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1. 发明公开

EP3451062A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME 有权转让
公开(公告)号：EP3451062A1
公开(公告)日：2019-03-06
申请号：EP17799158.5
申请日：2017-04-27
申请人： Towerjazz Panasonic Semiconductor Co., Ltd.
发明人： OGAWA Takahisa , FUKURA Mitsunori , TAKAHASHI Nobuyoshi
IPC分类号： G03F9/00 , G01B11/00 , G03F1/00 , G03F1/42 , G03F7/20
CPC分类号： H01L23/544 , G03F1/42 , G03F7/70466 , G03F7/70475 , G03F7/70633 , G03F9/7076 , G03F9/7084 , H01L21/0337 , H01L2223/54426
摘要： A semiconductor device includes first and second inspection mark regions (51a, 51b) having the same pattern including a plurality of overlay inspection marks (61a, 61b), a first element region (52) having a portion overlapping with the first inspection mark region (51a), and a second element region (53) having a portion overlapping with the second inspection mark region (51b). The first and second element regions (52, 53) are adjacent to each other and have different areas. The first element region (52) includes a first pattern aligned with a plurality of first overlay inspection marks (61a). The second element region (53) includes a second pattern aligned with a plurality of second overlay inspection marks (61b).

2. 发明公开

EP3059635A4 METHOD FOR ALIGNING SQUARE WAFER IN FIRST PHOTOLITHOGRAPHIC PROCESS 有权
标题翻译：方法用于使矩形半导体SLICES在第一光刻工艺
公开(公告)号：EP3059635A4
公开(公告)日：2017-06-07
申请号：EP14853966
申请日：2014-01-03
申请人： INST SEMICONDUCTORS CAS
发明人： LI JINMIN , WANG JUNXI , KONG QINGFENG , GUO JINXIA , YI XIAOYAN
IPC分类号： G03F9/00 , G03F1/42
CPC分类号： G03F9/7084 , G03F1/42
摘要： The present invention provides a method of aligning a quadrate wafer in a first photolithography process. The method includes: step A: fabricating mask aligning markers in a periphery region of a mask, which is used for a first exposure process of the quadrate wafer, around a mask pattern of the mask; step B: during the first exposure process, positioning the quadrate wafer in a preset region by using the mask aligning markers on the mask, and exposing the quadrate wafer through the mask; and step C: performing alignment for the quadrate wafer during a second exposure process and subsequent exposure processes by using aligning markers on the quadrate wafer that are obtained during the first exposure process. The method may be easily and reliably performed to ensure intact dies at periphery of a quadrate wafer to be produced and thus render increased yield of chips.
摘要翻译：本发明提供了在第一光刻工序对准晶片方块的方法。该方法包括：步骤A：在掩模的外围区域制作掩模对准标记，所有这些都被用于晶片方块的第一曝光工艺中，周围的掩模的掩模图案; 步骤B：在第一曝光工艺中，通过使用掩模上的掩模对准标记，并暴露所述正方形晶片通过掩模定位在预先设定的区域中的晶片的正方形; 和步骤C：通过使用在晶片方块对准标记在第二曝光工艺和随后的曝光工艺执行用于正方形晶片对准并在第一曝光工艺过程中获得的。该方法可以容易且可靠地进行，以确保完整此在晶片正方形周边要生产，从而使芯片的产率提高。

3. 发明公开

EP2283310A4 METHOD AND APPARATUS FOR OVERLAY COMPENSATION BETWEEN SUBSEQUENTLY PATTERNED LAYERS ON WORKPIECE 审中-公开
标题翻译：用于在工件上的多个层上进行重叠补偿的方法和装置
公开(公告)号：EP2283310A4
公开(公告)日：2011-11-02
申请号：EP09750177
申请日：2009-05-22
申请人： MICRONIC LASER SYSTEMS AB
发明人： FREDRIK SJOSTROM , WAHLSTEN MIKAEL
IPC分类号： G03F1/14 , B41J2/435 , G01B11/25 , G01B11/30 , G03F7/20 , G03F9/00
CPC分类号： G03F9/7003 , G03F1/26 , G03F1/42 , G03F7/70466

