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1. 发明授权

EP2929932B1 POWDER PLASMA TREATMENT APPARATUS 有权转让
标题翻译：粉末等离子体处理装置
公开(公告)号：EP2929932B1
公开(公告)日：2018-04-04
申请号：EP13862200.6
申请日：2013-12-06
申请人： Korea Basic Science Institute
发明人： SEOK, Dong Chan , JUNG, Yong Ho , JEONG, Hyun Young
IPC分类号： B01J19/08 , B01J2/00 , H05H1/42 , H05H1/24 , H01J37/32
CPC分类号： H01J37/32532 , B01J19/088 , B01J2219/083 , B01J2219/0879 , H01J37/32009 , H01J37/32348 , H01J37/32568 , H05H1/2406 , H05H2001/2412 , H05H2001/2431
摘要： A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus is a powder plasma processing apparatus of a cylindrical surface discharge plasma module, and the apparatus includes a plate-like electrode layer serving as an external surface of the cylindrical surface discharge plasma module, an insulating layer disposed on an internal surface of the plate-like electrode layer, and a plasma generating electrode disposed on the insulating layer, wherein the cylindrical surface discharge plasma module rotates, an alternating voltage is applied to the plasma generating electrode and the plate-like electrode layer to generate plasma around the plasma generating electrode, and a powder for plasma processing is processed by the plasma within the cylindrical surface discharge plasma module.

3. 发明公开

EP3152606A1 ENDFLÄCHENBESCHICHTUNG EINES WELLENLEITERS 有权
标题翻译： ENDFLÄCHENBESCHICHTUNGEINES WELLENLEITERS
公开(公告)号：EP3152606A1
公开(公告)日：2017-04-12
申请号：EP15724178.7
申请日：2015-05-26
申请人： Rosenberger-OSI GmbH & Co. OHG
发明人： WEIGAND, Benjamin , THEOBALD, Christian , L'HUILLIER, Johannes Albert
IPC分类号： G02B6/02 , G02B1/10
CPC分类号： G02B6/262 , G02B1/04 , G02B1/111 , G02B1/118 , G02B1/12 , G02B1/14 , G02B1/18 , G02B6/02 , G02B27/0006 , H01J37/32009 , H01J2237/334
摘要： The invention concerns a waveguide, such as an optical fibre, having a front face, such as a fibre facet, provided with a coating. The coating comprises one or more organic fluorine compounds. The invention also concerns a method for producing this type of waveguide by means of plasma polymerisation.
摘要翻译：本发明涉及一种波导，例如光纤，其具有设有涂层的前表面，例如光纤刻面。该涂层包含一种或多种有机氟化合物。本发明还涉及通过等离子体聚合生产这种波导的方法。

4. 发明授权

EP2206138B1 METHOD FOR MANUFACTURING A TREATED SURFACE AND VACUUM PLASMA SOURCES 有权转让
标题翻译：制造方法处理过的表面和真空等离子体源
公开(公告)号：EP2206138B1
公开(公告)日：2017-03-22
申请号：EP07822148.8
申请日：2007-11-01
申请人： Oerlikon Trading AG, Trübbach
发明人： RAMM, Juergen , WIDRIG, Beno , KURAPOV, Denis
IPC分类号： H01J37/32 , C23C14/00 , C23C14/22 , C23C14/35 , C23C14/54
CPC分类号： C23C14/54 , C23C14/0036 , C23C14/228 , C23C14/35 , C23C14/351 , H01J37/32009 , H01J37/32055 , H01J37/32477 , H01J37/32541

