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1. 发明授权

EP2939265B1 WAFER LEVEL PACKAGING OF MICROBOLOMETER VACUUM PACKAGE ASSEMBLIES 有权
公开(公告)号：EP2939265B1
公开(公告)日：2018-10-31
申请号：EP13822065.2
申请日：2013-12-26
申请人： Flir Systems, Inc.
发明人： SCHWEIKERT, Paul , SHARPE, Andrew , CARLSON, Gregory A. , MATSON, Alex , VILANDER, Scott , ZAHUTA, Bob , GOEDEN, Richard M.
IPC分类号： H01L21/50 , H01L21/67 , H01L23/00 , B81C1/00 , H01L21/677 , H01L21/68 , H01L21/683 , H01L31/0203 , H01L31/09
CPC分类号： H01L21/50 , B81C1/00269 , B81C2203/0118 , H01L21/67109 , H01L21/6719 , H01L21/67207 , H01L21/67745 , H01L21/67748 , H01L21/67757 , H01L21/681 , H01L21/6831 , H01L24/94 , H01L31/0203 , H01L31/09 , H01L2924/12042 , H01L2924/1461 , H01L2924/16235 , Y10T29/41 , H01L2924/00
摘要： An apparatus for the wafer level packaging (WLP) of micro-bolometer vacuum package assemblies (VPAs), in one embodiment, includes a wafer alignment and bonding chamber, a bolometer wafer chuck and a lid wafer chuck disposed within the chamber in vertically facing opposition to each other, means for creating a first ultra-high vacuum (UHV) environment within the chamber, means for heating and cooling the bolometer wafer chuck and the lid wafer chuck independently of each other, means for moving the lid wafer chuck in the vertical direction and relative to the bolometer wafer chuck, means for moving the bolometer wafer chuck translationally in two orthogonal directions in a horizontal plane and rotationally about a vertical axis normal to the horizontal plane, and means for aligning a fiducial on a bolometer wafer held by the bolometer wafer chuck with a fiducial on a lid wafer held by the lid wafer chuck.

2. 发明授权

EP3091567B1 SILICON WAFER PRE-ALIGNMENT DEVICE AND METHOD THEREFOR 有权转让
公开(公告)号：EP3091567B1
公开(公告)日：2018-08-08
申请号：EP14875898.0
申请日：2014-12-26
申请人： Shanghai Micro Electronics Equipment (Group) Co., Ltd.
发明人： SUN, Weiwang , WANG, Gang , HUANG, Chunxia , HU, Songli , JIANG, Jie , LU, Ruzhan , MOU, Jiyuan
IPC分类号： H01L21/68
CPC分类号： H01L21/681 , H01L21/6838 , H01L21/68764 , H01L21/68785 , H01L22/12 , H01L22/22
摘要： A wafer pre-alignment device is disclosed, including a first unit (40) configured to drive a wafer (60) to rotate or move upward or downward, a second unit (50) configured to drive the wafer to translate, and a position detector including a light source, a lens and an image sensor (20). A light beam from the light source passes through the wafer and the lens and thereby provides information indicating a position of the wafer to the image sensor. The first unit and the second unit are able to adjust the position of the wafer based on the information obtained by the image sensor. A method for pre-aligning a TSV wafer is also disclosed.

3. 发明授权

EP3117270B1 SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS 有权
公开(公告)号：EP3117270B1
公开(公告)日：2018-07-18
申请号：EP15707146.5
申请日：2015-03-02
申请人： ASML Netherlands B.V.
发明人： LOF, Joeri , KAUFFMAN, Joost , PETERS, Martin Dieter Nico , RUTGERS, Petrus Theodorus , STOPEL, Martijn Hendrikus Wilhelmus , VAN DEN EIJKEL, Gerard , VAN DER SCHOOT, Harmen Klaas , VISSER, Raimond
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70775 , G01B11/272 , G03F7/7075 , G03F9/7011 , H01L21/681 , H01L21/682 , H01L21/68707 , H01L22/12
摘要： A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.

4. 发明公开

EP3244264A3 EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 无效
公开(公告)号：EP3244264A3
公开(公告)日：2018-02-07
申请号：EP17169465.6
申请日：2010-08-24
申请人： Nikon Corporation
发明人： Shibazaki, Yuichi
IPC分类号： G03F7/20
CPC分类号： G03F7/20 , G01B11/27 , G03F7/70133 , G03F7/70358 , G03F7/70483 , G03F7/70516 , G03F7/70725 , G03F7/70775 , G03F9/70 , H01L21/681 , Y10T29/49002
摘要： Within an area (A 0 ) where of four heads (60 1 to 60 4 ) installed on a stage (WST1), heads included in the first head group and the second head group to which three heads each belong that include one head different from each other face the corresponding areas on a scale plate, the stage (WST1) is driven based on positional information which is obtained using the first head group, as well as obtaining the displacement (displacement of position, rotation, and scaling) between the first and second reference coordinate systems (C 1 , C 2 ) corresponding to the first and second head groups using the positional information obtained using the first and second head groups. By using the results and correcting measurement results obtained using the second head group, the displacement between the first and second reference coordinate systems (C 1 , C 2 ) is calibrated, which allows the measurement errors that come with the displacement between the areas on the scale plates where each of the four heads (60 1 to 60 4 ) face to be corrected.

