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1. 发明公开

EP4449488A1 ELECTROSTATIC END EFFECTOR FOR MANUFACTURING SYSTEM ROBOT 审中-公开
公开(公告)号：EP4449488A1
公开(公告)日：2024-10-23
申请号：EP22908507.1
申请日：2022-12-16
申请人： Applied Materials, Inc.
发明人： THANU, Rajkumar , WU, Pei-Chen , LACEKY, William , FARBER, Matvey , HUDGENS, Jeffrey, C.
IPC分类号： H01L21/683 , H01L21/677 , H01L21/687 , B25J15/00 , B25J11/00
CPC分类号： H01L21/67742 , H01L21/68707 , H01L21/6833 , H01L21/6831 , H01L21/68757 , B25J11/0095 , B25J15/0014 , B25J15/0085

2. 发明公开

EP3084818A1 SUBSTRATE SUPPORT APPARATUS HAVING REDUCED SUBSTRATE PARTICLE GENERATION 有权
标题翻译：与还原的底物颗粒生产基底承载设备
公开(公告)号：EP3084818A1
公开(公告)日：2016-10-26
申请号：EP14871014.8
申请日：2014-12-08
申请人： Applied Materials, Inc.
发明人： AGARWAL, Pulkit , SUH, Song-Moon , MORI, Glen , SANSONI, Steven V.
IPC分类号： H01L21/683
CPC分类号： H01L21/68757 , B25J11/0095 , B25J15/0014 , H01L21/68707 , H01L21/6875
摘要： Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes: a support surface; and a plurality of substrate contact elements protruding from the support surface, wherein the plurality of substrate contact elements are formed of a material having a hardness less than or equal to a hardness of silicon, having a low adhesion, having a coefficient of static friction large enough to prevent sliding, having a surface roughness less than or equal to 10 Ra, and that is electrically conductive.

3. 发明公开

EP2950329A1 TRANSFER SYSTEM, EXPOSURE APPARATUS, TRANSFER METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND SUCTION APPARATUS 无效
标题翻译： ÜBERTRAGUNGSSYSTEM，BELICHTUNGSVORRICHTUNG，ÜBERTRAGUNGSVERFAHREN，BELICHTUNGSVERFAHREN，VORRICHTUNGSHERSTELLUNGSVERFAHREN UND SAUGVORRICHTUNG
公开(公告)号：EP2950329A1
公开(公告)日：2015-12-02
申请号：EP13859307.4
申请日：2013-11-27
申请人： Nikon Corporation
发明人： HARA, Hideaki
IPC分类号： H01L21/027 , G03F7/20 , H01L21/677
CPC分类号： B25J11/0095 , B25J15/0616 , G03F7/70716 , G03F7/7075 , G03F7/70783 , H01L21/67259 , H01L21/67288 , H01L21/681 , H01L21/6838 , H01L21/68778
摘要： A carrier system is provided with a wafer stage (WST) which holds a mounted wafer (W) and is also movable along an XY plane, a chuck unit (153) which holds the wafer from above in a non-contact manner above a predetermined position and is vertically movable, and a plurality of vertical movement pins (140), which can support from below the wafer held by the chuck unit (153) on the wafer stage (WST) when the wafer stage (WST) is positioned at the predetermined position above and can also move vertically. Then, flatness of the wafer (W) is measured by a Z position detection system (146), and based on the measurement results, the chuck unit(153) and the vertical movement pins (140) that hold (support) the wafer (W) are independently driven.
摘要翻译：载体系统设置有保持安装的晶片（W）并且也可沿着XY平面移动的晶片台（WST），卡盘单元（153），其以不接触的方式从上方保持晶片高于预定的位置并且是可垂直移动的;以及多个垂直移动销（140），当晶片台（WST）位于该位置时，该垂直移动销（140）可以从晶片载台（WST）上由卡盘单元（153）保持的晶片的下方支撑上方的预定位置，也可以垂直移动。然后，通过Z位置检测系统（146）测量晶片（W）的平坦度，并且基于测量结果，夹持（支撑）晶片的卡盘单元（153）和垂直移动销（140） W）独立驱动。

