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    • 3. 发明公开
    • WEIGHING DEVICE
    • WIEGEVORRICHTUNG
    • EP3121570A4
    • 2017-10-04
    • EP15764975
    • 2015-03-17
    • ISHIDA SEISAKUSHO
    • CHIBA TOSHIYUKIMIZUNO EMIIWAKAWA KEN
    • G01G23/37G01G11/00G01G19/03G01G23/10
    • G01G23/37G01G11/00G01G11/003G01G11/04G01G19/035G01G23/10
    • Provided is a weighing device in which it is possible to reliably determine appropriate filter conditions even without actually performing weighing. A weighing device 1 includes: a weighing cell 5 which weighs an article P and outputs an original signal corresponding to the weight of the weighed article P; a filter unit 9 which performs a filtering process on the original signal output from the weighing cell 5; a controller 15 which makes a waveform of a weighing signal subjected to the filtering process be displayed on a touch panel 17; and a storage unit 13 which stores at least one of the original signal and the weighing signal, wherein the controller 15 predicts and generates the waveforms of a plurality of weighing signals in a case of performing a plurality of filtering processes having different characteristics on the original signal or the weighing signal stored in the storage unit 13, and makes the waveforms of the plurality of weighing signals be displayed on the touch panel 17.
    • 本发明提供一种即使不进行实际称量也能够可靠地确定适当的过滤条件的称量装置。 称重装置1包括:称量单元5,其称量物品P并输出与称量物品P的重量相对应的原始信号; 过滤单元9,其对从称重单元5输出的原始信号进行过滤处理; 在触摸面板17上显示使过滤处理后的称重信号的波形显示的控制部15, 以及存储单元13,其存储原始信号和称重信号中的至少一个,其中控制器15在对原件执行具有不同特性的多个滤波处理的情况下预测并生成多个称重信号的波形 信号或存储在存储单元13中的称重信号,并且使得多个称重信号的波形显示在触摸面板17上。
    • 4. 发明公开
    • UNLOADING ROBOT HAVING FUNCTION OF SENSING WEIGHT OF INJECTED MATERIAL
    • ENTLADUNGSROBOTER MIT FUNKTION ZUR MESSUNG DES GEWICHTS EINES INJIZIERTEN MATERIALS
    • EP3002102A4
    • 2017-03-29
    • EP14859009
    • 2014-06-16
    • HANYANG ROBOTICS CO LTD
    • JANG EUNG-HA
    • B29C45/40B25J15/06B25J19/02B29C37/00B29C45/42B29C45/76B29C47/92B65G47/91G01G19/52G01G21/22G01G23/10
    • B29C45/42B25J9/026B25J13/085B25J15/06B29C37/0017B29C45/4005B29C45/76B29C45/7686B29C47/92B29C2945/7613B29C2945/7625B29C2945/76317B29C2945/76421B65G47/914B65G47/918G01G19/52G01G21/22G01G23/10
    • Provided is a take-out robot including a load cell in a rotating unit to allow an injection molded product to be attached to an adhesive unit, measure a weight of the injection molded product on a conveying route of the take-out robot, and determine whether the injection molded product is desirable or faulty. Such a configuration of the take-out robot may be applied to reduce a cost and a space for installation and facilitate conveyance without an additional scale and a conveying route. In addition, to prevent damage to the load cell and prolong a service life of the load cell, a chucking device of measuring the weight may be installed to prevent a vertical load during the taking out and a force during the conveying from being applied to the load cell, and allow the force to be applied to the load cell only when reaching a weight measuring point. Further, a cut portion may be formed to have a stepped boundary surface in the load cell and thus, a stopper function may be performed against bending deflection of the load cell when a load is applied so that the load cell may be protected without an additional chucking device of measuring the weight.