5. 发明公开

EP3123494A1 NIEDERDRUCKPLASMAANLAGE MIT SEQUENTIELLER STEUERUNG 有权
公开(公告)号：EP3123494A1
公开(公告)日：2017-02-01
申请号：EP15713182.2
申请日：2015-03-26
申请人： Diener, Christof-Herbert
发明人： Diener, Christof-Herbert
IPC分类号： H01J37/32
CPC分类号： H01J37/32449 , H01J37/18 , H01J37/244 , H01J37/32009 , H01J37/32825 , H01J37/32926 , H01J2237/186
摘要： The invention relates to a low-pressure plasma system (10). The low-pressure plasma system (10) has a treatment chamber (12). The treatment chamber (12) is evacuated by a pump (14) in a first process step, the pump-off step. A gas supply valve (20) is additionally opened in a second process step, the process gas setting step, in order to achieve a defined gas composition at a low pressure in the treatment chamber (12). A plasma generator is activated in a third process step, the plasma treatment step, in order to ignite a plasma in the treatment chamber (12). A flushing valve (28) can be opened in a fourth process step, the flushing step, in order to flush the treatment chamber (12), wherein the gas supply valve (20) is closed and the plasma generator is deactivated during the fourth process step. The treatment chamber (12) can be ventilated via a ventilation valve (18) in a fifth process step, the ventilation step. Switching positions of a sequential switching element (30), preferably in the form of a rotary switch, correspond to the process steps. The sequential switching element (30) can have a nulled switching position in which the low-pressure plasma system (10) is deactivated. The sequential switching element (30) allows a simple design of the low-pressure plasma system (10) and an intuitive operation of the system.
摘要翻译：低压等离子体系统包括处理室，其通过泵在第一工艺步骤中泵出。在第二工艺步骤中，打开气体供给阀以便在处理室中以低压实现确定的气体组成。在第三工艺步骤中，等离子体发生器被接通以点燃处理室中的等离子体。在第四个处理步骤中，可以打开冲洗阀以便冲洗处理室。在第五工艺步骤中，处理室可以通过通风阀来通风。顺序开关元件可以是旋转开关，并且包括零开关位置，其中低压等离子体系统关闭。顺序开关元件使低压等离子体系统的简单实施例及其直观的操作成为可能。

6. 发明授权

EP2122656B1 NOVEL PLASMA SYSTEM FOR IMPROVED PROCESS CAPABILITY 有权转让
标题翻译：新型等离子系统可加快处理能力
公开(公告)号：EP2122656B1
公开(公告)日：2016-03-09
申请号：EP08717601.2
申请日：2008-03-11
申请人： Aixtron SE
发明人： TEO, Kenneth B. K. , RUPESINGHE, Nalin L.
IPC分类号： H01J37/32
CPC分类号： H01J37/32568 , H01J37/32009 , H01J37/3244

7. 发明授权

EP2151510B1 Vorrichtung und Verfahren zur Plasmabehandlung von Hohlkörpern 有权
标题翻译：的装置和方法的空心体的等离子体处理
公开(公告)号：EP2151510B1
公开(公告)日：2014-12-31
申请号：EP09009235.4
申请日：2009-07-15
申请人： Krones AG
发明人： Krüger, Jochen, Dr. , Felts, John
IPC分类号： C23C16/509 , C23C16/54 , C23C16/04 , A61L2/14
CPC分类号： C23C16/509 , A61L2/14 , C23C16/045 , C23C16/54 , H01J37/32009 , H01J37/32366 , H01J37/3244 , H01J37/32541 , H05H1/46 , H05H2001/466

8. 发明公开

EP2802681A2 APPARATUS AND METHOD FOR SURFACE PROCESSING OF A SUBSTRATE 审中-公开
标题翻译： DEVICE AND METHOD FOR基板的表面处理
公开(公告)号：EP2802681A2
公开(公告)日：2014-11-19
申请号：EP13702347.9
申请日：2013-01-07
申请人： Carl Zeiss SMT GmbH , Carl Zeiss Microscopy GmbH
发明人： CHUNG, Hin Yiu Anthony , ALIMAN, Michel , FEDOSENKO, Gennady , RANCK, Albrecht , GORKHOVER, Leonid
IPC分类号： C23C16/44 , G03F7/20 , G01N21/94 , C23C16/52 , H01J37/32 , H01J49/02 , H01J49/42
CPC分类号： H01J37/32009 , C23C16/405 , C23C16/44 , C23C16/4401 , C23C16/4408 , C23C16/45525 , C23C16/52 , H01J37/32963 , H01J37/32981 , H01J37/3299 , H01J49/027
摘要： The invention relates to an apparatus (1) for surface processing on a substrate (2), for example for applying a coating (14) to the substrate (2) or for removing a coating (14) from the substrate (2), wherein the apparatus (1) comprises: a chamber (5) enclosing an interior (4) and serving for arranging the substrate (2) for the surface processing, a process gas analyser (13a, 13b) for detecting at least one gaseous constituent of a residual gas atmosphere formed in the interior (4), wherein the process gas analyser (13a, 13b) comprises an ion trap (18) for storing the gaseous constituent to be detected, and an ionization device (17) for ionizing the gaseous constituent. The invention also relates to an associated method for monitoring surface processing on a substrate (2).

