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1. 发明公开

EP3162773A4 LOW-REFLECTION COATING, SUBSTRATE PROVIDED WITH LOW-REFLECTION COATING, AND PHOTOELECTRIC CONVERSION DEVICE 有权
公开(公告)号：EP3162773A4
公开(公告)日：2017-11-29
申请号：EP15815778
申请日：2015-06-30
申请人： NIPPON SHEET GLASS CO LTD
发明人： KOYO MIZUHO , KONDO FUMIYOSHI , MIYAMOTO YOKO , KAWAZU MITSUHIRO , MATSUBARA HIROFUMI
IPC分类号： C03C17/25 , C03C17/00 , G02B1/113 , H01L31/048
CPC分类号： G02B1/111 , C03C17/007 , C03C17/25 , C03C17/253 , C03C2217/211 , C03C2217/213 , C03C2217/214 , C03C2217/42 , C03C2217/425 , C03C2217/465 , C03C2217/478 , C03C2217/73 , C03C2217/732 , C03C2217/948 , C03C2218/118 , C03C2218/365 , G02B1/113 , H01L31/02168 , H01L31/048 , Y02E10/50
摘要： A low-reflection coating of the present invention is a porous film including fine silica particles being solid and spherical and having an average particle diameter of 80 to 150 nm; and a binder containing silica as a main component, the fine silica particles being bound together by the binder. The binder further contains an aluminum compound. The low-reflection coating contains, as components, 55 to 70 mass% of the fine silica particles, 25 to 40 mass% of the silica of the binder, and 2 to 7 mass% of the aluminum compound in terms of Al 2 O 3 . The low-reflection coating has a thickness of 80 to 800 nm. The low-reflection coating yields a transmittance gain of 2.5% or more when provided on the substrate. The transmittance gain represents an increase in average transmittance of the substrate provided with the low-reflection coating relative to the substrate not provided with the low-reflection coating, the average transmittance being measured in the wavelength range of 380 to 850 nm.

2. 发明公开

EP3010047A4 COATING LIQUID FOR SUPPRESSING DETERIORATION OF SOLAR CELL, THIN FILM OF SAME, AND METHOD FOR SUPPRESSING DETERIORATION OF SOLAR CELL 有权
标题翻译：涂布液减少磨损的太阳能电池，薄膜体和方法以减少磨损的太阳能电池
公开(公告)号：EP3010047A4
公开(公告)日：2017-01-18
申请号：EP14811634
申请日：2014-05-23
申请人： SHIN-ETSU CHEMICAL CO LTD
发明人： INOUE TOMOHIRO , FURUDATE MANABU , EGUCHI YOSHITSUGU , KOBAYASHI TAKASHI
IPC分类号： H01L31/048 , C09D7/12
CPC分类号： H01L31/02167 , C03C17/25 , C03C17/253 , C03C17/27 , C03C2217/211 , C03C2217/213 , C03C2217/214 , C03C2217/22 , C03C2217/42 , C09D1/00 , C09D7/40 , C09D7/67 , H01L31/0445 , H01L31/048 , H01L31/0481 , Y02E10/50
摘要： In order to prevent a degradation in a power generation capacity of a solar cell without modifying the parts of the solar cell themselves, there are provided a solar cell degradation control-coating liquid composed of an aqueous solution of a water-soluble compound of at least one metal selected from silicon, aluminum, zirconium, tin and zinc, or composed of a fine particle dispersion liquid of an oxide of such metal, the solar cell degradation-control coating liquid exhibiting a solid content concentration of 0.01 to 10% by mass in terms of metal oxide, and the fine particle dispersion liquid containing fine particles that have an average primary particle diameter of not larger than 50 nm and are dispersed at a dispersion particle diameter (D50) of smaller than 100 nm; a solar cell degradation control-thin film formed from such coating liquid and having a thickness of 10 to 700 nm; a solar cell degradation control method including a step of applying such coating liquid to a surface of a cover glass of a solar cell and a step of forming the thin film of the thickness of 10 to 700 nm through drying and curing at a temperature of from a normal temperature to 200°C; and a degradation-controlled solar cell with the thin film of the abovementioned coating liquid being formed on the surface of the cover glass of the solar cell.

