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    • 9. 发明公开
    • Cantilevered microtip
    • Mikrospitze auf freitragendem Arm。
    • EP0500980A1
    • 1992-09-02
    • EP91102880.1
    • 1991-02-27
    • TENCOR INSTRUMENTS
    • Neukermans, Armand P.Berger, Josef
    • G01B7/34G01N27/00
    • G01Q70/16G01Q70/10G01Q70/14H01L21/30604H01L21/30608Y10S438/924
    • A method for fabricating a microtip, cantilevered from a base and having a controllably high aspect ratio, for use in microprobe microscopy to probe variations in materials at the atomic level. A two-layer semiconductor material structure is provided (13), one layer being n type (15) and the other layer being p type (17). A thin pencil of ions (22) of n type is implanted through the n type layer into the p type layer (17), through a small aperture in a mask layer (19) that overlies the n type layer. The p type material is then etched away, leaving the n type ion profile (23) and the n type layer as a cantilevered microtip. The n type semiconductor layer may be replaced by a layer of any material that resists etching by the selected etchant.
    • 用于制造从底部悬臂并具有可控高的纵横比的微尖端的方法,用于微探针显微镜以探测原子水平的材料变化。 提供两层半导体材料结构(13),一层为n型(15),另一层为p型(17)。 将n型离子(22)的薄铅通过n型层通过覆盖在n型层上的掩模层(19)中的小孔注入p型层(17)。 然后将p型材料蚀刻掉,留下n型离子轮廓(23)和n型层作为悬臂微尖。 n型半导体层可以由抗蚀刻所选择的蚀刻剂的任何材料的层代替。