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    • 7. 发明公开
    • An adaptive lithography method and system
    • Verfahren und System einer适应石版画。
    • EP0273703A2
    • 1988-07-06
    • EP87311351.8
    • 1987-12-23
    • GENERAL ELECTRIC COMPANY
    • Eichelberger, Charles WilliamWelles, Kenneth Brakeley, IIWojnarowski, Robert John
    • H01L21/00G03F7/23G06F15/60H05K3/00
    • H01L24/25G03F7/704H01L21/6715H01L21/768H01L23/5389H01L24/24H01L24/75H01L24/76H01L2224/24137H01L2224/73267H01L2224/75H01L2224/75753H01L2224/758H01L2224/759H01L2924/01005H01L2924/01006H01L2924/01013H01L2924/01029H01L2924/01033H01L2924/01038H01L2924/01074H01L2924/01075H01L2924/01082H01L2924/12042H01L2924/12043H01L2924/14H01L2924/19043H01L2924/30105H01L2924/30107Y10S148/093Y10S430/146H01L2924/00
    • An adaptive method and system are disclosed for providing high density interconnections of very large scale integrated circuits on a substrate 28. The procedure is performed in four basic steps: first an artwork representa­tion for the interconnections of the integrated circuits is generated. This artwork representation is stored in a computer data base and assumes the integrated circuits to be at predetermined ideal locations and positions on the substrate. Second, using imaging (26,38,40), the actual positions of each integrated circuit on the substrate are determined. The actual positions of the integrated circuits are compared with their ideal positions to compute an offset and rotation for each integrated circuit on the substrate. Third, the computed offsets and rotations are then used to modify the artwork representation stored in the data base to account for the actual locations and positions of the integrated circuits on the substrate. Finally, the modified artwork representation is used to drive a direct writing laser lithography system (10,12,16,18,20,22,24) that actually forms the high density interconnections of the integrated circuits on the sub­strate. The artwork representations are stored in computer data bases in vector form to minimize storage requirements. The laser beam produced by the lithography system is raster scanned on the substrate. Modulation of the laser beam is controlled by the real time conversion of the vector repre­sentation of the modified artwork to be a bit mapped rep­resentation. To assure accurate formations of the intercon­nects, a feedback alignment system (42,44,46,48) is used to accurately position the laser beam throughout its raster scan.
    • 公开了一种用于在基板28上提供非常大规模集成电路的高密度互连的自适应方法和系统。该过程在四个基本步骤中执行:首先,生成用于集成电路互连的图形表示。 该图形表示存储在计算机数据库中,并且使集成电路处于基板上的预定理想位置和位置。 第二,使用成像(26,38,40),确定每个集成电路在基板上的实际位置。 将集成电路的实际位置与其理想位置进行比较,以计算衬底上每个集成电路的偏移和旋转。 第三,然后使用所计算的偏移和旋转来修改存储在数据库中的图形表示,以说明基板上集成电路的实际位置和位置。 最后,改进的图案表示用于驱动实际形成衬底上的集成电路的高密度互连的直写式激光光刻系统(10,12,16,18,20,22,24)。 艺术品表示以矢量形式存储在计算机数据库中以最小化存储要求。 由光刻系统产生的激光束在基板上进行光栅扫描。 激光束的调制由被修改的图形的矢量表示的实时转换控制为位图表示。 为了确保互连的精确结构,使用反馈对准系统(42,44,46,48)来精确地定位激光束在整个光栅扫描中。