    • 本发明提供一种取出机器人,该取出机器人在旋转单元中具备测力传感器,该测力传感器能够将注射成型品安装于粘接单元,测量取出机器人的传送路径上的注射成型品的重量, 无论注塑产品是合意的还是错误的。 取出机器人的这种构造可以应用于降低成本和安装空间并且便于运输而无需额外的比例尺和输送路线。 另外,为了防止测力传感器的损坏和延长测力传感器的使用寿命,可以安装测量重量的夹紧装置,以防止取出期间的垂直负载和传送过程中的力施加到 称重传感器,并且仅当达到重量测量点时才允许力施加到称重传感器。 此外,切口部分可以形成为在测力传感器中具有阶梯式边界表面,并且因此可以在施加载荷时针对测力传感器的弯曲偏转执行止动功能,从而可以保护测力传感器而无需额外 测量重量的夹紧装置。
    • 5. 发明公开
    • SEMICONDUCTOR WAFER WEIGHING APPARATUS AND METHODS
    • VORRICHTUNG UND VERFAHREN ZUM WIEGEN VON HALBLEITERWAFERN
    • EP3126796A1
    • 2017-02-08
    • EP15714608.5
    • 2015-03-23
    • Metryx Limited
    • WILBY, Robert JohnKIERMASZ, Adrian
    • G01G17/00G01G23/10H01L21/67
    • G01G23/10G01G17/00H01L21/67253H01L21/67288H01L22/12
    • A semiconductor wafer weighing apparatus comprises: a weight force measuring device for measuring a weight force of a semiconductor wafer; and control means configured to control an operation of the apparatus based on detection of acceleration of the apparatus or of a semiconductor wafer loaded on the apparatus by a detector for detecting acceleration of the apparatus or of a semiconductor wafer loaded on the apparatus; wherein: the control means is arranged to determine an error in the output of the weight force measuring device caused by an acceleration of the apparatus or of a semiconductor wafer loaded on the apparatus, using a predetermined relationship that matches the error in the output of the weight force measuring device to acceleration of the apparatus or of a semiconductor wafer loaded on the apparatus for different accelerations of the apparatus or of a semiconductor wafer loaded on the apparatus.
    • 半导体晶片称重装置包括:用于测量半导体晶片的重量的重量测量装置; 以及控制装置,被配置为基于检测装置或加载在装置上的半导体晶片的加速度来控制装置的操作,所述检测器用于检测装置或装载在装置上的半导体晶片的加速度; 其特征在于,所述控制装置被配置为使用与所述装置的加速度相对应的预定关系来确定由所述装置或装载在所述装置上的半导体晶片的加速度引起的所述重力测量装置的输出中的误差, 重量测量装置,用于加速设备或加载在设备上的半导体晶片,用于装置或装载在装置上的半导体晶片的不同加速度。
    • 9. 发明公开
    • Kraftmessvorrichtung und Referenzeinheit
    • EP1898193A1
    • 2008-03-12
    • EP06120100.0
    • 2006-09-05
    • Mettler-Toledo AG
    • Reber, DanielBurkhard, Hans-Rudolf
    • G01G23/10G01G23/01G01G7/04
    • G01G23/10G01G7/04G01G23/01
    • Die Kraftmessvorrichtung (1000) weist eine Messeinheit (100a) und eine Referenzeinheit (100R) auf, die der Abgabe einer Referenzgrösse, eines Referenzstromes (I REF ) oder einer Referenzspannung (U REF ), dient, mittels der die zu bestimmende Kraft (F MO) eines Messobjekts von der Messeinheit (100a) messbar ist. Erfindungsgemäss ist die Referenzeinheit (100R) eine mit einer Referenzmasse (m REF ) belastete Kraftmessvorrichtung, die nach dem Prinzip der elektromagnetischen Kraftkompensation einen Referenzstrom (I REF ) erzeugt, der mittels einer Mess- und Regelvorrichtung (3,4) derart regelbar ist, dass er in einer von einem Referenzhebel (105R) gehaltenen ersten Referenzspule (1R;1Ra) ein Magnetfeld erzeugt, welches mit dem Magnetfeld eines Referenzmagneten (2R) derart zusammenwirkt, dass eine Kraft auf den Referenzhebel (105R) einwirkt, mittels der die ebenfalls auf den Referenzhebel (105R) einwirkende Kraft (F REF ) der Referenzmasse (m REF ) kompensierbar ist.
    • 该装置具有参考单元和测量单元(100),其中参考单元允许测量单元测量和/或数字化待确定的测量对象的力。 当参考单元加载参考质量时,参考单元根据电磁力补偿的原理生成参考电流。 参考电流的大小由测量和调节装置控制。 作用于参考杆的参考质量块的力可以通过磁力补偿。