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1. 发明授权

EP2579271B1 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 失效转让
公开(公告)号：EP2579271B1
公开(公告)日：2018-04-11
申请号：EP12190694.5
申请日：2004-09-07
申请人： Carl Zeiss Microscopy GmbH , Applied Materials Israel
发明人： Knippelmeyer, Rainer , Kienzle, Oliver , Kemen, Thomas , Müller, Heiko , Uhlemann, Stephan , Haider, Maximilian , Casares, Antonio , Rogers, Steven
IPC分类号： G21K5/10 , G01N23/00 , H01J37/28 , H01J37/09 , H01J37/317 , H01J37/04 , H01J37/14 , H01J37/10
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical component comprises at least one multi-aperture plate having a plurality of apertures formed therein, each for manipulating particles of a charged particle beamlet passing therethrough; wherein the multi-aperture plate comprises plural conductive layer portions arranged substantially in a single plane, wherein plural apertures are formed in each of the plural conductive layer portions, and wherein a resistant gap is formed between adjacent conductive layer portions.

2. 发明授权

EP2579273B1 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权转让
标题翻译：用于这种系统和布置的粒子光学系统和布置以及粒子光学部件
公开(公告)号：EP2579273B1
公开(公告)日：2017-11-29
申请号：EP12190696.0
申请日：2004-09-07
申请人： Carl Zeiss Microscopy GmbH , Applied Materials Israel
发明人： Knippelmeyer, Rainer , Kienzle, Oliver , Kemen, Thomas , Müller, Heiko , Uhlemann, Stephan , Haider, Maximilian , Casares, Antonio , Rogers, Steven
IPC分类号： G21K5/10 , G01N23/00 , H01J37/28 , H01J37/09 , H01J37/317 , H01J37/12 , H01J37/14 , H01J37/10
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical component comprises at least one multi-aperture plate having a plurality of apertures formed therein, each for manipulating particles of a charged particle beamlet passing therethrough; wherein the multi-aperture plate comprises plural conductive layer portions arranged substantially in a single plane, wherein plural apertures are formed in each of the plural conductive layer portions, and wherein a resistant gap is formed between adjacent conductive layer portions.

3. 发明授权

EP2036112B1 APPARATUS FOR ACCELERATING AN ION BEAM 有权
标题翻译：设备加速的离子束
公开(公告)号：EP2036112B1
公开(公告)日：2014-04-30
申请号：EP07786966.7
申请日：2007-06-29
申请人： Nordiko Technical Services Limited
发明人： DAVIS, Mervyn Howard , HOLMES, Andrew James Timothy
IPC分类号： H01J37/04 , H01J37/305 , H01J49/02 , H05H15/00
CPC分类号： H01J37/04 , H01J27/024 , H01J37/3056 , H01J2237/04735 , H01J2237/08 , H05H15/00

4. 发明公开

EP2579273A2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权转让
标题翻译：光学粒子系统和安排以及用于这种系统和布置的光学粒子成分
公开(公告)号：EP2579273A2
公开(公告)日：2013-04-10
申请号：EP12190696.0
申请日：2004-09-07
申请人： Carl Zeiss SMT GmbH , Applied Materials Israel
发明人： Knippelmeyer, Rainer , Kienzle, Oliver , Kemen, Thomas , Müller, Heiko , Uhlemann, Stephan , Haider, Maximilian , Casares, Antonio , Rogers, Steven
IPC分类号： G21K5/10 , G01N23/00 , H01J37/28 , H01J37/09 , H01J37/317 , H01J37/12 , H01J37/14
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement, comprises at least one charged-particle source for generating a beam of charged particles; at least one multi-aperture plate 305 having a plurality of apertures formed in the plate, wherein a plurality of charged-particle beamlets 3 is formed from the beam of charged particles downstream of the multi-aperture plate, each of the charged-particle beamlets having a focus 323 in a focusing region of the multi-aperture plate; and an objective lens M for imaging substantially the focusing region of the multi-aperture plate onto an object 7 positionable in an object plane of the particle-optical arrangement.
摘要翻译：粒子光学装置，包括：用于生成带电粒子波束的至少一个带电粒子源; 至少一个多孔径板具有孔径的在所述板上形成的复数，worin带电粒子子束3的多元性305从带电粒子下游的多孔径板，每个带电粒子子束的光束所形成具有多孔径板的聚焦区域中的聚焦323; 并用于基本上成像M中的多孔径板的聚焦区走上物镜到对象在7定位在粒子 - 光学装置的物平面。

