaces it with a second work piece. An immersion fluid containment system (214) is provided to maintain the immersion liquid (212) in the gap during removal of the first work piece (208) and replacement with the second work piece.

7. 发明公开

EP2537304A1 SUBSTRATE SUPPORT STRUCTURE, CLAMP PREPARATION UNIT, AND LITHOGRAPHY SYSTEM 有权转让
标题翻译： AUFBAU EINESSUBSTRATTRÄGERS，EINHEIT ZUR HERSTELLUNG EINER KLAMMER UND LITHOGRAFIESYSTEM
公开(公告)号：EP2537304A1
公开(公告)日：2012-12-26
申请号：EP11704239.0
申请日：2011-02-18
申请人： Mapper Lithography IP B.V.
发明人： DE JONG, Hendrik Jan
IPC分类号： H04L21/00 , G03F7/00 , H01L21/67 , G03F7/20 , H01J37/317 , G03B27/58 , H01L21/687 , H01J37/20 , B82Y10/00
CPC分类号： H01L21/6875 , B82Y10/00 , B82Y40/00 , G03F7/707 , H01J37/3174 , H01L21/68757
摘要： A substrate support structure (13) for clamping a substrate (12) on a surface (16) by means of a capillary layer of a liquid (11). The surface has an outer edge (28) and includes one or more substrate supporting elements (17) for receiving the substrate to be clamped, wherein the one or more substrate supporting elements are arranged to provide support for the substrate at a plurality of support locations. The substrate support structure further includes a sealing structure (21) circumscribing the surface and having a top surface or edge (22, 24, 26) forming a sealing rim. A distance (c) between the outer edge of the surface and an outermost of the support locations is greater than a distance (d) between the outer edge and the sealing rim.
摘要翻译：一种用于通过液体的毛细管层将表面上的基板夹持的基板支撑结构。表面具有外边缘并且包括一个或多个用于接收要夹持的基板的基板支撑元件，其中所述一个或多个基板支撑元件布置成在多个支撑位置处为基板提供支撑。衬底支撑结构还包括限定表面的密封结构，并具有形成密封边缘的顶表面或边缘。表面的外边缘和支撑位置的最外侧之间的距离大于外边缘和密封边缘之间的距离。

8. 发明公开

EP2480933A1 LIMITING PLATE SHIFTING WITHIN A PLATE PALLET 审中-公开
标题翻译： LIMITED板移位导致摩擦片组
公开(公告)号：EP2480933A1
公开(公告)日：2012-08-01
申请号：EP10754829.9
申请日：2010-09-08
申请人： Eastman Kodak Company
发明人： SILVERMAN, Mark , KOROLIK, Pavel
IPC分类号： G03B27/58 , G03F7/00
CPC分类号： B65H9/18 , B65H2301/363 , B65H2301/42256 , B65H2402/62 , B65H2511/51 , B65H2701/1928 , B65H2220/01 , B65H2220/11
摘要： An apparatus for aligning and inserting a plate stack (112) into an automatic plate loader (100) in a predefined position. A plate pallet (116) carries the plate stack. A plate pallet adapter (128) adapted to carry the plate pallet, a centering element (236, 264) attached to the plate pallet adapter aligns the plate stack in a center position relative to the plate pallet adapter. A guiding unit (216, 220, 224, 228, 232, 504, 712) is attached to the plate pallet adapter, configured to align to the plate pallet and guide the plate pallet adapter into the automatic plate loader. In one embodiment, a plate adapter positioning sensor (268) is configured to sense and notify (124) an operator when the pallet adapter reaches the predefined position (248).

9. 发明公开

EP2255249A1 PLATE PALLET ALIGNMENT SYSTEM 有权
标题翻译：准系统FOR叠板
公开(公告)号：EP2255249A1
公开(公告)日：2010-12-01
申请号：EP09718893.2
申请日：2009-02-12
申请人： Eastman Kodak Company
发明人： KOROLIK, Pavel , BERES, Moshe , OLPAK, Tamir , REGEV, Shay , SILVERMAN, Mark
IPC分类号： G03F7/00 , B23Q3/18 , G03F9/00 , G03B27/58
CPC分类号： G03F7/0012 , B65H9/00 , B65H2301/363 , B65H2301/42256 , B65H2402/62 , B65H2701/1928 , G03B27/586
摘要： A plate pallet alignment and loading apparatus (10) for originally packed plate pallet (13) into a printing plate imaging device (71) includes plate pallet adaptor (11) wherein the originally packed plate pallet (13) is placed on top; plate pallet position detectors (15, 21, 31) attach to the plate pallet adaptor (11); a pallet alignment and loading apparatus (10) loads the plates from the originally packed plate pallet (13) into the printing plate imaging device; interleaf removal system (16) separates separation paper sheets placed between the plates; and plate pallet position correction actuators (43, 44, 45) corrects the plate pallet position in respect to the plate loading system (14) in response to pallet position results read from the plate pallet position detectors.

10. 发明公开

EP2207061A2 A system to vary dimensions of a template 有权
标题翻译：一个系统来改变模板的尺寸
公开(公告)号：EP2207061A2
公开(公告)日：2010-07-14
申请号：EP10160309.0
申请日：2005-06-01
申请人： MOLECULAR IMPRINTS, INC.
发明人： Cherala, Anshuman , Choi, Byung-Jin , Nimmakayala, Pawan K. , Meissl, Mario J. , Sreenivasan, Sidlgata V.
IPC分类号： G03F7/00 , G03B27/58
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03B27/58
摘要： A system to vary dimensions of a template comprising a frame (192) having a central aperture (194), and an actuator sub-assembly (190) including a plurality of lever sub-assemblies (196) mounted to the frame (192); the actuator sub assemblies are operable to apply a force such as to provide aperture (194) with appropriate dimensions to receive template (26).
摘要翻译：一种改变模板尺寸的系统，该模板包括具有中心孔（194）的框架（192）和包括安装在框架（192）上的多个杠杆子组件（196）的致动器子组件（190）; 致动器子组件可操作以施加力以提供具有合适尺寸的孔194以接收模板26。

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