专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP3141953A3 APPARATUS AND METHOD FOR MAINTAINING IMMERSION FLUID IN THE GAP UNDER THE PROJECTION LENS DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE 无效
标题翻译：浸没式光刻机中晶片交换过程中投影透镜下间隙内浸润液的设备和方法
公开(公告)号：EP3141953A3
公开(公告)日：2017-06-07
申请号：EP16186292.5
申请日：2004-03-17
申请人： Nikon Corporation
发明人： Binnard, Michael
IPC分类号： G03B27/32 , G03B27/42 , G03B27/58 , G03F7/20 , G03B27/52
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70716 , G03F7/70725 , G03F7/70733
摘要： An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece (208) and a stage assembly (202) including a work piece table (204) configured to support the work piece (208) adjacent the optical assembly (16). An environmental system (26) is provided to supply and remove an immersion fluid (212) from a gap between the optical assembly (16) and the work piece (208) on the stage assembly (202). After exposure of the work piece (208) is complete, an exchange system (216) removes the work piece (208) and replaces it with a second work piece. An immersion fluid containment system (214) is provided to maintain the immersion liquid (212) in the gap during removal of the first work piece (208) and replacement with the second work piece.
摘要翻译：公开了一种用于在光刻机器（10）中更换工件（208）期间将浸没流体（212）保持在邻近投影透镜（16）的间隙中的装置和方法。该设备和方法包括被配置成将图像投影到工件（208）上的光学组件（16）和包括工件台（204）的工作台组件（202），工件台（204）被配置为支撑与光学器件组件（16）。提供环境系统（26）以从台组件（202）上的光学组件（16）和工件（208）之间的间隙供应和移除浸没流体（212）。在工件（208）的暴露完成之后，交换系统（216）移除工件（208）并用第二工件替换它。提供浸没流体容纳系统（214）以在移除第一工件（208）和用第二工件替换期间将浸没液体（212）保持在间隙中。

2. 发明公开

EP3032572A1 EXPOSURE APPARATUS AND METHOD FOR PRODUCING A DEVICE 审中-公开
标题翻译： BELICHTUNGSVORRICHTUNG UND VERFAHREN ZUR HERSTELLUNG EINER VORRICHTUNG
公开(公告)号：EP3032572A1
公开(公告)日：2016-06-15
申请号：EP15199243.5
申请日：2004-05-24
申请人： Nikon Corporation
发明人： Kobayashi, Naoyuki , Tanimoto, Akikazu , Mizuno, Yasushi , Shiraishi, Kenichi , Nakano, Katsushi , Owa, Soichi
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus (EX) capable of forming a desirable device pattern when performing exposure by projecting a pattern onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device projects an image of the pattern onto the substrate (P) via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a substrate alignment system (5) and a mask alignment system (6), and liquid immersion exposure is performed for the substrate while the substrate and the pattern image are aligned with each other based on measurements of the substrate and mask alignment systems.
摘要翻译：提供一种能够经由投影光学系统（PL）和液体（1）将图案投影到基板（P）上时进行曝光时能够形成期望的装置图案的曝光装置（EX）。曝光装置通过投影光学系统和液体将图案的图像投影到基板（P）上，以露出基板。曝光装置包括基板对准系统（5）和掩模对准系统（6），并且基板和图案图像基于基板的测量和掩模对准而将基板和图案图像彼此对准时，对基板进行液浸曝光系统。

3. 发明授权

EP2613193B1 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine 有权
公开(公告)号：EP2613193B1
公开(公告)日：2016-01-13
申请号：EP13154185.6
申请日：2004-03-17
申请人： Nikon Corporation
发明人： Binnard, Michael
IPC分类号： G03B27/32 , G03B27/42 , G03B27/58 , G03F7/20 , G03B27/52
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70716 , G03F7/70725 , G03F7/70733
摘要： An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece (208) and a stage assembly (202) including a work piece table (204) configured to support the work piece (208) adjacent the optical assembly (16). An environmental system (26) is provided to supply and remove an immersion fluid (212) from a gap between the optical assembly (16) and the work piece (208) on the stage assembly (202). After exposure of the work piece (208) is complete, an exchange system (216) removes the work piece (208) and replaces it with a second work piece. An immersion fluid containment system (214) is provided to maintain the immersion liquid (212) in the gap during removal of the first work piece (208) and replacement with the second work piece.

4. 发明公开

EP2378358A4 THREE DIMENSIONAL DIGITAL IMAGING GRATING AND PHOTOSENSITIVE MATERIAL PHOTOSENSITIVE DEVICE AND IMAGING METHOD THEREOF 审中-公开
标题翻译： GRID三维数字成像和光敏器件的感光材料和成像及其方法
公开(公告)号：EP2378358A4
公开(公告)日：2013-09-04
申请号：EP09832938
申请日：2009-12-16
申请人： SHANGHAI YIYING DIGITAL TECHNOLOGY CO LTD
IPC分类号： G03B27/52 , G03B25/02 , G03B27/32 , G03B35/14 , G03C11/00 , G03D3/00 , G03D15/00
CPC分类号： G03B27/32 , G03B25/02 , G03B27/52 , G03B35/14 , G03C7/00 , G03D3/00 , G03D15/00

