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1. 发明授权

EP1781764B1 KLARSPÜLHALTIGE WASCH- UND REINIGUNGSMITTEL MIT SCHWEFELHALTIGEN AMINOSÄUREN 有权转让
标题翻译： KLARSPÜLHALTIGE洗涤和清洁剂含硫氨基酸
公开(公告)号：EP1781764B1
公开(公告)日：2013-12-18
申请号：EP05770951.1
申请日：2005-07-28
申请人： Henkel AG & Co. KGaA
发明人： KESSLER, Arnd , PEGELOW, Ulrich , NITSCH, Christian , GENTSCHEV, Pavel
IPC分类号： C11D3/34 , C11D1/722 , C11D1/72 , C11D3/37
CPC分类号： C11D3/378 , C11D1/721 , C11D1/722 , C11D3/3472 , C11D3/349 , C11D3/3769
摘要： The invention relates to machine cleaning agents, which contain at least one sulphurous amino acid and at least one rinsing substance from the group containing hydroxy mixed ethers, polymers with a cationic monomer unit and copolymers consisting of monomers containing sulphonic acid. Said cleaning agents are characterised by significantly improved silver corrosion protection.

2. 发明公开

EP2271616A4 SULFOPEROXYCARBOXYLIC ACIDS, THEIR PREPARATION AND METHODS OF USE AS BLEACHING AND ANTIMICROBIAL AGENTS 有权转让
标题翻译： SULFOPEROXYCARBONSÄUREN，生产和使用漂白剂和抗菌药物的方法
公开(公告)号：EP2271616A4
公开(公告)日：2013-07-17
申请号：EP09726128
申请日：2009-03-27
申请人： ECOLAB INC
发明人： LI JUNZHONG , STAUB RICHARD K , MCSHERRY DAVID D , LASCOTTE KEITH G , LANGE STEVEN J , EVERTS FRANK
IPC分类号： C07C309/12 , A23L3/3535 , C07C309/05 , C07C309/08 , C07D303/16 , C11D3/48
CPC分类号： A01N41/04 , A01N41/08 , A23B4/20 , A23B5/14 , A23L3/3535 , C07C409/42 , C07D303/16 , C11D3/3472 , C11D3/3945 , C11D3/48 , A01N37/16 , A01N59/00 , A01N2300/00
摘要： The present invention relates to novel sulfoperoxycarboxylic acid compounds, and methods for making and using them. The sulfoperoxycarboxylic compounds of the invention are storage stable, water soluble and have low to no odor. Further, the compounds of the present invention can be formed from non-petroleum based renewable materials. The compounds of the present invention can be used as antimicrobials, and bleaching agents. The compounds of the present invention are also suitable for use as coupling agents.
摘要翻译：本发明涉及新的磺基过氧羧酸化合物，以及用于制备和使用它们的方法。本发明的磺基过氧化合物是储存稳定的，水溶性的，并且具有低到没有气味。此外，本发明的化合物可以从非石油基可再生材料制成。本发明的化合物可被用作抗微生物剂，和漂白剂。本发明的化合物因此适合用作偶联剂。

3. 发明授权

EP1725647B1 IMPROVED ACIDIC CHEMISTRY FOR POST-CMP CLEANING 有权
标题翻译：改进ACID田宝，清洗后CMP
公开(公告)号：EP1725647B1
公开(公告)日：2009-04-22
申请号：EP05702325.1
申请日：2005-01-24
申请人： L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
发明人： FISHER, Matthew, L. , MISRA, Ashutosh
IPC分类号： C11D11/00 , C11D3/20 , C11D3/33 , C11D3/28 , C11D7/26 , C11D7/32 , C11D3/22 , C11D3/34 , C11D7/34
CPC分类号： C11D11/0047 , C11D3/0073 , C11D3/2072 , C11D3/2075 , C11D3/2082 , C11D3/2086 , C11D3/2096 , C11D3/221 , C11D3/28 , C11D3/33 , C11D3/3427 , C11D3/3472 , C11D3/3481 , C11D3/349 , C11D7/264 , C11D7/265 , C11D7/267 , C11D7/3245 , C11D7/3263 , C11D7/3272 , C11D7/3281 , C11D7/34 , C23G1/103
摘要： This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an acidic chemistry for the post-CMP cleaning of wafers containing metal, particularly copper, interconnects. Residual slurry particles, particularly copper or other metal particles, are removed from the wafer surface without significantly etching the metal, leaving deposits on the surface, or imparting significant organic (such as carbon) contamination to the wafer while also protecting the metal from oxidation and corrosion. Additionally, at least one strong chelating agent is present to complex metal ions in solution, facilitating the removal of metal from the dielectric and preventing re-deposition onto the wafer. Using acidic chemistry, it is possible to match the pH of the cleaning solution used after CMP to that of the last slurry used on the wafer surface.