4. 发明公开

EP1221073A4 A PHOTOLITHOGRAPHY MASK HAVING A SUBRESOLUTION ALIGNMENT MARK WINDOW 审中-公开
标题翻译： PHOTOLITHOGRAPHISCHE MASKE MIT NICHTAUFGELÖSENDEMAUSRICHTMARKIERUNGFENSTER
公开(公告)号：EP1221073A4
公开(公告)日：2005-01-12
申请号：EP00963687
申请日：2000-09-21
申请人： TYCO ELECTRONICS LOGISTICS AG
发明人： DILLEY JOHN WILLIAM LUKE , PICKENS MARION WAYNE
IPC分类号： G03F1/08 , G03F9/00 , H01L21/027 , G03F1/14
CPC分类号： G03F9/7088 , G03F1/42
摘要： A photolithography mask having a visible-light-opaque film disposed on a surface of a transparent substrate. The film includes at least one opening that defines an image of a circuit feature, and a window for viewing an alignment mark on an associated wafer. The window has an array of openings in the opaque film, wherein each opening is of a dimension which is substantially below that of the opening defining the image of the circuit feature. Further, a method of aligning the above photolithography mask with a wafer to be patterned. The method comprises the steps of looking through the window of the mask to view the alignment mark on the wafer and positioning the alignment mark of the wafer within the window of the mask.
摘要翻译：一种具有设置在透明基板表面上的可见光不透明膜的光刻掩模。该膜包括限定电路特征的图像的至少一个开口以及用于观看相关晶片上的对准标记的窗口。该窗口在不透明膜中具有开口阵列，其中每个开口的尺寸基本上低于限定电路特征图像的开口的尺寸。此外，将上述光刻掩模与待图案化的晶片对准的方法。该方法包括以下步骤：透过掩模的窗口观察晶片上的对准标记并将晶片的对准标记定位在掩模的窗口内。

5. 发明授权

EP0055303B1 Maske zur Abbildung eines Musters auf einer Photoresistschicht, Verfahren zur Herstellung dieser Maske und Verwendung derselben in einem photolithographischen Prozess 失效
标题翻译：用于将图案复制到光电隔层的掩模，用于生产该掩模的方法及其在光刻方法中的使用
公开(公告)号：EP0055303B1
公开(公告)日：1985-04-03
申请号：EP80108233.0
申请日：1980-12-29
申请人： IBM DEUTSCHLAND GMBH , International Business Machines Corporation
发明人： Schwarzbach, Frank Axel , Kolbe, Hartmut
IPC分类号： G03F9/00 , G03F1/00
CPC分类号： G03F9/70 , G03F1/42 , G03F1/50 , G03F9/00

6. 发明公开

EP3285120A1 STAGE LEVELING DEVICE FOR HIGH PERFORMANCE MASK ALIGNER 审中-公开
标题翻译：用于高性能面罩对齐器的台阶调整装置
公开(公告)号：EP3285120A1
公开(公告)日：2018-02-21
申请号：EP16201944.2
申请日：2016-12-02
申请人： Midas System Co., Ltd.
发明人： LEE, Gon Chul , MIN, Heung Ki , LEE, Jun Hyeong , JEON, Jae Geun
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： H01L21/682 , G03F1/42 , G03F7/70691 , G03F7/70716 , G03F7/70808 , G03F7/70833 , G03F9/7034
摘要： Disclosed is a stage leveling device for a high-performance mask aligner, having enhanced leveling maintenance and, in particular, a novel technology of preventing leveling misalignment by firmly fixing a leveling-completed wafer stage.
A conventional leveling device fixes a leveling-completed wafer stage by partially pressing side surfaces of a leveling rod and thus the leveling is misaligned due to deviations (errors) occurring while the leveling rod is moved upward and downward and leftward and rightward, and slip occurs due to a weak fixing strength of the leveling rod and thus the weight of the wafer (sample) that can be leveled to the maximum extent is decreased.
To address the problems described above, according to the present invention, when a locking ring (80) inserted at an outer side of a leveling rod (40;41) maintains an inclined state, locking is performed such that an inner circumferential surface of the locking ring fixes opposite sides of the leveling rod by applying pressure thereto and, when the locking ring maintains a horizontal state, unlocking is performed such that the inner circumferential surface of the locking ring is spaced apart from the leveling rod.
摘要翻译：本发明公开了一种用于高性能掩模对准器的平台调平装置，其具有增强的调平维持，并且特别是通过牢固地固定调平完成的晶片台来防止调平失准的新技术。传统的校平装置通过部分地按压调平杆的侧表面来固定校平完成的晶片台，因此由于在调平杆上下左右移动时发生的偏差（误差）而导致校平不对齐，并且发生滑动由于调平杆的固定强度弱，因此能够最大限度地调平的晶片（试样）的重量减少。为了解决上述问题，根据本发明，当插入调平杆（40; 41）外侧的锁定环（80）保持倾斜状态时，执行锁定，使得锁定环（80）的内圆周表面锁定环通过向其施加压力而固定调平杆的相对侧，并且当锁定环保持水平状态时，执行解锁以使得锁定环的内圆周表面与调平杆间隔开。

7. 发明授权

EP2972589B1 MECHANICALLY PRODUCED ALIGNMENT FIDUCIAL METHOD AND ALIGNMENT SYSTEM 有权
标题翻译：机械表面处理器AUSRICHTUNGSBEZUGSVERFAHREN UND AUSRICHTUNGSSYSTEM
公开(公告)号：EP2972589B1
公开(公告)日：2017-05-03
申请号：EP14715552
申请日：2014-03-11
申请人： MICRONIC MYDATA AB
发明人： SANDSTRÖM TORBJÖRN
IPC分类号： G03F9/00 , G03F1/42
CPC分类号： G03F7/70775 , G03F1/42 , G03F9/708 , G03F9/7088