5. 发明公开

EP2613192A2 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine 有权
公开(公告)号：EP2613192A2
公开(公告)日：2013-07-10
申请号：EP13154183.1
申请日：2004-03-17
申请人： Nikon Corporation
发明人： Binnard, Michael
IPC分类号： G03B27/32 , G03B27/42 , G03B27/58 , G03F7/20 , G03B27/52
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70716 , G03F7/70725 , G03F7/70733
摘要： An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece (208) and a stage assembly (202) including a work piece table (204) configured to support the work piece (208) adjacent the optical assembly (16). An environmental system (26) is provided to supply and remove an immersion fluid (212) from a gap between the optical assembly (16) and the work piece (208) on the stage assembly (202). After exposure of the work piece (208) is complete, an exchange system (216) removes the work piece (208) and replaces it with a second work piece. An immersion fluid containment system (214) is provided to maintain the immersion liquid (212) in the gap during removal of the first work piece (208) and replacement with the second work piece.

6. 发明公开

EP2466617A3 Exposure apparatus and method for producing device 审中-公开
标题翻译：曝光装置和器件制造方法
公开(公告)号：EP2466617A3
公开(公告)日：2012-10-10
申请号：EP12155097.4
申请日：2004-05-24
申请人： Nikon Corporation
发明人： Kobayashi, Naoyuki , Tanimoto, Akikazu , Mizuno, Yasushi , Shiraishi, Kenichi
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus (EX) capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate (P) via a projection optical system (PL) and the liquid (1). The exposure device projects an image of the pattern onto the substrate via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a liquid removing mechanism (40) which removes the liquid remaining on a part (7) arranged in the vicinity of the image plane of the projection optical system.

7. 发明公开

EP2466619A2 Exposure apparatus and method for producing device 审中-公开
公开(公告)号：EP2466619A2
公开(公告)日：2012-06-20
申请号：EP12155099.0
申请日：2004-05-24
申请人： Nikon Corporation
发明人： Kobayashi, Naoyuki , Tabnimoto, Akikazu , Mizuno, Yasushi , Shiraishi, Kenichi
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus (EX) capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate (P) via a projection optical system (PL) and the liquid (1). The exposure device projects an image of the pattern onto the substrate via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a liquid removing mechanism (40) which removes the liquid remaining on a part (7) arranged in the vicinity of the image plane of the projection optical system.

8. 发明公开

EP2466618A2 Exposure apparatus and method for producing device 审中-公开
标题翻译： Belichtungsvorrichtung und Verfahren zur Vorrichtungsherstellung
公开(公告)号：EP2466618A2
公开(公告)日：2012-06-20
申请号：EP12155098.2
申请日：2004-05-24
申请人： Nikon Corporation
发明人： KOBAYASHI, Naoyuki , TANIMOTO, Akikazu , MIZUNO, Yasushi , SHIRAISHI, Kenichi
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus (EX) capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate (P) via a projection optical system (PL) and the liquid (1). The exposure device projects an image of the pattern onto the substrate via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a liquid removing mechanism (40) which removes the liquid remaining on a part (7) arranged in the vicinity of the image plane of the projection optical system.
摘要翻译：提供了一种能够通过经由投影光学系统（PL）和液体（1）将图案投影到基板（P）进行曝光时去除不需要的液体而形成期望的装置图案的曝光装置（EX）。曝光装置通过投影光学系统和液体将图案的图像投射到基板上，以露出基板。曝光装置包括：液体移除机构（40），其移除残留在布置在投影光学系统的像面附近的部分（7）上的液体。

9. 发明公开

EP2302459A3 Lithography system 审中-公开
公开(公告)号：EP2302459A3
公开(公告)日：2011-04-06
申请号：EP10185252.3
申请日：2003-10-24
申请人： MAPPER LITHOGRAPHY IP B.V.
发明人： Van 't Spijker, Johannes Christiaan , Jager, Remco , Wieland, Marco Jan-Jaco , Kruit, Pieter
IPC分类号： G03F7/20 , H01J37/317
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： The invention relates to a maskless lithography system for transferring a pattern onto the surface of a target, comprising at least one beam generator for generating a plurality of beamlets, modulation means comprising a plurality of modulators for modulating the magnitude of a beamlet, and a control unit for controlling each of the modulators, wherein the control unit generates and delivers pattern data to said modulation means for controlling the magnitude of each individual beamlet, the control unit comprising at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting said at least one modulated light beam to said modulation means.

10. 发明公开

EP2302457A3 Lithography system 有权转让
标题翻译：石版系统
公开(公告)号：EP2302457A3
公开(公告)日：2011-04-06
申请号：EP10185248.1
申请日：2003-10-24
申请人： MAPPER LITHOGRAPHY IP B.V.
发明人： Van 't Spijker, Johannes Christiaan , Jager, Remco , Wieland, Marco Jan-Jaco , Kruit, Pieter
IPC分类号： G03F7/20 , H01J37/317
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： The invention relates to a maskless lithography system for transferring a pattern onto the surface of a target, comprising at least one beam generator for generating a plurality of beamlets, modulation means comprising a plurality of modulators for modulating the magnitude of a beamlet, and a control unit for controlling each of the modulators, wherein the control unit generates and delivers pattern data to said modulation means for controlling the magnitude of each individual beamlet, the control unit comprising at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting said at least one modulated light beam to said modulation means.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式