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1. 发明公开

EP3374485A1 CLEANING AND DISINFECTING COMPOSITION 有权
公开(公告)号：EP3374485A1
公开(公告)日：2018-09-19
申请号：EP16725736.9
申请日：2016-05-20
申请人： American Sterilizer Company
发明人： FRANCISKOVICH, Phillip P. , ROSENHAMER, Donald G. , FIX, Kathleen A.
IPC分类号： C11D1/66 , C11D1/72 , C11D1/75 , C11D1/88 , C11D1/90 , C11D3/04 , C11D3/20 , C11D3/22 , C11D3/28 , C11D3/30 , C11D3/33 , C11D3/36 , C11D3/37 , C11D3/39 , C11D3/48 , C11D7/10 , C11D7/26 , C11D7/32 , C11D7/36 , C11D11/00 , A61L2/18
CPC分类号： A61L2/18 , A01N37/02 , A01N37/16 , A01N59/00 , A01N59/02 , A61B1/005 , A61B1/125 , A61L2/186 , A61L2202/17 , A61L2202/24 , B08B3/08 , C11D1/66 , C11D1/662 , C11D1/72 , C11D1/722 , C11D1/75 , C11D1/88 , C11D1/90 , C11D3/0073 , C11D3/046 , C11D3/2068 , C11D3/2075 , C11D3/2082 , C11D3/2086 , C11D3/225 , C11D3/28 , C11D3/30 , C11D3/33 , C11D3/361 , C11D3/364 , C11D3/365 , C11D3/3707 , C11D3/38618 , C11D3/38627 , C11D3/38636 , C11D3/3947 , C11D3/48 , C11D7/10 , C11D7/263 , C11D7/265 , C11D7/3218 , C11D7/3245 , C11D7/3281 , C11D7/36 , C11D11/0041
摘要： The disclosed invention relates to a two-part liquid composition for cleaning and disinfecting a substrate, comprising: (A) a disinfectant medium comprising peracetic acid; and (B) a supplemental medium comprising a non-enzymatic cleaner, a corrosion inhibitor, and a chelator. The supplemental medium (B) may further comprise an enzymatic cleaner, a surfactant, a buffer, a pH modifier, or a mixture of two or more thereof. The substrate may be a medical device, for example, an endoscope.

2. 发明公开

EP3330352A1 CLEANING COMPOSITIONS INCLUDING ENZYMES AND ALKOXYLATED PHENOL 审中-公开
公开(公告)号：EP3330352A1
公开(公告)日：2018-06-06
申请号：EP17204768.0
申请日：2017-11-30
申请人： The Procter & Gamble Company
发明人： LANT, Neil Joseph
IPC分类号： C11D3/386
CPC分类号： C11D3/38636 , C11D3/2089 , C11D7/263
摘要： Cleaning compositions that include a galactanase enzyme and alkoxylated phenol, in particular an alkoxylated polyaryl phenol and/or an alkoxylated polyalkyl phenol. Methods of making and using such cleaning compositions. Use of a galactanase enzyme and an alkoxylated phenol.

3. 发明公开

EP3247784A1 SOLUTIONS AND PROCESSES FOR REMOVING SUBSTANCES FROM SUBSTRATES 有权转让
标题翻译：从基质中去除物质的解决方案和过程
公开(公告)号：EP3247784A1
公开(公告)日：2017-11-29
申请号：EP16740490.4
申请日：2016-01-05
申请人： Dynaloy, LLC
发明人： ACRA, Travis, W. , PETERS, Richard, Dalton , POLLARD, Kimberly, Dona , PFETTSCHER, Donald, James
IPC分类号： C11D7/32 , G03F7/42 , B01F17/18
CPC分类号： C11D7/3209 , C11D3/2068 , C11D7/261 , C11D7/263 , C11D7/3218 , C11D7/3263 , C11D11/0047 , H01L21/02068 , H01L21/0275 , H01L21/31133 , H01L24/11 , H01L24/13 , H01L24/14 , H01L2224/11002 , H01L2224/1132 , H01L2224/1146 , H01L2224/1147 , H01L2224/11849 , H01L2224/131 , H01L2224/14181 , H01L2224/16145 , H01L2224/16227 , H01L2924/00012 , H01L2924/014 , H01L2924/00014
摘要： The disclosure is directed solutions and processes to remove substances from substrates. Optionally, the substances can include photoresist on semiconductor wafers. The solution may include a quaternary ammonium hydroxide, a first amine, a second amine, and a third amine with the total amount of amine being no greater than about 95% by weight of a total weight of the solution. Additionally, a solution may include at least one amine, a quaternary ammonium hydroxide, and water and be free of a polar solvent other than water with the solution having a dynamic viscosity that is no greater than about 60 centipoise.

