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    • 3. 发明授权
    • MONOLITHIC FABRICATION OF THERMALLY ISOLATED MICROELECTROMECHANICAL SYSTEM (MEMS) DEVICES
    • 热分离微电子机械系统(MEMS)器件的整体制造
    • EP3095755B1
    • 2017-07-26
    • EP16168459.2
    • 2016-05-04
    • Honeywell International Inc.
    • REINKE, JohnLODDEN, Grant
    • B81B7/00B81C1/00
    • B81B7/0019B81B3/0081B81B7/0087B81B2201/0228B81B2201/025B81C1/0069H02N1/00
    • A method for fabricating a thermally isolated microelectromechanical system (MEMS) structure is provided. The method includes processing a first wafer of a first material with a glass wafer to form a composite substrate including at least one sacrificial structure of the first material and glass; forming a MEMS device in a second material; forming at least one temperature sensing element on at least one of: the composite substrate; and the MEMS device; and etching away the at least one sacrificial structure of the first material in the composite substrate to form at least one thermally isolating glass flexure. The MEMS device is thermally isolated on a thermal isolation stage by the at least one thermally isolating glass flexure. The at least one temperature sensing element in on a respective at least one of: the thermal isolation stage; and the MEMS device.
    • 提供了一种用于制造热隔离微机电系统(MEMS)结构的方法。 该方法包括用玻璃晶片处理第一材料的第一晶片以形成包括第一材料和玻璃的至少一个牺牲结构的复合衬底; 以第二材料形成MEMS器件; 在至少一个复合衬底上形成至少一个温度传感元件; 和MEMS器件; 以及蚀刻掉复合衬底中的第一材料的至少一个牺牲结构以形成至少一个热隔离玻璃弯曲部。 MEMS器件通过至少一个热绝缘玻璃挠曲件在热绝缘台上热隔离。 所述至少一个温度感测元件位于热隔离级中的相应的至少一个上: 和MEMS器件。
    • 7. 发明公开
    • Passive thermal isolation structure
    • 被动Wärmeisolationsstruktur
    • EP1829819A2
    • 2007-09-05
    • EP06125198.9
    • 2006-12-01
    • Honeywell International Inc.
    • Younger, Dan W.Lust, Lisa M
    • B81B7/00
    • B81B7/0087B81B2201/032F28F13/00F28F2270/00G05D23/024
    • A thermal isolation structure for use in passively regulating the temperature of a microdevice is disclosed. The thermal isolation structure can include a substrate wafer and a cap wafer defining an interior cavity, and a number of double-ended or single-ended thermal bimorphs coupled to the substrate wafer and thermally actustable between an initial position and a deformed position. The thermal bimorphs can be configured to deform and make contact with the cap wafer at different temperatures, creating various thermal shorts depending on the temperature of the substrate wafer. When attached to a microdevice such as a MEMS device, the thermal isolation structure can be configured to maintain the attached device at a constant temperature or within a particular temperature range.
    • 公开了一种用于被动调节微型设备的温度的隔热结构。 热隔离结构可以包括衬底晶片和限定内腔的帽晶片,以及耦合到衬底晶片并且在初始位置和变形位置之间可发热的多个双端或单端热双压电晶片。 热双晶体可以被配置成在不同的温度下变形并与盖晶片接触,根据衬底晶片的温度产生各种热短路。 当连接到诸如MEMS器件的微器件时,热隔离结构可以被配置为将连接的器件保持在恒定温度或特定温度范围内。
    • 8. 发明公开
    • MONOLITHIC FABRICATION OF THERMALLY ISOLATED MICROELECTROMECHANICAL SYSTEM (MEMS) DEVICES
    • 单片机HISTELLUNG VON THERMISCH ISOLIERTEN VORRICHTUNGEN MIT MIKROELEKTROMECHANISCHEN SYSTEMEN(MEMS)
    • EP3095755A1
    • 2016-11-23
    • EP16168459.2
    • 2016-05-04
    • Honeywell International Inc.
    • REINKE, JohnLODDEN, Grant
    • B81B7/00B81C1/00
    • B81B7/0019B81B3/0081B81B7/0087B81B2201/0228B81B2201/025B81C1/0069H02N1/00
    • A method for fabricating a thermally isolated microelectromechanical system (MEMS) structure is provided. The method includes processing a first wafer of a first material with a glass wafer to form a composite substrate including at least one sacrificial structure of the first material and glass; forming a MEMS device in a second material; forming at least one temperature sensing element on at least one of: the composite substrate; and the MEMS device; and etching away the at least one sacrificial structure of the first material in the composite substrate to form at least one thermally isolating glass flexure. The MEMS device is thermally isolated on a thermal isolation stage by the at least one thermally isolating glass flexure. The at least one temperature sensing element in on a respective at least one of: the thermal isolation stage; and the MEMS device.
    • 提供了一种用于制造热隔离微机电系统(MEMS)结构的方法。 该方法包括用玻璃晶片处理第一材料的第一晶片以形成包括第一材料和玻璃的至少一个牺牲结构的复合衬底; 在第二材料中形成MEMS器件; 在所述复合衬底中的至少一个上形成至少一个温度感测元件; 和MEMS器件; 并且蚀刻所述复合衬底中的所述第一材料的所述至少一个牺牲结构以形成至少一个热隔离玻璃弯曲部。 MEMS器件通过至少一个隔热玻璃弯曲件在热隔离台上热隔离。 所述至少一个温度感测元件位于以下各自中的至少一个中:热隔离级; 和MEMS器件。