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1. 发明公开

EP3285120A1 STAGE LEVELING DEVICE FOR HIGH PERFORMANCE MASK ALIGNER 审中-公开
标题翻译：用于高性能面罩对齐器的台阶调整装置
公开(公告)号：EP3285120A1
公开(公告)日：2018-02-21
申请号：EP16201944.2
申请日：2016-12-02
申请人： Midas System Co., Ltd.
发明人： LEE, Gon Chul , MIN, Heung Ki , LEE, Jun Hyeong , JEON, Jae Geun
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： H01L21/682 , G03F1/42 , G03F7/70691 , G03F7/70716 , G03F7/70808 , G03F7/70833 , G03F9/7034
摘要： Disclosed is a stage leveling device for a high-performance mask aligner, having enhanced leveling maintenance and, in particular, a novel technology of preventing leveling misalignment by firmly fixing a leveling-completed wafer stage.
A conventional leveling device fixes a leveling-completed wafer stage by partially pressing side surfaces of a leveling rod and thus the leveling is misaligned due to deviations (errors) occurring while the leveling rod is moved upward and downward and leftward and rightward, and slip occurs due to a weak fixing strength of the leveling rod and thus the weight of the wafer (sample) that can be leveled to the maximum extent is decreased.
To address the problems described above, according to the present invention, when a locking ring (80) inserted at an outer side of a leveling rod (40;41) maintains an inclined state, locking is performed such that an inner circumferential surface of the locking ring fixes opposite sides of the leveling rod by applying pressure thereto and, when the locking ring maintains a horizontal state, unlocking is performed such that the inner circumferential surface of the locking ring is spaced apart from the leveling rod.
摘要翻译：本发明公开了一种用于高性能掩模对准器的平台调平装置，其具有增强的调平维持，并且特别是通过牢固地固定调平完成的晶片台来防止调平失准的新技术。传统的校平装置通过部分地按压调平杆的侧表面来固定校平完成的晶片台，因此由于在调平杆上下左右移动时发生的偏差（误差）而导致校平不对齐，并且发生滑动由于调平杆的固定强度弱，因此能够最大限度地调平的晶片（试样）的重量减少。为了解决上述问题，根据本发明，当插入调平杆（40; 41）外侧的锁定环（80）保持倾斜状态时，执行锁定，使得锁定环（80）的内圆周表面锁定环通过向其施加压力而固定调平杆的相对侧，并且当锁定环保持水平状态时，执行解锁以使得锁定环的内圆周表面与调平杆间隔开。

2. 发明授权

EP2993525B1 EXPOSURE APPARATUS AND EXPOSURE METHOD 有权
标题翻译：曝光装置和曝光方法
公开(公告)号：EP2993525B1
公开(公告)日：2017-10-04
申请号：EP15168108.7
申请日：2006-06-28
申请人： Nikon Corporation
发明人： Hidaka, Yasuhiro , Nagayama, Tadashi
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F7/70191 , G03F9/7026 , G03F9/7034 , G03F9/7065 , G03F9/7088 , Y10T29/49124
摘要： A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member (7) having first reflective surfaces (7b, 7c), and a light receiving system has a light receiving prism member (8) having second reflective surfaces (8b, 8c) arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.
摘要翻译：本发明提供一种表面位置检测装置，其能够高精度地检测被检测面的表面位置，而基本上不受由于在穿过反射表面的光通量中出现的偏振分量导致的相对位置偏移的影响。在该装置中，投影系统具有具有第一反射表面（7b，7c）的投影侧棱镜构件（7），以及具有排列有第二反射表面（8b，8c）的光接收棱镜构件（8）的光接收系统对应于投影侧棱镜部件。表面位置检测设备还具有用于补偿由于已经穿过第一和第二反射表面的光束的偏振分量而导致的相对位置偏移的构件。

3. 发明授权

EP1526409B1 Scanning exposure apparatus and device manufacturing method 有权
标题翻译： Abtastbelichtungsapparat和方法用于制造装置
公开(公告)号：EP1526409B1
公开(公告)日：2015-08-26
申请号：EP04256481.5
申请日：2004-10-20
申请人： CANON KABUSHIKI KAISHA
发明人： Akimoto, Satoshi
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F9/7034

4. 发明授权

EP2520978B1 Surface position detection apparatus, exposure apparatus and exposure method 有权转让
标题翻译：表面位置检测装置，曝光装置和曝光方法
公开(公告)号：EP2520978B1
公开(公告)日：2015-04-29
申请号：EP12150436.9
申请日：2006-06-28
申请人： Nikon Corporation
发明人： Hidaka, Yasuhiro , Nagayama, Tadashi
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F7/70191 , G03F9/7026 , G03F9/7034 , G03F9/7065 , G03F9/7088 , Y10T29/49124
摘要： A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member (7) having first reflective surfaces (7b, 7c), and a light receiving system has a light receiving prism member (8) having second reflective surfaces (8b, 8c) arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.

