会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明公开
    • Passive thermal isolation structure
    • 被动Wärmeisolationsstruktur
    • EP1829819A2
    • 2007-09-05
    • EP06125198.9
    • 2006-12-01
    • Honeywell International Inc.
    • Younger, Dan W.Lust, Lisa M
    • B81B7/00
    • B81B7/0087B81B2201/032F28F13/00F28F2270/00G05D23/024
    • A thermal isolation structure for use in passively regulating the temperature of a microdevice is disclosed. The thermal isolation structure can include a substrate wafer and a cap wafer defining an interior cavity, and a number of double-ended or single-ended thermal bimorphs coupled to the substrate wafer and thermally actustable between an initial position and a deformed position. The thermal bimorphs can be configured to deform and make contact with the cap wafer at different temperatures, creating various thermal shorts depending on the temperature of the substrate wafer. When attached to a microdevice such as a MEMS device, the thermal isolation structure can be configured to maintain the attached device at a constant temperature or within a particular temperature range.
    • 公开了一种用于被动调节微型设备的温度的隔热结构。 热隔离结构可以包括衬底晶片和限定内腔的帽晶片,以及耦合到衬底晶片并且在初始位置和变形位置之间可发热的多个双端或单端热双压电晶片。 热双晶体可以被配置成在不同的温度下变形并与盖晶片接触,根据衬底晶片的温度产生各种热短路。 当连接到诸如MEMS器件的微器件时,热隔离结构可以被配置为将连接的器件保持在恒定温度或特定温度范围内。