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1. 发明公开

EP1232513A4 STABILIZED OSCILLATOR CIRCUIT FOR PLASMA DENSITY MEASUREMENT 有权
标题翻译：稳定型振荡器电路，用于测量等离子体密度
公开(公告)号：EP1232513A4
公开(公告)日：2007-03-07
申请号：EP00948743
申请日：2000-07-20
申请人： TOKYO ELECTRON LTD
发明人： SIRKIS MURRAY D , VERDEYEN JOSEPH T
IPC分类号： H05H1/00 , H01L21/3065 , H05H1/46
CPC分类号： H05H1/0081
摘要： A method and system for controlling electron densities in a plasma processing system (105). By applying a dither voltage (117) and a correction voltage to a voltage-controller oscillator (101), electron density of an open resonator plasma processing system (105) may be measured and controlled as part of a plasma-based process.

2. 发明公开

EP0753876A2 Aliasing sampler for plasma probe detection 失效
标题翻译： Aliasing-Probennehmer zur Detektion mit einer Plasmasonde
公开(公告)号：EP0753876A2
公开(公告)日：1997-01-15
申请号：EP96301451.9
申请日：1996-03-04
申请人： ENI, A DIVISION OF ASTEC AMERICA, INC.
发明人： Keane, Anthony Richard Alan
IPC分类号： H01J17/32 , H05H1/36 , H03B19/00 , G01R19/255 , G01R21/133 , G01R31/24
CPC分类号： H05H1/0081
摘要： An aliasing sampler probe (22, Fig. 1) for detecting plasma RF voltage and current employs a sampling signal with a sampling rate slower that the RF fundamental frequency selected to produce an aliasing waveform at an aliasing frequency that is several orders of magnitude below the RF fundamental frequency. In one embodiment, the RF power is applied at 13.56 MHz (Fig. 3A), and sampling pulses have a sampling rate of 2.732 MHz (Fig. 3B) to produce replicas of the RF voltage and current waveforms (Fig. 4) at an aliasing frequency of about 100 KHz. The aliasing replicas preserve phase and harmonic information with an accuracy that is not available from other sampling techniques.
摘要翻译：在等离子体布置中，RF发生器以预定的RF频率产生RF电波并且包含影响RF波形的谐波信息，该电波通过RF匹配网络提供给等离子体的功率输入电波产生等离子体的腔室。检测器在等离子体室的输入处对RF电波进行采样，以确定施加到等离子体室的RF电功率的测量。检测器包括用于以低于预定RF频率的预定采样速率对RF波的振幅进行采样的采样装置，以及用于合成采样幅度以在明显低于预定RF频率的预定混叠频率产生混叠波形的装置，其中混叠波形保留RF波的谐波信息。

3. 发明公开

EP0619694A1 METHOD OF MONITORING ATMOSPHERIC PRESSURE GLOW DISCHARGE PLASMA 失效
标题翻译：监测大气压力辉光放电等离子体的方法
公开(公告)号：EP0619694A1
公开(公告)日：1994-10-12
申请号：EP92924896.1
申请日：1992-12-09
申请人： Okazaki, Satiko , OGOMA, Masuhiro
发明人： Okazaki, Satiko , OGOMA, Masuhiro
IPC分类号： H05H1/00 , C23C16/50
CPC分类号： C23C16/54 , C23C16/505 , C23C16/52 , H05H1/0081
摘要： The generation of glow plasma due to discharge at an atmospheric pressure and its stabilization are monitored by counting the number of current pulses. Alternatively, they are monitored by the change of a retention voltage and/or the change of the full current value besides the number of the current pulses, or by Lissajous figures, to detect the plasma state and to stabilize and control the plasma. These procedures make it possible to stabilize and monitor the atmospheric pressure glow discharge plasma accurately, rapidly and readily, and to control the plasma.
摘要翻译：通过计数电流脉冲的数量来监测由于在大气压力下放电和其稳定而产生的辉光等离子体。或者，除了电流脉冲的数量之外，还通过保留电压的变化和/或全电流值的变化来监测它们，或者通过利萨如图来检测等离子体状态并稳定和控制等离子体。这些步骤可以准确，快速，方便地稳定和监测大气压辉光放电等离子体，并控制等离子体。

4. 发明授权

EP0347717B1 Schaltungsanordnung zum Erkennen eines Plasmas 失效
标题翻译：电路，用于检测等离子体。
公开(公告)号：EP0347717B1
公开(公告)日：1994-09-14
申请号：EP89110662.7
申请日：1989-06-13
申请人： LEYBOLD AKTIENGESELLSCHAFT
发明人： Gesche, Roland, Dr. , Vey, Norbert
IPC分类号： H05H1/00 , H01J37/32
CPC分类号： H01J37/32082 , H01J37/32091 , H01J37/32174 , H01J37/32935 , H05H1/0081