4. 发明公开

EP3107976A1 STABILIZED HYDROCHLOROFLUOROOLEFINS AND HYDROFLUOROOLEFINS 审中-公开
标题翻译：稳定剂氢氟酸盐
公开(公告)号：EP3107976A1
公开(公告)日：2016-12-28
申请号：EP15752020.6
申请日：2015-02-10
申请人： Arkema, Inc.
发明人： ELSHEIKH, Maher Y. , CHEN, Benjamin Bin , VAN HORN, Brett L. , ABBAS, Laurent , SESHADRI, Sri R.
IPC分类号： C09K5/04 , C07C21/04
CPC分类号： C09K5/044 , A62D1/0057 , C08F2/42 , C08J9/144 , C08J9/146 , C08J9/149 , C08J2325/06 , C08J2375/04 , C09K3/30 , C09K5/045 , C09K2205/126 , C11D3/0084 , C11D7/247 , C11D7/261 , C11D7/263 , C11D7/5018
摘要： Disclosed is a combination of hydrofluoroolefins and/or hydrochlorofluoroolefins with stabilizers wherein the stabilizers minimize the degradation of the hydrofluoroolefins and hydrochlorofluoroolefins during storage, handling and use yet allow for atmospheric degradation. The combinations exhibit low or zero ozone depletion potential and lower global warming potential making them of interest as replacements for chlorofluorocarbons and hydrfluorocarbons. The combinations of the present invention comprise hydrofluoroolefins and/or hydrochlorofluoroolefins in combination with a stabilizer or stabilizers selected from free radical scavengers, acid scavengers, oxygen scavengers, polymerization inhibitors and combinations thereof.
摘要翻译：公开了氢氟烯烃和/或氢氯氟烯烃与稳定剂的组合，其中稳定剂使储存，处理和使用期间氢氟烯烃和氢氯氟烯烃的降解最小化，但允许大气降解。这些组合表现出低或零臭氧消耗潜力和较低的全球变暖潜能，使其成为氯氟烃和氢氟碳化物的替代品。本发明的组合包括与选自自由基清除剂，酸清除剂，除氧剂，聚合抑制剂及其组合的稳定剂或稳定剂组合的氢氟烯烃和/或氢氯氟烯烃。

5. 发明公开

EP2763946A1 PROCEDE DE PREPARATION DU 1,2,3-TRIMETHOXYPROPANE, UTILISATIONS ET COMPOSITIONS COMPRENANT LEDIT 1,2,3-TRIMETHOXYPROPANE 无效
标题翻译：用于生产1,2,3-三甲丙烷，其用途和组合物与本1,2,3-三甲丙烷
公开(公告)号：EP2763946A1
公开(公告)日：2014-08-13
申请号：EP12775821.7
申请日：2012-10-05
申请人： Fonds de Developpement des Filières des Oleagineux et Proteagineux (FIDOP) , Université Claude Bernard Lyon I
发明人： LEMAIRE, Marc , DAYOUB, Wissam , SUTTER, Marc , RAOUL, Yann
IPC分类号： C07C41/16 , C07C43/10 , A61K8/33 , A61K47/08 , C09D9/00 , C10L10/00 , C11D3/43 , C11D7/50
CPC分类号： C07C41/16 , A61K8/33 , A61K47/08 , A61Q1/00 , A61Q13/00 , C09D7/20 , C09D9/005 , C10L1/1826 , C10M2207/0225 , C10N2240/08 , C10N2240/30 , C11D3/2068 , C11D7/263 , C07C43/10
摘要： The present invention relates to a method for preparing 1,2,3-trimethoxypropane from glycerol, in the presence of a methylating agent and a phase-transfer catalyst in a basic medium, to a composition including the 1,2,3-trimethoxypropane, and to the use thereof as a solvent for replacing a solvent used in the performance of a chemical reaction or as a reagent involved in said chemical reaction.

