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    • 5. 发明公开
    • Method and apparatus for forming an anti-reflection film for a cathode-ray tube
    • 形成阴极射线管的抗反射膜的方法和装置
    • EP0533030A3
    • 1993-05-26
    • EP92115338.3
    • 1992-09-08
    • HITACHI, LTD.
    • Oishi, TomojiMaekawa, SachikoKato, AkiraNishizawa, MasahiroTomita, YoshifumiOkude, KojiroTochigi, KenjiMisawa, Yutaka
    • H01J29/89G02B1/10
    • G02B1/11H01J29/896H01J2209/012
    • An anti-reflection film (2) is produced on the panel surface of a cathode-ray tube (1) by:
      (A) preparing a solution (8) for forming an anti-reflection film (2), which contains water and an alkoxide having the formula,
              M(OR) n
      wherein M is Si or a metal selected from the group consisting of Ti, Al, Zr, Sn, In, Sb and Zn; R is an alkyl group having 1-10 carbon atoms; n is an integer of from 1 to 8; and when n is not 1, the alkyl groups represented by R may be the same or different, (B) coating the solution (8) for forming an anti-reflection film (2) on the outermost surface of the panel of a cathode-ray tube (1), and (C) applying an ultraviolet light (7) to the solution (8) for forming an anti-reflection film (2) coated on said surface to cure the solution to form a transparent film with fine roughness. This production method is carried out using an apparatus having:
      (a) a coating means (3) for coating the above solution (8) for forming an anti-reflection film (2) on the outermost surface of the panel of a cathode-ray tube (1), (b) a transferring means (4) for transferring the solution-coated cathode-ray tube (1), and (c) an ultraviolet light-applying means (7) for photocuring the solution (8) coated on the cathode-ray tube (1) during the transfer of the solution-coated cathode-ray tube. In the above method, when a silicon alkoxide is used as the metal alkoxide, there can be obtained a cathode-ray tube having an anti-reflection film made of alkali-free silica on the outermost surface of the panel, said anti-reflection film giving a ratio of Si-O-Si peak intensity to Si-OH peak intensity of 4 or more when measured for infrared spectrum. Further embodiments include an antistatic layer and the inclusion of an organic dye into the anti-reflection film.