3. 发明公开

EP1926109A1 FILM FORMING APPARATUS AND METHOD OF FILM FORMATION 审中-公开
标题翻译：维多利亚州维多利亚州
公开(公告)号：EP1926109A1
公开(公告)日：2008-05-28
申请号：EP06768232.8
申请日：2006-07-14
申请人： Fujikura, Ltd.
发明人： GOTO, Kenji , KAWASHIMA, Takuya , TANABE, Nobuo , SUZUKI, Yasuo
IPC分类号： H01B13/00 , C03C17/25 , C23C18/02
CPC分类号： C23C18/02 , C03C17/001 , C03C17/002 , C03C17/25 , C03C17/253 , C03C2217/231 , C03C2217/24 , C03C2218/112 , C23C18/1216 , C23C18/1258 , H01L31/1884 , Y02E10/50
摘要： A film forming apparatus includes: a device A that generates liquid fine particles, the liquid fine particles having controlled particle diameters; a device B that is defined by a space for guiding the generated liquid fine particles while controlling a temperature thereof; a device C that sprays the guided liquid fine particles; and a device D that is defined by a space for forming a transparent conductive film by coating the sprayed liquid fine particles onto a subject to be processed.
摘要翻译：成膜装置包括：产生液体微粒的装置A，具有受控粒径的液体微粒; 装置B，其由用于引导所产生的液体微粒同时控制其温度的空间限定; 喷射引导液体微粒的装置C; 以及由用于形成透明导电膜的空间通过将喷射的液体微粒涂覆到待处理对象上而限定的装置D.

4. 发明授权

EP0941773B1 Procédé de dépôt de couches à base d'oxyde(s) métallique(s) 有权
标题翻译：一种用于沉积金属氧化物的制造方法（一个或多个）层
公开(公告)号：EP0941773B1
公开(公告)日：2003-10-29
申请号：EP99400595.7
申请日：1999-03-11
申请人： SAINT-GOBAIN GLASS FRANCE
发明人： Minami, Tsutomu , Tadanaga, Kiyoharu
IPC分类号： B05D7/24 , C03C17/25
CPC分类号： C03C17/23 , B05D7/24 , C03C17/253 , C03C2217/21 , C03C2217/211 , C03C2217/24 , C03C2217/241 , C03C2217/244 , C03C2218/113 , C03C2218/328 , C03C2218/33

5. 发明授权

EP1230188B1 GLASS SHEET WITH METAL OXIDE FILM, METHOD OF MANUFACTURING THE SAME, AND DOUBLE-GLAZING UNIT USING THE SAME 有权
标题翻译：与金属氧化物膜，METHOD FOR THEIR和玻璃单元，使用SAME双层玻璃
公开(公告)号：EP1230188B1
公开(公告)日：2003-09-17
申请号：EP00969926.5
申请日：2000-10-19
申请人： Nippon Sheet Glass Co., Ltd.
发明人： NORIMATSU, Hodaka, Nippon Sheet Glass Co., Ltd , FUJISAWA, Akira, Nippon Sheet Glass Co., Ltd , HIRATA, Masahiro, Nippon Sheet Glass Co., Ltd
IPC分类号： C03C17/34 , C03C17/245 , C03C17/25
CPC分类号： C03C17/2453 , C03C17/253 , C03C17/3417 , C03C2217/212 , C03C2217/241 , C03C2217/244 , C03C2218/112 , C03C2218/152