5. 发明公开

EP2733535A2 Surface position detection apparatus, exposure apparatus, and exposure method 有权转让
标题翻译： Oberflächenpositionerkennungsvorrichtung，Belichtungsvorrichtung und Belichtungsverfahren
公开(公告)号：EP2733535A2
公开(公告)日：2014-05-21
申请号：EP13194244.3
申请日：2006-06-28
申请人： Nikon Corporation
发明人： Hidaka, Yasuhiro , Nagayama, Tadashi
IPC分类号： G03F9/00 , G01B11/00 , G03F7/20
CPC分类号： G03F7/70191 , G03F9/7026 , G03F9/7034 , G03F9/7065 , G03F9/7088 , Y10T29/49124
摘要： A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member (7) having first reflective surfaces (7b, 7c), and a light receiving system has a light receiving prism member (8) having second reflective surfaces (8b, 8c) arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a depolarizing member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.
摘要翻译：一种表面位置检测装置，其能够高度精确地检测待检测表面的表面位置，而不会由于通过反射表面的光束中产生的偏振分量而受到相对位置偏移的影响。在该装置中，投影系统具有具有第一反射面（7b，7c）的突出侧棱镜部件（7），并且受光系统具有配置有第二反射面（8b，8c）的受光棱镜部件（8）与突出侧棱镜构件对应。表面位置检测装置还具有去偏振构件，用于补偿由于穿过第一和第二反射表面的光束的偏振分量引起的相对位移。

6. 发明公开

EP2466384A3 Plane position detecting apparatus, exposure apparatus and device manufacturing method 审中-公开
标题翻译：平面位置检测装置，曝光装置和装置制造方法
公开(公告)号：EP2466384A3
公开(公告)日：2012-09-05
申请号：EP12151076.2
申请日：2006-11-14
申请人： Nikon Corporation
发明人： Hidaka, Yasuhiro
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/7065 , G01B11/14 , G03F9/7026 , G03F9/7034 , G03F9/7088
摘要： A surface position detecting apparatus is arranged to be able to detect a surface position of a detection target surface with high accuracy, while restraining influence of a relative positional deviation between polarization components in a beam totally reflected on an internal reflection surface of a prism member, on detection of the surface position of the detection target surface. At least one of a light projection system and a light reception system is provided with a total reflection prism member (7; 8) having an internal reflection surface (7b, 7c; 8b, 8c) which totally reflects an incident beam. For restraining influence of the relative positional deviation between polarization components of the beam totally reflected on the internal reflection surface of the total reflection prism member, on the detection of the surface position of the detection target surface (Wa), a refractive index of an optical material forming the total reflection prism member and an angle of incidence of the incident beam to the internal reflection surface of the total reflection prism member are set so as to satisfy a predetermined relation.
摘要翻译：本发明提供一种表面位置检测装置，其能够一边抑制在棱镜部件的内部反射面上全反射的光束中的偏振分量之间的相对位置偏差的影响，一边高精度地检测检测对象面的表面位置，一旦检测到检测目标表面的表面位置。光投射系统和光接收系统中的至少一个设置有具有全反射入射光束的内反射表面（7b，7c; 8b，8c）的全反射棱镜构件（7; 8）。为了抑制在全反射棱镜构件的内部反射面全反射的光束的偏振成分间的相对位置偏差对检测对象面（Wa）的表面位置的检测的影响，形成全反射棱镜构件的材料和入射光束相对于全反射棱镜构件的内部反射表面的入射角设定为满足预定关系。

7. 发明公开

EP1544681A3 Exposure apparatus 审中-公开
公开(公告)号：EP1544681A3
公开(公告)日：2011-02-23
申请号：EP04029550.3
申请日：2004-12-14
申请人： CANON KABUSHIKI KAISHA
发明人： Miura, Seiya Canon Kabushiki Kaisha
IPC分类号： G03F9/00
CPC分类号： G03F9/7034 , G03F9/7026
摘要： An exposure apparatus includes a projection optical system for projecting a pattern on a reticle mounted on a first stage onto an object mounted on a second stage, a first reference plate provided on the reticle or a surface equivalent to the reticle, the first reference plate having three or more first reference marks each of which serves as a reference for an alignment between the reticle and the object, a measuring unit for measuring focus position at imaging positions of the first reference marks and for measuring an image surface of the projection optical system, and a correcting unit for correcting a relationship between the image surface and a reference surface as a reference of a measurement by the measuring unit.