4. 发明公开

EP2716416A2 Loading/unloading robot 有权
标题翻译：装载/卸载机器人
公开(公告)号：EP2716416A2
公开(公告)日：2014-04-09
申请号：EP13187347.3
申请日：2013-10-04
申请人： Hirata Corporation
发明人： Ando, Hiroaki
IPC分类号： B25J9/04
CPC分类号： B25J18/04 , B25J9/043 , B25J11/0095
摘要： A loading/unloading robot includes an arm unit attached to a support unit that is capable of being raised and lowered and a hand unit for conveying a loaded/unloaded object, attached to the arm unit. The support unit includes a base portion capable of revolving around a raising/lowering axis and a head portion rotatably attached to the base portion. The arm unit includes arms that are rotatably attached to the head portion. Front ends of the arms move forward and backward along a forward/backward direction that passes the head portion. The hand unit includes a loading/unloading hand rotatably attached to the arm. A center distance from the rotational axis of the head portion to the rotational axes of rear arms is shorter than a center distance from an axis of revolution of the base portion to the rotational axis of the head portion.
摘要翻译：装载/卸载机器人包括附接到能够升降的支撑单元的臂单元和附接到臂单元的用于传送装载/卸载物体的手单元。支撑单元包括能够围绕升降轴旋转的基部和可旋转地附接到基部的头部。臂单元包括可旋转地附接到头部的臂。臂的前端沿着通过头部的前后方向前后移动。手单元包括可旋转地连接到手臂的装载/卸载手。从头部的旋转轴线到后臂的旋转轴线的中心距离小于从基部的旋转轴线到头部的旋转轴线的中心距离。

5. 发明公开

EP3163603A1 ROBOT HAVING END EFFECTOR AND METHOD OF OPERATING THE SAME 有权
标题翻译：具有末端执行器的机器人及其操作方法
公开(公告)号：EP3163603A1
公开(公告)日：2017-05-03
申请号：EP16178043.2
申请日：2010-01-29
申请人： Kawasaki Jukogyo Kabushiki Kaisha
发明人： HASHIMOTO, Yasuhiko , YOSHIDA, Tetsuya
IPC分类号： H01L21/677 , B25J15/08
CPC分类号： B25J15/0014 , B25J9/042 , B25J9/10 , B25J11/0095 , B25J15/0052 , B25J15/0616 , H01L21/67742 , H01L21/68707 , Y10S414/137 , Y10S414/141 , Y10T74/20305
摘要： The present invention relates to an end effector including: blade members for holding substrates, each configured to hold the substrate, and configured such that each interval between the blade members can be changed; a blade support unit configured to support the blade members, the blade support unit being configured to be driven integrally with the blade members by the robot; and blade drive means configured to change the interval between the blade members by moving at least one of the blade members relative to another blade member.
摘要翻译：末端执行器技术领域本发明涉及一种末端执行器，该末端执行器包括：用于保持基板的叶片构件，每个叶片构件用于保持基板，刀片支撑单元，所述刀片支撑单元构造成支撑所述刀片构件，所述刀片支撑单元被配置为由所述机器人与所述刀片构件一体驱动; 以及叶片驱动装置，该叶片驱动装置构造成通过相对于另一叶片构件移动至少一个叶片构件来改变叶片构件之间的间隔。

6. 发明公开

EP3056321A3 LOADING/UNLOADING ROBOT 有权
标题翻译： LADE- / ENTLADEROBOTER
公开(公告)号：EP3056321A3
公开(公告)日：2017-03-01
申请号：EP16162163.6
申请日：2013-10-04
申请人： Hirata Corporation
发明人： ANDO, Hiroaki
IPC分类号： B25J9/04
CPC分类号： B25J18/04 , B25J9/043 , B25J11/0095
摘要： A loading/unloading robot comprising: a support unit installed so as to be capable of being raised and lowered; an arm unit attached to the support unit; and a hand unit for conveying an object to be loaded and unloaded, attached to the arm unit, wherein the support unit includes a base portion that can be revolved around a raising/lowering axis that extends in a raising/lowering direction and a head portion rotatably attached to the base portion, the arm unit includes an arm that is rotatably attached to the head portion, a front end of the arm moves forward and backward along a forward/backward direction that passes the head portion, the hand unit includes a loading/unloading hand rotatably attached to the front end of the arm, the head portion includes a base-end portion supported on an upper surface of the base portion that is a head portion installation surface, a front portion including an arm installation surface on which the arm is attached, and a stepped portion that integrally joins the base-end portion and the front portion, a height of an upper surface of the front portion that is the arm installation surface is lower than a height of an upper surface of the base-end portion, and a height of the arm installation surface is equal to or lower than a height of the upper surface of the base portion that is the head portion installation surface.
摘要翻译：装载/卸载机器人包括附接到能够升高和降低的支撑单元的臂单元和用于传送附接到臂单元的加载/卸载物体的手单元。支撑单元包括能够围绕升降轴旋转的基部和可旋转地附接到基部的头部。臂单元包括可旋转地附接到头部的臂。臂的前端沿着通过头部的前后方向前后移动。手动单元包括可旋转地附接到臂的装载/卸载手。从头部的旋转轴线到后臂的旋转轴线的中心距离比从基部的旋转轴线到头部的旋转轴线的中心距离短。