6. 发明授权

EP0917525B1 METHOD OF MANUFACTURING A CONDUCTIVE LAYER ON A SUBSTRATE 失效
标题翻译：制造方法导电层上的衬底
公开(公告)号：EP0917525B1
公开(公告)日：2001-10-31
申请号：EP98907103.0
申请日：1998-03-19
申请人： Koninklijke Philips Electronics N.V.
发明人： DEN BOER, Johannes, Henricus, Wilhelmus, Gerardus , MUTTER, Claudia , WADMAN, Sipke , WILLEMS, Xavier
IPC分类号： C03C17/23
CPC分类号： H01J9/20 , C03C17/25 , C03C17/253 , C03C17/3411 , C03C2217/211 , C03C2217/215 , C03C2217/228 , C03C2217/23 , C03C2218/11 , C03C2218/32 , H01J2209/012 , H01J2229/8635
摘要： A conductive layer comprising metal-oxide or metal-oxides is applied to a substrate by providing a layer comprising a metal-salt or a mixture of metal-salts on the substrate, bringing the layer into contact with an alkaline solution, and, subsequently, subjecting the layer to a thermal treatment (heating).

7. 发明公开

EP0940368A1 PROCESS FOR PREPARING In 2?O 3?-SnO 2? PRECURSOR SOL AND PROCESS FOR PREPARING THIN FILM OF In 2?O 3?-SnO 2? 失效
标题翻译： 2的生产方法在2→3 0？-Sn0的先驱吗？及其制备在2→3 0？-Sn0 2的薄膜的制造方法？
公开(公告)号：EP0940368A1
公开(公告)日：1999-09-08
申请号：EP98921798.9
申请日：1998-05-25
申请人： KRI International, Inc.
发明人： TOKI, Motoyuki , FUKUI, Toshimi , ASAKUMA, Naoko , FUJII, Takamitsu
IPC分类号： C01G19/00 , C30B29/22 , G09F9/30 , C09D5/24 , H01B13/00
CPC分类号： C01G19/00 , C03C17/253 , C03C2217/231 , C03C2218/113 , C04B41/505 , C04B2111/805 , C04B2111/94 , C04B41/0036 , C04B41/0045 , C04B41/4537 , C04B41/4554 , C04B41/5072
摘要： The invention relates to a method for forming a transparent conductive thin film of In 2 O 3 -SnO 2 on a surface of a plastics substrate of less heat resistance other than that of glass, ceramics, etc. When an In 2 O 3 -SnO 2 precursor sol is produced by hydrolyzing and polymerizing a solution containing indium alkoxide and tin alkoxide, either tri-s-butoxyindium or tri-t-butoxyindium is used as the indium alkoxide. water is added to the solution containing indium alkoxide and tin alkoxide at a temperature of not higher than -20°C. The obtained In 2 O 3 -SnO 2 precursor sol is applied to a surface of a substrate to form a gel film, then the gel film is either irradiated with an ultraviolet beam of which wave length is not longer than 360 nm, or irradiated with an ultraviolet beam of which wave length is not longer than 260 nm and further irradiated with a laser beam of which wave length is not longer than 360 nm, to crystallize the gel forming the thin film, whereby an In 2 O 3 -SnO 2 thin film having a conductivity is formed on the surface of the substrate.
摘要翻译：本发明涉及一种用于当氧化铟-的SnO2前体溶胶通过水解和生成比玻璃，陶瓷等的其他耐热性更小的塑料基材的表面上形成氧化铟 - 的SnO 2构成的透明导电薄膜聚合含有铟醇盐和锡的醇盐，要么三S-butoxyindium或三叔butoxyindium的溶液被用作铟醇盐。将水加入到该溶液中含有铟锡醇盐和醇盐在不低于-20℃。将得到氧化铟-的SnO2前体溶胶施加到基板的表面高的温度以形成凝胶的电影，则该电影是凝胶任一照射与哪个波长的紫外光束不长于360纳米，或在哪个波长的紫外线照射不大于260nm的长和与波长的激光束进一步照射不大于360nm的长，以结晶凝胶形成薄膜，由此，在具有导电性氧化铟-SnO2薄膜是在基板的表面上形成。

8. 发明授权

EP0701977B1 Verfahren zur pyrolytischen Beschichtung von Glas-, Glaskeramik- und Emailprodukten 失效
标题翻译：一种用于玻璃，玻璃陶瓷和搪瓷制品的热解涂覆过程
公开(公告)号：EP0701977B1
公开(公告)日：1997-07-16
申请号：EP95113812.2
申请日：1995-09-02
申请人： Th. Goldschmidt AG
发明人： Krohm, Hans-Günther , Vallerien, Sven-Uwe, Dr.
IPC分类号： C03C17/34 , C03C17/25
CPC分类号： C03C17/3417 , C03C17/253