5. 发明公开

EP3244263A3 EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 无效
公开(公告)号：EP3244263A3
公开(公告)日：2018-02-07
申请号：EP17169460.7
申请日：2010-08-24
申请人： Nikon Corporation
发明人： Shibazaki, Yuichi
IPC分类号： G03F7/20
CPC分类号： G03F7/20 , G01B11/27 , G03F7/70133 , G03F7/70358 , G03F7/70483 , G03F7/70516 , G03F7/70725 , G03F7/70775 , G03F9/70 , H01L21/681 , Y10T29/49002
摘要： Within an area (A 0 ) where of four heads (60 1 to 60 4 ) installed on a stage (WST1), heads included in the first head group and the second head group to which three heads each belong that include one head different from each other face the corresponding areas on a scale plate, the stage (WST1) is driven based on positional information which is obtained using the first head group, as well as obtaining the displacement (displacement of position, rotation, and scaling) between the first and second reference coordinate systems (C 1 , C 2 ) corresponding to the first and second head groups using the positional information obtained using the first and second head groups. By using the results and correcting measurement results obtained using the second head group, the displacement between the first and second reference coordinate systems (C 1 , C 2 ) is calibrated, which allows the measurement errors that come with the displacement between the areas on the scale plates where each of the four heads (60 1 to 60 4 ) face to be corrected.

6. 发明授权

EP3163604B1 POSITION DETECTION APPARATUS, POSITION DETECTION METHOD, INFORMATION PROCESSING PROGRAM, AND STORAGE MEDIUM 有权
标题翻译：位置检测装置，位置检测方法，信息处理程序和存储介质
公开(公告)号：EP3163604B1
公开(公告)日：2017-12-13
申请号：EP16191665.5
申请日：2016-09-30
申请人： OMRON CORPORATION
发明人： MINATO, Yoshihisa , HATTORI, Kosuke , KIUCHI, Yutaka , AKATSUKA, Yuki
IPC分类号： H01L21/68
CPC分类号： H01L21/67259 , G06T7/0004 , G06T7/0042 , G06T2207/10004 , G06T2207/30148 , H01L21/681 , H01L21/682
摘要： A hypothesis testing position detection apparatus improves robustness against abnormal detection values, and achieves both high accuracy estimation and high-speed estimation processing. An image processing apparatus (10) extracts, from calculated values (points H1 and H2) for a central position of a plane shape (I50), one of the calculated values nearer a provisional center (PP1) as a candidate for evaluation (testing) performed using a plurality of detection points (D51 to Dn).

7. 发明公开

EP3236492A1 VERFAHREN UND SYSTEM ZUR STEUERUNG EINER VORRICHTUNG ZUM GREIFEN ODER POSITIONIEREN VON AUF EINEM SUBSTRATTRÄGER ANGEORDNETEN SUBSTRATEN 审中-公开
标题翻译：用于控制设备以在基板载体上设置的抓取或定位基板的方法和系统
公开(公告)号：EP3236492A1
公开(公告)日：2017-10-25
申请号：EP16165811.7
申请日：2016-04-18
申请人： Meyer Burger (Germany) AG
发明人： Ansorge, Erik , Böhm, Christian , Raschke, Sebastian
IPC分类号： H01L21/68 , H01L21/67
CPC分类号： H01L21/67248 , H01L21/681
摘要： Die Erfindung betrifft ein Verfahren zur Steuerung einer Vorrichtung zum Greifen oder Positionieren von mindestens einem Substrat auf einem Substratträger. Der Substratträger besteht aus einem Material mit mindestens einem bekannten Ausdehnungskoeffizienten. Bei dem Verfahren wird zunächst bei einer bekannten ersten Temperatur des Substratträgers ein erstes Parameterset des Substratträgers bestehend Länge, Breite und/oder Höhe des Substratträgers sowie die relative Position eines Substratbezugspunktes auf dem Substratträger bezüglich eines Bezugspunktes des Substratträgers ermittelt. Nachfolgend wird ein zweites Parameterset aus Länge, Breite und/oder Höhe des Substratträgers bei einer unbekannten zweiten Temperatur des Substratträgers mit Hilfe von mindestens zwei Lasersensoren ermittelt, wobei zwei der Lasersensoren auf gegenüberliegenden Seiten des Substratträgers und auf einer Laserlinie angeordnet sind. Mit Hilfe des ermittelten zweiten Parametersets und des mindestens einen Ausdehnungskoeffizienten kann die genaue Position des Substratbezugspunktes auf dem an einer ersten Position positionierten Substratträger bei der unbekannten zweiten Temperatur ermittelt und die Vorrichtung zum Greifen oder Positionieren entsprechend gesteuert werden. Das erfindungsgemäße System zur Steuerung einer Vorrichtung zum Greifen oder Positionieren weist den Verfahrensschritten entsprechende Mittel auf.
摘要翻译：本发明涉及一种用于控制用于将至少一个衬底夹持或定位在衬底载体上的装置的方法。基材载体由具有至少一种已知膨胀系数的材料组成。在该方法中，第一组由长度，宽度和/或衬底载体的高度与基板支撑件的基板载体的一个参考点的在基板的基准点的相对位置的基片载体的参数相对于确定为首先在衬底支撑件的一个已知的第一温度。接着，第二组的长度，宽度和/或衬底支撑件的高度的参数在衬底支撑件与至少两个激光传感器的帮助下的未知的第二温度，其中，两个激光传感器定位在衬底载体的相对侧上并在激光线被确定。与所确定的第二参数集的助剂和至少一个膨胀系数，基板参考点的精确位置可以在在未知温度下的位于第一位置的衬底载具来确定，并且所述第二设备是用于夹持或定位相应地控制。根据本发明的用于控制用于抓取或定位的装置的系统包括对应于方法步骤的装置。