5. 发明公开

EP4383953A1 IONENSENSOR FÜR DIE REGULATION DER LEISTUNG EINES PLASMAGENERATORS 审中-公开
公开(公告)号：EP4383953A1
公开(公告)日：2024-06-12
申请号：EP23169414.2
申请日：2023-04-24
申请人： DBD Plasma GmbH
发明人： Damm, Roland , Gredner, Alexander , Haese, Christian , Haese, Jürgen
IPC分类号： H05H1/00 , H05H1/24 , A61L9/22 , F24F8/30
CPC分类号： H05H1/2406 , H05H1/0081 , H05H2245/1520210501 , F24F8/30 , A61L9/22
摘要： Die Erfindung betrifft bevorzugt eine Vorrichtung zur Erzeugung von Ionen in einem Luftstrom umfassend eine Spannungsquelle und einen Plasmagenerator, wobei sich der Plasmagenerator in dem Luftstrom befindet. Die Vorrichtung weist einen lonensensor und eine Auswerteeinheit auf, wobei die Auswerteeinheit dazu konfiguriert ist in Abhängigkeit eines Messsignals des lonensensors eine Leistung der Spannungsquelle zu regulieren.

6. 发明公开

EP4363841A1 MEMS RESONATOR SENSOR SUBSTRATE FOR PLASMA, TEMPERATURE, STRESS, OR DEPOSITION SENSING 审中-实审
公开(公告)号：EP4363841A1
公开(公告)日：2024-05-08
申请号：EP22833870.3
申请日：2022-06-03
申请人： Applied Materials, Inc.
发明人： LIN, Chuang-Chia , PETERSON, David , KRAUS, Philip, Allan , BAYATI, Amir
IPC分类号： G01N29/04 , G01N29/12 , G01N29/34 , G01N29/44 , G06N20/00 , H01L21/66
CPC分类号： H05H1/0081 , H01J37/32917 , H01J37/32935

7. 发明授权

EP2929759B1 VERFAHREN UND STEUERUNGSEINRICHTUNG ZUM BETRIEB EINER PLASMAERZEUGUNGSEINRICHTUNG 有权
公开(公告)号：EP2929759B1
公开(公告)日：2017-08-16
申请号：EP13795530.8
申请日：2013-11-27
申请人： Oerlikon Metco AG, Wohlen
发明人： LIECHTI, Florian , FRIEDERY, Albert , KOSCHNITZKE, Hartmut , GRÖBER, René
IPC分类号： H05H1/36
CPC分类号： H05H1/30 , H05H1/0081 , H05H1/36

8. 发明授权

EP1794600B1 SONDE DE MESURE DE CARACTERISTIQUES D'UN COURANT D'EXCITATION D'UN PLASMA, ET REACTEUR A PLASMA ASSOCIE. 有权
标题翻译：用探头直流等离子体及相关等离子体反应器的快感的测量性能
公开(公告)号：EP1794600B1
公开(公告)日：2015-04-08
申请号：EP05789496.6
申请日：2005-09-15
申请人： Ecole Polytechnique , Centre National de la Recherche Scientifique (CNRS)
发明人： DINE, Sébastien , JOLLY, Jacques , LAROUR, Jean, Bernard, Pierre
IPC分类号： G01R19/00 , H05H1/00
CPC分类号： H05H1/0081

9. 发明公开

EP2174671A4 PLASMA STERILIZING DEVICE AND METHOD 有权
标题翻译：装置和方法的等离子体灭菌
公开(公告)号：EP2174671A4
公开(公告)日：2011-03-02
申请号：EP08792181
申请日：2008-08-04
申请人： UNIV SAGA
发明人： HAYASHI NOBUYA , KITAZAKI SATOSHI
IPC分类号： A61L2/14 , A61B1/12
CPC分类号： A01N1/0294 , A61L2/00 , A61L2/14 , A61L9/00 , A61L2202/24 , H05H1/0081

10. 发明公开

EP0692926A4 INSTRUMENT FOR MEASURING PLASMA EXCITED BY HIGH-FREQUENCY 失效
标题翻译：仪的测量高频等离子体激
公开(公告)号：EP0692926A4
公开(公告)日：1995-09-18
申请号：EP94904322
申请日：1994-01-14
申请人： OHMI TADAHIRO
发明人： OHMI TADAHIRO , HIRAYAMA MASAKI
IPC分类号： H05H1/00
CPC分类号： H01J37/32935 , H05H1/0081
摘要： This instrument can measure parameters of a plasma accurately and easily even though the plasma is excited by a high-frequency. The instrument for measuring parameters of a plasma generated in a vacuum chamber by high-frequency discharge at a given frequency comprises a wire (106) for electrically connecting a first electrode (101) arranged in a space where a plasma is produced and a terminal (110) arranged outside the vacuum chamber for taking out signals, and a first insulator (105) so arranged as to cover at least a part of the surface of the wire therewith. The absolute value of the impedance at the given frequency between the first electrode and the ground when looking into the terminal side from the first electrode is five times or more the absolute value of the impedance at the given frequency between the first electrode and the plasma in a state where no direct current flows through the first electrode.

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