4. 发明授权

EP0858102B1 Surface treatment composition and method for treating surface of substrate by using the same 失效
标题翻译：处理基材表面和治疗剂用于此目的的方法
公开(公告)号：EP0858102B1
公开(公告)日：2007-07-25
申请号：EP98101323.8
申请日：1998-01-26
申请人： Mitsubishi Chemical Corporation
发明人： Morinaga, Hitoshi, c/o Mitsubishi Chem. Corp.
IPC分类号： H01L21/306 , C11D1/00 , C23G1/14
CPC分类号： H01L21/02052 , C11D3/33 , C11D3/3418 , C11D3/3472 , C11D3/349 , C11D3/364 , C11D3/365 , C23G1/14

5. 发明公开

EP1781764A1 KLARSPÜLHALTIGE WASCH- UND REINIGUNGSMITTEL MIT SCHWEFELHALTIGEN AMINOSÄUREN 有权转让
标题翻译： KLARSPÜLHALTIGE洗涤和清洁剂含硫氨基酸
公开(公告)号：EP1781764A1
公开(公告)日：2007-05-09
申请号：EP05770951.1
申请日：2005-07-28
申请人： HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN
发明人： KESSLER, Arnd , PEGELOW, Ulrich , NITSCH, Christian , GENTSCHEV, Pavel
IPC分类号： C11D3/34 , C11D1/722 , C11D1/72 , C11D3/37
CPC分类号： C11D3/378 , C11D1/721 , C11D1/722 , C11D3/3472 , C11D3/349 , C11D3/3769
摘要： The invention relates to machine cleaning agents, which contain at least one sulphurous amino acid and at least one rinsing substance from the group containing hydroxy mixed ethers, polymers with a cationic monomer unit and copolymers consisting of monomers containing sulphonic acid. Said cleaning agents are characterised by significantly improved silver corrosion protection.

6. 发明公开

EP0858102A3 Surface treatment composition and method for treating surface of substrate by using the same 失效
标题翻译：处理基材表面和治疗剂用于此目的的方法
公开(公告)号：EP0858102A3
公开(公告)日：2000-08-30
申请号：EP98101323.8
申请日：1998-01-26
申请人： MITSUBISHI CHEMICAL CORPORATION
发明人： Morinaga, Hitoshi, c/o Mitsubishi Chem. Corp.
IPC分类号： H01L21/306 , C11D1/00 , C23G1/14
CPC分类号： H01L21/02052 , C11D3/33 , C11D3/3418 , C11D3/3472 , C11D3/349 , C11D3/364 , C11D3/365 , C23G1/14
摘要： A surface treatment composition containing a complexing agent as a metal deposition preventive in a liquid medium, in which the complexing agent is an ethylenediaminephenol derivative of the following general formula (1) or its salt: wherein X 1 and X 2 are hydroxyl groups; Y 1 to Y 8 are respectively independently a hydrogen atom, a hydroxyl group, a halogen atom, a carboxyl group, a phosphonic acid group, a sulfonic acid group, a carbonyl group, a nitro group, a nitroso group, an amino group, an imino group, a nitrilo group, a nitrile group, a thiocyanate group, a hydroxyamino group, a hydroxyimino group, or an alkyl or alkoxy group which may have a substituent, provided that at least one of Y 1 to Y 8 is not a hydrogen atom; Z 1 to Z 4 are respectively independently a hydrogen atom, a carboxyl group or a sulfonic acid group; and R 1 to R 4 are respectively independently a hydrogen atom or an alkyl group which may have a substituent.
摘要翻译：的表面处理组合物含有配位剂作为金属沉积在液体介质中的预防，其中所述配位剂是以下通式的ethylenediaminephenol衍生物（1）或其盐： worin X1和X2是羟基; Y1到Y8分别独立地为氢原子，羟基，卤原子，羧基，膦酸基，磺酸基，羰基，硝基，亚硝基成氨基，亚氨基，以基，次氮基，腈基，硫氰酸酯基，羟基氨基，羟基亚氨基，或烷基或烷氧基可以具有取代基，条件做Y1至Y8的至少一个为不是氢原子; Z1到Z4分别独立地表示氢原子，羧基或磺酸基; 和R1至R4分别是氢原子或独立地为烷基基团的可以具有取代基。

7. 发明公开

EP0935692A1 FABRIC TREATED WITH CELLULASE AND OXIDOREDUCTASE 失效
标题翻译：面料采用纤维素酶和氧化还原酶经处理
公开(公告)号：EP0935692A1
公开(公告)日：1999-08-18
申请号：EP97900194.0
申请日：1997-01-08
申请人： NOVO NORDISK A/S
发明人： VOLLMOND, Thomas
IPC分类号： D06L3 , C11D3 , C12S3 , D06M16 , D06P1 , D06P5
CPC分类号： D06P1/65106 , C11D3/28 , C11D3/3418 , C11D3/3472 , C11D3/349 , C11D3/38645 , C11D3/38654 , D06M16/003 , D06P1/6426 , D06P1/65118 , D06P1/65193 , D06P5/02 , D06P5/04 , D06P5/06 , D06P5/158
摘要： The invention deals with a process for providing an abraded look with a reduced strength loss in dyed fabric comprising (a) contacting, in an aqueous medium, a dyed fabric with a cellulase in a concentration corresponding to 0.01-250 νg of enzyme protein per g of fabric; (b) simultaneously or subsequently treating said fabric with a phenol oxidizing enzyme system and an enhancing agent.