6. 发明公开

EP2613199A1 PHOTORESIST RESIDUE AND POLYMER RESIDUE REMOVING LIQUID COMPOSITION 审中-公开
标题翻译： FLÜSSIGEZUSAMMENSETZUNG ZUR ENTFERNUNG VON FOTOLACK- UND POLYMERRESTEN
公开(公告)号：EP2613199A1
公开(公告)日：2013-07-10
申请号：EP11821952.6
申请日：2011-09-02
申请人： Kanto Kagaku Kabushiki Kaisha
发明人： OHWADA, Takuo
IPC分类号： G03F7/42 , C11D7/26 , C11D7/50 , H01L21/027 , H01L21/304
CPC分类号： G03F7/422 , C11D7/261 , C11D7/263 , C11D7/265 , C11D7/5022 , C11D11/0047 , G03F7/426 , H01L21/02063 , H01L21/31133
摘要： Provided are a photoresist residue and polymer residue removing liquid composition, and a method of removing the residue used therewith, for removing photoresist residue and polymer residue produced during a process of manufacturing a semiconductor circuit element having metallic wiring. Specifically, the composition does not contain nitrogen-containing organic hydroxyl compounds, ammonia or fluorine compounds, and contains an aliphatic polycarboxylic acid having a melting point of 25°C or higher with an excellent residue removing property and having a metallic oxide main component as the residue removing component. The photoresist residue and polymer residue removing liquid composition, and the method of removing the residue used therewith, is capable of preventing the aliphatic polycarboxylic acid from being recrystallized by evaporation of water after a solution has adhered around a cleaning device liquid ejecting nozzle or a cleaning tank and a chamber. In the photoresist residue and polymer residue removing liquid composition containing the aliphatic polycarboxylic acid with a melting point of 25°C or higher, the removing liquid contains an organic solvent that is miscible with water and has a vapor pressure of 17 mm Hg or less at 25°C and a hydroxyl group within the structure.
摘要翻译：提供了光致抗蚀剂残渣和聚合物残渣除去液体组合物，以及除去其中使用的残留物的方法，用于除去在具有金属布线的半导体电路元件的制造过程中产生的光致抗蚀剂残留物和聚合物残留物。具体而言，该组合物不含有有机羟基化合物，氨或氟化合物，并且含有熔点为25℃以上且脂肪族除去性优异且具有金属氧化物主成分的脂肪族多元羧酸作为残渣去除组分。光致抗蚀剂残渣和聚合物残渣除去液体组合物以及除去残留物的除去方法能够防止在溶液附着在清洗装置液体喷射喷嘴或清洗之后通过蒸发水使脂肪族多元羧酸重结晶坦克和一个房间。在含有熔点为25℃以上的脂肪族多元羧酸的光致抗蚀剂残渣和聚合物残渣除去液组合物中，除去液含有与水混溶的有机溶剂，蒸气压为17mmHg以下 25℃和结构内的羟基。

7. 发明公开

EP2576747A1 HARD SURFACE TREATMENT COMPOSITION 有权转让
标题翻译：组合物技术处理硬表面
公开(公告)号：EP2576747A1
公开(公告)日：2013-04-10
申请号：EP11719579.2
申请日：2011-05-17
申请人： Unilever NV , Unilever PLC
发明人： BARNE, Sameer, Keshav , NAYAK, Kalpana, Kamalakar , PERINCHEERY, Aravindakshan , SAJI, Maya, Treesa
IPC分类号： C11D3/00 , C11D3/18 , C11D3/20 , C11D3/22 , C11D3/37 , C11D3/50 , C11D7/26 , C11D7/24
CPC分类号： C11D3/188 , C11D3/2034 , C11D3/2037 , C11D3/2062 , C11D3/2068 , C11D3/2072 , C11D3/2093 , C11D3/222 , C11D3/225 , C11D3/3707 , C11D3/3753 , C11D3/3757 , C11D3/3776 , C11D3/48 , C11D3/50 , C11D7/248 , C11D7/261 , C11D7/263 , C11D7/264 , C11D7/266
摘要： The invention is in the field of hard surface cleaning, especially hard surface treatment for obtaining a lasting anti-microbial benefit. It remains to be desired to prepare hard surface cleaning compositions having a high anti-microbial effect, even after longer time, with a low dosage of anti-microbial essential oils. It is therefore an object of the invention to provide a hard surface treatment composition, having good anti-microbial properties, at low levels of essential oil. Surprisingly it has been found that composition comprising a low amount of essential oil and a polymer complex provides improved anti-microbial efficacy.