7. 发明公开

EP2950328A4 SUCTION APPARATUS, CARRY-IN METHOD, CONVEYANCE SYSTEM, LIGHT EXPOSURE DEVICE, AND DEVICE PRODUCTION METHOD 审中-公开
标题翻译： SAUGVORRICHTUNG，EINTRAGEVERFAHREN，FÖRDERSYSTEM，LICHTEXPOSITIONSVORRICHTUNG UND VORRICHTUNGSHERSTELLUNGSVERFAHREN
公开(公告)号：EP2950328A4
公开(公告)日：2017-01-25
申请号：EP13858330
申请日：2013-11-27
申请人： NIPPON KOGAKU KK
发明人： ICHINOSE GO , IBE TAISUKE
IPC分类号： H01L21/027 , B25J11/00 , G03F7/20 , H01L21/683 , H01L21/687
CPC分类号： H01L21/6838 , B25J11/0095 , G03F7/70908 , H01L21/68742
摘要： In a carrier system, a chuck unit (153) is used to hold a placed wafer (W) from above, and vertical-motion pins (140) use suction to hold the wafer (W) from below. Then, chuck unit (153) and vertical-motion pins (140) are subsequently lowered until a bottom surface of the wafer comes into contact with a wafer table (WTB). During the lowering, the holding force exerted by chuck unit (153) and the arrangement of chuck members (124) are optimally adjusted such that, as a result of the restraint of wafer (W) by chuck unit (153) and vertical-motion pins (140), localized surplus-restraint is imparted to wafer (W), and warping does not occur.
摘要翻译：在载体系统中，卡盘单元（153）用于从上方保持放置的晶片（W），并且垂直运动销（140）使用吸力从下面保持晶片（W）。然后，随后将卡盘单元（153）和垂直运动销（140）降低直到晶片的底表面与晶片台（WTB）接触。在下降期间，卡盘单元（153）施加的保持力和卡盘构件（124）的布置被最佳地调节，使得由于通过卡盘单元（153）限制晶片（W）和垂直运动销（140），局部剩余约束被赋予晶片（W），并且不发生翘曲。

8. 发明公开

EP3056321A2 LOADING/UNLOADING ROBOT 有权
标题翻译： LADE- / ENTLADEROBOTER
公开(公告)号：EP3056321A2
公开(公告)日：2016-08-17
申请号：EP16162163.6
申请日：2013-10-04
申请人： Hirata Corporation
发明人： ANDO, Hiroaki
IPC分类号： B25J9/04
CPC分类号： B25J18/04 , B25J9/043 , B25J11/0095
摘要： A loading/unloading robot comprising: a support unit installed so as to be capable of being raised and lowered; an arm unit attached to the support unit; and a hand unit for conveying an object to be loaded and unloaded, attached to the arm unit, wherein the support unit includes a base portion that can be revolved around a raising/lowering axis that extends in a raising/lowering direction and a head portion rotatably attached to the base portion, the arm unit includes an arm that is rotatably attached to the head portion, a front end of the arm moves forward and backward along a forward/backward direction that passes the head portion, the hand unit includes a loading/unloading hand rotatably attached to the front end of the arm, the head portion includes a base-end portion supported on an upper surface of the base portion that is a head portion installation surface, a front portion including an arm installation surface on which the arm is attached, and a stepped portion that integrally joins the base-end portion and the front portion, a height of an upper surface of the front portion that is the arm installation surface is lower than a height of an upper surface of the base-end portion, and a height of the arm installation surface is equal to or lower than a height of the upper surface of the base portion that is the head portion installation surface.
摘要翻译：一种装载/卸载机器人，包括：安装成能够升高和降低的支撑单元; 附接到所述支撑单元的臂单元; 以及用于传送被安装到所述臂单元上的待装载物体的手单元，其中，所述支撑单元包括可围绕沿着上下方向延伸的上下轴线旋转的基部，以及头部臂单元包括可旋转地附接到头部的臂，臂的前端沿着通过头部的前后方向前后移动，手单元包括负载可拆卸地安装在臂的前端的卸载手，头部包括支撑在作为头部安装表面的基部的上表面上的基端部，包括臂安装表面的前部，并且与前端部一体地连接的台阶部分，作为臂安装面的前部的上表面的高度低于基端部的上表面的高度和臂安装面的高度等于或低于作为头部安装面的基部的上表面的高度。