9. 发明公开

EP0780346A1 Verfahren zur pyrolytischen Beschichtung von Glas und Glaskeramik 失效
公开(公告)号：EP0780346A1
公开(公告)日：1997-06-25
申请号：EP96119670.6
申请日：1996-12-07
申请人： Th. Goldschmidt AG
发明人： Krohm, Hans-Günter , Vallerien, Sven-Uwe, Dr.
IPC分类号： C03C17/23 , C03C17/245 , C03C17/25
CPC分类号： C03C17/23 , C03C17/2453 , C03C17/253 , C03C2217/211 , C03C2217/244 , C03C2218/112 , C03C2218/152 , C03C2218/17
摘要： Verfahren zur pyrolytischen Erzeugung von transmissionsmindernden Schichten aus antimonoxiddotiertem Zinnoxid auf Glas und Glaskeramik, wobei die antimonoxiddotierte Zinnoxidschicht Zinn und Antimon im Molverhältnis 1 : 0,2 bis 1 : 0,5 enthält.
摘要翻译：在玻璃或玻璃 - 陶瓷上的氧化锑掺杂氧化锡的透射率降低层的热解生成方法中，新颖的是该层含有摩尔比1:0.2-0.5的Sn和Sb。还要求保护的是用于在玻璃或玻璃陶瓷上进行热解沉积减透层的制备物，该制剂由97-70wt。锡化合物和3-30wt。部分锑化合物与0-60％（以上化合物的重量）的有机溶剂或溶剂混合物和/或水混合。

10. 发明公开

EP0727397A3 Verfahren zur Heissendvergütung von Hohlglaskörpern durch Aufbringen von Metallverbindungen auf die heisse äussere Glasoberfläche 失效
标题翻译：由热外玻璃表面上沉积的金属连接过程中空玻璃体的热端涂层
公开(公告)号：EP0727397A3
公开(公告)日：1996-10-09
申请号：EP96101497.4
申请日：1996-02-02
申请人： Th. Goldschmidt AG
发明人： Eisen, Heinz-Günter , Krohm, Hans-Günter , Vallerien, Sven-Uwe, Dr.
IPC分类号： C03C17/25 , C03C17/34 , C03C17/42
CPC分类号： C03C17/253 , C03C17/34 , C03C17/42 , C03C2217/211 , C03C2217/213 , C03C2217/228 , C03C2217/23 , C03C2218/112
摘要： Die Erfindung betrifft ein Verfahren zur Heißendvergütung von Hohlglaskörpern, wobei man auf die zu beschichtende heiße Oberfläche
eine Lösung von Bor-, Silicium-, Zinn- und gegebenenfalls Phosphorverbindungen in Wasser und/oder organischen Lösungsmitteln aufbringt und daraus pyrolytisch eine Schicht aus Oxiden dieser Elemente erzeugt und gegebenenfalls auf diese Schicht in an sich bekannter Weise weitere Schichten im Verfahren der Heißend- und/oder Kaltendvergütung aufbringt sowie Mittel hierfür.
摘要翻译：空心玻璃体的热端回火包括施加氛围中的硼，硅，锡，和选择。 P CPDS。在水和/或表面上的有机溶剂待涂覆，和热解制备的元件，并且选择的氧化物的层。该层在热和/或冷端回火的过程上施加进一步的层。第一层优先。的厚度为5-300纳米，和关于进一步层的应用中，10-300纳米的总层厚被获得。的一个或更多的Si CPDS 4-35（重量PTS ..）;：用于对空心besteht热解施加金属氧化物层的试剂。 1-27乙CPD（一个或多个）; 8-43的Sn CPD（多个）。 0-35 P CPD（多个）。和30-86有机溶剂（混合）; 和/或水。

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