8. 发明公开

EP2283310A1 METHOD AND APPARATUS FOR OVERLAY COMPENSATION BETWEEN SUBSEQUENTLY PATTERNED LAYERS ON WORKPIECE 审中-公开
标题翻译：方法和设备补偿OVERLAP安排在部分连续层之间
公开(公告)号：EP2283310A1
公开(公告)日：2011-02-16
申请号：EP09750177.9
申请日：2009-05-22
申请人： MICRONIC LASER SYSTEMS AB
发明人： FREDRIK, Sjostrom , WAHLSTEN, Mikael
IPC分类号： G01B11/30 , B41J2/435 , G01B11/25 , G03F7/20
CPC分类号： G03F9/7003 , G03F1/26 , G03F1/42 , G03F7/70466
摘要： Methods and apparatuses for patterning workpieces are provided. The methods and apparatuses described herein improve overlay between subsequently patterned layers on a workpiece by introducing an improved alignment method that compensates for workpiece distortions.

9. 发明公开

EP1531363A1 Reticle holder 审中-公开
标题翻译： Retikelhalter
公开(公告)号：EP1531363A1
公开(公告)日：2005-05-18
申请号：EP04077961.3
申请日：2004-10-27
申请人： ASML Netherlands B.V.
发明人： Heerens, Gert Jan , van de Ven, Bastiaan Lambertus Wilhelmus Marinus
IPC分类号： G03F7/20 , G03B27/62 , B65D85/30
CPC分类号： G03F1/42 , G03F7/707
摘要： Assembly of a reticle and a reticle holder, wherein the state of the reticle holder (1) is adjustable between a form closed reticle blocking state and a reticle releasing state, wherein the reticle holder (1) is arranged to hold the reticle (MA) at least in a form closed manner in at least one direction (X, Y, Z) when the reticle holder (1) is in the blocking state, where the reticle holder (1) is arranged to release the reticle (MA) when the reticle holder (1) is in the releasing state.
The invention also relates to a system comprising an assembly of a reticle (MA) and reticle holder (201), as well as at least one detector (250), wherein the reticle (MA) comprises one or more markers (MRK), wherein the reticle holder (201) and the detector (250) are arranged to be kinematically aligned with respect to each other, wherein the detector (250) is arranged to detect said reticle markers (MRK) for positioning the reticle (MA) with respect to the reticle holder (201).
摘要翻译：其中，所述标线保持架（1）的状态可以在闭合的掩模版遮蔽状态和掩模版释放状态之间调节，其中，所述标线保持器（1）被布置成保持所述掩模版（MA）至少在挡板保持器（1）处于阻挡状态时在至少一个方向（X，Y，Z）上以闭合的形式闭合，其中当光掩模保持器（1）布置成释放掩模版（MA）时标线架（1）处于释放状态。本发明还涉及包括掩模版（MA）和掩模版保持器（201）的组件以及至少一个检测器（250）的系统，其中所述掩模版（MA）包括一个或多个标记（ MRK），其中所述掩模版保持器（201）和所述检测器（250）被布置成相对于彼此运动学对准，其中所述检测器（250）布置成检测用于定位所述掩模版（MA）的所述掩模版标记（MRK））相对于掩模版保持器（201）。

10. 发明公开

EP1359467A2 Arrangement and method for transferring a pattern from a mask to a wafer 审中-公开
标题翻译：装置和方法，用于从掩模的图案转移到工件
公开(公告)号：EP1359467A2
公开(公告)日：2003-11-05
申请号：EP03009513.7
申请日：2003-04-28
申请人： MOTOROLA, INC.
发明人： Maltabes, John George , Charles, Alain Bernard , Mautz, Karl
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/7084 , G03F1/42 , G03F1/44 , G03F1/70
摘要： An arrangement for transferring a pattern from a mask (100) onto a wafer is provided. A product area (110) of the mask (100) is at least partly surrounded by a frame (112) having an alignment mark area (114). In order to avoid the need to produce a specific mask set for different alignment styles, the mask (100) and the frame (112) are designed as being separate units. Further, methods for transferring a pattern from a mask to a wafer are provided that employ a frame separated from a product area.
摘要翻译：用于传递环的布置从掩模（100）到晶片上的图案提供的。掩模（100）的产品区域（110）至少部分地由具有在对准标记区域（114）的框架（112）包围。为了避免需要产生用于不同风格对准特定的掩模组，掩模（100）和框架（112）被设计为单独的单元。此外，提供了用于传递环的方法从掩模的图案的晶片并使用从产品区分开的框架。

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