8. 发明授权

EP0485161B1 Stripping compositions and method of stripping resists from substrates 有权
标题翻译：剥离和方法用于从表面去除抗蚀剂
公开(公告)号：EP0485161B1
公开(公告)日：1999-01-27
申请号：EP91310208.3
申请日：1991-11-05
申请人： EKC TECHNOLOGY, INC.
发明人： Lee, Wai Mun
IPC分类号： G03F7/42
CPC分类号： H01L21/02071 , B24B37/042 , C09D9/00 , C11D3/2058 , C11D3/2065 , C11D3/2086 , C11D3/30 , C11D3/3427 , C11D3/3472 , C11D3/43 , C11D7/261 , C11D7/262 , C11D7/263 , C11D7/265 , C11D7/267 , C11D7/32 , C11D7/3209 , C11D7/3218 , C11D7/3227 , C11D7/3245 , C11D7/3254 , C11D7/3263 , C11D7/3272 , C11D7/3281 , C11D7/34 , C11D7/5013 , C11D11/0047 , C11D11/0052 , C23G1/103 , C23G1/205 , G03F7/42 , G03F7/423 , G03F7/425 , H01L21/02052 , H01L21/02063 , H01L21/31133 , H01L21/76802 , H01L21/76885

9. 发明授权

EP0509382B1 Biodegradable bleach stabilizers for detergents 有权转让
标题翻译：洗涤剂可生物降解的漂白稳定剂
公开(公告)号：EP0509382B1
公开(公告)日：1998-11-04
申请号：EP92106046.3
申请日：1992-04-08
申请人： HAMPSHIRE CHEMICAL CORPORATION
发明人： Woodbury, Richard Paul , Hartman, JudithAnn Ruth
IPC分类号： C11D3/39
CPC分类号： C11D3/3951 , C07C229/16 , C07C229/24 , C07C319/18 , C11D3/33 , C11D3/3472 , C11D3/349 , C11D3/394 , C07C323/52

10. 发明公开

EP0783034A3 Chelating agent and detergent comprising the same 无效
标题翻译：螯合剂和含有该洗涤剂
公开(公告)号：EP0783034A3
公开(公告)日：1998-07-08
申请号：EP96118762
申请日：1996-11-22
申请人： NITTO CHEMICAL INDUSTRY CO LTD
发明人： YAMAMOTO HIROSHI , TAKAYANAGI YASUYUKI , TAKAHASHI KIYOBUMI , NAKAHAMA TETURO
IPC分类号： C11D1/83 , C11D3/08 , C11D3/20 , C11D3/33 , C11D3/34 , C11D3/395
CPC分类号： C11D3/33 , C11D3/2075 , C11D3/2082 , C11D3/2086 , C11D3/3472 , C11D3/349
摘要： Disclosed is a biodegradable chelating agent which comprises a compound of the following formula [1] and at least one compound selected from the group consisting of aspartic acid, maleic acid, acrylic acid, malic acid, glycine, glycolic acid, iminodiacetic acid, nitrilotriacetic acid, α-alanine, β-alanine, iminodipropionic acid, fumaric acid, a synthetic starting amino acid and a synthetic intermediate amino acid and a salt thereof in an amount of 8% by weight or less based on the compound of the formula [1]: wherein R
1 represents hydrogen or an unsubstituted or substituted hydrocarbon group of 1-10 carbon atoms, R
2 represents hydrogen or an unsubstituted or substituted hydrocarbon group of 1-8 carbon atoms, R
1 and R
2 may form a ring together, the substituent which can be present in R
1 and R
2 is at least one member selected from the group consisting of -OH, -CO
2 M and -SO
3 M where M represents hydrogen or an alkali metal; X represents where R
3 represents hydrogen or an unsubstituted or substituted hydrocarbon group of 1-8 carbon atoms, the substituent is at least one member selected from the group consisting of -OH, -CO
2 M and -SO
3 M, R
4 represents at least one member selected from the group consisting of hydrogen, -CO
2 M and -SO
3 M, A
1 and A
2 each represent at least one member selected from the group consisting of hydrogen, CO
2 M and SO
3 M, A
5 represents an alkylene group of 1-8 carbon atoms which may be of straight chain or branched chain or may form a ring, the alkylene group may contain in the chain an ether bond -O-, an ester bond -COO- or an amide bond -CONH-, M represents hydrogen or an alkali metal, and n represents an integer of 1-8; and Y represents at least one member selected from the group consisting of hydrogen, CO
2 M and SO
3 M.

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