9. 发明公开

EP2766506A1 PLASMA PROCESSING DEVICE 有权
标题翻译：等离子体处理装置
公开(公告)号：EP2766506A1
公开(公告)日：2014-08-20
申请号：EP13823907.4
申请日：2013-06-20
申请人： Chugai Ro Co., Ltd.
发明人： AKANO, Shinya
IPC分类号： C23C14/32 , C23C14/54 , H05H1/26
CPC分类号： H01J37/32669 , C23C14/32 , C23C14/54 , H01J37/32009 , H01J37/32357 , H01J37/32651 , H01J37/3266 , H05H1/26
摘要： The present invention provides a plasma processing device that can bring the plasma close to an object of processing, and can separate the plasma from the object of processing. This plasma processing device (1) comprises the following: a chamber (2) having therein a holding space (2a) for holding an object of processing (5) and a plasma space (2b) in which plasma is formed; a plasma gun (3) for forming plasma by emitting electrons into the plasma space (2b); and at least a pair of opposing magnets (4), the positions of which are adjustable and which create a magnetic flux traversing the chamber (2) between the holding space (2a) and the plasma space (2b).
摘要翻译：本发明提供一种等离子体处理装置，其能够使等离子体接近处理对象物，并且能够将等离子体与处理对象物分离。该等离子体处理装置（1）包括：在内部具有用于保持处理对象物（5）的保持空间（2a）和形成等离子体的等离子体空间（2b）的腔室（2）等离子体枪（3），用于通过将电子发射到等离子体空间（2b）中来形成等离子体; 和至少一对相对的磁体（4），它们的位置是可调整的并且产生在保持空间（2a）和等离子体空间（2b）之间横穿腔室（2）的磁通量。

10. 发明公开

EP2739719A2 SYSTEM AND METHOD FOR TISSUE CONSTRUCTION USING AN ELECTRIC FIELD APPLICATOR 审中-公开
标题翻译：系统公司VERFAHREN ZUR GEWEBEKONSTRUKTION MITTELS EINES ELEKTRISCHEN FELDAPIKATORS
公开(公告)号：EP2739719A2
公开(公告)日：2014-06-11
申请号：EP12753276.0
申请日：2012-07-31
申请人： Tokyo Electron Limited
发明人： BRCKA, Jozef
IPC分类号： C12M3/00 , B03C5/00 , H01J37/32 , C12M1/26
CPC分类号： C23C16/50 , A61F2/00 , B03C5/005 , B03C5/026 , C12M3/00 , C12M21/08 , C12M33/00 , C23C16/04 , C23C16/48 , H01J37/32009 , H01J37/32697 , H01L21/02612 , H01L21/67011
摘要： A method and apparatus are provided for constructing tissue from cells or other objects by application of temporally and spatially controlled electric fields. Electric field applicators expose a substrate (32) to the electric field controlled to affect the processing medium (28) to achieve a processing effect on the construction of tissue on the substrate (32). Electrical bias is selected to interact with dipole properties of the medium (28) to control the movement of suspended dielectrophoretic cells or other particles in the medium (28) or at the substrate (32). The motion of suspended particles may be affected to cause suspended particles of different properties to follow different paths in the processing medium (28), which may be used to cause the suspended particles to be sorted. The processing medium (28) and electrical bias may be selected to affect the structure, or orientation, of one or more layers on the substrate (32).
摘要翻译：处理方法和装置使用至少一个电场施加器（34），其被偏置以产生空间 - 时间电场，以影响处理介质（26），悬浮的纳米物体（28）或基板（30）在处理中相互作用其中介质（26）或颗粒的偶极子性质在基底（30）上构成结构。该装置可以包括磁场，声场，光学力或其他生成装置。该处理可能会影响基板（30）上的选择性局部层，或者可以控制层中的颗粒的取向，控制介电电泳颗粒或介质的移动，或引起不同性质的悬浮颗粒遵循处理介质（26）中的不同路径。可以进行在基板（30）上沉积或改性层。此外，可以选择处理介质（26）和电偏压以在衬底（30）上制备用于将衬底（30）接合到第二衬底的至少一个层，或者以受控的方向沉积碳纳米管（CNT）在基板上。

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