5. 发明公开

EP2579271A2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 失效转让
标题翻译：光学粒子系统和安排以及用于这种系统和布置的光学粒子成分
公开(公告)号：EP2579271A2
公开(公告)日：2013-04-10
申请号：EP12190694.5
申请日：2004-09-07
申请人： Carl Zeiss SMT GmbH , Applied Materials Israel
发明人： Knippelmeyer, Rainer , Kienzle, Oliver , Kemen, Thomas , Müller, Heiko , Uhlemann, Stephan , Haider, Maximilian , Casares, Antonio , Rogers, Steven
IPC分类号： G21K5/10 , G01N23/00 , H01J37/28 , H01J37/09 , H01J37/317 , H01J37/04 , H01J37/14
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement, comprises at least one charged-particle source 329 for generating at least one beam 309 of charged particles; at least one multi-aperture plate 313 having a plurality of apertures formed in the plate, wherein the plurality of apertures being arranged in a first pattern, wherein a plurality of charged-particle beamlets 3 is formed from the beam of charged particles downstream of the aperture plate; a first focusing lens 303 providing a focusing field in a first region between the charged-particle source and the multi-aperture plate; and a decelerating electrode providing a decelerating field in a second region 321 in between of the first focusing lens and the multi-aperture plate, such that a kinetic energy of the charged particles passing the first focusing lens is higher than a kinetic energy of the charged particles passing the multi-aperture plate.
摘要翻译：粒子光学装置，包括至少一个带电粒子源329，用于产生带电粒子309中的至少一个光束; 至少一个多孔径板具有孔径的在所述板上形成的复数，worin的多元性313 Aperture的布置在一个第一图案，worin带电粒子子束的多元性3从带电粒子的束的下游FORMED 孔径板; 第一聚焦透镜303中的带电粒子源和多孔径板之间的第一区域中提供聚焦场; 和减速电极提供在第二区域321的减速场在所述第一聚焦透镜和所述多孔径板之间，求并通过第一聚焦透镜的带电粒子的动能比该带电的动能更高颗粒经过多孔径板。

6. 发明授权

EP2044608B1 ION SOURCES 有权转让
标题翻译：离子源
公开(公告)号：EP2044608B1
公开(公告)日：2012-05-02
申请号：EP07766199.9
申请日：2007-07-12
申请人： SPP Process Technology Systems UK Limited
发明人： PROUDFOOT, Gary , GREEN, Gordon Robert , TROWELL, Robert Kenneth
IPC分类号： H01J27/18 , H01J37/08
CPC分类号： H01J27/18 , H01J27/024 , H01J37/04 , H01J37/08 , H01J2237/04735 , H01J2237/083
摘要： This invention relates to an Ion gun (10) which comprises of plasma generator (11) driven from an RF source (12), a plasma or source chamber (13), having an outlet (14), across which is mounted an accelerator grid (15). The accelerator grid (15) comprises four individual grids. The first grid (16), which is closest to the outlet (14), is maintained at a positive voltage by a DC source (16a), the second grid (17) is maintained strongly negative by DC source (17a). The third grid (18) is maintained at a negative voltage, which is much lower than that of the second grid (17), by DC source (18a) and the fourth grid is grounded. Means of mounting these grids are also described.

7. 发明授权

EP1158564B1 An electron spin analyzer 有权
标题翻译：电子自旋分析仪
公开(公告)号：EP1158564B1
公开(公告)日：2007-06-20
申请号：EP01109500.7
申请日：2001-04-25
申请人： HOKKAIDO UNIVERSITY
发明人： Mukasa, Koichi , Ikeda, Masayuki , Sueoka, Kazuhisa , Mutoh, Masakazu, c/o Muth Construction Company , Kadono, Hisao, c/o Sanko Steel Corporation , Ueda, Eisuke, c/o Suga Seisakusho Co., Ltd.
IPC分类号： H01J37/295 , H01J37/244 , G01T1/32
CPC分类号： H01J37/252 , H01J2237/04735 , H01J2237/24557