8. 发明公开

EP1956339A1 PLANE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：平面位置检测装置，曝光装置以及元件制造工艺
公开(公告)号：EP1956339A1
公开(公告)日：2008-08-13
申请号：EP06823369.1
申请日：2006-11-14
申请人： NIKON CORPORATION
发明人： HIDAKA, Yasuhiro
IPC分类号： G01B11/00 , G03F9/02 , H01L21/027
CPC分类号： G03F9/7065 , G01B11/14 , G03F9/7026 , G03F9/7034 , G03F9/7088
摘要： A surface position detecting apparatus is arranged to be able to detect a surface position of a detection target surface with high accuracy, while restraining influence of a relative positional deviation between polarization components in a beam totally reflected on an internal reflection surface of a prism member, on detection of the surface position of the detection target surface. At least one of a light projection system and a light reception system is provided with a total reflection prism member (7; 8) having an internal reflection surface (7b, 7c; 8b, 8c) which totally reflects an incident beam. For restraining influence of the relative positional deviation between polarization components of the beam totally reflected on the internal reflection surface of the total reflection prism member, on the detection of the surface position of the detection target surface (Wa), a refractive index of an optical material forming the total reflection prism member and an angle of incidence of the incident beam to the internal reflection surface of the total reflection prism member are set so as to satisfy a predetermined relation.

9. 发明公开

EP1843209A3 Exposure apparatus and device manufacturing method 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：EP1843209A3
公开(公告)日：2007-12-05
申请号：EP07105473.8
申请日：2007-04-02
申请人： Canon Kabushiki Kaisha
发明人： Kosugi, Yuji
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F7/70725 , G03F9/7003 , G03F9/7034 , G03F9/7046 , G03F9/7084
摘要： An exposure apparatus is configured to expose a substrate (4) to light while the substrate is scanned. The apparatus comprises a stage (22) configured to hold the substrate (4) and to move, a measuring device (50) configured to measure a position of a surface of the substrate (4) held by the stage (22), a controller (110) configured to define an arrangement of measurement points with respect to each of a plurality of shot regions arranged along a straight line, and to cause the measuring device (5) to sequentially measure positions of the surface with respect to the defined measurement points in the plurality of shot regions while causing the stage (22) to move to scan the substrate (4) along the straight line. The controller (110) is configured to define the arrangement such that the plurality of shot regions have the arrangement in common with each other.
摘要翻译：曝光设备被配置成在衬底被扫描的同时使衬底（4）曝光。该设备包括：构造成保持基板（4）并移动的台（22）;构造成测量由台（22）保持的基板（4）的表面的位置的测量装置（50）;控制器（110），其被配置为相对于沿着直线布置的多个压射区域中的每一个限定测量点的布置，并且使得测量装置（5）顺序地测量表面相对于限定的测量点的位置在使所述台（22）移动以沿着所述直线扫描所述基板（4）的同时在所述多个压射区域中形成所述多个压射区域。控制器（110）被配置成限定该布置，使得多个压射区域具有彼此共同的布置。

10. 发明公开

EP1830395A1 METHOD FOR MEASURING POSITION OF MASK SURFACE IN HEIGHT DIRECTION, EXPOSURE APPARATUS AND EXPOSURE METHOD 审中-公开
标题翻译： VERFAHREN ZUR MESSUNG DER位置EERERMASKENOBERFLÄCHE在DERHÖHENRICHTUNGUND BELICHTUNGSVORRICHTUNG
公开(公告)号：EP1830395A1
公开(公告)日：2007-09-05
申请号：EP05822346.2
申请日：2005-12-21
申请人： NIKON CORPORATION
发明人： HIRAYANAGI, Noriyuki NIKON CORPORATION , TANAKA, Keiichi NIKON CORPORATION
IPC分类号： H01L21/027 , G01B11/00 , G03B21/00 , G03F7/20
CPC分类号： G03F7/70358 , G03F7/70783 , G03F9/7026 , G03F9/7034
摘要： A method to measure the height-direction position of a mask M in an exposure device having a function to irradiate the mask M with light emitted from a light source and transfer a pattern formed on the mask M onto a photosensitive substrate such as a wafer by a projection optical system, a mask surface height-direction position measurement method characterized by moving, before measuring the height-direction position of the mask M, an exposure area defining member 1 which is arranged between the mask M and the projection optical system and defines an exposure area at the time of exposure.
摘要翻译：一种用于测量具有从光源发出的光照射掩模M的功能的曝光装置中的掩模M的高度方向位置的方法，并且将形成在掩模M上的图案转印到诸如晶片的感光基板上，投影光学系统，掩模表面高度方向位置测量方法，其特征在于在测量掩模M的高度方向位置之前移动曝光区域限定构件1，其布置在掩模M和投影光学系统之间并且限定曝光时的曝光区域。

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