9. 发明公开

EP2891175A1 SINGLE ULTRA-PLANAR WAFER TABLE STRUCTURE FOR BOTH WAFERS AND FILM FRAMES 有权
标题翻译：单瓶EXTREMELY晶片平台结构晶圆以及电影FRAME
公开(公告)号：EP2891175A1
公开(公告)日：2015-07-08
申请号：EP13833045.1
申请日：2013-09-02
申请人： Semiconductor Technologies & Instruments Pte Ltd.
发明人： JIN Jian Ping , LEE Leng Kheam
IPC分类号： H01L21/683
CPC分类号： H01L21/681 , B25J11/0095 , B25J15/0616 , B25J15/0658 , B25J15/0666 , G01B11/27 , G01N21/9501 , G01N2201/025 , H01L21/67144 , H01L21/67706 , H01L21/6838 , H01L21/68757 , Y10T29/49826
摘要： A wafer table structure providing a single wafer table surface suitable for handling both wafers and film frames includes a base tray having a set of compartments formed therein by way of a set of ridges formed in or on an interior base tray surface; a hardenable fluid permeable compartment material disposed within the set of base tray compartments; and a set of openings formed in the base tray interior surface by which the hardened compartment material is exposable to negative or positive pressures. The base tray includes a first ceramic material (e.g., porcelain), and the hardenable compartment material includes a second ceramic material. The base tray and the compartment material are simultaneously machinable by way of a standard machining process to thereby planarize exposed outer surfaces of the base tray and the hardened compartment material at an essentially identical rate for forming a highly or ultra-planar wafer table surface.

10. 发明公开

EP2840599A1 ACCOMMODATING CONTAINER, SHUTTER OPENING AND CLOSING UNIT FOR ACCOMMODATING CONTAINER, AND WAFER STOCKER USING SAME 有权
标题翻译： RECORD容器中，快门打开和关闭单元RECORDING集装箱及WAFER AUFBEWAHER SO
公开(公告)号：EP2840599A1
公开(公告)日：2015-02-25
申请号：EP13778995.4
申请日：2013-04-10
申请人： Rorze Corporation
发明人： SAKIYA, Fumio , SAKATA, Katsunori
IPC分类号： H01L21/673
CPC分类号： H01L21/67742 , B25J11/0095 , E05F15/47 , E05F15/50 , E05F15/603 , E05F15/78 , H01L21/67265 , H01L21/67346 , H01L21/67379 , H01L21/67383 , H01L21/67386 , H01L21/67393 , H01L21/67748 , H01L21/67769 , H01L21/67772 , H01L21/67775
摘要： Provided is a wafer stocker that can prevent the inflow of an external atmosphere, maintain a wafer storage space at a desired atmosphere with a relatively small amount of gas, and prevent dust from being attached to a wafer surface. A shutter portion, including multiple shield plates having the same height as an interval between shelf plates disposed in a storage container, is disposed with a slight space from a body portion, and by supplying clean gas into the storage container, a clean atmosphere of a higher pressure than an external environment is maintained, and a shutter portion is opened and closed by moving up and down the shield plate independently from the shelf plate that supports a wafer.
摘要翻译：本发明提供一种晶圆储料器也可以防止外部空气的流入而，保持在期望的气氛中在晶片的存储空间与气体的相对小的量，并且防止灰尘附着到晶片表面。快门部分，包括具有相同的高度，在储存容器处理完毕搁板之间的间隔的多个屏蔽板，设置有从主体部分的轻微的空间，并通过提供清洁气体至储存容器，的清洁气氛比外部环境更高的压力被保持，并且一个活门部分被打开和关闭通过上下移动从搁板屏蔽板unabhängig支撑晶片一样。

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