8. 发明公开

EP3227929A1 SOLAR CELL PRODUCTION APPARATUS FOR PROCESSING A SUBSTRATE, AND METHOD FOR PROCESSING A SUBSTRATE FOR THE PRODUCTION OF A SOLAR CELL 审中-公开
标题翻译：用于处理基板的太阳能电池生产设备以及处理用于生产太阳能电池的基板的方法
公开(公告)号：EP3227929A1
公开(公告)日：2017-10-11
申请号：EP14808580.6
申请日：2014-12-02
申请人： Applied Materials Italia Srl
发明人： DE SANTI, Luigi , GISLON, Daniele , BACCINI, Andrea , VERCESI, Tommaso , PASQUALIN, Gianfranco
IPC分类号： H01L31/18
CPC分类号： H01L31/18 , B41F15/00 , B41M3/00 , H01L21/681 , H01L22/10
摘要： The present disclosure provides a solar cell production apparatus for processing a substrate. The solar cell production apparatus includes at least one substrate support configured to support the substrate; one or more printing stations configured for forming a printing structure on the substrate positioned on the substrate support; and an inspection system including at least one first camera, wherein the at least one first camera is configured for detecting a position of the printing structure on the substrate positioned on the substrate support while the substrate is passing through a field of view of the at least one first camera.
摘要翻译：本发明提供一种用于处理基板的太阳能电池制造装置。该太阳能电池生产设备包括：至少一个衬底支撑件（12），被构造为支撑衬底（10）; 一个或多个印刷工位（11），所述印刷工位（11）被配置用于在位于所述基底支撑件（12）上的所述基底（10）上形成印刷结构; 以及包括至少一个第一相机（180）的检查系统，其中所述至少一个第一相机（180）被配置用于检测位于所述基板支撑件（12）上的所述基板（10）上的所述印刷结构的位置，而所述衬底穿过至少一个第一照相机的视场。

9. 发明授权

EP2346073B1 PREALIGNER 有权
标题翻译：预对准
公开(公告)号：EP2346073B1
公开(公告)日：2017-05-24
申请号：EP08877541.6
申请日：2008-10-22
申请人： Kawasaki Jukogyo Kabushiki Kaisha
发明人： HASHIMOTO, Yasuhiko
IPC分类号： H01L21/677 , H01L21/68 , H01L21/687
CPC分类号： H01L21/681 , H01L21/67748 , H01L21/68 , H01L21/68707 , H01L21/68742

10. 发明授权

EP2521635B1 SYSTEM AND METHOD FOR PICKING AND PLACEMENT OF CHIP DIES 有权
标题翻译：系统和方法记录和芯片PLACE
公开(公告)号：EP2521635B1
公开(公告)日：2016-12-14
申请号：EP11713530.1
申请日：2011-01-06
申请人： Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO
发明人： VAN ZWET, Erwin John , VAN DOOREN, Léon , VERMEER, Adrianus Johannes Petrus Maria , MODDEMEIJER, Kees
IPC分类号： B25J9/16 , G05B19/401 , H01L21/68 , H05K13/04
CPC分类号： B25J9/1697 , G05B19/401 , G05B2219/40609 , G05B2219/45029 , H01L21/681 , Y10T29/53087 , Y10T29/53091 , Y10T29/53174 , Y10T29/53178

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