8. 发明公开

EP2446008A1 VERWENDUNG VON DIETHERVERBINDUNGEN BEI DER CHEMISCHEN REINIGUNG VON TEXTIL-, LEDER- ODER PELZWAREN 有权
标题翻译：二醚在化学清洗纺织，皮革或毛皮商品用途
公开(公告)号：EP2446008A1
公开(公告)日：2012-05-02
申请号：EP10724084.8
申请日：2010-06-14
申请人： CHEMISCHE FABRIK KREUSSLER & CO. GMBH
发明人： SEITER, Manfred , MEYER, Cord , EIGEN, Helmut
IPC分类号： C11D1/722 , C11D3/43 , D06L1/02 , D06L1/04
CPC分类号： C11D3/43 , C11D3/0031 , C11D3/2068 , C11D7/263 , C11D7/5022 , C11D11/0017 , D06L1/02
摘要： The invention relates to an improved method for chemically cleaning textile, leather, or fur goods, wherein the goods to be cleaned are brought into contact with a cleaning agent, wherein the cleaning agent comprises at least one solvent, wherein according to the invention a cleaning agent is used comprising a compound of the general formula (I) as a solvent, wherein x is a whole number from 1 to 10 and R
1 , R
2 , R
3 , and R
4 are selected independently of each other from H, a C
1 - to C
22 -alkyl radical or alkenyl radical, a polyalkylene oxide, a C
3 - to C
6 -cycloalkyl radical, a carbo- or heterocyclical C
3 - to C
6 -cycloalkenyl radical, and an aryl radical. The invention further relates to the use of a solvent having the general formula (I) for producing a cleaning agent for chemically cleaning textiles, leather, and fur goods, and a liquid cleaning agent for use in a method for chemically cleaning textile, leather, or fur goods, wherein the cleaning agent comprises a portion of a solvent having the general formula (I).

9. 发明授权

EP1914296B1 Stripper containing an acetal or a ketal for removing post-etched phot-resist, etch polymer and residue 有权
标题翻译：通过光致抗蚀剂残留和其他残留物Ätzpolymers蚀刻与缩醛或缩酮除去雨刷
公开(公告)号：EP1914296B1
公开(公告)日：2011-03-16
申请号：EP07118852.8
申请日：2007-10-19
申请人： Air Products and Chemicals, Inc.
发明人： Egbe, Matthew I. , Legenza, Michael Walter
IPC分类号： C11D17/00
CPC分类号： C11D7/264 , C11D7/261 , C11D7/263 , C11D7/3281 , C11D7/5022 , C11D11/0047

10. 发明公开

EP2276588A1 CLEANING COMPOSITIONS FOR USE IN CLOSED LOOP CLEANING MACHINES 审中-公开
标题翻译：清洁组合物用于清洁机采用闭环
公开(公告)号：EP2276588A1
公开(公告)日：2011-01-26
申请号：EP09730097.4
申请日：2009-02-27
申请人： Dow Global Technologies Inc.
发明人： GEISSLER, Konrad , KUEMIN, Marius
IPC分类号： B08B3/08 , B08B3/14 , C11D7/50
CPC分类号： B08B3/08 , B08B3/14 , C11D7/263 , C11D7/5022 , D06F43/007 , D06L1/02 , D06L1/10
摘要： Embodiments of the present disclosure include cleaning processes, closed loop cleaning machines, and methods of cleaning an article. The cleaning process includes contacting a surface of an article with a cleaning composition in a cleaning chamber, where the cleaning composition includes at least about 85 percent by weight organic solvents, based on total weight of the cleaning composition, and where at least about 5 percent by weight of the organic solvents is propylene glycol, based on total weight of the organic solvents, to clean the surface of the article, collecting the cleaning composition including contaminants, and recovering the cleaning composition via distillation, where a distillation apparatus removes the contaminants from the cleaning composition and is connected to the cleaning chamber by a process stream.

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