8. 发明公开

EP1158564A3 An electron spin analyzer 有权
标题翻译：电子自旋分析仪
公开(公告)号：EP1158564A3
公开(公告)日：2005-06-15
申请号：EP01109500.7
申请日：2001-04-25
申请人： HOKKAIDO UNIVERSITY
发明人： Mukasa, Koichi , Ikeda, Masayuki , Sueoka, Kazuhisa , Mutoh, Masakazu, c/o Muth Construction Company , Kadono, Hisao, c/o Sanko Steel Corporation , Ueda, Eisuke, c/o Suga Seisakusho Co., Ltd.
IPC分类号： H01J37/295 , H01J37/244 , G01T1/32
CPC分类号： H01J37/252 , H01J2237/04735 , H01J2237/24557
摘要： A hemisphere accelerating electrode has a double structure composed of an inner accelerating electrode (3) and an outer accelerating electrode (2). The inner accelerating electrode has an inner introducing inlet and an inner opening, and the outer accelerating electrode has an outer introducing inlet and an outer opening. The aperture angle of the inner introducing inlet is preferably larger than that of the outer introducing inlet by 0.1-5 degrees. Then, the aperture angle of the inner opening is preferably larger than that of the outer opening by 0.1-5 degrees. Moreover, scattered electron detectors (4) have correcting electrodes, respectively, and are arranged in the shifted directions from the introducing direction of electrons by 100-140 degrees.

9. 发明公开

EP1254591A1 METHODS AND APPARATUS FOR OPERATING HIGH ENERGY ACCELERATOR IN LOW ENERGY MODE 审中-公开
标题翻译：方法和装置运行具有低功率高能加速器
公开(公告)号：EP1254591A1
公开(公告)日：2002-11-06
申请号：EP01907132.3
申请日：2001-02-08
申请人： Varian Semiconductor Equipment Associates Inc.
发明人： PEDERSEN, Bjorn, O. , MACIEJOWSKI, Peter, E. , GOODENOUGH, William, G. , MURPHY, Paul, J. , MCKENNA, Charles, M.
IPC分类号： H05H5/06 , H01J37/317
CPC分类号： H01J37/3171 , H01J2237/04735 , H05H5/06
摘要： Methods and apparatus are provided for efficiently operating an ion implanter which includes a charged particle accelerator in a high energy mode and in a low energy mode. The charged particle accelerator includes a high voltage power supply, an accelerator column coupled to the high voltage power supply and a switching assembly. The accelerator column includes a plurality of accelerator electrodes. The high voltage power supply is disabled from energizing the accelerator column in the low energy mode. The switching assembly includes switching elements for electrically connecting the accelerator electrodes to a reference potential in the low energy mode and for electrically isolating the accelerator electrodes from the reference potential in the high energy mode. The switching assembly prevents positive potentials on the accelerator electrodes and thus minimizes space charge expansion of the beam when transporting positive ion beams in the low energy mode.

10. 发明公开

EP0780879A2 Electron beam exposure apparatus 失效
标题翻译： Elektronenstrahl-Belichtungsgerät
公开(公告)号：EP0780879A2
公开(公告)日：1997-06-25
申请号：EP96117887.8
申请日：1996-11-07
申请人： NEC CORPORATION
发明人： Aizaki, Naoaki
IPC分类号： H01J37/317 , H01J37/073
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/073 , H01J37/3177 , H01J2237/04735 , H01J2237/0635
摘要： An electron beam exposure apparatus, comprising an electron emitting apparatus including a lead electrode and a plurality of electron emitting elements having end portions exposed individually in a plurality of openings formed in rows and columns on a principal face of the lead electrode, a control power supply for applying a voltage between the lead electrode and selected ones of the electron emitting elements to emit electrons from the selected electron emitting elements, an acceleration electrode in the form of a flat plate having a number of very small openings equal to the number of and corresponding to the electron emitting elements, and a converging electrode in the form of a flat plate having a number of very small openings equal to the number of and corresponding to the electron emitting elements.
摘要翻译：一种电子束曝光装置，包括电子发射装置，其包括引线电极和多个电子发射元件，所述多个电子发射元件具有单独暴露在引线电极的主面上以行和列形成的多个开口中的端部，控制电源为了在引线电极和所选择的电子发射元件之间施加电压以从所选择的电子发射元件发射电子，平板形式的加速电极具有等于其数量和对应的数量的非常小的开口电子发射元件，以及平板形式的会聚电极，其具有等于电子发射元件的数目并对应于其数量的非常小的开口。

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